DE60019917D1 - Halbtonphasenschiebermaske und maskenrohling - Google Patents
Halbtonphasenschiebermaske und maskenrohlingInfo
- Publication number
- DE60019917D1 DE60019917D1 DE60019917T DE60019917T DE60019917D1 DE 60019917 D1 DE60019917 D1 DE 60019917D1 DE 60019917 T DE60019917 T DE 60019917T DE 60019917 T DE60019917 T DE 60019917T DE 60019917 D1 DE60019917 D1 DE 60019917D1
- Authority
- DE
- Germany
- Prior art keywords
- mask
- rolling
- halftone phase
- phase slider
- slider
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
- G03F1/58—Absorbers, e.g. of opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25574699A JP2001083687A (ja) | 1999-09-09 | 1999-09-09 | ハーフトーン位相シフトフォトマスク及びこれを作製するためのハーフトーン位相シフトフォトマスク用ブランクス |
JP25574699 | 1999-09-09 | ||
PCT/JP2000/006038 WO2001020400A1 (fr) | 1999-09-09 | 2000-09-06 | Photomasque de similigravure a decalage de phase et plaques pour la fabrication de photomasque de similigravure a decalage de phase |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60019917D1 true DE60019917D1 (de) | 2005-06-09 |
DE60019917T2 DE60019917T2 (de) | 2005-09-29 |
Family
ID=17283066
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60019917T Expired - Fee Related DE60019917T2 (de) | 1999-09-09 | 2000-09-06 | Halbtonphasenschiebermaske und maskenrohling |
Country Status (7)
Country | Link |
---|---|
US (1) | US6764792B1 (de) |
EP (1) | EP1176466B1 (de) |
JP (1) | JP2001083687A (de) |
KR (1) | KR100680684B1 (de) |
DE (1) | DE60019917T2 (de) |
TW (1) | TW440745B (de) |
WO (1) | WO2001020400A1 (de) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4490598B2 (ja) * | 2001-03-30 | 2010-06-30 | 株式会社日立ハイテクノロジーズ | 表面検査装置 |
JP4600629B2 (ja) * | 2001-06-26 | 2010-12-15 | 信越化学工業株式会社 | 位相シフトマスクブランク及びその製造方法 |
US6806095B2 (en) * | 2002-03-06 | 2004-10-19 | Padmapani C. Nallan | Method of plasma etching of high-K dielectric materials with high selectivity to underlying layers |
US6855463B2 (en) * | 2002-08-27 | 2005-02-15 | Photronics, Inc. | Photomask having an intermediate inspection film layer |
JP4525893B2 (ja) * | 2003-10-24 | 2010-08-18 | 信越化学工業株式会社 | 位相シフトマスクブランク、位相シフトマスク及びパターン転写方法 |
JP4535243B2 (ja) * | 2004-05-11 | 2010-09-01 | ルネサスエレクトロニクス株式会社 | 位相シフトマスクの製造方法 |
US20060222961A1 (en) * | 2005-03-31 | 2006-10-05 | Pei-Yang Yan | Leaky absorber for extreme ultraviolet mask |
US8435704B2 (en) | 2010-03-30 | 2013-05-07 | Hoya Corporation | Mask blank, transfer mask, and methods of manufacturing the same |
JP5950430B2 (ja) * | 2011-09-15 | 2016-07-13 | Hoya株式会社 | マスクブランク、多階調マスクおよびそれらの製造方法 |
JP6389375B2 (ja) * | 2013-05-23 | 2018-09-12 | Hoya株式会社 | マスクブランクおよび転写用マスク並びにそれらの製造方法 |
JP6165871B2 (ja) * | 2013-09-10 | 2017-07-19 | Hoya株式会社 | マスクブランク、転写用マスクおよび転写用マスクの製造方法 |
JP6891099B2 (ja) * | 2017-01-16 | 2021-06-18 | Hoya株式会社 | 位相シフトマスクブランクおよびこれを用いた位相シフトマスクの製造方法、並びに表示装置の製造方法 |
JP7126836B2 (ja) * | 2017-03-28 | 2022-08-29 | Hoya株式会社 | 位相シフトマスクブランク及びそれを用いた位相シフトマスクの製造方法、並びにパターン転写方法 |
US11314161B2 (en) | 2018-03-14 | 2022-04-26 | Hoya Corporation | Mask blank, phase shift mask, and method of manufacturing semiconductor device |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3272790B2 (ja) * | 1992-12-03 | 2002-04-08 | ホーヤ株式会社 | 位相シフトマスクの製造方法及び位相シフトマスクブランク |
JP3411613B2 (ja) * | 1993-03-26 | 2003-06-03 | Hoya株式会社 | ハーフトーン型位相シフトマスク |
KR100295385B1 (ko) | 1993-04-09 | 2001-09-17 | 기타지마 요시토시 | 하프톤위상쉬프트포토마스크,하프톤위상쉬프트포토마스크용블랭크스및이들의제조방법 |
JP3339649B2 (ja) * | 1993-07-30 | 2002-10-28 | 大日本印刷株式会社 | ハーフトーン位相シフトフォトマスク用ブランクスの製造方法、及び、ハーフトーン位相シフトフォトマスクの製造方法 |
JP3453435B2 (ja) * | 1993-10-08 | 2003-10-06 | 大日本印刷株式会社 | 位相シフトマスクおよびその製造方法 |
JPH07219204A (ja) * | 1994-01-28 | 1995-08-18 | Hoya Corp | ハーフトーン型位相シフトマスク及びその製造方法並びにパターン転写方法 |
JP3484548B2 (ja) * | 1994-03-16 | 2004-01-06 | 大日本印刷株式会社 | 上シフター型位相シフトフオトマスク用ブランクス及び上シフター型位相シフトフオトマスクとそれらの製造方法 |
US5635315A (en) * | 1995-06-21 | 1997-06-03 | Hoya Corporation | Phase shift mask and phase shift mask blank |
JP2996613B2 (ja) * | 1995-12-27 | 2000-01-11 | ホーヤ株式会社 | 位相シフトマスクブランク及び位相シフトマスクの製造方法 |
JP3431411B2 (ja) * | 1996-09-03 | 2003-07-28 | 株式会社東芝 | 露光用マスクの位相検査方法 |
JPH10104821A (ja) * | 1996-09-27 | 1998-04-24 | Dainippon Printing Co Ltd | フォトマスク及びその製造方法 |
JP3262529B2 (ja) * | 1997-12-19 | 2002-03-04 | ホーヤ株式会社 | 位相シフトマスク及び位相シフトマスクブランク |
US6037083A (en) * | 1998-12-22 | 2000-03-14 | Hoya Corporation | Halftone phase shift mask blanks, halftone phase shift masks, and fine pattern forming method |
TW446852B (en) * | 1999-06-11 | 2001-07-21 | Hoya Corp | Phase shift mask and phase shift mask blank and methods of manufacturing the same |
-
1999
- 1999-09-09 JP JP25574699A patent/JP2001083687A/ja active Pending
-
2000
- 2000-09-06 EP EP00956950A patent/EP1176466B1/de not_active Expired - Lifetime
- 2000-09-06 DE DE60019917T patent/DE60019917T2/de not_active Expired - Fee Related
- 2000-09-06 WO PCT/JP2000/006038 patent/WO2001020400A1/ja active IP Right Grant
- 2000-09-06 US US09/830,598 patent/US6764792B1/en not_active Expired - Fee Related
- 2000-09-06 KR KR1020017005778A patent/KR100680684B1/ko not_active IP Right Cessation
- 2000-09-08 TW TW089118426A patent/TW440745B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
WO2001020400A1 (fr) | 2001-03-22 |
DE60019917T2 (de) | 2005-09-29 |
EP1176466A1 (de) | 2002-01-30 |
EP1176466A4 (de) | 2003-03-19 |
KR20010089414A (ko) | 2001-10-06 |
TW440745B (en) | 2001-06-16 |
JP2001083687A (ja) | 2001-03-30 |
US6764792B1 (en) | 2004-07-20 |
KR100680684B1 (ko) | 2007-02-09 |
EP1176466B1 (de) | 2005-05-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE50112013D1 (de) | Deodorantien und antiperspirantien | |
DE60104766D1 (de) | Halbton-Phasenschiebermaske sowie Maskenrohling | |
DE69913169D1 (de) | Sportschuh und dafür vorgesehene dornen | |
DE60125938D1 (de) | Selektiv aufweitbarer und lösbarer stent | |
NO2009003I2 (no) | Etravirin | |
DE10080052T1 (de) | Beratungshilfeverfahren und -einrichtungen | |
AU5763101A (en) | Anti-inflammatory compounds and uses thereof | |
DE69924155D1 (de) | Fluoren-copolymere und daraus hergestellte vorrichtungen | |
DE60137812D1 (de) | Digitalrundfunkempfang und Druck | |
DE69910314D1 (de) | Gruppenantenne und Funkgerät | |
DE60141247D1 (de) | Bandkassette und bandeinheit | |
DE60038834D1 (de) | Kombinierter Druckknopf- und Drehschalter | |
DE60020737D1 (de) | Sic-einkristall und herstellungsverfahren dafür | |
DE60019917D1 (de) | Halbtonphasenschiebermaske und maskenrohling | |
DE60122160D1 (de) | Antennenstruktur und zugehöriges verfahren | |
DE60003873D1 (de) | Resistzusammensetzungen und Strukturierungsverfahren | |
DE60029075D1 (de) | Kopiergerät und Kopierverfahren | |
DE60034754D1 (de) | Resistzusammensetzung und Musterübertragungsverfahren | |
DE69916694D1 (de) | 2-Hydroxy-5-methyl-hexan-3-on und 3-hydroxy-5-methyl-hexan-2-on | |
ID27975A (id) | Peralatan penjepit gulungan | |
DE60010280D1 (de) | Substituierte pyridazinen und kondensierte pyridazinen mit angiogenesis-inhibierender wirkung | |
DE60044930D1 (de) | Resistzusammensetzung und Musterübertragungsverfahren | |
DE60112981D1 (de) | Walzwerk und Walzstrasse | |
DE60025502D1 (de) | Sic-einkristall und herstellungsverfahren dafür | |
DE60027550D1 (de) | Farbstabiler hypochloriger entkeimer und entkeimungsverfahren |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |