KR960013517B1 - 가스레이저 발진기 - Google Patents

가스레이저 발진기 Download PDF

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Publication number
KR960013517B1
KR960013517B1 KR1019920013578A KR920013578A KR960013517B1 KR 960013517 B1 KR960013517 B1 KR 960013517B1 KR 1019920013578 A KR1019920013578 A KR 1019920013578A KR 920013578 A KR920013578 A KR 920013578A KR 960013517 B1 KR960013517 B1 KR 960013517B1
Authority
KR
South Korea
Prior art keywords
receptacle
permanent magnets
pair
laser oscillator
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1019920013578A
Other languages
English (en)
Korean (ko)
Other versions
KR930003516A (ko
Inventor
다까아끼 무라따
기요히사 데라이
도오루 다마가와
히로가쓰 스즈끼
Original Assignee
가부시끼가이샤 도시바
아오이 죠이찌
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시끼가이샤 도시바, 아오이 죠이찌 filed Critical 가부시끼가이샤 도시바
Publication of KR930003516A publication Critical patent/KR930003516A/ko
Application granted granted Critical
Publication of KR960013517B1 publication Critical patent/KR960013517B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0975—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using inductive or capacitive excitation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/032—Constructional details of gas laser discharge tubes for confinement of the discharge, e.g. by special features of the discharge constricting tube
    • H01S3/0326—Constructional details of gas laser discharge tubes for confinement of the discharge, e.g. by special features of the discharge constricting tube by an electromagnetic field

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Lasers (AREA)
KR1019920013578A 1991-07-29 1992-07-29 가스레이저 발진기 Expired - Fee Related KR960013517B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP91-187995 1991-07-29
JP3187995A JPH081972B2 (ja) 1991-07-29 1991-07-29 ガスレーザ発振器

Publications (2)

Publication Number Publication Date
KR930003516A KR930003516A (ko) 1993-02-24
KR960013517B1 true KR960013517B1 (ko) 1996-10-05

Family

ID=16215791

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019920013578A Expired - Fee Related KR960013517B1 (ko) 1991-07-29 1992-07-29 가스레이저 발진기

Country Status (5)

Country Link
US (1) US5454003A (enExample)
JP (1) JPH081972B2 (enExample)
KR (1) KR960013517B1 (enExample)
DE (1) DE4224023A1 (enExample)
TW (1) TW226492B (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2725594B2 (ja) * 1994-04-28 1998-03-11 松下電器産業株式会社 気体レーザ装置
US5596593A (en) * 1996-02-09 1997-01-21 Luxar Corporation Orthogonal RFDC transverse excited gas laser
US7339973B2 (en) * 2001-09-13 2008-03-04 Cymer, Inc. Electrodes for fluorine gas discharge lasers
JP3730223B2 (ja) * 2003-01-31 2005-12-21 ファナック株式会社 ガスレーザ発振装置
DE10325512A1 (de) * 2003-06-04 2005-01-05 Thales Electron Devices Gmbh Gaslaseranordnung
EP1976346A1 (en) * 2007-03-30 2008-10-01 Ecole Polytechnique Apparatus for generating a plasma
WO2022128056A1 (de) * 2020-12-14 2022-06-23 Trumpf Lasersystems For Semiconductor Manufacturing Gmbh Laserverstärker, laser und verfahren mit quer zum e-feld verlaufendem b-feld

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4004249A (en) * 1976-01-22 1977-01-18 General Motors Corporation Optical waveguide laser pumped by guided electromagnetic wave
US4672618A (en) * 1983-03-07 1987-06-09 Beckman Instruments, Inc. Laser stabilization servo system
JPS59188987A (ja) * 1983-04-11 1984-10-26 Nec Corp イオンレ−ザ装置
JPS6037189A (ja) * 1983-08-09 1985-02-26 Mitsubishi Electric Corp 無声放電励起同軸型レ−ザ発振器
US4785458A (en) * 1984-02-13 1988-11-15 Mitsubishi Denki Kabushiki Kaisha Gas laser device
US4779279A (en) * 1984-03-05 1988-10-18 Beckman Instruments, Inc. Magnetic laser control
US4755999A (en) * 1985-03-25 1988-07-05 Macken John A Laser apparatus utilizing a magnetically enhanced electrical discharge
US4849984A (en) * 1986-02-03 1989-07-18 Hill Alan E Large volume gaseous electric discharge system
JPS62291189A (ja) * 1986-06-11 1987-12-17 Nec Corp Ｈｅ−Ｎｅガスレ−ザ装置
US4730334A (en) * 1987-01-05 1988-03-08 Collins George J Ultraviolet metal ion laser
JPS63229793A (ja) * 1987-03-19 1988-09-26 Fanuc Ltd レ−ザ発振器配管系の異常検出装置
IL82545A (en) * 1987-05-15 1991-11-21 Galram Technology Ind Ltd Method and apparatus for the cooling of gas lasers
EP0295539A3 (de) * 1987-06-12 1989-06-14 Siemens Aktiengesellschaft Gaslaser
JPH025585A (ja) * 1988-06-24 1990-01-10 Fanuc Ltd レーザ発振装置
DE3926965A1 (de) * 1989-08-16 1991-02-21 Siemens Ag Gaslaser
US5048032A (en) * 1990-07-18 1991-09-10 Spectra-Physics Air cooled RF induction excited ion laser

Also Published As

Publication number Publication date
US5454003A (en) 1995-09-26
KR930003516A (ko) 1993-02-24
TW226492B (enExample) 1994-07-11
DE4224023A1 (de) 1993-02-04
JPH0537056A (ja) 1993-02-12
JPH081972B2 (ja) 1996-01-10

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