DE4224023A1 - Gaslaseroszillator - Google Patents

Gaslaseroszillator

Info

Publication number
DE4224023A1
DE4224023A1 DE4224023A DE4224023A DE4224023A1 DE 4224023 A1 DE4224023 A1 DE 4224023A1 DE 4224023 A DE4224023 A DE 4224023A DE 4224023 A DE4224023 A DE 4224023A DE 4224023 A1 DE4224023 A1 DE 4224023A1
Authority
DE
Germany
Prior art keywords
container
laser oscillator
gas
permanent magnets
gas laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE4224023A
Other languages
German (de)
English (en)
Inventor
Takaaki Murata
Kiyohisa Terai
Tohoru Tamagawa
Hirokatsu Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Publication of DE4224023A1 publication Critical patent/DE4224023A1/de
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0975—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using inductive or capacitive excitation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/032—Constructional details of gas laser discharge tubes for confinement of the discharge, e.g. by special features of the discharge constricting tube
    • H01S3/0326—Constructional details of gas laser discharge tubes for confinement of the discharge, e.g. by special features of the discharge constricting tube by an electromagnetic field

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Lasers (AREA)
DE4224023A 1991-07-29 1992-07-21 Gaslaseroszillator Ceased DE4224023A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3187995A JPH081972B2 (ja) 1991-07-29 1991-07-29 ガスレーザ発振器

Publications (1)

Publication Number Publication Date
DE4224023A1 true DE4224023A1 (de) 1993-02-04

Family

ID=16215791

Family Applications (1)

Application Number Title Priority Date Filing Date
DE4224023A Ceased DE4224023A1 (de) 1991-07-29 1992-07-21 Gaslaseroszillator

Country Status (5)

Country Link
US (1) US5454003A (enExample)
JP (1) JPH081972B2 (enExample)
KR (1) KR960013517B1 (enExample)
DE (1) DE4224023A1 (enExample)
TW (1) TW226492B (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1976346A1 (en) * 2007-03-30 2008-10-01 Ecole Polytechnique Apparatus for generating a plasma
WO2022128056A1 (de) * 2020-12-14 2022-06-23 Trumpf Lasersystems For Semiconductor Manufacturing Gmbh Laserverstärker, laser und verfahren mit quer zum e-feld verlaufendem b-feld

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2725594B2 (ja) * 1994-04-28 1998-03-11 松下電器産業株式会社 気体レーザ装置
US5596593A (en) * 1996-02-09 1997-01-21 Luxar Corporation Orthogonal RFDC transverse excited gas laser
US7339973B2 (en) * 2001-09-13 2008-03-04 Cymer, Inc. Electrodes for fluorine gas discharge lasers
JP3730223B2 (ja) * 2003-01-31 2005-12-21 ファナック株式会社 ガスレーザ発振装置
DE10325512A1 (de) * 2003-06-04 2005-01-05 Thales Electron Devices Gmbh Gaslaseranordnung

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4849984A (en) * 1986-02-03 1989-07-18 Hill Alan E Large volume gaseous electric discharge system
DE3926965A1 (de) * 1989-08-16 1991-02-21 Siemens Ag Gaslaser

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4004249A (en) * 1976-01-22 1977-01-18 General Motors Corporation Optical waveguide laser pumped by guided electromagnetic wave
US4672618A (en) * 1983-03-07 1987-06-09 Beckman Instruments, Inc. Laser stabilization servo system
JPS59188987A (ja) * 1983-04-11 1984-10-26 Nec Corp イオンレ−ザ装置
JPS6037189A (ja) * 1983-08-09 1985-02-26 Mitsubishi Electric Corp 無声放電励起同軸型レ−ザ発振器
US4785458A (en) * 1984-02-13 1988-11-15 Mitsubishi Denki Kabushiki Kaisha Gas laser device
US4779279A (en) * 1984-03-05 1988-10-18 Beckman Instruments, Inc. Magnetic laser control
US4755999A (en) * 1985-03-25 1988-07-05 Macken John A Laser apparatus utilizing a magnetically enhanced electrical discharge
JPS62291189A (ja) * 1986-06-11 1987-12-17 Nec Corp Ｈｅ−Ｎｅガスレ−ザ装置
US4730334A (en) * 1987-01-05 1988-03-08 Collins George J Ultraviolet metal ion laser
JPS63229793A (ja) * 1987-03-19 1988-09-26 Fanuc Ltd レ−ザ発振器配管系の異常検出装置
IL82545A (en) * 1987-05-15 1991-11-21 Galram Technology Ind Ltd Method and apparatus for the cooling of gas lasers
EP0295539A3 (de) * 1987-06-12 1989-06-14 Siemens Aktiengesellschaft Gaslaser
JPH025585A (ja) * 1988-06-24 1990-01-10 Fanuc Ltd レーザ発振装置
US5048032A (en) * 1990-07-18 1991-09-10 Spectra-Physics Air cooled RF induction excited ion laser

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4849984A (en) * 1986-02-03 1989-07-18 Hill Alan E Large volume gaseous electric discharge system
DE3926965A1 (de) * 1989-08-16 1991-02-21 Siemens Ag Gaslaser

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
CAPJACK, C.E., ANTONIUK, D.M. et al.: Dynamics of magnetically stabilized laser discharge, in US-Z.: J. Appl. Phys., Vol. 52, No. 7, July 1981, S. 4517-4522 *
WILLIS, R.J., SEGUIN, H.J.J., et al. Gain Characteristics of an Axial Gas Discharge Interacting with a Transverse Rotating Magnetic Field, in US-Z.: IEEE Journal of Quantum Electronics, Vol. 24, No. 9, September 1988, S. 1833-1835 *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1976346A1 (en) * 2007-03-30 2008-10-01 Ecole Polytechnique Apparatus for generating a plasma
WO2008119687A1 (en) * 2007-03-30 2008-10-09 Ecole Polytechnique Apparatus for generating a plasma
WO2022128056A1 (de) * 2020-12-14 2022-06-23 Trumpf Lasersystems For Semiconductor Manufacturing Gmbh Laserverstärker, laser und verfahren mit quer zum e-feld verlaufendem b-feld

Also Published As

Publication number Publication date
US5454003A (en) 1995-09-26
KR930003516A (ko) 1993-02-24
KR960013517B1 (ko) 1996-10-05
TW226492B (enExample) 1994-07-11
JPH0537056A (ja) 1993-02-12
JPH081972B2 (ja) 1996-01-10

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
8131 Rejection