DE60040371D1 - Verfahren zur Auswertung eines Ladungsträgerstrahls - Google Patents
Verfahren zur Auswertung eines LadungsträgerstrahlsInfo
- Publication number
- DE60040371D1 DE60040371D1 DE60040371T DE60040371T DE60040371D1 DE 60040371 D1 DE60040371 D1 DE 60040371D1 DE 60040371 T DE60040371 T DE 60040371T DE 60040371 T DE60040371 T DE 60040371T DE 60040371 D1 DE60040371 D1 DE 60040371D1
- Authority
- DE
- Germany
- Prior art keywords
- evaluating
- charge carrier
- carrier beam
- charge
- carrier
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/282—Determination of microscope properties
- H01J2237/2823—Resolution
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Electron Sources, Ion Sources (AREA)
- Tests Of Electronic Circuits (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/390,002 US6545275B1 (en) | 1999-09-03 | 1999-09-03 | Beam evaluation |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60040371D1 true DE60040371D1 (de) | 2008-11-13 |
Family
ID=23540638
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60040371T Expired - Lifetime DE60040371D1 (de) | 1999-09-03 | 2000-08-31 | Verfahren zur Auswertung eines Ladungsträgerstrahls |
Country Status (4)
Country | Link |
---|---|
US (1) | US6545275B1 (de) |
EP (1) | EP1081742B1 (de) |
JP (1) | JP5075303B2 (de) |
DE (1) | DE60040371D1 (de) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6545275B1 (en) * | 1999-09-03 | 2003-04-08 | Applied Materials, Inc. | Beam evaluation |
US6694284B1 (en) | 2000-09-20 | 2004-02-17 | Kla-Tencor Technologies Corp. | Methods and systems for determining at least four properties of a specimen |
US6812045B1 (en) | 2000-09-20 | 2004-11-02 | Kla-Tencor, Inc. | Methods and systems for determining a characteristic of a specimen prior to, during, or subsequent to ion implantation |
US6673637B2 (en) | 2000-09-20 | 2004-01-06 | Kla-Tencor Technologies | Methods and systems for determining a presence of macro defects and overlay of a specimen |
US6806951B2 (en) | 2000-09-20 | 2004-10-19 | Kla-Tencor Technologies Corp. | Methods and systems for determining at least one characteristic of defects on at least two sides of a specimen |
US6782337B2 (en) | 2000-09-20 | 2004-08-24 | Kla-Tencor Technologies Corp. | Methods and systems for determining a critical dimension an a presence of defects on a specimen |
US6891627B1 (en) | 2000-09-20 | 2005-05-10 | Kla-Tencor Technologies Corp. | Methods and systems for determining a critical dimension and overlay of a specimen |
JP4263416B2 (ja) * | 2001-08-24 | 2009-05-13 | 株式会社日立製作所 | 荷電粒子顕微鏡評価システム |
US7236847B2 (en) | 2002-01-16 | 2007-06-26 | Kla-Tencor Technologies Corp. | Systems and methods for closed loop defect reduction |
US6677586B1 (en) * | 2002-08-27 | 2004-01-13 | Kla -Tencor Technologies Corporation | Methods and apparatus for electron beam inspection of samples |
US6990743B2 (en) * | 2002-08-29 | 2006-01-31 | Micron Technology, Inc. | Process for monitoring measuring device performance |
JP4500099B2 (ja) * | 2004-05-06 | 2010-07-14 | 株式会社日立ハイテクノロジーズ | 電子顕微鏡装置システム及び電子顕微鏡装置システムを用いた寸法計測方法 |
JP4621098B2 (ja) * | 2005-09-14 | 2011-01-26 | 株式会社日立ハイテクノロジーズ | 走査型電子顕微鏡および画像信号処理方法 |
