DE4421053A1 - Beleuchtungseinrichtung - Google Patents

Beleuchtungseinrichtung

Info

Publication number
DE4421053A1
DE4421053A1 DE4421053A DE4421053A DE4421053A1 DE 4421053 A1 DE4421053 A1 DE 4421053A1 DE 4421053 A DE4421053 A DE 4421053A DE 4421053 A DE4421053 A DE 4421053A DE 4421053 A1 DE4421053 A1 DE 4421053A1
Authority
DE
Germany
Prior art keywords
lighting device
axicons
lighting
distance
glass rod
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE4421053A
Other languages
German (de)
English (en)
Inventor
Johannes Wangler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Carl Zeiss AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH, Carl Zeiss AG filed Critical Carl Zeiss SMT GmbH
Priority to DE4421053A priority Critical patent/DE4421053A1/de
Priority to DE4441947A priority patent/DE4441947A1/de
Priority to TW084104406A priority patent/TW298629B/zh
Priority to DE59507458T priority patent/DE59507458D1/de
Priority to EP95107364A priority patent/EP0687956B2/de
Priority to JP7152749A priority patent/JPH086175A/ja
Priority to US08/490,752 priority patent/US5675401A/en
Priority to KR1019950016072A priority patent/KR100384551B1/ko
Publication of DE4421053A1 publication Critical patent/DE4421053A1/de
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B15/00—Optical objectives with means for varying the magnification
    • G02B15/02—Optical objectives with means for varying the magnification by changing, adding, or subtracting a part of the objective, e.g. convertible objective
    • G02B15/04—Optical objectives with means for varying the magnification by changing, adding, or subtracting a part of the objective, e.g. convertible objective by changing a part
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/001—Axicons, waxicons, reflaxicons
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/42—Coupling light guides with opto-electronic elements
    • G02B6/4201—Packages, e.g. shape, construction, internal or external details
    • G02B6/4204—Packages, e.g. shape, construction, internal or external details the coupling comprising intermediate optical elements, e.g. lenses, holograms
    • G02B6/4206—Optical features
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/42—Coupling light guides with opto-electronic elements
    • G02B6/4298—Coupling light guides with opto-electronic elements coupling with non-coherent light sources and/or radiation detectors, e.g. lamps, incandescent bulbs, scintillation chambers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70183—Zoom systems for adjusting beam diameter

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Microscoopes, Condenser (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE4421053A 1994-06-17 1994-06-17 Beleuchtungseinrichtung Ceased DE4421053A1 (de)

Priority Applications (8)

Application Number Priority Date Filing Date Title
DE4421053A DE4421053A1 (de) 1994-06-17 1994-06-17 Beleuchtungseinrichtung
DE4441947A DE4441947A1 (de) 1994-06-17 1994-11-25 Beleuchtungseinrichtung
TW084104406A TW298629B (zh) 1994-06-17 1995-05-03
DE59507458T DE59507458D1 (de) 1994-06-17 1995-05-16 Beleuchtungseinrichtung
EP95107364A EP0687956B2 (de) 1994-06-17 1995-05-16 Beleuchtungseinrichtung
JP7152749A JPH086175A (ja) 1994-06-17 1995-05-29 照明システム
US08/490,752 US5675401A (en) 1994-06-17 1995-06-15 Illuminating arrangement including a zoom objective incorporating two axicons
KR1019950016072A KR100384551B1 (ko) 1994-06-17 1995-06-16 조광시스템

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE4421053A DE4421053A1 (de) 1994-06-17 1994-06-17 Beleuchtungseinrichtung

Publications (1)

Publication Number Publication Date
DE4421053A1 true DE4421053A1 (de) 1995-12-21

Family

ID=6520742

Family Applications (3)

Application Number Title Priority Date Filing Date
DE4421053A Ceased DE4421053A1 (de) 1994-06-17 1994-06-17 Beleuchtungseinrichtung
DE4441947A Ceased DE4441947A1 (de) 1994-06-17 1994-11-25 Beleuchtungseinrichtung
DE59507458T Expired - Fee Related DE59507458D1 (de) 1994-06-17 1995-05-16 Beleuchtungseinrichtung

