DE60120322D1 - Plattierungsbad und Verfahren zur Plattierung von Zinn-Zink Legierungen - Google Patents
Plattierungsbad und Verfahren zur Plattierung von Zinn-Zink LegierungenInfo
- Publication number
- DE60120322D1 DE60120322D1 DE60120322T DE60120322T DE60120322D1 DE 60120322 D1 DE60120322 D1 DE 60120322D1 DE 60120322 T DE60120322 T DE 60120322T DE 60120322 T DE60120322 T DE 60120322T DE 60120322 D1 DE60120322 D1 DE 60120322D1
- Authority
- DE
- Germany
- Prior art keywords
- quaternary ammonium
- bath
- plating
- ammonium polymer
- salts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/60—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of tin
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US691985 | 2000-10-19 | ||
US09/691,985 US6436269B1 (en) | 2000-10-19 | 2000-10-19 | Plating bath and method for electroplating tin-zinc alloys |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60120322D1 true DE60120322D1 (de) | 2006-07-20 |
DE60120322T2 DE60120322T2 (de) | 2007-06-06 |
Family
ID=24778800
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60120322T Expired - Lifetime DE60120322T2 (de) | 2000-10-19 | 2001-10-19 | Plattierungsbad und Verfahren zur Plattierung von Zinn-Zink Legierungen |
Country Status (6)
Country | Link |
---|---|
US (1) | US6436269B1 (de) |
EP (1) | EP1201789B9 (de) |
AT (1) | ATE329069T1 (de) |
CA (1) | CA2359444C (de) |
DE (1) | DE60120322T2 (de) |
ES (1) | ES2263539T3 (de) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100470674B1 (ko) * | 2000-11-18 | 2005-03-07 | 주식회사 포스코 | 주석-아연 합금전기도금용액용 첨가제, 주석-아연합금전기도금용액 및 이 도금용액을 이용한 주석-아연합금전기도금강판의 제조방법 |
JP4758614B2 (ja) * | 2003-04-07 | 2011-08-31 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | 電気めっき組成物および方法 |
JP2005060822A (ja) * | 2003-08-08 | 2005-03-10 | Rohm & Haas Electronic Materials Llc | 複合基体の電気メッキ |
US7964083B2 (en) * | 2004-03-04 | 2011-06-21 | Taskem, Inc. | Polyamine brightening agent |
EP2085502A1 (de) | 2008-01-29 | 2009-08-05 | Enthone, Incorporated | Elektrolytzusammensetzung und Verfahren zur Abscheidung einer Zinn-Zink-Legierung |
EP2175048A1 (de) | 2008-10-13 | 2010-04-14 | Atotech Deutschland Gmbh | Metallplattierungszusammensetzung zur Beschichtung von Blechzinklegierungen auf einem Substrat |
EP2292679B1 (de) * | 2009-09-08 | 2020-03-11 | ATOTECH Deutschland GmbH | Polymere mit Aminoendgruppen und deren Verwendung als Additive für galvanische Zink- und Zinklegierungsbäder |
EP2698449B1 (de) * | 2012-08-13 | 2019-10-02 | ATOTECH Deutschland GmbH | Plattierungsbadzusammensetzung für die Tauchplattierung von Gold |
CN103757672B (zh) * | 2014-01-20 | 2016-06-29 | 广州市海科顺表面处理有限公司 | 一种锌锡合金电镀方法 |
US9273407B2 (en) * | 2014-03-17 | 2016-03-01 | Hong Kong Applied Science and Technology Research Institute Company Limited | Additive for electrodeposition |
CN104562090A (zh) * | 2014-12-30 | 2015-04-29 | 昆明理工大学 | 一种低共熔型离子液体原位电解制备纳米多孔铜的方法 |
US9783905B2 (en) | 2014-12-30 | 2017-10-10 | Rohm and Haas Electronic Mateirals LLC | Reaction products of amino acids and epoxies |
US9725816B2 (en) | 2014-12-30 | 2017-08-08 | Rohm And Haas Electronic Materials Llc | Amino sulfonic acid based polymers for copper electroplating |
US9611560B2 (en) | 2014-12-30 | 2017-04-04 | Rohm And Haas Electronic Materials Llc | Sulfonamide based polymers for copper electroplating |
CN104894630A (zh) * | 2015-05-06 | 2015-09-09 | 哈尔滨工业大学 | 一种离子液体电沉积制备三维锗/碳纳米复合薄膜的方法 |
CN105063690A (zh) * | 2015-08-21 | 2015-11-18 | 无锡桥阳机械制造有限公司 | 一种Sn-Zn合金电镀液 |
US9809892B1 (en) * | 2016-07-18 | 2017-11-07 | Rohm And Haas Electronic Materials Llc | Indium electroplating compositions containing 1,10-phenanthroline compounds and methods of electroplating indium |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4157388A (en) | 1977-06-23 | 1979-06-05 | The Miranol Chemical Company, Inc. | Hair and fabric conditioning compositions containing polymeric ionenes |
JPS6015716B2 (ja) | 1977-10-21 | 1985-04-20 | デイツプソ−ル株式会社 | 錫または錫合金電気めつき用浴の安定化方法 |
GB2013241B (en) | 1977-11-16 | 1982-03-24 | Dipsol Chem | Electroplating bath for depositing tin or tin alloy with brightness |
US4614568A (en) * | 1983-06-14 | 1986-09-30 | Nihon Kogyo Kabushiki Kaisha | High-speed silver plating and baths therefor |
US4717458A (en) * | 1986-10-20 | 1988-01-05 | Omi International Corporation | Zinc and zinc alloy electrolyte and process |
JP3279353B2 (ja) | 1992-09-25 | 2002-04-30 | ディップソール株式会社 | 錫−亜鉛合金電気めっき浴 |
US5405523A (en) | 1993-12-15 | 1995-04-11 | Taskem Inc. | Zinc alloy plating with quaternary ammonium polymer |
US5435898A (en) * | 1994-10-25 | 1995-07-25 | Enthone-Omi Inc. | Alkaline zinc and zinc alloy electroplating baths and processes |
DE4446329A1 (de) * | 1994-12-23 | 1996-06-27 | Basf Ag | Salze aromatischer Hydroxylverbindungen und deren Verwendung als Glanzbildner |
US6143160A (en) | 1998-09-18 | 2000-11-07 | Pavco, Inc. | Method for improving the macro throwing power for chloride zinc electroplating baths |
-
2000
- 2000-10-19 US US09/691,985 patent/US6436269B1/en not_active Expired - Lifetime
-
2001
- 2001-10-17 CA CA2359444A patent/CA2359444C/en not_active Expired - Fee Related
- 2001-10-19 AT AT01124311T patent/ATE329069T1/de not_active IP Right Cessation
- 2001-10-19 ES ES01124311T patent/ES2263539T3/es not_active Expired - Lifetime
- 2001-10-19 DE DE60120322T patent/DE60120322T2/de not_active Expired - Lifetime
- 2001-10-19 EP EP01124311A patent/EP1201789B9/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP1201789B9 (de) | 2006-11-15 |
EP1201789A3 (de) | 2002-05-08 |
EP1201789B1 (de) | 2006-06-07 |
ATE329069T1 (de) | 2006-06-15 |
EP1201789A2 (de) | 2002-05-02 |
US6436269B1 (en) | 2002-08-20 |
CA2359444A1 (en) | 2002-04-19 |
DE60120322T2 (de) | 2007-06-06 |
CA2359444C (en) | 2010-06-29 |
ES2263539T3 (es) | 2006-12-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |