FR2841648B1 - Appareil et procede de mesure de birefringence, appareil de suppression de deformation et polarimetre - Google Patents

Appareil et procede de mesure de birefringence, appareil de suppression de deformation et polarimetre

Info

Publication number
FR2841648B1
FR2841648B1 FR0307976A FR0307976A FR2841648B1 FR 2841648 B1 FR2841648 B1 FR 2841648B1 FR 0307976 A FR0307976 A FR 0307976A FR 0307976 A FR0307976 A FR 0307976A FR 2841648 B1 FR2841648 B1 FR 2841648B1
Authority
FR
France
Prior art keywords
polarimeter
deformation suppression
measuring birefringence
suppression apparatus
birefringence
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0307976A
Other languages
English (en)
Other versions
FR2841648A1 (fr
Inventor
Yasuhiro Kishikawa
Seiji Takeuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2002191706A external-priority patent/JP2004037137A/ja
Priority claimed from JP2002380014A external-priority patent/JP4058337B2/ja
Application filed by Canon Inc filed Critical Canon Inc
Publication of FR2841648A1 publication Critical patent/FR2841648A1/fr
Application granted granted Critical
Publication of FR2841648B1 publication Critical patent/FR2841648B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J4/00—Measuring polarisation of light
    • G01J4/04—Polarimeters using electric detection means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/23—Bi-refringence
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Pathology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
FR0307976A 2002-07-01 2003-07-01 Appareil et procede de mesure de birefringence, appareil de suppression de deformation et polarimetre Expired - Fee Related FR2841648B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002191706A JP2004037137A (ja) 2002-07-01 2002-07-01 複屈折測定装置、除歪装置、偏光状態検出装置及び露光装置
JP2002380014A JP4058337B2 (ja) 2002-12-27 2002-12-27 複屈折測定装置

Publications (2)

Publication Number Publication Date
FR2841648A1 FR2841648A1 (fr) 2004-01-02
FR2841648B1 true FR2841648B1 (fr) 2012-08-03

Family

ID=29738460

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0307976A Expired - Fee Related FR2841648B1 (fr) 2002-07-01 2003-07-01 Appareil et procede de mesure de birefringence, appareil de suppression de deformation et polarimetre

Country Status (3)

Country Link
US (1) US7251029B2 (fr)
DE (1) DE10329360B4 (fr)
FR (1) FR2841648B1 (fr)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20040015251A (ko) * 2001-05-15 2004-02-18 칼 짜이스 에스엠티 아게 불화물 결정 렌즈들을 포함하는 렌즈 시스템
US7239447B2 (en) * 2001-05-15 2007-07-03 Carl Zeiss Smt Ag Objective with crystal lenses
DE10123725A1 (de) * 2001-05-15 2002-11-21 Zeiss Carl Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren
DE10162796B4 (de) * 2001-12-20 2007-10-31 Carl Zeiss Smt Ag Verfahren zur Optimierung der Abbildungseigenschaften von mindestens zwei optischen Elementen sowie photolithographisches Fertigungsverfahren
US7292388B2 (en) * 2002-05-08 2007-11-06 Carl Zeiss Smt Ag Lens made of a crystalline material
US7233395B2 (en) * 2003-09-25 2007-06-19 Georgia Tech Research Corporation Performing retardation measurements
JP4776891B2 (ja) * 2004-04-23 2011-09-21 キヤノン株式会社 照明光学系、露光装置、及びデバイス製造方法
US7375799B2 (en) 2005-02-25 2008-05-20 Asml Netherlands B.V. Lithographic apparatus
KR100949170B1 (ko) * 2005-06-13 2010-03-23 에이에스엠엘 네델란즈 비.브이. 수동 레티클 툴, 리소그래피 장치 및 리소그래피 툴 내의디바이스를 패터닝하는 방법
JP2007198896A (ja) 2006-01-26 2007-08-09 Canon Inc 計測方法
WO2007130990A2 (fr) * 2006-05-01 2007-11-15 Hinds Instruments, Inc. Mesure de diatténuation linéaire et circulaire dans des éléments optiques
JP2009206373A (ja) * 2008-02-28 2009-09-10 Canon Inc 露光装置及びデバイス製造方法
US8072599B2 (en) * 2008-03-14 2011-12-06 Teledyne Scientific & Imaging, Llc Real-time, hybrid amplitude-time division polarimetric imaging camera
DE102009015393B3 (de) * 2009-03-20 2010-09-02 Carl Zeiss Smt Ag Messverfahren und Messsystem zur Messung der Doppelbrechung
US8328417B2 (en) * 2009-08-20 2012-12-11 Corning Incorporated Photoelastic method for absolute determination of zero CTE crossover in low expansion silica-titania glass samples
WO2011023765A1 (fr) * 2009-08-26 2011-03-03 Carl Zeiss Laser Optics Gmbh Module de métrologie pour système laser
TWI399529B (zh) * 2009-09-10 2013-06-21 Ind Tech Res Inst 線掃瞄式量測系統
JP2013036792A (ja) * 2011-08-05 2013-02-21 Seiko Epson Corp 偏光状態測定装置及び偏光状態測定方法
NL2009824A (en) 2011-12-21 2013-06-24 Asml Netherlands Bv Lithographic apparatus with a deformation sensor.
JP6084507B2 (ja) * 2012-04-16 2017-02-22 Hoya株式会社 マスクブランク用基板の製造方法、マスクブランクの製造方法、転写用マスクの製造方法、及び半導体デバイスの製造方法
WO2015057219A2 (fr) 2013-10-16 2015-04-23 Halliburton Energy Services Inc. Dispositif de calcul optique indépendant de l'intensité
WO2016037063A1 (fr) * 2014-09-05 2016-03-10 Massachusetts Institute Of Technology Systemes, procedes, et appareil pour l'imagerie thermique sensible
US10732336B2 (en) 2017-02-02 2020-08-04 Corning Incorporated Method of assembling optical systems and minimizing retardance distortions in optical assemblies
JP6351893B1 (ja) * 2018-02-26 2018-07-04 日本分光株式会社 位相差制御装置
CN109489938B (zh) * 2018-11-15 2021-01-05 中国科学院光电技术研究所 一种基于自准直成像法光学镜头畸变的检测方法
CN110160965B (zh) * 2019-06-10 2021-11-05 南京恒高光电研究院有限公司 一种检测bgo晶体的残余双折射的装置和方法

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3463575A (en) * 1966-12-09 1969-08-26 Eg & G Inc Light beam sampling apparatus
US4252410A (en) * 1978-10-19 1981-02-24 Hewlett-Packard Company Polarization rotation method and apparatus
US4801798A (en) * 1987-12-14 1989-01-31 Eastman Kodak Company Method and apparatus for measuring optical retardation in transparent materials
DE68919394T2 (de) * 1988-09-16 1995-03-30 Fujitsu Ltd System zum Detektieren eines biologischen Gegenstandes und dieses System verwendendes Fingerabdruckvergleichssystem.
US5475491A (en) * 1989-02-10 1995-12-12 Canon Kabushiki Kaisha Exposure apparatus
JPH04102178A (ja) 1990-08-22 1992-04-03 Hitachi Ltd 物体モデル入力装置
JP3174795B2 (ja) * 1992-04-30 2001-06-11 ホーヤ株式会社 ガラス体の製造方法、ガラス体の除歪方法、ガラス体の熱処理装置及びガラス体の除歪装置
US5784202A (en) 1993-07-08 1998-07-21 Asahi Kogaku Kogyo Kabushika Kaisha Apparatus for isometrically splitting beams
US5719702A (en) * 1993-08-03 1998-02-17 The United States Of America As Represented By The United States Department Of Energy Polarization-balanced beamsplitter
US5398112A (en) * 1993-10-04 1995-03-14 Wyko Corporation Method for testing an optical window with a small wedge angle
EP0757844A1 (fr) * 1994-04-28 1997-02-12 Semitool, Inc. Systemes de traitement de semi-conducteurs
JPH07320090A (ja) 1994-05-26 1995-12-08 Hitachi Ltd 画像生成装置
JP2736870B2 (ja) 1995-02-10 1998-04-02 株式会社超高速ネットワーク・コンピュータ技術研究所 三次元図形データ削減方法
WO1997011810A1 (fr) * 1995-09-27 1997-04-03 Komatsu Ltd. Appareil laser
US5825492A (en) * 1996-04-26 1998-10-20 Jaton Systems Incorporated Method and apparatus for measuring retardation and birefringence
JPH10229038A (ja) * 1997-02-14 1998-08-25 Nikon Corp 露光量制御方法
JP3973273B2 (ja) 1997-09-22 2007-09-12 三洋電機株式会社 画像生成装置および画像生成方法
AU3299399A (en) 1998-02-20 1999-09-06 Hinds Instruments, Inc. Birefringence measurement system
US6473179B1 (en) * 1998-02-20 2002-10-29 Hinds Instruments, Inc. Birefringence measurement system
JPH11328427A (ja) 1998-05-08 1999-11-30 Fujitsu Ltd 多角形分割描画装置、多角形分割描画方法および記憶媒体
US6672109B1 (en) * 1999-04-21 2004-01-06 Nikon Corporation Silica glass member, method for producing the same, and projection aligners using the same
AU5848100A (en) * 1999-07-05 2001-01-22 Nikon Corporation Method for producing quartz glass member and quartz glass member produced thereby
JP2001148344A (ja) * 1999-09-09 2001-05-29 Nikon Corp 露光装置、エネルギ源の出力制御方法、該方法を用いるレーザ装置、及びデバイス製造方法
US6157448A (en) * 1999-10-08 2000-12-05 Uniopt Co., Ltd. Birefringence measurement optical system and high spatial resolution polarimetric apparatus
DE19953528B4 (de) * 1999-11-05 2010-10-07 Schott Ag Vorrichtung und Verfahren zur automatischen Messung der Spannungsdoppelbrechung mit feststehendem Analysator
WO2001073385A1 (fr) * 2000-03-31 2001-10-04 Hinds Instruments, Inc Systeme destine a mesurer la birefringence circulaire et lineaire
HU226937B1 (en) * 2000-11-17 2010-03-29 Mta Szegedi Biolog Koezpont Method and apparatus for determining polarization amount of material by a laser scanning microscope

Also Published As

Publication number Publication date
FR2841648A1 (fr) 2004-01-02
US7251029B2 (en) 2007-07-31
US20040008348A1 (en) 2004-01-15
DE10329360A1 (de) 2004-02-26
DE10329360B4 (de) 2008-08-28

Similar Documents

Publication Publication Date Title
FR2841648B1 (fr) Appareil et procede de mesure de birefringence, appareil de suppression de deformation et polarimetre
FR2814664B3 (fr) Procede et appareil de mesure des reserves lipidiques
FR2832004B1 (fr) Procede et appareil de reemission de bits codes
FR2833120B1 (fr) Appareil et procede de cryptage de donnees
FR2872922B1 (fr) Procede et appareil d'acquisition vribratoire sismique
SG111234A1 (en) Lithographic apparatus and device manufacturing method, and measurement system
NO20070947L (no) Metode og apparatur for produktdistribusjon
FR2811263B1 (fr) Appareil et procede pour suivre une condition de pneumatique anormale
FR2863712B1 (fr) Procede et appareil pour mesurer le sautillement
FR2851489B1 (fr) Appareil de moulage et procede de moulage
FR2888930B1 (fr) Dispositfi de mesure a resonateur et procede mettant en oeuvre le dispositif
FI20021327A0 (fi) Menetelmä ja laitteisto murskaimen asetuksen mittaamiseksi ja säätämiseksi
FR2884918B1 (fr) Dispositif et procede de mesure de couple de torsion.
FR2884310B1 (fr) Dispositif et procede de mesure de largeur de touche entre rouleaux
FR2845186B1 (fr) Procede et dispositif de mesure de similarite entre images
FR2800870B1 (fr) Appareil de mesure de dispersion optique et procede de mesure utilisant cet appareil
FR2858731B1 (fr) Procede et appareil de cryptage
NO20060663L (no) Fremgangsmate og anordning for bombering av bandsaghjul
FR2847093B1 (fr) Procede et appareil de chiffrement avec une structure (des) parallele
NO20024089D0 (no) Fremgangsmåte og anordning ved strömningsmåling
FR2878075B1 (fr) Procede et appareil de mesure de plaques de semi-conducteur
FR2848296B1 (fr) Procede et appareil de mesure de vitesse de rotation par interferometrie atomique
FR2858051B1 (fr) Dispositif et procede de mesure de deformation
FR2856218B1 (fr) Appareil et procede de conversion de balayage
FR2827633B1 (fr) Procede et appareil de detection de deterioration de catalyseur

Legal Events

Date Code Title Description
PLFP Fee payment

Year of fee payment: 14

PLFP Fee payment

Year of fee payment: 15

PLFP Fee payment

Year of fee payment: 16

ST Notification of lapse

Effective date: 20200306