Family Applications After (2)

Application Number Title Priority Date Filing Date
DE4441947A Ceased DE4441947A1 (de) 1994-06-17 1994-11-25 Beleuchtungseinrichtung
DE59507458T Expired - Fee Related DE59507458D1 (de) 1994-06-17 1995-05-16 Beleuchtungseinrichtung

Country Status (3)

Country Link
KR (1) KR100384551B1 (zh)
DE (3) DE4421053A1 (zh)
TW (1) TW298629B (zh)

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0949541A2 (en) * 1998-04-08 1999-10-13 Asm Lithography B.V. Lithography apparatus
US6452662B2 (en) 1998-04-08 2002-09-17 Asml Netherlands B.V. Lithography apparatus
DE10109592A1 (de) * 2001-02-28 2002-09-26 Zeiss Carl Jena Gmbh Anordnung zum Erzeugen eines leuchtenden Feldes
DE10144244A1 (de) * 2001-09-05 2003-03-20 Zeiss Carl Zoom-System, insbesondere für eine Beleuchtungseinrichtung
FR2831967A1 (fr) * 2001-11-05 2003-05-09 Samsung Electronics Co Ltd Appareil et procede d'exposition d'un objet a de la lumiere
EP1319983A3 (en) * 2001-10-18 2003-08-27 ASML US, Inc. Advanced illumination system for use in microlithography
US6855486B1 (en) 1999-09-29 2005-02-15 Asml Netherlands B.V. Lithographic method and apparatus
US6864960B2 (en) 2001-09-05 2005-03-08 Carl Zeiss Smt Ag Zoom system for an illumination device
DE102004015148A1 (de) * 2004-03-27 2005-10-20 Fuhrberg Teichmann Optische Vorrichtung zur Formung der Intensitätsverteilung eines Lichtstrahlenbündels
US7006295B2 (en) 2001-10-18 2006-02-28 Asml Holding N.V. Illumination system and method for efficiently illuminating a pattern generator
US7079321B2 (en) 2001-10-18 2006-07-18 Asml Holding N.V. Illumination system and method allowing for varying of both field height and pupil
EP1686405A1 (de) 1998-11-30 2006-08-02 Carl Zeiss SMT AG Mikrolithographisches Reduktionsobjektiv mit fünf Linsengruppen
US7187430B2 (en) 2002-06-11 2007-03-06 Asml Holding N.V. Advanced illumination system for use in microlithography
EP1941313A2 (en) * 2005-10-27 2008-07-09 Yale University An optical system for illumination of an evanescent field
US7408622B2 (en) 2003-08-14 2008-08-05 Carl Zeiss Smt Ag Illumination system and polarizer for a microlithographic projection exposure apparatus
US7511886B2 (en) 2003-05-13 2009-03-31 Carl Zeiss Smt Ag Optical beam transformation system and illumination system comprising an optical beam transformation system
US9500956B2 (en) 2011-07-26 2016-11-22 Carl Zeiss Smt Gmbh Optical system of a microlithographic projection exposure apparatus, and microlithographic exposure

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6060735A (en) * 1996-09-06 2000-05-09 Kabushiki Kaisha Toshiba Thin film dielectric device
US7130129B2 (en) 1996-12-21 2006-10-31 Carl Zeiss Smt Ag Reticle-masking objective with aspherical lenses
US6583937B1 (en) 1998-11-30 2003-06-24 Carl-Zeiss Stiftung Illuminating system of a microlithographic projection exposure arrangement

Cited By (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0949541A3 (en) * 1998-04-08 2001-09-12 Asm Lithography B.V. Lithography apparatus
US6452662B2 (en) 1998-04-08 2002-09-17 Asml Netherlands B.V. Lithography apparatus
EP0949541A2 (en) * 1998-04-08 1999-10-13 Asm Lithography B.V. Lithography apparatus
EP1686405A1 (de) 1998-11-30 2006-08-02 Carl Zeiss SMT AG Mikrolithographisches Reduktionsobjektiv mit fünf Linsengruppen
US6855486B1 (en) 1999-09-29 2005-02-15 Asml Netherlands B.V. Lithographic method and apparatus
DE10109592A1 (de) * 2001-02-28 2002-09-26 Zeiss Carl Jena Gmbh Anordnung zum Erzeugen eines leuchtenden Feldes
DE10109592C2 (de) * 2001-02-28 2003-10-30 Zeiss Carl Jena Gmbh Anordnung zum Erzeugen eines leuchtenden Feldes
DE10144244A1 (de) * 2001-09-05 2003-03-20 Zeiss Carl Zoom-System, insbesondere für eine Beleuchtungseinrichtung
US6900946B2 (en) 2001-09-05 2005-05-31 Carl Zeiss Smt Ag Zoom system, in particular, a zoom system for an illumination device of a microlithographic projection system
US6864960B2 (en) 2001-09-05 2005-03-08 Carl Zeiss Smt Ag Zoom system for an illumination device
EP1319983A3 (en) * 2001-10-18 2003-08-27 ASML US, Inc. Advanced illumination system for use in microlithography
CN1303476C (zh) * 2001-10-18 2007-03-07 Asml美国公司 用于微平版印刷中的改进的照明系统
US6775069B2 (en) 2001-10-18 2004-08-10 Asml Holding N.V. Advanced illumination system for use in microlithography
US7158307B2 (en) 2001-10-18 2007-01-02 Asml Holding N.V. Efficiently illuminating a modulating device
US7006295B2 (en) 2001-10-18 2006-02-28 Asml Holding N.V. Illumination system and method for efficiently illuminating a pattern generator
US7079321B2 (en) 2001-10-18 2006-07-18 Asml Holding N.V. Illumination system and method allowing for varying of both field height and pupil
FR2831967A1 (fr) * 2001-11-05 2003-05-09 Samsung Electronics Co Ltd Appareil et procede d'exposition d'un objet a de la lumiere
NL1021785C2 (nl) * 2001-11-05 2004-10-27 Samsung Electronics Co Ltd Inrichting en werkwijze voor het belichten van een object.
US7187430B2 (en) 2002-06-11 2007-03-06 Asml Holding N.V. Advanced illumination system for use in microlithography
US7511886B2 (en) 2003-05-13 2009-03-31 Carl Zeiss Smt Ag Optical beam transformation system and illumination system comprising an optical beam transformation system
US7408622B2 (en) 2003-08-14 2008-08-05 Carl Zeiss Smt Ag Illumination system and polarizer for a microlithographic projection exposure apparatus
US7847920B2 (en) 2003-08-14 2010-12-07 Carl Zeiss Smt Ag Illumination system and polarizer for a microlithographic projection exposure apparatus
DE102004015148A1 (de) * 2004-03-27 2005-10-20 Fuhrberg Teichmann Optische Vorrichtung zur Formung der Intensitätsverteilung eines Lichtstrahlenbündels
DE102004015148B4 (de) * 2004-03-27 2007-04-19 Fuhrberg, Teichmann, Windolph LISA laser products oHG Faserlaser mit einer Optischen Vorrichtung zur Formung der Intensitätsverteilung eines Lichtstrahlenbündels
EP1941313A2 (en) * 2005-10-27 2008-07-09 Yale University An optical system for illumination of an evanescent field
EP1941313A4 (en) * 2005-10-27 2012-02-29 Univ Yale OPTICAL SYSTEM FOR ILLUMINATING A DEFECTIVE FIELD
US9500956B2 (en) 2011-07-26 2016-11-22 Carl Zeiss Smt Gmbh Optical system of a microlithographic projection exposure apparatus, and microlithographic exposure

Also Published As

Publication number Publication date
DE59507458D1 (de) 2000-01-27
KR960001786A (ko) 1996-01-25
TW298629B (zh) 1997-02-21
DE4441947A1 (de) 1996-05-30
KR100384551B1 (ko) 2003-10-11

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