JPS56165324A - Formation of pattern - Google Patents
Formation of patternInfo
- Publication number
- JPS56165324A JPS56165324A JP5410881A JP5410881A JPS56165324A JP S56165324 A JPS56165324 A JP S56165324A JP 5410881 A JP5410881 A JP 5410881A JP 5410881 A JP5410881 A JP 5410881A JP S56165324 A JPS56165324 A JP S56165324A
- Authority
- JP
- Japan
- Prior art keywords
- recess
- pattern
- proper
- photoresist layer
- less
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000015572 biosynthetic process Effects 0.000 title 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 4
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To form patterns different from that of a photomask is designed by a method wherein a workpiece surface provided with a recess is covered with a photoresist layer, thick in the recess and thin on the other part, and is exposed to light, with an exposure less than proper on the recess and more than proper on the other part, with a traveling pattern creating different results from those expected for the mask. CONSTITUTION:The surface 2 of a workpiece 1 made of Si, etc., is provided with a recess and the photoresist layer 3 is thick in the recess and thin over the other part. Because the exposure effect of the light 7 depends upon the thickness of the photoresist layer, the effect on the recess is less than proper and more than proper on the other part. Therefore, the region 13 exposed less remains constituting a selected pattern when the developing process is completed. Thus, a difference in photoresist layer thickness results in a pattern different from other pattern such as photomask.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56054108A JPS5914892B2 (en) | 1981-04-09 | 1981-04-09 | Pattern formation method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56054108A JPS5914892B2 (en) | 1981-04-09 | 1981-04-09 | Pattern formation method |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12426676A Division JPS5348676A (en) | 1976-10-15 | 1976-10-15 | Method of forming pattern |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56165324A true JPS56165324A (en) | 1981-12-18 |
JPS5914892B2 JPS5914892B2 (en) | 1984-04-06 |
Family
ID=12961401
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56054108A Expired JPS5914892B2 (en) | 1981-04-09 | 1981-04-09 | Pattern formation method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5914892B2 (en) |
-
1981
- 1981-04-09 JP JP56054108A patent/JPS5914892B2/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS5914892B2 (en) | 1984-04-06 |
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