DE60003281D1 - Thermisches Übertragungsverfahren. - Google Patents

Thermisches Übertragungsverfahren.

Info

Publication number
DE60003281D1
DE60003281D1 DE60003281T DE60003281T DE60003281D1 DE 60003281 D1 DE60003281 D1 DE 60003281D1 DE 60003281 T DE60003281 T DE 60003281T DE 60003281 T DE60003281 T DE 60003281T DE 60003281 D1 DE60003281 D1 DE 60003281D1
Authority
DE
Germany
Prior art keywords
thermal transfer
transfer process
thermal
transfer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60003281T
Other languages
English (en)
Other versions
DE60003281T2 (de
Inventor
B Wolk
B Mccormick
F Baude
Yong Hsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/231,723 external-priority patent/US6114088A/en
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of DE60003281D1 publication Critical patent/DE60003281D1/de
Application granted granted Critical
Publication of DE60003281T2 publication Critical patent/DE60003281T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/382Contact thermal transfer or sublimation processes
    • B41M5/38207Contact thermal transfer or sublimation processes characterised by aspects not provided for in groups B41M5/385 - B41M5/395
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M3/00Printing processes to produce particular kinds of printed work, e.g. patterns
    • B41M3/006Patterns of chemical products used for a specific purpose, e.g. pesticides, perfumes, adhesive patterns; use of microencapsulated material; Printing on smoking articles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/265Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used for the production of optical filters or electrical components
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/382Contact thermal transfer or sublimation processes
    • B41M5/38207Contact thermal transfer or sublimation processes characterised by aspects not provided for in groups B41M5/385 - B41M5/395
    • B41M5/38214Structural details, e.g. multilayer systems
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/382Contact thermal transfer or sublimation processes
    • B41M5/392Additives, other than colour forming substances, dyes or pigments, e.g. sensitisers, transfer promoting agents
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/382Contact thermal transfer or sublimation processes
    • B41M5/392Additives, other than colour forming substances, dyes or pigments, e.g. sensitisers, transfer promoting agents
    • B41M5/395Macromolecular additives, e.g. binders
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122Basic optical elements, e.g. light-guiding paths
    • G02B6/1221Basic optical elements, e.g. light-guiding paths made from organic materials
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13Integrated optical circuits characterised by the manufacturing method
    • G02B6/138Integrated optical circuits characterised by the manufacturing method by using polymerisation
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/10Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/04Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching
    • H05K3/046Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/18Deposition of organic active material using non-liquid printing techniques, e.g. thermal transfer printing from a donor sheet
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40Thermal treatment, e.g. annealing in the presence of a solvent vapour
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/40Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
    • B41M5/42Intermediate, backcoat, or covering layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/10OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • H10K59/122Pixel-defining structures or layers, e.g. banks
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/17Passive-matrix OLED displays
    • H10K59/173Passive-matrix OLED displays comprising banks or shadow masks
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/12Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10Organic polymers or oligomers
    • H10K85/111Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
    • H10K85/115Polyfluorene; Derivatives thereof
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/165Thermal imaging composition

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Pest Control & Pesticides (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Electroluminescent Light Sources (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
DE60003281T 1999-01-15 2000-01-11 Thermisches Übertragungsverfahren. Expired - Fee Related DE60003281T2 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US09/231,723 US6114088A (en) 1999-01-15 1999-01-15 Thermal transfer element for forming multilayer devices
US231723 1999-01-15
US09/473,115 US6194119B1 (en) 1999-01-15 1999-12-28 Thermal transfer element and process for forming organic electroluminescent devices
US473115 1999-12-28
PCT/US2000/000616 WO2000041893A1 (en) 1999-01-15 2000-01-11 Thermal transfer element and process for forming organic electroluminescent devices

Publications (2)

Publication Number Publication Date
DE60003281D1 true DE60003281D1 (de) 2003-07-17
DE60003281T2 DE60003281T2 (de) 2004-05-06

Family

ID=26925371

Family Applications (3)

Application Number Title Priority Date Filing Date
DE60027483T Expired - Fee Related DE60027483T2 (de) 1999-01-15 2000-01-11 Materialstrukturierungsverfahren
DE60035078T Expired - Fee Related DE60035078T2 (de) 1999-01-15 2000-01-11 Herstellungsverfahren eines Donorelements für Übertragung durch Wärme
DE60003281T Expired - Fee Related DE60003281T2 (de) 1999-01-15 2000-01-11 Thermisches Übertragungsverfahren.

Family Applications Before (2)

Application Number Title Priority Date Filing Date
DE60027483T Expired - Fee Related DE60027483T2 (de) 1999-01-15 2000-01-11 Materialstrukturierungsverfahren
DE60035078T Expired - Fee Related DE60035078T2 (de) 1999-01-15 2000-01-11 Herstellungsverfahren eines Donorelements für Übertragung durch Wärme

Country Status (5)

Country Link
US (4) US6291116B1 (de)
EP (1) EP1144197B1 (de)
DE (3) DE60027483T2 (de)
HK (1) HK1042675B (de)
WO (1) WO2000041893A1 (de)

Families Citing this family (145)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6566153B1 (en) * 1998-10-14 2003-05-20 The Regents Of The University Of California Process for fabricating organic semiconductor devices using ink-jet printing technology and device and system employing same
WO2000041893A1 (en) 1999-01-15 2000-07-20 3M Innovative Properties Company Thermal transfer element and process for forming organic electroluminescent devices
US6483236B1 (en) * 2000-05-24 2002-11-19 Eastman Kodak Company Low-voltage organic light-emitting device
US6867539B1 (en) 2000-07-12 2005-03-15 3M Innovative Properties Company Encapsulated organic electronic devices and method for making same
JP2002063985A (ja) * 2000-08-22 2002-02-28 Nec Corp 有機エレクトロルミネッセンス素子
US6699728B2 (en) * 2000-09-06 2004-03-02 Osram Opto Semiconductors Gmbh Patterning of electrodes in oled devices
US6855384B1 (en) 2000-09-15 2005-02-15 3M Innovative Properties Company Selective thermal transfer of light emitting polymer blends
US6358664B1 (en) 2000-09-15 2002-03-19 3M Innovative Properties Company Electronically active primer layers for thermal patterning of materials for electronic devices
US7042152B2 (en) * 2000-10-17 2006-05-09 Samsung Sdi Co., Ltd. Organic electroluminescence device including oxygen in an interface between organic layer and cathode
TW545079B (en) * 2000-10-26 2003-08-01 Semiconductor Energy Lab Light emitting device
US6605903B2 (en) * 2000-11-30 2003-08-12 Intel Corporation Selectively activating display column sections
US6650000B2 (en) * 2001-01-16 2003-11-18 International Business Machines Corporation Apparatus and method for forming a battery in an integrated circuit
US6852355B2 (en) * 2001-03-01 2005-02-08 E. I. Du Pont De Nemours And Company Thermal imaging processes and products of electroactive organic material
US6767807B2 (en) 2001-03-02 2004-07-27 Fuji Photo Film Co., Ltd. Method for producing organic thin film device and transfer material used therein
JP2002343565A (ja) 2001-05-18 2002-11-29 Sharp Corp 有機led表示パネルの製造方法、その方法により製造された有機led表示パネル、並びに、その方法に用いられるベースフィルム及び基板
JP2002343564A (ja) 2001-05-18 2002-11-29 Sharp Corp 転写用フィルムおよびそれを用いた有機エレクトロルミネッセンス素子の製造方法
JP3969698B2 (ja) 2001-05-21 2007-09-05 株式会社半導体エネルギー研究所 発光装置の作製方法
US20020197393A1 (en) * 2001-06-08 2002-12-26 Hideaki Kuwabara Process of manufacturing luminescent device
US7211828B2 (en) * 2001-06-20 2007-05-01 Semiconductor Energy Laboratory Co., Ltd. Light emitting device and electronic apparatus
TW548860B (en) 2001-06-20 2003-08-21 Semiconductor Energy Lab Light emitting device and method of manufacturing the same
JP2003045901A (ja) * 2001-08-01 2003-02-14 Sony Corp 素子の転写方法及びこれを用いた素子の配列方法、画像表示装置の製造方法
US6737753B2 (en) * 2001-09-28 2004-05-18 Osram Opto Semiconductor Gmbh Barrier stack
US7524528B2 (en) * 2001-10-05 2009-04-28 Cabot Corporation Precursor compositions and methods for the deposition of passive electrical components on a substrate
KR20040077655A (ko) 2001-10-19 2004-09-06 슈페리어 마이크로파우더스 엘엘씨 전자 형상 증착용 테잎 조성물
US7553512B2 (en) * 2001-11-02 2009-06-30 Cabot Corporation Method for fabricating an inorganic resistor
US7453202B2 (en) 2001-11-28 2008-11-18 Samsung Sdi Co., Ltd. Organic EL display device having organic soluble derivative layer
KR100478522B1 (ko) * 2001-11-28 2005-03-28 삼성에스디아이 주식회사 유기 화합물 유도체막층을 포함하고 있는 고분자 유기전계 발광 소자 및 그 제조 방법
JP2003187972A (ja) * 2001-12-20 2003-07-04 Dainippon Printing Co Ltd 有機el素子の製造方法および有機el転写体と被転写体
EP1456893A1 (de) * 2001-12-20 2004-09-15 Add-Vision, Inc. Siebdruckbare elektrode für eine organische lichtemittierende vorrichtung
US6610455B1 (en) * 2002-01-30 2003-08-26 Eastman Kodak Company Making electroluminscent display devices
US7157142B2 (en) 2002-02-06 2007-01-02 Fuji Photo Film Co., Ltd. Method for producing organic, thin-film device and transfer material used therein
AU2003223198A1 (en) 2002-03-01 2003-09-16 E.I. Du Pont De Nemours And Company Printing of organic conductive polymers containing additives
KR100473589B1 (ko) * 2002-03-12 2005-03-09 엘지.필립스 엘시디 주식회사 패시브 매트릭스형 유기전계발광 소자 및 그의 제조방법
KR20030075971A (ko) * 2002-03-22 2003-09-26 이홍희 유기 전자 소자의 박막 패턴 형성 방법
US7045861B2 (en) 2002-03-26 2006-05-16 Semiconductor Energy Laboratory Co., Ltd. Light-emitting device, liquid-crystal display device and method for manufacturing same
US6770502B2 (en) 2002-04-04 2004-08-03 Eastman Kodak Company Method of manufacturing a top-emitting OLED display device with desiccant structures
US6949389B2 (en) * 2002-05-02 2005-09-27 Osram Opto Semiconductors Gmbh Encapsulation for organic light emitting diodes devices
US6923881B2 (en) 2002-05-27 2005-08-02 Fuji Photo Film Co., Ltd. Method for producing organic electroluminescent device and transfer material used therein
US7230271B2 (en) * 2002-06-11 2007-06-12 Semiconductor Energy Laboratory Co., Ltd. Light emitting device comprising film having hygroscopic property and transparency and manufacturing method thereof
US20040004433A1 (en) * 2002-06-26 2004-01-08 3M Innovative Properties Company Buffer layers for organic electroluminescent devices and methods of manufacture and use
US20040000985A1 (en) * 2002-06-26 2004-01-01 Alps Electric Co., Ltd. Sliding-type electric component including carbon fiber contact
US6890627B2 (en) * 2002-08-02 2005-05-10 Eastman Kodak Company Laser thermal transfer from a donor element containing a hole-transporting layer
US6939660B2 (en) * 2002-08-02 2005-09-06 Eastman Kodak Company Laser thermal transfer donor including a separate dopant layer
EP1388903B1 (de) * 2002-08-09 2016-03-16 Semiconductor Energy Laboratory Co., Ltd. Organische elektrolumineszente Vorrichtung
US6784017B2 (en) * 2002-08-12 2004-08-31 Precision Dynamics Corporation Method of creating a high performance organic semiconductor device
US7449246B2 (en) * 2004-06-30 2008-11-11 General Electric Company Barrier coatings
US7015640B2 (en) * 2002-09-11 2006-03-21 General Electric Company Diffusion barrier coatings having graded compositions and devices incorporating the same
US20060208634A1 (en) * 2002-09-11 2006-09-21 General Electric Company Diffusion barrier coatings having graded compositions and devices incorporating the same
US20050181212A1 (en) * 2004-02-17 2005-08-18 General Electric Company Composite articles having diffusion barriers and devices incorporating the same
JP2004111335A (ja) * 2002-09-20 2004-04-08 Fuji Xerox Co Ltd 有機電界発光素子
US20040062947A1 (en) * 2002-09-25 2004-04-01 Lamansky Sergey A. Organic electroluminescent compositions
DE10246425A1 (de) * 2002-10-04 2004-04-15 Technische Universität Braunschweig Verfahren zur Mikrostrukturierung mittels ortsselektiver Sublimation
US6855636B2 (en) * 2002-10-31 2005-02-15 3M Innovative Properties Company Electrode fabrication methods for organic electroluminscent devices
US7195036B2 (en) * 2002-11-04 2007-03-27 The Regents Of The University Of Michigan Thermal micro-valves for micro-integrated devices
JP2005005245A (ja) 2002-11-08 2005-01-06 Fuji Photo Film Co Ltd 転写素材の転写方法、形状転写方法及び転写装置
US6918982B2 (en) * 2002-12-09 2005-07-19 International Business Machines Corporation System and method of transfer printing an organic semiconductor
US7176484B2 (en) 2002-12-09 2007-02-13 International Business Machines Corporation Use of an energy source to convert precursors into patterned semiconductors
US20040191564A1 (en) * 2002-12-17 2004-09-30 Samsung Sdi Co., Ltd. Donor film for low molecular weight full color organic electroluminescent device using laser induced thermal imaging method and method for fabricating low molecular weight full color organic electroluminescent device using the film
US6975067B2 (en) * 2002-12-19 2005-12-13 3M Innovative Properties Company Organic electroluminescent device and encapsulation method
WO2004063806A1 (de) * 2003-01-09 2004-07-29 Polyic Gmbh & Co. Kg Platine oder substrat für ein organisches elektronikgerät, sowie verwendung dazu
IL153895A (en) * 2003-01-12 2013-01-31 Orion Solar Systems Ltd Solar cell device
US6833201B2 (en) * 2003-01-31 2004-12-21 Clemson University Nanostructured-doped compound for use in an EL element
DE10316933A1 (de) * 2003-04-12 2004-10-21 E+E Elektronik Gmbh Sensorsystem und Verfahren zu dessen Herstellung
US7371452B2 (en) * 2003-04-28 2008-05-13 Eastman Kodak Company Conductive patterned sheet utilizing multi-layered conductive conduit channels
US7033711B2 (en) * 2003-07-16 2006-04-25 Eastman Kodak Company Aperture ratio or resolution of an OLED device by limiting the edge taper region
JP4650265B2 (ja) * 2003-07-23 2011-03-16 コニカミノルタホールディングス株式会社 有機エレクトロルミネッセンス素子、照明装置及び表示装置
US7275972B2 (en) * 2003-08-22 2007-10-02 3M Innovative Properties Company Method of making an electroluminescent device having a patterned emitter layer and non-patterned emitter layer
JP2005078941A (ja) 2003-08-29 2005-03-24 Fuji Photo Film Co Ltd 有機電界発光素子の製造方法及び有機電界発光素子
JP2005085799A (ja) * 2003-09-04 2005-03-31 Seiko Epson Corp 成膜方法、配線パターンの形成方法、半導体装置の製造方法、電気光学装置、及び電子機器
US6929048B2 (en) * 2003-09-05 2005-08-16 Eastman Kodak Company Laser transfer of organic material from a donor to form a layer in an OLED device
US7294372B2 (en) * 2003-10-01 2007-11-13 Eastman Kodak Company Conductive color filters
US7271534B2 (en) * 2003-11-04 2007-09-18 3M Innovative Properties Company Segmented organic light emitting device
US7432124B2 (en) * 2003-11-04 2008-10-07 3M Innovative Properties Company Method of making an organic light emitting device
ATE383733T1 (de) 2003-11-18 2008-01-15 3M Innovative Properties Co Elektrolumineszenzbauelemente und verfahren zur herstellung von elektrolumineszenzbauelementen mit einem farbwandlungselement
US20050118923A1 (en) * 2003-11-18 2005-06-02 Erika Bellmann Method of making an electroluminescent device including a color filter
US20050123850A1 (en) * 2003-12-09 2005-06-09 3M Innovative Properties Company Thermal transfer of light-emitting dendrimers
US7374685B2 (en) * 2003-12-18 2008-05-20 Clemson University Process for separating metallic from semiconducting single-walled carbon nanotubes
JP4743577B2 (ja) * 2004-01-09 2011-08-10 大日本印刷株式会社 発光素子およびその製造方法
US7202504B2 (en) 2004-05-20 2007-04-10 Semiconductor Energy Laboratory Co., Ltd. Light-emitting element and display device
US7485337B2 (en) * 2004-05-27 2009-02-03 Eastman Kodak Company Depositing an organic layer for use in OLEDs
US8034419B2 (en) * 2004-06-30 2011-10-11 General Electric Company Method for making a graded barrier coating
US20090110892A1 (en) * 2004-06-30 2009-04-30 General Electric Company System and method for making a graded barrier coating
KR20060017414A (ko) * 2004-08-20 2006-02-23 삼성에스디아이 주식회사 유기 전계 발광 소자의 제조 방법
DE102004040831A1 (de) * 2004-08-23 2006-03-09 Polyic Gmbh & Co. Kg Funketikettfähige Umverpackung
KR100623694B1 (ko) * 2004-08-30 2006-09-19 삼성에스디아이 주식회사 레이저 전사용 도너 기판 및 그 기판을 사용하여 제조되는유기 전계 발광 소자의 제조 방법
KR100611767B1 (ko) * 2004-08-30 2006-08-10 삼성에스디아이 주식회사 레이저 전사용 도너 기판 및 그 필름을 사용하여 제조되는유기 전계 발광 소자의 제조 방법
KR20060020044A (ko) * 2004-08-30 2006-03-06 삼성에스디아이 주식회사 유기전계발광표시장치 및 도너 기판의 제조방법
US20060062983A1 (en) * 2004-09-17 2006-03-23 Irvin Glen C Jr Coatable conductive polyethylenedioxythiophene with carbon nanotubes
KR20060027750A (ko) * 2004-09-23 2006-03-28 삼성에스디아이 주식회사 유기 전계 발광 소자의 제조 방법
US7781047B2 (en) 2004-10-21 2010-08-24 Eastman Kodak Company Polymeric conductor donor and transfer method
DE102004059467A1 (de) * 2004-12-10 2006-07-20 Polyic Gmbh & Co. Kg Gatter aus organischen Feldeffekttransistoren
DE102004059465A1 (de) * 2004-12-10 2006-06-14 Polyic Gmbh & Co. Kg Erkennungssystem
DE102004059464A1 (de) * 2004-12-10 2006-06-29 Polyic Gmbh & Co. Kg Elektronikbauteil mit Modulator
US7414313B2 (en) * 2004-12-22 2008-08-19 Eastman Kodak Company Polymeric conductor donor and transfer method
DE102004063435A1 (de) 2004-12-23 2006-07-27 Polyic Gmbh & Co. Kg Organischer Gleichrichter
US8569948B2 (en) 2004-12-28 2013-10-29 Samsung Display Co., Ltd. Electroluminescent devices and methods of making electroluminescent devices including an optical spacer
US7630029B2 (en) * 2005-02-16 2009-12-08 Industrial Technology Research Institute Conductive absorption layer for flexible displays
US20060188721A1 (en) * 2005-02-22 2006-08-24 Eastman Kodak Company Adhesive transfer method of carbon nanotube layer
DE102005009819A1 (de) 2005-03-01 2006-09-07 Polyic Gmbh & Co. Kg Elektronikbaugruppe
DE102005009820A1 (de) * 2005-03-01 2006-09-07 Polyic Gmbh & Co. Kg Elektronikbaugruppe mit organischen Logik-Schaltelementen
DE102005017655B4 (de) 2005-04-15 2008-12-11 Polyic Gmbh & Co. Kg Mehrschichtiger Verbundkörper mit elektronischer Funktion
TWI361018B (en) * 2005-04-18 2012-03-21 Sony Corp Display device and a method of manufacturing the s
US7569331B2 (en) * 2005-06-01 2009-08-04 Hewlett-Packard Development Company, L.P. Conductive patterning
KR101223718B1 (ko) * 2005-06-18 2013-01-18 삼성디스플레이 주식회사 나노 도전성 막의 패터닝 방법
DE102005031448A1 (de) 2005-07-04 2007-01-11 Polyic Gmbh & Co. Kg Aktivierbare optische Schicht
DE102005035589A1 (de) 2005-07-29 2007-02-01 Polyic Gmbh & Co. Kg Verfahren zur Herstellung eines elektronischen Bauelements
US7410825B2 (en) 2005-09-15 2008-08-12 Eastman Kodak Company Metal and electronically conductive polymer transfer
DE102005044306A1 (de) 2005-09-16 2007-03-22 Polyic Gmbh & Co. Kg Elektronische Schaltung und Verfahren zur Herstellung einer solchen
KR100717269B1 (ko) * 2005-11-01 2007-05-15 삼성전자주식회사 디스플레이장치 및 그 제조방법
US8264137B2 (en) 2006-01-03 2012-09-11 Samsung Electronics Co., Ltd. Curing binder material for carbon nanotube electron emission cathodes
US7443082B2 (en) * 2006-03-03 2008-10-28 Basf Corporation Piezoelectric polymer composite article and system
