DE60015725D1 - Erzeugung von werkstoffen - Google Patents
Erzeugung von werkstoffenInfo
- Publication number
- DE60015725D1 DE60015725D1 DE60015725T DE60015725T DE60015725D1 DE 60015725 D1 DE60015725 D1 DE 60015725D1 DE 60015725 T DE60015725 T DE 60015725T DE 60015725 T DE60015725 T DE 60015725T DE 60015725 D1 DE60015725 D1 DE 60015725D1
- Authority
- DE
- Germany
- Prior art keywords
- generation
- materials
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
Landscapes
- Chemical & Material Sciences (AREA)
- Dispersion Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Electrostatic Spraying Apparatus (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Chemical Vapour Deposition (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB9900955 | 1999-01-15 | ||
GBGB9900955.7A GB9900955D0 (en) | 1999-01-15 | 1999-01-15 | Material deposition |
PCT/GB2000/000013 WO2000042234A1 (en) | 1999-01-15 | 2000-01-05 | Material fabrication |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60015725D1 true DE60015725D1 (de) | 2004-12-16 |
DE60015725T2 DE60015725T2 (de) | 2005-11-03 |
Family
ID=10845993
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60015725T Expired - Lifetime DE60015725T2 (de) | 1999-01-15 | 2000-01-05 | Erzeugung von Werkstoffen |
Country Status (9)
Country | Link |
---|---|
US (1) | US6800333B2 (de) |
EP (1) | EP1144721B1 (de) |
JP (1) | JP2002535482A (de) |
AU (1) | AU1883500A (de) |
CA (1) | CA2359822A1 (de) |
DE (1) | DE60015725T2 (de) |
GB (2) | GB9900955D0 (de) |
RU (1) | RU2001122806A (de) |
WO (1) | WO2000042234A1 (de) |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3823591B2 (ja) * | 1999-03-25 | 2006-09-20 | 三菱電機株式会社 | Cvd原料用気化装置およびこれを用いたcvd装置 |
US6908045B2 (en) * | 2003-01-28 | 2005-06-21 | Casio Computer Co., Ltd. | Solution spray apparatus and solution spray method |
WO2006086655A1 (en) * | 2005-02-11 | 2006-08-17 | Battelle Memorial Institute | Ehd aerosol dispensing device and spraying method |
JP4789551B2 (ja) * | 2005-09-06 | 2011-10-12 | 株式会社半導体エネルギー研究所 | 有機el成膜装置 |
JP2008043944A (ja) * | 2006-07-21 | 2008-02-28 | Matsushita Electric Ind Co Ltd | 微粒子の製造方法及び装置 |
JP2008153147A (ja) * | 2006-12-20 | 2008-07-03 | Seiko Epson Corp | プラズマ処理装置 |
US20080196627A1 (en) * | 2007-02-16 | 2008-08-21 | Core Technologies, Inc. | Vitreous enamel coating powder |
US7361207B1 (en) | 2007-02-28 | 2008-04-22 | Corning Incorporated | System and method for electrostatically depositing aerosol particles |
GB0814174D0 (en) * | 2008-08-02 | 2008-09-10 | Eastman Kodak Co | A method of making solar cells by dry powder printing |
US20100126227A1 (en) * | 2008-11-24 | 2010-05-27 | Curtis Robert Fekety | Electrostatically depositing conductive films during glass draw |
FI20080674A0 (fi) * | 2008-12-22 | 2008-12-22 | Beneq Oy | Menetelmä lasin pinnoittamiseksi |
DE102009002320B4 (de) * | 2009-04-09 | 2013-11-07 | Hochschule für angewandte Wissenschaft und Kunst Fachhochschule Hildesheim/Holzminden/Göttingen | Verfahren zur Reduzierung des elektrischen Kontaktwiderstands einer Oberfläche eines metallischen Körpers und Vorrichtung zur Durchführung des Verfahrens |
FI20095651A0 (fi) * | 2009-06-10 | 2009-06-10 | Beneq Oy | Menetelmä ja laitteisto lasisubstraatin pinnoittamiseksi |
DE102009044043A1 (de) * | 2009-09-17 | 2011-03-31 | Kerona Gmbh | Verwendung eines raumtemperaturhärtenden Beschichtungsmittels |
CN101759372B (zh) * | 2009-12-31 | 2012-10-10 | 中国科学院广州能源研究所 | 一体化超声喷雾热解镀膜装置 |
EP2582466B1 (de) * | 2010-06-21 | 2014-04-30 | Beneq OY | Vorrichtung und verfahren zur beschichtung eines glassubstrats |
EP2582858A1 (de) * | 2010-06-21 | 2013-04-24 | Beneq OY | Vorrichtung und verfahren zur beschichtung eines glassubstrats |
WO2012001210A1 (en) * | 2010-06-29 | 2012-01-05 | Beneq Oy | Apparatus and method for charging nanoparticles |
CN102744177B (zh) * | 2012-07-10 | 2014-10-08 | 重庆理工大学 | 一种超声雾化薄膜喷涂机 |
DE102013103504A1 (de) * | 2013-04-09 | 2014-10-09 | Hartmut Frey | Verfahren zur Herstellung von Lithium-Luft-Akkumulatoren mittels Hochdrucksprühen und Vorrichtung dazu |
US20170283306A1 (en) | 2014-05-12 | 2017-10-05 | Prince Minerals Llc | Glass composite suitable for providing a protective coating on untreated substrates |
KR101569288B1 (ko) * | 2014-08-28 | 2016-07-21 | 성균관대학교산학협력단 | 에어로졸 생성 장치 및 방법 |
JP3208344U (ja) * | 2015-11-16 | 2017-01-05 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 低蒸気圧のエアゾールに支援されるcvd |
US10273577B2 (en) * | 2015-11-16 | 2019-04-30 | Applied Materials, Inc. | Low vapor pressure aerosol-assisted CVD |
EP3463677A4 (de) * | 2016-06-01 | 2020-02-05 | Arizona Board of Regents on behalf of Arizona State University | System und verfahren zum beschichten durch aufsprühen von teilchenförmigen beschichtungen |
CN109046817B (zh) * | 2018-07-13 | 2023-09-05 | 金华职业技术学院 | 一种大分子沉积方法 |
CN113755826A (zh) * | 2021-08-26 | 2021-12-07 | 新沂市锡沂高新材料产业技术研究院有限公司 | 一种基于电晕荷电的氧化镓薄膜沉积系统及薄膜沉积方法 |
CN114990522B (zh) * | 2022-04-14 | 2023-08-08 | 重庆理工大学 | 一种热分解薄膜制备装置 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3436257A (en) * | 1964-07-30 | 1969-04-01 | Norma J Vance | Metal silicate coating utilizing electrostatic field |
FR2531880A1 (fr) * | 1982-08-18 | 1984-02-24 | Commissariat Energie Atomique | Procede de fabrication de couches minces |
SU1319914A1 (ru) * | 1985-12-02 | 1987-06-30 | Научно-Производственное Объединение "Лакокраспокрытие" | Электростатический распылитель порошковых материалов |
SU1607967A1 (ru) * | 1988-12-19 | 1990-11-23 | Московский энергетический институт | Электростатический распылитель |
JPH0550015A (ja) * | 1991-08-09 | 1993-03-02 | Kobe Steel Ltd | 塗装方法 |
US5344676A (en) * | 1992-10-23 | 1994-09-06 | The Board Of Trustees Of The University Of Illinois | Method and apparatus for producing nanodrops and nanoparticles and thin film deposits therefrom |
CA2240625A1 (en) * | 1995-12-14 | 1997-06-19 | Imperial College Of Science, Technology & Medicine | Film or coating deposition and powder formation |
US5916640A (en) * | 1996-09-06 | 1999-06-29 | Msp Corporation | Method and apparatus for controlled particle deposition on surfaces |
GB9711080D0 (en) * | 1997-05-29 | 1997-07-23 | Imperial College | Film or coating deposition on a substrate |
-
1999
- 1999-01-15 GB GBGB9900955.7A patent/GB9900955D0/en not_active Ceased
-
2000
- 2000-01-05 GB GB0000078A patent/GB2347369A/en not_active Withdrawn
- 2000-01-05 CA CA002359822A patent/CA2359822A1/en not_active Abandoned
- 2000-01-05 RU RU2001122806/02A patent/RU2001122806A/ru unknown
- 2000-01-05 DE DE60015725T patent/DE60015725T2/de not_active Expired - Lifetime
- 2000-01-05 JP JP2000593789A patent/JP2002535482A/ja active Pending
- 2000-01-05 EP EP00900068A patent/EP1144721B1/de not_active Expired - Lifetime
- 2000-01-05 AU AU18835/00A patent/AU1883500A/en not_active Abandoned
- 2000-01-05 WO PCT/GB2000/000013 patent/WO2000042234A1/en active IP Right Grant
-
2001
- 2001-07-13 US US09/909,173 patent/US6800333B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US20020106452A1 (en) | 2002-08-08 |
AU1883500A (en) | 2000-08-01 |
WO2000042234A1 (en) | 2000-07-20 |
EP1144721B1 (de) | 2004-11-10 |
US6800333B2 (en) | 2004-10-05 |
EP1144721A1 (de) | 2001-10-17 |
CA2359822A1 (en) | 2000-07-20 |
DE60015725T2 (de) | 2005-11-03 |
RU2001122806A (ru) | 2005-01-20 |
JP2002535482A (ja) | 2002-10-22 |
GB0000078D0 (en) | 2000-02-23 |
GB9900955D0 (en) | 1999-03-10 |
GB2347369A (en) | 2000-09-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |