DE60035966D1 - Herstellungsverfahren für eine akustische oberflächenwellenvorrichtung - Google Patents

Herstellungsverfahren für eine akustische oberflächenwellenvorrichtung

Info

Publication number
DE60035966D1
DE60035966D1 DE60035966T DE60035966T DE60035966D1 DE 60035966 D1 DE60035966 D1 DE 60035966D1 DE 60035966 T DE60035966 T DE 60035966T DE 60035966 T DE60035966 T DE 60035966T DE 60035966 D1 DE60035966 D1 DE 60035966D1
Authority
DE
Germany
Prior art keywords
manufacturing
wave device
surface wave
acoustic surface
acoustic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60035966T
Other languages
English (en)
Other versions
DE60035966T2 (de
Inventor
Masahiro Nakano
Michiyuki Nakazawa
Katsuo Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Corp
Original Assignee
TDK Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TDK Corp filed Critical TDK Corp
Application granted granted Critical
Publication of DE60035966D1 publication Critical patent/DE60035966D1/de
Publication of DE60035966T2 publication Critical patent/DE60035966T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02535—Details of surface acoustic wave devices
    • H03H9/02614—Treatment of substrates, e.g. curved, spherical, cylindrical substrates ensuring closed round-about circuits for the acoustical waves
    • H03H9/02622—Treatment of substrates, e.g. curved, spherical, cylindrical substrates ensuring closed round-about circuits for the acoustical waves of the surface, including back surface
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02535—Details of surface acoustic wave devices
    • H03H9/02818—Means for compensation or elimination of undesirable effects
    • H03H9/02937—Means for compensation or elimination of undesirable effects of chemical damage, e.g. corrosion

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Toxicology (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Composite Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
DE60035966T 1999-11-30 2000-03-31 Herstellungsverfahren für eine akustische oberflächenwellenvorrichtung Expired - Fee Related DE60035966T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP34075799 1999-11-30
JP34075799 1999-11-30
PCT/JP2000/002104 WO2001041304A1 (fr) 1999-11-30 2000-03-31 Dispositif a onde acoustique de surface et procede de production correspondant

Publications (2)

Publication Number Publication Date
DE60035966D1 true DE60035966D1 (de) 2007-09-27
DE60035966T2 DE60035966T2 (de) 2008-03-20

Family

ID=18340027

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60035966T Expired - Fee Related DE60035966T2 (de) 1999-11-30 2000-03-31 Herstellungsverfahren für eine akustische oberflächenwellenvorrichtung

Country Status (7)

Country Link
US (1) US6580198B2 (de)
EP (1) EP1158668B1 (de)
JP (1) JP3411908B2 (de)
CN (1) CN1159843C (de)
DE (1) DE60035966T2 (de)
TW (1) TW465180B (de)
WO (1) WO2001041304A1 (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3766585B2 (ja) * 2000-09-04 2006-04-12 アルプス電気株式会社 磁気ヘッド装置の製造方法
TW513855B (en) * 2001-01-15 2002-12-11 Matsushita Electric Ind Co Ltd Saw device and method for manufacturing the device
DE10206480B4 (de) * 2001-02-16 2005-02-10 Leibniz-Institut für Festkörper- und Werkstoffforschung e.V. Akustisches Oberflächenwellenbauelement
JP3926633B2 (ja) * 2001-06-22 2007-06-06 沖電気工業株式会社 Ｓａｗデバイス及びその製造方法
JP3735550B2 (ja) * 2001-09-21 2006-01-18 Ｔｄｋ株式会社 弾性表面波装置およびその製造方法
JP3945363B2 (ja) * 2001-10-12 2007-07-18 株式会社村田製作所 弾性表面波装置
US7148610B2 (en) * 2002-02-01 2006-12-12 Oc Oerlikon Balzers Ag Surface acoustic wave device having improved performance and method of making the device
JP3841053B2 (ja) * 2002-07-24 2006-11-01 株式会社村田製作所 弾性表面波装置及びその製造方法
JP3646116B2 (ja) 2003-07-17 2005-05-11 Ｔｄｋ株式会社 表面弾性波素子、表面弾性波装置、表面弾性波デュプレクサ、及び表面弾性波素子の製造方法
JP4279271B2 (ja) 2005-06-01 2009-06-17 アルプス電気株式会社 弾性表面波素子及びその製造方法
CN1921301B (zh) * 2005-08-26 2010-09-29 鸿富锦精密工业（深圳）有限公司 表面声波元件
JP3961012B1 (ja) * 2006-03-22 2007-08-15 Ｔｄｋ株式会社 弾性表面波装置
US8143681B2 (en) * 2006-04-20 2012-03-27 The George Washington University Saw devices, processes for making them, and methods of use
US20100007444A1 (en) * 2006-04-20 2010-01-14 Anis Nurashikin Nordin GHz Surface Acoustic Resonators in RF-CMOS
CN101421922B (zh) * 2006-04-24 2011-03-23 株式会社村田制作所 弹性表面波装置
US8018010B2 (en) * 2007-04-20 2011-09-13 The George Washington University Circular surface acoustic wave (SAW) devices, processes for making them, and methods of use
US20090124513A1 (en) * 2007-04-20 2009-05-14 Patricia Berg Multiplex Biosensor
US8015872B2 (en) * 2008-09-09 2011-09-13 Honeywell International Inc. Surface acoustic wave based humidity sensor apparatus with integrated signal conditioning
JP5526635B2 (ja) * 2009-07-24 2014-06-18 セイコーエプソン株式会社 弾性表面波デバイスの製造方法
JP5526665B2 (ja) * 2009-09-07 2014-06-18 セイコーエプソン株式会社 弾性表面波デバイスの製造方法
US8960004B2 (en) 2010-09-29 2015-02-24 The George Washington University Synchronous one-pole surface acoustic wave resonator
CN103138702A (zh) * 2013-01-23 2013-06-05 天津理工大学 一种多层膜结构的声表面波器件及其制备方法
KR20180016828A (ko) 2016-08-08 2018-02-20 삼성전기주식회사 표면 탄성파 필터 장치 및 이의 제조방법

