DE3838165C2 - - Google Patents

Info

Publication number
DE3838165C2
DE3838165C2 DE3838165A DE3838165A DE3838165C2 DE 3838165 C2 DE3838165 C2 DE 3838165C2 DE 3838165 A DE3838165 A DE 3838165A DE 3838165 A DE3838165 A DE 3838165A DE 3838165 C2 DE3838165 C2 DE 3838165C2
Authority
DE
Germany
Prior art keywords
charge
recording material
electrophotographic recording
layer
material according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3838165A
Other languages
German (de)
English (en)
Other versions
DE3838165A1 (de
Inventor
Yuzuru Fukuda
Masayuku Nishikawa
Shigeru Yagi
Ken-Ichi Minami-Ashigara Kanagawa Jp Karakida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Business Innovation Corp
Original Assignee
Fuji Xerox Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP62282236A external-priority patent/JP2595575B2/ja
Priority claimed from JP63049608A external-priority patent/JP2720448B2/ja
Application filed by Fuji Xerox Co Ltd filed Critical Fuji Xerox Co Ltd
Publication of DE3838165A1 publication Critical patent/DE3838165A1/de
Application granted granted Critical
Publication of DE3838165C2 publication Critical patent/DE3838165C2/de
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G7/00—Selection of materials for use in image-receiving members, i.e. for reversal by physical contact; Manufacture thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00—Recording-members for original recording by exposure, e.g. to light, to heat or to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02—Charge-receiving layers
    • G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/043—Photoconductive layers characterised by having two or more layers or characterised by their composite structure
    • G03G5/0433—Photoconductive layers characterised by having two or more layers or characterised by their composite structure all layers being inorganic
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/081—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24—Deposition of silicon only

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Photoreceptors In Electrophotography (AREA)
DE3838165A 1987-11-10 1988-11-10 Verfahren zum herstellen eines elektrophotographischen photorezeptors Granted DE3838165A1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP62282236A JP2595575B2 (ja) 1987-11-10 1987-11-10 電子写真感光体の製造方法
JP63049608A JP2720448B2 (ja) 1988-03-04 1988-03-04 電子写真感光体の製造方法

Publications (2)

Publication Number Publication Date
DE3838165A1 DE3838165A1 (de) 1989-05-24
DE3838165C2 true DE3838165C2 (enExample) 1993-01-07

Family

ID=26390024

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3838165A Granted DE3838165A1 (de) 1987-11-10 1988-11-10 Verfahren zum herstellen eines elektrophotographischen photorezeptors

Country Status (4)

Country Link
US (1) US5082760A (enExample)
KR (1) KR0156562B1 (enExample)
DE (1) DE3838165A1 (enExample)
GB (1) GB2212289B (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0810332B2 (ja) * 1988-02-10 1996-01-31 富士ゼロックス株式会社 電子写真感光体の製造方法
US11486042B2 (en) * 2018-01-18 2022-11-01 Viavi Solutions Inc. Silicon coating on hard shields

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2746967C2 (de) * 1977-10-19 1981-09-24 Siemens AG, 1000 Berlin und 8000 München Elektrofotographische Aufzeichnungstrommel
AU530905B2 (en) * 1977-12-22 1983-08-04 Canon Kabushiki Kaisha Electrophotographic photosensitive member
JPS6035059B2 (ja) * 1977-12-22 1985-08-12 キヤノン株式会社 電子写真感光体およびその製造方法
US4361638A (en) * 1979-10-30 1982-11-30 Fuji Photo Film Co., Ltd. Electrophotographic element with alpha -Si and C material doped with H and F and process for producing the same
US4369242A (en) * 1980-09-25 1983-01-18 Minnesota Mining And Manufacturing Company Non-porous and porous Al2 O3 barrier zones in layered electrophotographic device
JPS596540A (ja) * 1982-07-05 1984-01-13 Toshiba Corp 半導体装置の製造方法
JPS5990821A (ja) * 1982-11-16 1984-05-25 Canon Inc エレクトロクロミツク素子
JPS6166216A (ja) * 1984-09-07 1986-04-05 Hitachi Ltd 磁気ヘツド
US4634648A (en) * 1985-07-05 1987-01-06 Xerox Corporation Electrophotographic imaging members with amorphous carbon
US4737429A (en) * 1986-06-26 1988-04-12 Xerox Corporation Layered amorphous silicon imaging members
JPH0782240B2 (ja) * 1986-09-04 1995-09-06 富士ゼロックス株式会社 電子写真感光体
JPH0810332B2 (ja) * 1988-02-10 1996-01-31 富士ゼロックス株式会社 電子写真感光体の製造方法

Also Published As

Publication number Publication date
KR890008619A (ko) 1989-07-12
GB2212289B (en) 1991-10-09
DE3838165A1 (de) 1989-05-24
US5082760A (en) 1992-01-21
GB8826096D0 (en) 1988-12-14
GB2212289A (en) 1989-07-19
KR0156562B1 (ko) 1998-11-16

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Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
D2 Grant after examination
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee