DE60106588D1 - Spatiale und spektrale wellenfrontanalyse und -messung - Google Patents

Spatiale und spektrale wellenfrontanalyse und -messung

Info

Publication number
DE60106588D1
DE60106588D1 DE60106588T DE60106588T DE60106588D1 DE 60106588 D1 DE60106588 D1 DE 60106588D1 DE 60106588 T DE60106588 T DE 60106588T DE 60106588 T DE60106588 T DE 60106588T DE 60106588 D1 DE60106588 D1 DE 60106588D1
Authority
DE
Germany
Prior art keywords
spatial
measurement
wave front
spectral wave
phase
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60106588T
Other languages
English (en)
Other versions
DE60106588T2 (de
Inventor
Yoel Arieli
Shay Wolfling
Eyal Shekel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Icos Vision Systems NV
Original Assignee
NANO-OR TECHNOLOGIES Inc WILMINGTON
NANO OR TECHNOLOGIES Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NANO-OR TECHNOLOGIES Inc WILMINGTON, NANO OR TECHNOLOGIES Inc filed Critical NANO-OR TECHNOLOGIES Inc WILMINGTON
Application granted granted Critical
Publication of DE60106588D1 publication Critical patent/DE60106588D1/de
Publication of DE60106588T2 publication Critical patent/DE60106588T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/12—Heads, e.g. forming of the optical beam spot or modulation of the optical beam
    • G11B7/14—Heads, e.g. forming of the optical beam spot or modulation of the optical beam specially adapted to record on, or to reproduce from, more than one track simultaneously
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9506—Optical discs
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B20/00—Signal processing not specific to the method of recording or reproducing; Circuits therefor
    • G11B20/10—Digital recording or reproducing
    • G11B20/10009—Improvement or modification of read or write signals

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Spectrometry And Color Measurement (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
  • Holo Graphy (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Optical Recording Or Reproduction (AREA)
DE60106588T 2000-04-12 2001-04-11 Spatiale und spektrale Wellenfrontenanalyse und -messung Expired - Lifetime DE60106588T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US19686200P 2000-04-12 2000-04-12
US196862P 2000-04-12
PCT/IL2001/000335 WO2001077629A2 (en) 2000-04-12 2001-04-11 Spatial and spectral wavefront analysis and measurement

Publications (2)

Publication Number Publication Date
DE60106588D1 true DE60106588D1 (de) 2004-11-25
DE60106588T2 DE60106588T2 (de) 2005-11-24

Family

ID=22727069

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60106588T Expired - Lifetime DE60106588T2 (de) 2000-04-12 2001-04-11 Spatiale und spektrale Wellenfrontenanalyse und -messung

Country Status (10)

Country Link
US (3) US6819435B2 (de)
EP (1) EP1272823B1 (de)
JP (2) JP2003530564A (de)
KR (1) KR100830548B1 (de)
AT (1) ATE280386T1 (de)
AU (1) AU2001250613A1 (de)
CA (1) CA2404765A1 (de)
DE (1) DE60106588T2 (de)
IL (1) IL152213A0 (de)
WO (1) WO2001077629A2 (de)

Families Citing this family (24)

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US6819435B2 (en) * 2000-04-12 2004-11-16 Nano Or Technologies Inc. Spatial and spectral wavefront analysis and measurement
IL146924A (en) 2001-12-04 2007-03-08 Nova Measuring Instr Ltd Metal cmp process monitoring
WO2003062743A1 (en) * 2002-01-24 2003-07-31 Nano-Or Technologies (Israel) Ltd. Improved spatial wavefront analysis and 3d measurement
US6911637B1 (en) * 2002-05-23 2005-06-28 The United States Of America As Represented By The Secretary Of The Army Wavefront phase sensors using optically or electrically controlled phase spatial light modulators
US7034945B2 (en) * 2002-07-26 2006-04-25 Lockheed Martin Corporation Fourier transform spectrometry with a multi-aperture interferometer
US7197248B1 (en) * 2002-07-29 2007-03-27 United States Of America As Represented By The Secretary Of The Army Adaptive correction of wave-front phase distortions in a free-space laser communication system and method
US7423766B1 (en) * 2003-12-17 2008-09-09 Chian Chiu Li Interferometric optical profiler
US7656768B2 (en) * 2004-01-27 2010-02-02 Micron Technology, Inc. Phase masks for use in holographic data storage
KR101159380B1 (ko) * 2004-03-11 2012-06-27 이코스비젼 시스팀스 엔.브이. 파면 조정 및 향상된 3?ｄ 측정을 위한 방법 및 장치
IL174590A (en) 2005-03-29 2015-03-31 Yoel Arieli A method and an imaging system for the analysis of optical properties of an object illuminated by a light source
US7733557B2 (en) * 2006-04-24 2010-06-08 Micron Technology, Inc. Spatial light modulators with changeable phase masks for use in holographic data storage
US7531774B2 (en) * 2006-06-05 2009-05-12 General Dynamics Advanced Information Systems, Inc. Measurement-diverse imaging and wavefront sensing with amplitude and phase estimation
WO2009017694A2 (en) * 2007-07-26 2009-02-05 General Dynamics Advanced Information Systems, Inc. Optical spatial heterodyne fourier transform interferometer
FR2930336B1 (fr) * 2008-04-22 2010-05-14 Onera (Off Nat Aerospatiale) Procede, reseau de phase et dispositif d'analyse de surface d'onde d'un faisceau de lumiere
DE102008050867B4 (de) * 2008-09-30 2011-12-08 Carl Zeiss Laser Optics Gmbh Verfahren zum Messen eines Spektrums einer schmalbandigen Lichtquelle sowie Spektrometeranordnung
EP2189769A1 (de) * 2008-11-19 2010-05-26 BAE Systems PLC Spiegelstruktur
WO2010058193A2 (en) * 2008-11-19 2010-05-27 Bae Systems Plc Mirror structure
NL2008414A (en) * 2011-03-21 2012-09-24 Asml Netherlands Bv Method and apparatus for determining structure parameters of microstructures.
US9885671B2 (en) 2014-06-09 2018-02-06 Kla-Tencor Corporation Miniaturized imaging apparatus for wafer edge
US9645097B2 (en) 2014-06-20 2017-05-09 Kla-Tencor Corporation In-line wafer edge inspection, wafer pre-alignment, and wafer cleaning
GB2542622A (en) 2015-09-28 2017-03-29 Cambridge Entpr Ltd Method and apparatus for performing complex fourier transforms
DE102016115844A1 (de) * 2016-07-01 2018-01-04 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Anordnung zur Erzeugung eines Bessel-Strahls
EP3647748A1 (de) * 2018-11-05 2020-05-06 Wooptix S.L. Wellenfrontkrümmungssensor mit zeitlicher abtastung der bildintensitätsverteilung
US11550164B2 (en) 2019-02-11 2023-01-10 Honeywell International Inc. Holographic mode filter for super-resolution imaging

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US4190366A (en) 1977-04-25 1980-02-26 Laser Precision Corporation Refractively scanned interferometer
US4407569A (en) 1981-07-07 1983-10-04 Carl Zeiss-Stiftung Device for selectively available phase-contrast and relief observation in microscopes
US4624569A (en) * 1983-07-18 1986-11-25 Lockheed Missiles & Space Company, Inc. Real-time diffraction interferometer
US4653921A (en) 1985-09-09 1987-03-31 Lockheed Missiles & Space Company, Inc. Real-time radial shear interferometer
FR2595820B1 (fr) * 1986-03-13 1990-01-05 Bertin & Cie Dispositif a fibres optiques pour la detection a distance d'une grandeur physique, en particulier de la temperature
AU616640B2 (en) * 1986-10-17 1991-11-07 Global Holonetics Corporation Transform optical processing system
US5159474A (en) 1986-10-17 1992-10-27 E. I. Du Pont De Nemours And Company Transform optical processing system
JPS63184029A (ja) * 1987-01-26 1988-07-29 Canon Inc 波面形状測定方法
JP2502092B2 (ja) * 1987-06-10 1996-05-29 浜松ホトニクス株式会社 干渉装置
JPH01212304A (ja) * 1988-02-19 1989-08-25 Ricoh Co Ltd 縞走査・シアリング方法
US5235587A (en) 1989-09-29 1993-08-10 The Regents Of The University Of California Optical data storage apparatus and method
JPH03128411A (ja) * 1989-10-13 1991-05-31 Hitachi Metals Ltd 光学的形状測定装置
US5367375A (en) 1992-02-07 1994-11-22 Hughes Aircraft Company Spatial wavefront evaluation by intensity relationship
US5446540A (en) 1992-10-30 1995-08-29 International Business Machines Corporation Method of inspecting phase shift masks employing phase-error enhancing
JPH06186504A (ja) 1992-12-15 1994-07-08 Olympus Optical Co Ltd 回折光学素子を用いた顕微鏡
DE4326761A1 (de) 1993-08-10 1995-02-16 Zeiss Carl Fa Stereomikroskop
JPH07261089A (ja) 1994-03-24 1995-10-13 Olympus Optical Co Ltd 位相差顕微鏡
US5751475A (en) 1993-12-17 1998-05-12 Olympus Optical Co., Ltd. Phase contrast microscope
JP3540352B2 (ja) 1993-12-17 2004-07-07 オリンパス株式会社 位相差顕微鏡
US5471303A (en) 1994-04-29 1995-11-28 Wyko Corporation Combination of white-light scanning and phase-shifting interferometry for surface profile measurements
JP3583480B2 (ja) 1994-09-29 2004-11-04 オリンパス株式会社 位相差顕微鏡
US5600440A (en) 1995-07-05 1997-02-04 The United States Of America As Represented By The Secretary Of The Navy Liquid crystal interferometer
JP3523734B2 (ja) 1995-12-26 2004-04-26 オリンパス株式会社 位相差顕微鏡
US5969855A (en) 1995-10-13 1999-10-19 Olympus Optical Co., Ltd. Microscope apparatus
US5814815A (en) 1995-12-27 1998-09-29 Hitachi, Ltd. Phase-contrast electron microscope and phase plate therefor
US5870191A (en) 1996-02-12 1999-02-09 Massachusetts Institute Of Technology Apparatus and methods for surface contour measurement
JP3790905B2 (ja) 1996-02-22 2006-06-28 オリンパス株式会社 位相差顕微鏡
US5777736A (en) 1996-07-19 1998-07-07 Science Applications International Corporation High etendue imaging fourier transform spectrometer
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JP3708246B2 (ja) 1996-09-19 2005-10-19 オリンパス株式会社 光制御部材を有する光学顕微鏡
JPH10172898A (ja) 1996-12-05 1998-06-26 Nikon Corp 観察装置、位置検出装置および該位置検出装置を備えた露光装置
US6819435B2 (en) * 2000-04-12 2004-11-16 Nano Or Technologies Inc. Spatial and spectral wavefront analysis and measurement
WO2003062743A1 (en) * 2002-01-24 2003-07-31 Nano-Or Technologies (Israel) Ltd. Improved spatial wavefront analysis and 3d measurement

Also Published As

Publication number Publication date
CA2404765A1 (en) 2001-10-18
EP1272823A2 (de) 2003-01-08
US7327470B2 (en) 2008-02-05
WO2001077629A3 (en) 2002-03-21
EP1272823B1 (de) 2004-10-20
WO2001077629A2 (en) 2001-10-18
ATE280386T1 (de) 2004-11-15
US6819435B2 (en) 2004-11-16
US20020027661A1 (en) 2002-03-07
JP2003530564A (ja) 2003-10-14
DE60106588T2 (de) 2005-11-24
AU2001250613A1 (en) 2001-10-23
JP2013064741A (ja) 2013-04-11
US7542144B2 (en) 2009-06-02
KR100830548B1 (ko) 2008-05-21
IL152213A0 (en) 2003-05-29
JP5537629B2 (ja) 2014-07-02
US20080088851A1 (en) 2008-04-17
KR20030017496A (ko) 2003-03-03
US20050094157A1 (en) 2005-05-05

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: ICOS VISION SYSTEMS N.V., HEVERLEE, BE