DE60027942D1 - Verfahren zum Herstellen von Quarzglas - Google Patents

Verfahren zum Herstellen von Quarzglas

Info

Publication number
DE60027942D1
DE60027942D1 DE60027942T DE60027942T DE60027942D1 DE 60027942 D1 DE60027942 D1 DE 60027942D1 DE 60027942 T DE60027942 T DE 60027942T DE 60027942 T DE60027942 T DE 60027942T DE 60027942 D1 DE60027942 D1 DE 60027942D1
Authority
DE
Germany
Prior art keywords
quartz glass
producing quartz
producing
glass
quartz
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60027942T
Other languages
English (en)
Other versions
DE60027942T2 (de
Inventor
Norio Komine
Seishi Fujiwara
Akiko Yoshida
Hiroki Jinbo
Norihisa Yamaguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP11063258A external-priority patent/JP2000256019A/ja
Priority claimed from JP08848899A external-priority patent/JP4320829B2/ja
Priority claimed from JP11095982A external-priority patent/JP2000290028A/ja
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of DE60027942D1 publication Critical patent/DE60027942D1/de
Application granted granted Critical
Publication of DE60027942T2 publication Critical patent/DE60027942T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1407—Deposition reactors therefor
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C03B19/1423—Reactant deposition burners
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/07—Impurity concentration specified
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/04—Multi-nested ports
    • C03B2207/06—Concentric circular ports
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/04—Multi-nested ports
    • C03B2207/12—Nozzle or orifice plates
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/20—Specific substances in specified ports, e.g. all gas flows specified
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/20—Specific substances in specified ports, e.g. all gas flows specified
    • C03B2207/22—Inert gas details
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/20—Specific substances in specified ports, e.g. all gas flows specified
    • C03B2207/24—Multiple flame type, e.g. double-concentric flame
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
    • C03B2207/32—Non-halide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/36—Fuel or oxidant details, e.g. flow rate, flow rate ratio, fuel additives
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/08—Doped silica-based glasses containing boron or halide
    • C03C2201/11—Doped silica-based glasses containing boron or halide containing chlorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/50—Doped silica-based glasses containing metals containing alkali metals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Thermal Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
DE60027942T 1999-03-10 2000-03-10 Verfahren zum Herstellen von Quarzglas Expired - Lifetime DE60027942T2 (de)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP6325899 1999-03-10
JP11063258A JP2000256019A (ja) 1999-03-10 1999-03-10 石英ガラスおよびその製造方法
JP8848899 1999-03-30
JP08848899A JP4320829B2 (ja) 1999-03-30 1999-03-30 紫外用合成石英ガラスの製造方法とそれにより得られた部材
JP11095982A JP2000290028A (ja) 1999-04-02 1999-04-02 真空紫外用合成石英ガラスの製造方法とそれにより得られた部材
JP9598299 1999-04-02

Publications (2)

Publication Number Publication Date
DE60027942D1 true DE60027942D1 (de) 2006-06-22
DE60027942T2 DE60027942T2 (de) 2007-05-24

Family

ID=27298106

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60027942T Expired - Lifetime DE60027942T2 (de) 1999-03-10 2000-03-10 Verfahren zum Herstellen von Quarzglas

Country Status (3)

Country Link
US (3) US6649268B1 (de)
EP (1) EP1035078B1 (de)
DE (1) DE60027942T2 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001019465A (ja) 1999-07-07 2001-01-23 Shin Etsu Chem Co Ltd エキシマレーザ用合成石英ガラス部材及びその製造方法
JP2001342026A (ja) * 2000-05-30 2001-12-11 Tosoh Quartz Corp 石英ガラスの製造方法及び製造装置
US20040162211A1 (en) * 2001-09-27 2004-08-19 Domey Jeffrey J. Fused silica having high internal transmission and low birefringence
JP2003149479A (ja) * 2001-11-14 2003-05-21 Hitachi Cable Ltd 石英系ガラス光導波路及びそれを用いた光モジュール
JP2004284886A (ja) * 2003-03-24 2004-10-14 Shin Etsu Chem Co Ltd 合成石英ガラス製造用バーナー
WO2014045990A1 (ja) * 2012-09-18 2014-03-27 株式会社ニコン ＳｉＯ2 －ＴｉＯ2 系ガラスの製造方法および該ガラスからなるフォトマスク基板の製造方法
KR102095474B1 (ko) * 2013-03-27 2020-04-01 삼성디스플레이 주식회사 유기 화합물 검출 장치 및 이를 구비한 표시 장치의 제조 설비
CA161693S (en) 2014-09-29 2015-11-03 Altria Client Services Inc Electronic vaping article
CA165365S (en) 2015-05-15 2016-11-22 Altria Client Services Llc Mouthpiece for electronic vaping device
USD782108S1 (en) 2015-05-15 2017-03-21 Altria Client Services Llc Mouthpiece for electronic vaping device
USD767820S1 (en) 2015-05-15 2016-09-27 Altria Client Services Llc Mouthpiece for electronic vaping device
USD767822S1 (en) 2015-06-25 2016-09-27 Altria Client Services Llc Cartomizer for an electronic vaping device
US10314338B2 (en) 2015-06-25 2019-06-11 Altria Client Services Llc Electronic vaping device
CA166053S (en) 2015-06-25 2016-11-22 Altria Client Services Llc Electronic vaping device
USD790122S1 (en) 2015-11-13 2017-06-20 Altria Client Services Llc Electronic vaping device
USD797990S1 (en) 2015-11-13 2017-09-19 Altria Client Services Llc Electronic vaporizer
USD847419S1 (en) 2015-11-13 2019-04-30 Altria Client Services, Llc Electronic vaping device
US11242277B2 (en) * 2018-08-21 2022-02-08 Corning Incorporated Method of producing soot
CN112856413B (zh) * 2021-01-15 2022-03-18 西安交通大学 一种可调氢气引射/二次进风的燃烧器与燃烧方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51102014A (en) 1974-11-01 1976-09-09 Komatsu Denshi Kinzoku Kk Kojundotomeigarasutaino seizohoho
JPS5263213A (en) 1975-11-20 1977-05-25 Komatsu Denshi Kinzoku Kk Process for preparing highhpurity transparent silica glass products
JPH0791084B2 (ja) 1988-09-14 1995-10-04 信越化学工業株式会社 耐紫外線用合成石英ガラスおよびその製造方法
US5325230A (en) * 1989-06-09 1994-06-28 Shin-Etsu Quartz Products Co., Ltd. Optical members and blanks of synthetic silica glass and method for their production
ATE116448T1 (de) * 1989-06-09 1995-01-15 Heraeus Quarzglas Optische teile und rohlinge aus synthetischem siliziumdioxidglas und verfahren zu ihrer herstellung.
US5043002A (en) * 1990-08-16 1991-08-27 Corning Incorporated Method of making fused silica by decomposing siloxanes
JP3007510B2 (ja) 1993-04-27 2000-02-07 信越化学工業株式会社 合成石英ガラス部材の製造方法
JP2970330B2 (ja) 1993-08-26 1999-11-02 株式会社ニコン 内部透過率の測定方法及び分光光度計の調整方法
US5707908A (en) * 1995-01-06 1998-01-13 Nikon Corporation Silica glass
JP3064857B2 (ja) 1995-03-28 2000-07-12 株式会社ニコン 光リソグラフィー用光学部材および合成石英ガラスの製造方法
EP0835848A3 (de) * 1996-08-21 1998-06-10 Nikon Corporation Fluor enthaltendes Silicaglas, sein Herstellungsverfahren und ein dieses Glas enthaltender Projektionsbelichtungsapparat
DE69806672T2 (de) 1997-04-08 2003-03-20 Shinetsu Quartz Prod Optisches synthetisches Quarzglas, Herstellungsverfahren davon, und optisches Element für Excimer-Laser mit dem synthetischen Quarzglas
TW440548B (en) 1997-05-14 2001-06-16 Nippon Kogaku Kk Synthetic silica glass optical member and method of manufacturing the same
US6094940A (en) * 1997-10-09 2000-08-01 Nikon Corporation Manufacturing method of synthetic silica glass
JP3794664B2 (ja) * 1998-07-29 2006-07-05 信越化学工業株式会社 合成石英ガラス部材及びその製造方法、並びにエキシマレーザ用光学部品
JP2001010833A (ja) * 1999-06-21 2001-01-16 Nikon Corp 石英ガラス部材
ATE303977T1 (de) * 1999-12-27 2005-09-15 Shinetsu Chemical Co Verfahren zur herstellung von quarzglass und das so erhaltene produkt
US6378337B1 (en) * 2000-09-15 2002-04-30 Corning Incorporated Method for producing bulk fused silica

Also Published As

Publication number Publication date
EP1035078A2 (de) 2000-09-13
US6649268B1 (en) 2003-11-18
EP1035078A3 (de) 2001-10-17
DE60027942T2 (de) 2007-05-24
EP1035078B1 (de) 2006-05-17
US20050284177A1 (en) 2005-12-29
US20040095566A1 (en) 2004-05-20

Similar Documents

Publication Publication Date Title
DE60005168D1 (de) Verfahren zum schleifen von glas
ATE267147T1 (de) Verfahren zur vorbereitung von glasgemeng zum herstellen von glas
DE59814223D1 (de) Verfahren zum Herstellen von einkristallinen Strukturen
DE60027942D1 (de) Verfahren zum Herstellen von Quarzglas
DE60007039D1 (de) Verfahren zum Herstellen von Schrauben
DE60031174D1 (de) Verfahren zum herstellen von gebogenen thermoplastischen rohren
DE60127792D1 (de) Verfahren zum herstellen von brillenlinsen und polierwerkzeug
DE60027219D1 (de) Verfahren zum Schmelzen von Glas
DE50015231D1 (de) Verfahren zum Läutern von Glas
DE69923278D1 (de) Verfahren zum herstellen von zusammenhängenden beuteln
DE50211265D1 (de) Verfahren zum Herstellen von Zigarettenpackungen
DE60124452D1 (de) CVD Verfahren zum Herstellen von amorphem Silizium
DE60117717D1 (de) Verfahren zum Herstellen von Fahrzeugreifen
DE59813943D1 (de) Verfahren zum Herstellen von elektronischen Elementen
DE69805877T2 (de) Verfahren und Vorrichtung zum Herstellen von Quartzglasprodukten
DE69908230D1 (de) Verfahren zum Herstellen von Alpha-Hydroxycarboxylaten
DE69722118D1 (de) Verfahren zum herstellen von floatglasscheiben
DE60010807D1 (de) Verfahren zur vorbereitung von glasgemeng zum herstellen von glas
DE60118325D1 (de) Verfahren und Schachtofen zum Herstellen von Glaskugeln
DE69823991D1 (de) Verfahren zum Lösen von Glasscheiben
DE59914127D1 (de) Verfahren zum herstellen von halbleiterbauelementen
DE60137401D1 (de) Verfahren zur Selektion von Quartzglassubstraten
DE60016659D1 (de) Verfahren zum Herstellen von synthetischem Quarzglas
DE69940478D1 (de) Verfahren zum herstellen von flüssigkeitsbeuteln
DE69941916D1 (de) Verfahren zum Herstellen von synthetischem Quarzglas

Legal Events

Date Code Title Description
8364 No opposition during term of opposition