JP4922710B2 (ja) * | 2006-09-20 | 2012-04-25 | 株式会社日立ハイテクノロジーズ | 電子顕微鏡の分解能評価用試料及び電子顕微鏡の分解能評価方法並びに電子顕微鏡 |
DE102007014396A1 (de) * | 2007-03-26 | 2008-10-09 | Siemens Ag | Abdeckung für ein Sekundärteil eines Linearmotors |
US7615747B1 (en) * | 2007-09-06 | 2009-11-10 | Kla-Tencor Corporation | Sampling feedback system |
JP5302595B2 (ja) * | 2008-08-06 | 2013-10-02 | 株式会社日立ハイテクノロジーズ | 傾斜観察方法および観察装置 |
US9124810B2 (en) * | 2010-04-14 | 2015-09-01 | Koh Young Technology Inc. | Method of checking an inspection apparatus and method of establishing a measurement variable of the inspection apparatus |
KR101343375B1 (ko) | 2010-04-14 | 2013-12-20 | 주식회사 고영테크놀러지 | 검사 장치의 진단 및 측정변수 설정 방법 |
JP2011233466A (ja) * | 2010-04-30 | 2011-11-17 | Jeol Ltd | 電子顕微鏡の分解能評価方法、プログラム、及び情報記憶媒体 |
US9702695B2 (en) | 2010-05-27 | 2017-07-11 | Hitachi High-Technologies Corporation | Image processing device, charged particle beam device, charged particle beam device adjustment sample, and manufacturing method thereof |
KR101227116B1 (ko) * | 2012-12-04 | 2013-01-29 | 주식회사 고영테크놀러지 | 검사 장치의 진단 및 측정변수 설정 방법 |
US9002097B1 (en) * | 2013-02-26 | 2015-04-07 | Hermes Microvision Inc. | Method and system for enhancing image quality |
JP2019109960A (ja) * | 2016-03-15 | 2019-07-04 | 株式会社日立ハイテクノロジーズ | 荷電粒子ビームの評価方法、荷電粒子ビームの評価のためのコンピュータープログラム、及び荷電粒子ビームの評価装置 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3919558A (en) | 1974-11-04 | 1975-11-11 | Gen Electric | Hot sub-stage for a scanning electron microscope |
US4068381A (en) * | 1976-10-29 | 1978-01-17 | The United States Of America As Represented By The Secretary Of Commerce | Scanning electron microscope micrometer scale and method for fabricating same |
JPS59112217A (ja) * | 1982-11-29 | 1984-06-28 | Toshiba Corp | 寸法測定方法 |
JPS6358747A (ja) * | 1986-08-29 | 1988-03-14 | Agency Of Ind Science & Technol | 電子顕微鏡 |
US5043586A (en) * | 1990-10-25 | 1991-08-27 | International Business Machines Corporation | Planarized, reusable calibration grids |
JPH0545265A (ja) * | 1991-08-12 | 1993-02-23 | Jeol Ltd | 走査電子顕微鏡の性能評価用試料及びその製作方法 |
FR2704649B1 (fr) * | 1993-04-30 | 1995-07-21 | Centre Nat Rech Scient | Machine de traction in situ et eprouvette pour microscope electronique a balayage. |
JP2746125B2 (ja) * | 1994-06-17 | 1998-04-28 | 日本電気株式会社 | 電子線露光装置の装置較正用基準マーク及び装置較正方法。 |
JPH09184715A (ja) * | 1995-12-28 | 1997-07-15 | Hitachi Ltd | パターン形状検査装置 |
JPH1125898A (ja) * | 1997-05-08 | 1999-01-29 | Hitachi Ltd | 電子顕微鏡の分解能評価方法および分解能評価用試料 |
JP3397101B2 (ja) * | 1997-10-29 | 2003-04-14 | 株式会社日立製作所 | 欠陥検査方法および装置 |
US6545275B1 (en) * | 1999-09-03 | 2003-04-08 | Applied Materials, Inc. | Beam evaluation |
-
1999
- 1999-09-03 US US09/390,002 patent/US6545275B1/en not_active Expired - Lifetime
-
2000
- 2000-08-31 EP EP00118879A patent/EP1081742B1/de not_active Expired - Lifetime
- 2000-08-31 DE DE60040371T patent/DE60040371D1/de not_active Expired - Lifetime
- 2000-09-04 JP JP2000309916A patent/JP5075303B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP5075303B2 (ja) | 2012-11-21 |
EP1081742A2 (de) | 2001-03-07 |
EP1081742A3 (de) | 2001-06-13 |
US6545275B1 (en) | 2003-04-08 |
EP1081742B1 (de) | 2008-10-01 |
JP2001202911A (ja) | 2001-07-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |