DE3879471D1 - Verfahren zur herstellung eines photoresistmusters und apparat dafuer. - Google Patents
Verfahren zur herstellung eines photoresistmusters und apparat dafuer.Info
- Publication number
- DE3879471D1 DE3879471D1 DE8888106389T DE3879471T DE3879471D1 DE 3879471 D1 DE3879471 D1 DE 3879471D1 DE 8888106389 T DE8888106389 T DE 8888106389T DE 3879471 T DE3879471 T DE 3879471T DE 3879471 D1 DE3879471 D1 DE 3879471D1
- Authority
- DE
- Germany
- Prior art keywords
- mask
- producing
- photoresist pattern
- photoresist layer
- apparatus therefor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 229920002120 photoresistant polymer Polymers 0.000 title abstract 3
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 230000004048 modification Effects 0.000 abstract 1
- 238000012986 modification Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/26506—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors
- H01L21/26513—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors of electrically active species
- H01L21/2652—Through-implantation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/266—Bombardment with radiation with high-energy radiation producing ion implantation using masks
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Toxicology (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Health & Medical Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP88106389A EP0338110B1 (de) | 1988-04-21 | 1988-04-21 | Verfahren zur Herstellung eines Photoresistmusters und Apparat dafür |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3879471D1 true DE3879471D1 (de) | 1993-04-22 |
DE3879471T2 DE3879471T2 (de) | 1993-09-16 |
Family
ID=8198905
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8888106389T Expired - Fee Related DE3879471T2 (de) | 1988-04-21 | 1988-04-21 | Verfahren zur herstellung eines photoresistmusters und apparat dafuer. |
Country Status (4)
Country | Link |
---|---|
US (2) | US4935334A (de) |
EP (1) | EP0338110B1 (de) |
JP (2) | JP2654450B2 (de) |
DE (1) | DE3879471T2 (de) |
Families Citing this family (46)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3842354A1 (de) * | 1988-12-16 | 1990-06-21 | Kernforschungsz Karlsruhe | Verfahren zur lithographischen herstellung von galvanisch abformbaren mikrostrukturen mit dreieckigem oder trapezfoermigem querschnitt |
EP0469370A3 (en) * | 1990-07-31 | 1992-09-09 | Gold Star Co. Ltd | Etching process for sloped side walls |
JP2932650B2 (ja) * | 1990-09-17 | 1999-08-09 | 松下電器産業株式会社 | 微細構造物の製造方法 |
US5357311A (en) * | 1991-02-25 | 1994-10-18 | Nikon Corporation | Projection type light exposure apparatus and light exposure method |
US5281500A (en) * | 1991-09-04 | 1994-01-25 | Micron Technology, Inc. | Method of preventing null formation in phase shifted photomasks |
JPH05206025A (ja) * | 1992-01-27 | 1993-08-13 | Rohm Co Ltd | 微細加工方法 |
WO1994007179A1 (en) * | 1992-09-22 | 1994-03-31 | Knirck Jeffrey G | Method and apparatus for the photolithographic exposure of excess photoresist on a substrate |
AU5681194A (en) * | 1993-01-21 | 1994-08-15 | Sematech, Inc. | Phase shifting mask structure with multilayer optical coating for improved transmission |
US5418095A (en) * | 1993-01-21 | 1995-05-23 | Sematech, Inc. | Method of fabricating phase shifters with absorbing/attenuating sidewalls using an additive process |
US5411824A (en) * | 1993-01-21 | 1995-05-02 | Sematech, Inc. | Phase shifting mask structure with absorbing/attenuating sidewalls for improved imaging |
JPH06260383A (ja) * | 1993-03-03 | 1994-09-16 | Nikon Corp | 露光方法 |
DE69432092D1 (de) * | 1993-05-24 | 2003-03-13 | Holtronic Technologies Plc Lon | Vorrichtung und Verfahren zur Veränderung des Massstabs eines gedruckten Musters |
DE4333620A1 (de) * | 1993-10-15 | 1995-04-20 | Jenoptik Technologie Gmbh | Anordnung und Verfahren zur Erzeugung von Dosisprofilen für die Herstellung von Oberflächenprofilen |
US6358672B2 (en) * | 1998-02-05 | 2002-03-19 | Samsung Electronics Co., Ltd. | Method of forming semiconductor device pattern including cross-linking and flow baking a positive photoresist |
US6383719B1 (en) | 1998-05-19 | 2002-05-07 | International Business Machines Corporation | Process for enhanced lithographic imaging |
DE19833756A1 (de) * | 1998-07-16 | 2000-01-27 | Hertz Inst Heinrich | Anordnung zur Herstellung vertikaler Strukturen in Halbleitermaterialien |
US6094256A (en) * | 1998-09-29 | 2000-07-25 | Nikon Precision Inc. | Method for forming a critical dimension test structure and its use |
US6093507A (en) * | 1999-01-04 | 2000-07-25 | Taiwan Semiconductor Manufacturing Company | Simplified process for fabricating levinson and chromeless type phase shifting masks |
GB2349237A (en) | 1999-04-24 | 2000-10-25 | Sharp Kk | An optical element, method of manufacture thereof and a display device incorporating said element. |
US6747727B2 (en) | 1999-04-26 | 2004-06-08 | Hong-Da Liu | Method for the manufacture of a liquid crystal display |
US6284443B1 (en) | 1999-04-30 | 2001-09-04 | International Business Machines Corporation | Method and apparatus for image adjustment |
KR100346603B1 (ko) * | 1999-10-06 | 2002-07-26 | 아남반도체 주식회사 | 기울어진 패턴 프로파일을 얻을 수 있는 마스크 패턴 |
KR100346604B1 (ko) * | 1999-11-10 | 2002-07-26 | 아남반도체 주식회사 | 계단형 패턴 프로파일을 얻을 수 있는 마스크 패턴 |
JP2002329648A (ja) * | 2001-04-27 | 2002-11-15 | Mitsubishi Electric Corp | 半導体装置の製造方法 |
US6956659B2 (en) * | 2001-05-22 | 2005-10-18 | Nikon Precision Inc. | Measurement of critical dimensions of etched features |
JP4673513B2 (ja) * | 2001-08-01 | 2011-04-20 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
JP2003240997A (ja) * | 2002-02-21 | 2003-08-27 | Fujitsu Ltd | 空間反射型構造を有する光集積回路の製造方法 |
EP1353217A1 (de) * | 2002-03-29 | 2003-10-15 | JSR Corporation | Optisches Ausrichtungsverfahren und Flüssigkristallanzeigevorrichtung |
US6974653B2 (en) * | 2002-04-19 | 2005-12-13 | Nikon Precision Inc. | Methods for critical dimension and focus mapping using critical dimension test marks |
US20040173921A1 (en) * | 2003-03-07 | 2004-09-09 | Konica Minolta Holdings, Inc. | Electron beam depicting method, production method of mother die, mother die, production method of metallic mold, metallic mold, optical element and electron beam depicting apparatus |
ITMI20031045A1 (it) * | 2003-05-23 | 2004-11-24 | St Microelectronics Srl | Procedimento per la definizione di aperture di dimensioni sub-litografiche in substrati di silicio. |
JP4508594B2 (ja) * | 2003-10-01 | 2010-07-21 | 大日本印刷株式会社 | カラーフィルタの製造方法および半透過半反射型液晶表示装置用カラーフィルタ |
JP4184918B2 (ja) * | 2003-10-22 | 2008-11-19 | 株式会社東芝 | コンタクトホールの形成方法 |
US7256873B2 (en) * | 2004-01-28 | 2007-08-14 | Asml Netherlands B.V. | Enhanced lithographic resolution through double exposure |
US20080165257A1 (en) * | 2007-01-05 | 2008-07-10 | Micron Technology, Inc. | Configurable pixel array system and method |
US7812869B2 (en) * | 2007-05-11 | 2010-10-12 | Aptina Imaging Corporation | Configurable pixel array system and method |
US8409457B2 (en) * | 2008-08-29 | 2013-04-02 | Micron Technology, Inc. | Methods of forming a photoresist-comprising pattern on a substrate |
US7759186B2 (en) * | 2008-09-03 | 2010-07-20 | The United States Of America As Represented By The Secretary Of The Navy | Method for fabricating junction termination extension with formation of photosensitive dopant mask to control doping profile and lateral width for high-voltage electronic devices |
DE102009006885B4 (de) * | 2009-01-30 | 2011-09-22 | Advanced Micro Devices, Inc. | Verfahren zum Erzeugen einer abgestuften Wannenimplantation für asymmetrische Transistoren mit kleinen Gateelektrodenabständen und Halbleiterbauelemente |
SE537101C2 (sv) * | 2010-03-30 | 2015-01-07 | Fairchild Semiconductor | Halvledarkomponent och förfarande för utformning av en struktur i ett målsubstrat för tillverkning av en halvledarkomponent |
JP2012168230A (ja) * | 2011-02-10 | 2012-09-06 | Seiko Epson Corp | 構造体の製造方法 |
CN103688198A (zh) * | 2011-05-19 | 2014-03-26 | 株式会社日立高新技术 | 衍射光栅制造方法、分光光度仪、以及半导体装置的制造方法 |
FR2977071A1 (fr) * | 2011-06-27 | 2012-12-28 | St Microelectronics Crolles 2 | Procede de dopage controle d'un substrat semi-conducteur |
JP5780350B2 (ja) * | 2013-11-14 | 2015-09-16 | 大日本印刷株式会社 | 蒸着マスク、フレーム付き蒸着マスク、及び有機半導体素子の製造方法 |
DE102017115169A1 (de) | 2017-07-06 | 2019-01-10 | Temicon Gmbh | Erzeugung von belichteten Strukturen auf einem Werkstück |
US20210231889A1 (en) * | 2020-01-06 | 2021-07-29 | Attonics Systems Pte Ltd | Optical arrays, filter arrays, optical devices and method of fabricating same |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3422442A (en) * | 1966-01-12 | 1969-01-14 | Us Army | Micro-electronic form masking system |
US4224361A (en) * | 1978-09-05 | 1980-09-23 | International Business Machines Corporation | High temperature lift-off technique |
GB2035610B (en) * | 1978-10-20 | 1983-03-23 | Hitachi Ltd | Wafer projection aligner |
US4310743A (en) * | 1979-09-24 | 1982-01-12 | Hughes Aircraft Company | Ion beam lithography process and apparatus using step-and-repeat exposure |
US4308337A (en) * | 1980-03-10 | 1981-12-29 | Rca Corporation | Uniform light exposure of positive photoresist for replicating spiral groove in plastic substrate |
JPS5721819A (en) * | 1980-07-15 | 1982-02-04 | Fujitsu Ltd | Forming method for pattern |
JPS5914888B2 (ja) * | 1981-04-09 | 1984-04-06 | 財団法人半導体研究振興会 | パタ−ン形成方法 |
US4545673A (en) * | 1983-07-08 | 1985-10-08 | Bergsma Calvin D | Photographic modifier method and apparatus for graphics and the like |
US4716443A (en) * | 1984-11-29 | 1987-12-29 | Byers Thomas L | Photographic image precision reproportioning system |
US4748477A (en) * | 1985-04-30 | 1988-05-31 | Canon Kabushiki Kaisha | Exposure apparatus |
FR2590376A1 (fr) * | 1985-11-21 | 1987-05-22 | Dumant Jean Marc | Procede de masquage et masque utilise |
EP0227851B1 (de) * | 1985-12-21 | 1991-02-27 | Ibm Deutschland Gmbh | Verfahren zum Herstellen eines Photolackmusters |
US4708466A (en) * | 1986-02-07 | 1987-11-24 | Canon Kabushiki Kaisha | Exposure apparatus |
JPS6349909A (ja) * | 1986-08-20 | 1988-03-02 | Canon Inc | 位置決め制御装置 |
-
1988
- 1988-04-21 EP EP88106389A patent/EP0338110B1/de not_active Expired - Lifetime
- 1988-04-21 DE DE8888106389T patent/DE3879471T2/de not_active Expired - Fee Related
- 1988-12-30 US US07/292,086 patent/US4935334A/en not_active Expired - Fee Related
-
1989
- 1989-03-20 JP JP1066424A patent/JP2654450B2/ja not_active Expired - Lifetime
-
1990
- 1990-02-08 US US07/477,371 patent/US5111240A/en not_active Expired - Fee Related
-
1994
- 1994-01-19 JP JP6004021A patent/JP2502939B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP2502939B2 (ja) | 1996-05-29 |
EP0338110A1 (de) | 1989-10-25 |
JPH0212806A (ja) | 1990-01-17 |
EP0338110B1 (de) | 1993-03-17 |
JP2654450B2 (ja) | 1997-09-17 |
US4935334A (en) | 1990-06-19 |
US5111240A (en) | 1992-05-05 |
DE3879471T2 (de) | 1993-09-16 |
JPH0758004A (ja) | 1995-03-03 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |