DE60015725D1 - Erzeugung von werkstoffen - Google Patents

Erzeugung von werkstoffen

Info

Publication number
DE60015725D1
DE60015725D1 DE60015725T DE60015725T DE60015725D1 DE 60015725 D1 DE60015725 D1 DE 60015725D1 DE 60015725 T DE60015725 T DE 60015725T DE 60015725 T DE60015725 T DE 60015725T DE 60015725 D1 DE60015725 D1 DE 60015725D1
Authority
DE
Germany
Prior art keywords
generation
materials
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60015725T
Other languages
English (en)
Other versions
DE60015725T2 (de
Inventor
Kwang-Leong Choy
Junfa Mei
Bo Su
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Imperial College of Science Technology and Medicine
Original Assignee
Imperial College of Science Technology and Medicine
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Imperial College of Science Technology and Medicine filed Critical Imperial College of Science Technology and Medicine
Publication of DE60015725D1 publication Critical patent/DE60015725D1/de
Application granted granted Critical
Publication of DE60015725T2 publication Critical patent/DE60015725T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles

Landscapes

  • Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Electrostatic Spraying Apparatus (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Chemical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
DE60015725T 1999-01-15 2000-01-05 Erzeugung von Werkstoffen Expired - Lifetime DE60015725T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GBGB9900955.7A GB9900955D0 (en) 1999-01-15 1999-01-15 Material deposition
GB9900955 1999-01-15
PCT/GB2000/000013 WO2000042234A1 (en) 1999-01-15 2000-01-05 Material fabrication

Publications (2)

Publication Number Publication Date
DE60015725D1 true DE60015725D1 (de) 2004-12-16
DE60015725T2 DE60015725T2 (de) 2005-11-03

Family

ID=10845993

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60015725T Expired - Lifetime DE60015725T2 (de) 1999-01-15 2000-01-05 Erzeugung von Werkstoffen

Country Status (9)

Country Link
US (1) US6800333B2 (de)
EP (1) EP1144721B1 (de)
JP (1) JP2002535482A (de)
AU (1) AU1883500A (de)
CA (1) CA2359822A1 (de)
DE (1) DE60015725T2 (de)
GB (2) GB9900955D0 (de)
RU (1) RU2001122806A (de)
WO (1) WO2000042234A1 (de)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3823591B2 (ja) * 1999-03-25 2006-09-20 三菱電機株式会社 Ｃｖｄ原料用気化装置およびこれを用いたｃｖｄ装置
US6908045B2 (en) * 2003-01-28 2005-06-21 Casio Computer Co., Ltd. Solution spray apparatus and solution spray method
US7798420B2 (en) * 2005-02-11 2010-09-21 Battelle Memorial Institute Aerosol dispensing device and method
JP4789551B2 (ja) * 2005-09-06 2011-10-12 株式会社半導体エネルギー研究所 有機ｅｌ成膜装置
JP2008043944A (ja) * 2006-07-21 2008-02-28 Matsushita Electric Ind Co Ltd 微粒子の製造方法及び装置
JP2008153147A (ja) * 2006-12-20 2008-07-03 Seiko Epson Corp プラズマ処理装置
US20080196627A1 (en) * 2007-02-16 2008-08-21 Core Technologies, Inc. Vitreous enamel coating powder
US7361207B1 (en) 2007-02-28 2008-04-22 Corning Incorporated System and method for electrostatically depositing aerosol particles
GB0814174D0 (en) * 2008-08-02 2008-09-10 Eastman Kodak Co A method of making solar cells by dry powder printing
US20100126227A1 (en) * 2008-11-24 2010-05-27 Curtis Robert Fekety Electrostatically depositing conductive films during glass draw
FI20080674A0 (fi) * 2008-12-22 2008-12-22 Beneq Oy Menetelmä lasin pinnoittamiseksi
DE102009002320B4 (de) * 2009-04-09 2013-11-07 Hochschule für angewandte Wissenschaft und Kunst Fachhochschule Hildesheim/Holzminden/Göttingen Verfahren zur Reduzierung des elektrischen Kontaktwiderstands einer Oberfläche eines metallischen Körpers und Vorrichtung zur Durchführung des Verfahrens
FI20095651A0 (fi) * 2009-06-10 2009-06-10 Beneq Oy Menetelmä ja laitteisto lasisubstraatin pinnoittamiseksi
DE102009044043A1 (de) * 2009-09-17 2011-03-31 Kerona Gmbh Verwendung eines raumtemperaturhärtenden Beschichtungsmittels
CN101759372B (zh) * 2009-12-31 2012-10-10 中国科学院广州能源研究所 一体化超声喷雾热解镀膜装置
WO2011161297A1 (en) 2010-06-21 2011-12-29 Beneq Oy Apparatus and method for coating glass substrate
WO2011161296A1 (en) * 2010-06-21 2011-12-29 Beneq Oy Apparatus and method for coating glass substrate
WO2012001210A1 (en) * 2010-06-29 2012-01-05 Beneq Oy Apparatus and method for charging nanoparticles
CN102744177B (zh) * 2012-07-10 2014-10-08 重庆理工大学 一种超声雾化薄膜喷涂机
DE102013103504A1 (de) * 2013-04-09 2014-10-09 Hartmut Frey Verfahren zur Herstellung von Lithium-Luft-Akkumulatoren mittels Hochdrucksprühen und Vorrichtung dazu
EP3142983A1 (de) 2014-05-12 2017-03-22 Prince Minerals LLC Glasverbund zum aufbringen einer schutzschicht auf unbehandelte substrate
KR101569288B1 (ko) * 2014-08-28 2016-07-21 성균관대학교산학협력단 에어로졸 생성 장치 및 방법
JP3208344U (ja) * 2015-11-16 2017-01-05 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 低蒸気圧のエアゾールに支援されるｃｖｄ
US10273577B2 (en) * 2015-11-16 2019-04-30 Applied Materials, Inc. Low vapor pressure aerosol-assisted CVD
US10092926B2 (en) * 2016-06-01 2018-10-09 Arizona Board Of Regents On Behalf Of Arizona State University System and methods for deposition spray of particulate coatings
CN109046817B (zh) * 2018-07-13 2023-09-05 金华职业技术学院 一种大分子沉积方法
CN113755826A (zh) * 2021-08-26 2021-12-07 新沂市锡沂高新材料产业技术研究院有限公司 一种基于电晕荷电的氧化镓薄膜沉积系统及薄膜沉积方法
CN114990522B (zh) * 2022-04-14 2023-08-08 重庆理工大学 一种热分解薄膜制备装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3436257A (en) * 1964-07-30 1969-04-01 Norma J Vance Metal silicate coating utilizing electrostatic field
FR2531880A1 (fr) * 1982-08-18 1984-02-24 Commissariat Energie Atomique Procede de fabrication de couches minces
SU1319914A1 (ru) * 1985-12-02 1987-06-30 Научно-Производственное Объединение "Лакокраспокрытие" Электростатический распылитель порошковых материалов
SU1607967A1 (ru) * 1988-12-19 1990-11-23 Московский энергетический институт Электростатический распылитель
JPH0550015A (ja) * 1991-08-09 1993-03-02 Kobe Steel Ltd 塗装方法
US5344676A (en) * 1992-10-23 1994-09-06 The Board Of Trustees Of The University Of Illinois Method and apparatus for producing nanodrops and nanoparticles and thin film deposits therefrom
AU1182997A (en) * 1995-12-14 1997-07-03 Imperial College Of Science, Technology And Medicine Film or coating deposition and powder formation
US5916640A (en) * 1996-09-06 1999-06-29 Msp Corporation Method and apparatus for controlled particle deposition on surfaces
GB9711080D0 (en) * 1997-05-29 1997-07-23 Imperial College Film or coating deposition on a substrate

Also Published As

Publication number Publication date
AU1883500A (en) 2000-08-01
WO2000042234A1 (en) 2000-07-20
JP2002535482A (ja) 2002-10-22
EP1144721A1 (de) 2001-10-17
CA2359822A1 (en) 2000-07-20
GB9900955D0 (en) 1999-03-10
EP1144721B1 (de) 2004-11-10
US6800333B2 (en) 2004-10-05
RU2001122806A (ru) 2005-01-20
GB0000078D0 (en) 2000-02-23
US20020106452A1 (en) 2002-08-08
DE60015725T2 (de) 2005-11-03
GB2347369A (en) 2000-09-06

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Legal Events

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