DE60032330D1 - Hochlichtempfindliches härtbares harz, strahlungshärtbare harzzusammensetzung, verfahren zur herstellung, farbfilter und flüssigkristallbildschirm - Google Patents

Hochlichtempfindliches härtbares harz, strahlungshärtbare harzzusammensetzung, verfahren zur herstellung, farbfilter und flüssigkristallbildschirm

Info

Publication number
DE60032330D1
DE60032330D1 DE60032330T DE60032330T DE60032330D1 DE 60032330 D1 DE60032330 D1 DE 60032330D1 DE 60032330 T DE60032330 T DE 60032330T DE 60032330 T DE60032330 T DE 60032330T DE 60032330 D1 DE60032330 D1 DE 60032330D1
Authority
DE
Germany
Prior art keywords
sensitive
radiation
highly
preparation
liquid crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60032330T
Other languages
English (en)
Other versions
DE60032330T2 (de
Inventor
Kazuhiko Nakamura
Shunsuke Sega
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Application granted granted Critical
Publication of DE60032330D1 publication Critical patent/DE60032330D1/de
Publication of DE60032330T2 publication Critical patent/DE60032330T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40—High-molecular-weight compounds
    • C08G18/62—Polymers of compounds having carbon-to-carbon double bonds
    • C08G18/6216—Polymers of alpha-beta ethylenically unsaturated carboxylic acids or of derivatives thereof
    • C08G18/625—Polymers of alpha-beta ethylenically unsaturated carboxylic acids; hydrolyzed polymers of esters of these acids
    • C08G18/6254—Polymers of alpha-beta ethylenically unsaturated carboxylic acids and of esters of these acids containing hydroxy groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/81—Unsaturated isocyanates or isothiocyanates
    • C08G18/8108—Unsaturated isocyanates or isothiocyanates having only one isocyanate or isothiocyanate group
    • C08G18/8116—Unsaturated isocyanates or isothiocyanates having only one isocyanate or isothiocyanate group esters of acrylic or alkylacrylic acid having only one isocyanate or isothiocyanate group
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
    • C09D175/04—Polyurethanes
    • C09D175/14—Polyurethanes having carbon-to-carbon unsaturated bonds
    • C09D175/16—Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
  • Polyurethanes Or Polyureas (AREA)
DE60032330T 1999-10-08 2000-10-10 Hochlichtempfindliches härtbares harz, strahlungshärtbare harzzusammensetzung, verfahren zur herstellung, farbfilter und flüssigkristallbildschirm Expired - Fee Related DE60032330T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP28880299 1999-10-08
JP28880299A JP2001106765A (ja) 1999-10-08 1999-10-08 高感度硬化性樹脂、硬化性樹脂組成物、それらの製造方法、カラーフィルター及び液晶パネル
PCT/JP2000/007035 WO2001027182A1 (en) 1999-10-08 2000-10-10 High photo-sensitivity curable resin, photo-curable resin composition, production method thereof, color filter and liquid crystal display panel

Publications (2)

Publication Number Publication Date
DE60032330D1 true DE60032330D1 (de) 2007-01-25
DE60032330T2 DE60032330T2 (de) 2007-06-14

Family

ID=17734931

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60032330T Expired - Fee Related DE60032330T2 (de) 1999-10-08 2000-10-10 Hochlichtempfindliches härtbares harz, strahlungshärtbare harzzusammensetzung, verfahren zur herstellung, farbfilter und flüssigkristallbildschirm

Country Status (7)

Country Link
US (1) US6582862B1 (de)
EP (1) EP1141063B1 (de)
JP (1) JP2001106765A (de)
KR (1) KR100414478B1 (de)
DE (1) DE60032330T2 (de)
TW (1) TWI260329B (de)
WO (1) WO2001027182A1 (de)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4215905B2 (ja) * 1999-02-15 2009-01-28 シャープ株式会社 液晶表示装置
US7399574B2 (en) * 2001-09-28 2008-07-15 Dai Nippon Printing Co., Ltd. Curable resin for photo-patterning, process for producing the same, curable resin composition, color filter, liquid crystal panel substrate, and liquid crystal panel
US6846612B2 (en) * 2002-02-01 2005-01-25 Brewer Science Inc. Organic anti-reflective coating compositions for advanced microlithography
EP1405850B1 (de) 2002-10-01 2007-03-07 Nippon Oil Corporation (Meth)acrylverbindung mit einer Oxetanylgruppe und damit hergestellter Flüssigkristallfilm
KR20040037944A (ko) * 2002-10-31 2004-05-08 엘지.필립스 엘시디 주식회사 기판내부에 보상필름을 형성한 액정표시장치 및 그제조방법
US7323232B2 (en) * 2002-10-31 2008-01-29 Fujifilm Corporation Resin composition for spacer, spacer, and liquid crystal display device
WO2005037926A1 (ja) * 2003-10-15 2005-04-28 Toray Industries, Inc. 黒色組成物、黒色被膜組成物、樹脂ブラックマトリクス、液晶表示装置用カラーフィルターおよび液晶表示装置
KR100931489B1 (ko) * 2003-12-30 2009-12-11 엘지디스플레이 주식회사 액정 표시 장치 및 그 제조 방법
EP1715373A4 (de) * 2004-02-10 2007-10-03 Sekisui Chemical Co Ltd Spaltenabstandselement, flüssigkristall-display-element und aushärtbare harzzusammensetzung für ein spaltenabstandsglied
JP4587865B2 (ja) * 2004-04-22 2010-11-24 昭和電工株式会社 感光性樹脂組成物及びその硬化物並びにそれらを使用するプリント配線基板の製造方法
KR20060099885A (ko) * 2005-03-15 2006-09-20 삼성전자주식회사 가요성 액정 표시 장치 및 그 제조 방법
TWI326372B (en) * 2005-08-08 2010-06-21 Ind Tech Res Inst Emireflective display and method thereof
TWI280421B (en) * 2005-09-27 2007-05-01 Chi Mei Optoelectronics Corp Color filter substrate and fabricating method thereof, LCD panel and device
TWI322906B (en) * 2005-12-02 2010-04-01 Innolux Display Corp Liquid crystal display device
KR101358255B1 (ko) * 2006-06-27 2014-02-05 엘지디스플레이 주식회사 광경화 타입 소수성 몰드 및 그 제조방법
KR100832298B1 (ko) * 2006-06-29 2008-05-26 엘지디스플레이 주식회사 패턴 형성용 레지스트와 이를 이용한 소프트몰드 제조방법
KR101371014B1 (ko) * 2006-10-12 2014-03-11 삼성디스플레이 주식회사 오버코트막 형성 방법, 컬러 필터 기판 제조 방법,이로부터 제조된 컬러 필터 기판 및 액정 표시 장치
JP5535430B2 (ja) * 2007-06-01 2014-07-02 富士フイルム株式会社 カラーフィルタ用硬化性組成物、カラーフィルタ、及びその製造方法
KR101462275B1 (ko) * 2007-09-27 2014-11-20 동우 화인켐 주식회사 착색 감광성 수지 조성물, 컬러필터 및 이를 구비한 액정표시장치
KR101048329B1 (ko) * 2008-10-06 2011-07-14 주식회사 엘지화학 우레탄계 다관능성 모노머, 그의 제조방법 및 이를 포함하는 감광성 수지 조성물
JP5653173B2 (ja) * 2010-10-29 2015-01-14 三洋化成工業株式会社 感光性樹脂組成物
JP5817562B2 (ja) * 2011-03-24 2015-11-18 Jsr株式会社 カラーフィルタ、カラーフィルタの製造方法および液晶表示素子
JP5884325B2 (ja) * 2011-07-15 2016-03-15 Jsr株式会社 カラーフィルタ、液晶表示素子およびカラーフィルタの製造方法
JP6252039B2 (ja) * 2013-08-27 2017-12-27 凸版印刷株式会社 カラーフィルタ及び液晶表示装置
JP2016210909A (ja) * 2015-05-11 2016-12-15 日立化成株式会社 光硬化性樹脂組成物及び硬化物
JPWO2019163505A1 (ja) * 2018-02-21 2020-12-03 富士フイルム株式会社 硬化性組成物、硬化物、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子及び画像表示装置
KR20210012994A (ko) * 2018-05-25 2021-02-03 세키스이가가쿠 고교가부시키가이샤 액정 표시 소자용 시일제, 상하 도통 재료 및 액정 표시 소자
KR20230096925A (ko) 2022-02-16 2023-06-30 (주)라라클래스 온라인 교육 시스템
KR102554239B1 (ko) 2022-02-16 2023-07-12 (주)라라클래스 온라인 교육 시스템

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US3928299A (en) * 1971-04-30 1975-12-23 Bayer Ag Polymers which contain urethane groups and which are cross-linkable by vinyl polymerisation
US4717643A (en) * 1985-08-06 1988-01-05 Hercules Incorporated No thermal cure dry film solder mask
JP3218256B2 (ja) * 1993-01-29 2001-10-15 東洋インキ製造株式会社 アルカリ現像型感光性着色組成物
WO1995000573A1 (en) * 1993-06-23 1995-01-05 Union Carbide Chemicals & Plastics Reactive polymers having pendant flexible side chains prepared from ethylenically unsaturated isocyanates
US6432614B1 (en) * 1998-07-31 2002-08-13 Dai Nippon Printing Co., Ltd. Photosensitive resin composition and color filter
US6410206B1 (en) * 1999-02-25 2002-06-25 Dai Nippon Printing Co., Ltd. Photosensitive resin composition, color filter, and copolymer resin useful for them

Also Published As

Publication number Publication date
DE60032330T2 (de) 2007-06-14
JP2001106765A (ja) 2001-04-17
EP1141063A1 (de) 2001-10-10
EP1141063B1 (de) 2006-12-13
TWI260329B (en) 2006-08-21
KR20010050901A (ko) 2001-06-25
WO2001027182A1 (en) 2001-04-19
US6582862B1 (en) 2003-06-24
KR100414478B1 (ko) 2004-01-07

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8339 Ceased/non-payment of the annual fee