TW200739982A (en) * 2006-04-06 2007-10-16 Nat Univ Chung Cheng Method for manufacturing full-color organic light-emitting diode array based on microcontact printing technology
US7223515B1 (en) 2006-05-30 2007-05-29 3M Innovative Properties Company Thermal mass transfer substrate films, donor elements, and methods of making and using same
US7670450B2 (en) 2006-07-31 2010-03-02 3M Innovative Properties Company Patterning and treatment methods for organic light emitting diode devices
US7626603B2 (en) * 2006-11-02 2009-12-01 Industrial Technology Research Institute Thermal transfer device and method for forming a display device using the same
US20100035377A1 (en) * 2006-12-22 2010-02-11 Cbrite Inc. Transfer Coating Method
WO2008080066A1 (en) 2006-12-22 2008-07-03 Cbrite Inc. Hemispherical coating method for micro-elements
US7646144B2 (en) * 2006-12-27 2010-01-12 Eastman Kodak Company OLED with protective bi-layer electrode
DE102007005917A1 (de) * 2007-02-01 2008-08-07 Leonhard Kurz Gmbh & Co. Kg Farbige Markierung und Beschriftung mittels energiereicher Strahlung
JP5208591B2 (ja) * 2007-06-28 2013-06-12 株式会社半導体エネルギー研究所 発光装置、及び照明装置
JP5325471B2 (ja) 2007-07-06 2013-10-23 株式会社半導体エネルギー研究所 発光装置の作製方法
US8058802B2 (en) * 2007-09-28 2011-11-15 General Electric Company Thermal management article and method
GB2453766A (en) 2007-10-18 2009-04-22 Novalia Ltd Method of fabricating an electronic device
US8153201B2 (en) * 2007-10-23 2012-04-10 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing light-emitting device, and evaporation donor substrate
US20100080929A1 (en) * 2008-09-30 2010-04-01 General Electric Company System and method for applying a conformal barrier coating
US8033885B2 (en) * 2008-09-30 2011-10-11 General Electric Company System and method for applying a conformal barrier coating with pretreating
JP5292263B2 (ja) * 2008-12-05 2013-09-18 株式会社半導体エネルギー研究所 成膜方法及び発光素子の作製方法
US9472783B2 (en) * 2009-10-12 2016-10-18 General Electric Company Barrier coating with reduced process time
US20110151153A1 (en) * 2009-12-23 2011-06-23 E.I. Du Pont De Nemours And Company Polymeric conductive donor
JP5113865B2 (ja) * 2010-03-11 2013-01-09 株式会社東芝 有機エレクトロルミネッセンス表示装置の製造方法
KR20110112992A (ko) * 2010-04-08 2011-10-14 삼성모바일디스플레이주식회사 유기 발광 장치 및 이의 제조 방법
WO2012021968A1 (en) * 2010-08-18 2012-02-23 Dayan Ban Organic/inorganic hybrid optical amplifier with wavelength conversion
US9425027B2 (en) * 2011-05-15 2016-08-23 Varian Semiconductor Equipment Associates, Inc. Methods of affecting material properties and applications therefor
JP5845775B2 (ja) * 2011-09-26 2016-01-20 住友電気工業株式会社 薄膜個片の接合方法
KR102065763B1 (ko) 2013-03-27 2020-01-14 삼성디스플레이 주식회사 승화형 열전사 방법을 이용하는 유기 전계 발광 표시 장치의 유기 발광 패턴 형성 방법 및 유기 발광 패턴 형성 장치
US9105854B2 (en) 2013-09-20 2015-08-11 International Business Machines Corporation Transferable transparent conductive oxide
CN104752476B (zh) * 2013-12-31 2018-05-22 乐金显示有限公司 有机发光显示装置及其制造方法
KR102175007B1 (ko) * 2013-12-31 2020-11-06 엘지디스플레이 주식회사 유기전계발광표시장치 및 그 제조방법
US9577196B2 (en) * 2014-02-28 2017-02-21 International Business Machines Corporation Optoelectronics integration by transfer process
KR102365285B1 (ko) * 2014-11-05 2022-02-18 에베 그룹 에. 탈너 게엠베하 제품 기판을 코팅하기 위한 방법 및 장치
KR101958397B1 (ko) * 2015-05-15 2019-03-15 주식회사 다원시스 유기막 증착 장치와, 방법 및 유기막 장치
TWI671931B (zh) * 2018-03-19 2019-09-11 謙華科技股份有限公司 使用熱轉印膜製備有機發光二極體之方法
TW201943114A (zh) * 2018-03-31 2019-11-01 謙華科技股份有限公司 使用熱轉印膜連續製備有機發光二極體之方法
JP7516427B2 (ja) 2019-05-31 2024-07-16 スリーエム イノベイティブ プロパティズ カンパニー パターン化された転写物品
JP2023508548A (ja) * 2019-12-30 2023-03-02 スリーエム イノベイティブ プロパティズ カンパニー 機能構造を有する歯科装具及びこのような装具の形成に使用される転写物品

Family Cites Families (61)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4252671A (en) 1979-12-04 1981-02-24 Xerox Corporation Preparation of colloidal iron dispersions by the polymer-catalyzed decomposition of iron carbonyl and iron organocarbonyl compounds
US4539507A (en) 1983-03-25 1985-09-03 Eastman Kodak Company Organic electroluminescent devices having improved power conversion efficiencies
GB2170016B (en) 1984-12-19 1989-04-05 Plessey Co Plc Improvements in or relating to modulators
CA1268808A (en) 1985-07-23 1990-05-08 Alan G. Macdiarmid High capacity polyaniline electrodes
EP0258836B1 (de) 1986-09-01 1992-08-12 Tomoegawa Paper Co. Ltd. Übertragungsaufzeichnungsmittel und ihre Verwendung für Übertragungsaufzeichnungsverfahren
US4833124A (en) 1987-12-04 1989-05-23 Eastman Kodak Company Process for increasing the density of images obtained by thermal dye transfer
DE3872854T2 (de) 1987-12-21 1993-03-04 Eastman Kodak Co Infrarot absorbierende cyaninfarbstoffe fuer farbstoff-donorelemente zur verwendung bei de laserinduzierten thermischen farbstoffuebertragung.
JPH01290495A (ja) 1988-05-18 1989-11-22 Konica Corp 感熱転写記録媒体
US5256506A (en) 1990-10-04 1993-10-26 Graphics Technology International Inc. Ablation-transfer imaging/recording
US5156938A (en) 1989-03-30 1992-10-20 Graphics Technology International, Inc. Ablation-transfer imaging/recording
US5501938A (en) 1989-03-30 1996-03-26 Rexham Graphics Inc. Ablation-transfer imaging/recording
US5171650A (en) 1990-10-04 1992-12-15 Graphics Technology International, Inc. Ablation-transfer imaging/recording
US4942141A (en) 1989-06-16 1990-07-17 Eastman Kodak Company Infrared absorbing squarylium dyes for dye-donor element used in laser-induced thermal dye transfer
US4950639A (en) 1989-06-16 1990-08-21 Eastman Kodak Company Infrared absorbing bis(aminoaryl)polymethine dyes for dye-donor element used in laser-induced thermal dye transfer
US4948776A (en) 1989-06-16 1990-08-14 Eastman Kodak Company Infrared absorbing chalcogenopyrylo-arylidene dyes for dye-donor element used in laser-induced thermal dye transfer
US4948778A (en) 1989-06-20 1990-08-14 Eastman Kodak Company Infrared absorbing oxyindolizine dyes for dye-donor element used in laser-induced thermal dye transfer
US4912083A (en) 1989-06-20 1990-03-27 Eastman Kodak Company Infrared absorbing ferrous complexes for dye-donor element used in laser-induced thermal dye transfer
US4952552A (en) 1989-06-20 1990-08-28 Eastman Kodak Company Infrared absorbing quinoid dyes for dye-donor element used in laser-induced thermal dye transfer
US5061569A (en) 1990-07-26 1991-10-29 Eastman Kodak Company Electroluminescent device with organic electroluminescent medium
US5024990A (en) 1990-10-31 1991-06-18 Eastman Kodak Company Mixture of dyes for cyan dye donor for thermal color proofing
US5023229A (en) 1990-10-31 1991-06-11 Eastman Kodak Company Mixture of dyes for magenta dye donor for thermal color proofing
US5166024A (en) 1990-12-21 1992-11-24 Eastman Kodak Company Photoelectrographic imaging with near-infrared sensitizing pigments
US5401607A (en) 1991-04-17 1995-03-28 Polaroid Corporation Processes and compositions for photogeneration of acid
DE4118870A1 (de) * 1991-06-07 1992-12-17 Ystral Gmbh Maschinenbau Und P Vorrichtung zum benetzen und dispergieren von pulvern in fluessigkeiten
US5141671A (en) 1991-08-01 1992-08-25 Eastman Kodak Company Mixed ligand 8-quinolinolato aluminum chelate luminophors
US5244770A (en) 1991-10-23 1993-09-14 Eastman Kodak Company Donor element for laser color transfer
DE69320241T2 (de) 1992-05-06 1999-04-29 Kyowa Hakko Kogyo Co., Ltd., Tokio/Tokyo Chemisch amplifizierte Resistzusammensetzung
US5351617A (en) 1992-07-20 1994-10-04 Presstek, Inc. Method for laser-discharge imaging a printing plate
JP3727652B2 (ja) 1992-11-18 2005-12-14 ラトラン テクノロジーズ エルエルシー Lat画像化フイルムのオンディマンド製造
US5286604A (en) 1992-11-25 1994-02-15 E. I. Du Pont De Nemours And Company Single layer dry processible photothermal-sensitive element
EP0641008A4 (de) 1993-03-11 1995-07-12 Sony Corp Verfahren zur Bildung eines fluoreszenten Films und Ubertragungsmaterial zur Bildung des fluoreszenten Films.
SG59953A1 (en) * 1993-03-26 1999-02-22 Sumitomo Electric Industries Organic electroluminescent elements
US5372915A (en) 1993-05-19 1994-12-13 Eastman Kodak Company Method of making a lithographic printing plate containing a resole resin and a novolac resin in the radiation sensitive layer
US5387496A (en) 1993-07-30 1995-02-07 Eastman Kodak Company Interlayer for laser ablative imaging
EP0713586B1 (de) 1993-08-13 2001-07-18 PGI Graphics Imaging LLC Ablationsübertragung auf zwischenprodukte
JP3534445B2 (ja) 1993-09-09 2004-06-07 隆一 山本 ポリチオフェンを用いたel素子
US5360694A (en) 1993-10-18 1994-11-01 Minnesota Mining And Manufacturing Company Thermal dye transfer
US5521035A (en) * 1994-07-11 1996-05-28 Minnesota Mining And Manufacturing Company Methods for preparing color filter elements using laser induced transfer of colorants with associated liquid crystal display device
US5707745A (en) 1994-12-13 1998-01-13 The Trustees Of Princeton University Multicolor organic light emitting devices
US5685939A (en) * 1995-03-10 1997-11-11 Minnesota Mining And Manufacturing Company Process for making a Z-axis adhesive and establishing electrical interconnection therewith
AU7256496A (en) * 1995-10-17 1997-05-07 Minnesota Mining And Manufacturing Company Method for radiation-induced thermal transfer of resist for flexible printed circuitry
US5688551A (en) * 1995-11-13 1997-11-18 Eastman Kodak Company Method of forming an organic electroluminescent display panel
US5605780A (en) 1996-03-12 1997-02-25 Eastman Kodak Company Lithographic printing plate adapted to be imaged by ablation
US5691114A (en) 1996-03-12 1997-11-25 Eastman Kodak Company Method of imaging of lithographic printing plates using laser ablation
US5747217A (en) 1996-04-03 1998-05-05 Minnesota Mining And Manufacturing Company Laser-induced mass transfer imaging materials and methods utilizing colorless sublimable compounds
US5691098A (en) 1996-04-03 1997-11-25 Minnesota Mining And Manufacturing Company Laser-Induced mass transfer imaging materials utilizing diazo compounds
US5725989A (en) 1996-04-15 1998-03-10 Chang; Jeffrey C. Laser addressable thermal transfer imaging element with an interlayer
US5693446A (en) 1996-04-17 1997-12-02 Minnesota Mining And Manufacturing Company Polarizing mass transfer donor element and method of transferring a polarizing mass transfer layer
US5710097A (en) * 1996-06-27 1998-01-20 Minnesota Mining And Manufacturing Company Process and materials for imagewise placement of uniform spacers in flat panel displays
US5998085A (en) * 1996-07-23 1999-12-07 3M Innovative Properties Process for preparing high resolution emissive arrays and corresponding articles
JP3874380B2 (ja) 1996-08-26 2007-01-31 エヌ・イーケムキャット株式会社 空格子点型格子欠陥を有するカーボン担持白金スケルトン合金電極触媒
KR100195175B1 (ko) 1996-12-23 1999-06-15 손욱 유기전자발광소자 유기박막용 도너필름, 이를 이용한 유기전자발광소자의 제조방법 및 그 방법에 따라 제조된 유기전자발광소자
KR0176336B1 (ko) * 1996-12-31 1999-04-01 박원훈 아세틸렌기를 함유한 플로렌계 교대 공중합체 및 이를 이용한 전계발광소자
US5756240A (en) * 1997-01-24 1998-05-26 Eastman Kodak Company Method of making color filter arrays by transferring colorant material
US5904961A (en) * 1997-01-24 1999-05-18 Eastman Kodak Company Method of depositing organic layers in organic light emitting devices
US5937272A (en) 1997-06-06 1999-08-10 Eastman Kodak Company Patterned organic layers in a full-color organic electroluminescent display array on a thin film transistor array substrate
US5777070A (en) 1997-10-23 1998-07-07 The Dow Chemical Company Process for preparing conjugated polymers
JP4547723B2 (ja) 1998-03-09 2010-09-22 セイコーエプソン株式会社 有機el表示装置の製造方法
WO2000014777A1 (en) 1998-09-04 2000-03-16 Fed Corporation Fabrication method for high resolution full color organic led displays
US6114088A (en) 1999-01-15 2000-09-05 3M Innovative Properties Company Thermal transfer element for forming multilayer devices
WO2000041893A1 (en) 1999-01-15 2000-07-20 3M Innovative Properties Company Thermal transfer element and process for forming organic electroluminescent devices

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WO2000041893A8 (en) 2001-05-25
US6291116B1 (en) 2001-09-18
US6410201B2 (en) 2002-06-25
US20010000744A1 (en) 2001-05-03
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US6582876B2 (en) 2003-06-24
WO2000041893A1 (en) 2000-07-20
DE60035078D1 (de) 2007-07-12
DE60027483D1 (de) 2006-05-24
HK1042675A1 (en) 2002-08-23
EP1144197B1 (de) 2003-06-11
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