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3965444A (en) 1975-01-03 1976-06-22 Raytheon Company Temperature compensated surface acoustic wave devices
US4017890A (en) 1975-10-24 1977-04-12 International Business Machines Corporation Intermetallic compound layer in thin films for improved electromigration resistance
JPH0247866B2 (ja) 1981-03-16 1990-10-23 Seiko Epson Corp Handotaishusekikairo
JPH02206215A (ja) * 1989-02-06 1990-08-16 Oki Electric Ind Co Ltd 弾性表面波フィルタ
JPH03190311A (ja) 1989-12-20 1991-08-20 Hitachi Ltd 弾性表面波装置
JPH0758876B2 (ja) 1990-10-12 1995-06-21 日本無線株式会社 表面弾性波素子
JPH04294625A (ja) * 1991-03-25 1992-10-19 Seiko Epson Corp 弾性表面波素子
US5520751A (en) 1993-09-24 1996-05-28 Exxon Research And Engineering Company Oxidation of low chromium steels
JPH0739118U (ja) * 1993-12-20 1995-07-14 株式会社大真空 圧電振動子の電極構造
JPH07326942A (ja) 1994-05-31 1995-12-12 Kyocera Corp 弾性表面波装置
JPH0832399A (ja) * 1994-07-19 1996-02-02 Meidensha Corp 弾性表面波素子及び圧電振動素子
KR100255906B1 (ko) * 1994-10-19 2000-05-01 모리시타 요이찌 전자부품과 그 제조방법
US5766379A (en) * 1995-06-07 1998-06-16 The Research Foundation Of State University Of New York Passivated copper conductive layers for microelectronic applications and methods of manufacturing same
JPH0983288A (ja) 1995-09-19 1997-03-28 Japan Radio Co Ltd 表面弾性波素子
JP3609423B2 (ja) 1995-09-21 2005-01-12 Ｔｄｋ株式会社 弾性表面波装置及びその製造方法
JPH09199974A (ja) 1996-01-19 1997-07-31 Nec Corp 弾性表面波装置
JPH09294044A (ja) * 1996-04-26 1997-11-11 Rohm Co Ltd 弾性表面波素子
JPH09312543A (ja) * 1996-05-23 1997-12-02 Aisin Seiki Co Ltd 表面弾性波素子
JPH10107569A (ja) * 1996-09-27 1998-04-24 Toko Inc 表面弾性波装置の製造方法
JPH10107572A (ja) * 1996-09-30 1998-04-24 Kyocera Corp 弾性表面波装置
CN1205744C (zh) 1997-09-22 2005-06-08 Tdk株式会社 声表面波器件及其制造工艺
US6365555B1 (en) * 1999-10-25 2002-04-02 Worcester Polytechnic Institute Method of preparing metal containing compounds using hydrodynamic cavitation

Also Published As

Publication number Publication date
JP3411908B2 (ja) 2003-06-03
US6580198B2 (en) 2003-06-17
TW465180B (en) 2001-11-21
DE60035966T2 (de) 2008-03-20
US20020047495A1 (en) 2002-04-25
WO2001041304A1 (fr) 2001-06-07
CN1338146A (zh) 2002-02-27
EP1158668A4 (de) 2005-03-02
CN1159843C (zh) 2004-07-28
EP1158668A1 (de) 2001-11-28
EP1158668B1 (de) 2007-08-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee