DE3837386C2 - - Google Patents
Info
- Publication number
- DE3837386C2 DE3837386C2 DE3837386A DE3837386A DE3837386C2 DE 3837386 C2 DE3837386 C2 DE 3837386C2 DE 3837386 A DE3837386 A DE 3837386A DE 3837386 A DE3837386 A DE 3837386A DE 3837386 C2 DE3837386 C2 DE 3837386C2
- Authority
- DE
- Germany
- Prior art keywords
- bismuth
- image
- water
- barium
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 claims description 28
- 239000000463 material Substances 0.000 claims description 24
- 229910002651 NO3 Inorganic materials 0.000 claims description 18
- -1 nitrate ions Chemical class 0.000 claims description 18
- 239000000126 substance Substances 0.000 claims description 17
- 238000004140 cleaning Methods 0.000 claims description 13
- 229910000416 bismuth oxide Inorganic materials 0.000 claims description 12
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 claims description 12
- 238000003384 imaging method Methods 0.000 claims description 12
- 229910052751 metal Inorganic materials 0.000 claims description 12
- 239000002184 metal Substances 0.000 claims description 12
- 150000003476 thallium compounds Chemical class 0.000 claims description 11
- 150000001875 compounds Chemical class 0.000 claims description 9
- 150000001622 bismuth compounds Chemical class 0.000 claims description 7
- QYIGOGBGVKONDY-UHFFFAOYSA-N 1-(2-bromo-5-chlorophenyl)-3-methylpyrazole Chemical compound N1=C(C)C=CN1C1=CC(Cl)=CC=C1Br QYIGOGBGVKONDY-UHFFFAOYSA-N 0.000 claims description 6
- 229940036348 bismuth carbonate Drugs 0.000 claims description 5
- GMZOPRQQINFLPQ-UHFFFAOYSA-H dibismuth;tricarbonate Chemical compound [Bi+3].[Bi+3].[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O GMZOPRQQINFLPQ-UHFFFAOYSA-H 0.000 claims description 5
- SFOQXWSZZPWNCL-UHFFFAOYSA-K bismuth;phosphate Chemical compound [Bi+3].[O-]P([O-])([O-])=O SFOQXWSZZPWNCL-UHFFFAOYSA-K 0.000 claims description 4
- BRCWHGIUHLWZBK-UHFFFAOYSA-K bismuth;trifluoride Chemical compound F[Bi](F)F BRCWHGIUHLWZBK-UHFFFAOYSA-K 0.000 claims description 4
- RXPAJWPEYBDXOG-UHFFFAOYSA-N hydron;methyl 4-methoxypyridine-2-carboxylate;chloride Chemical compound Cl.COC(=O)C1=CC(OC)=CC=N1 RXPAJWPEYBDXOG-UHFFFAOYSA-N 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- BWOROQSFKKODDR-UHFFFAOYSA-N oxobismuth;hydrochloride Chemical compound Cl.[Bi]=O BWOROQSFKKODDR-UHFFFAOYSA-N 0.000 claims description 3
- KKMOSYLWYLMHAL-UHFFFAOYSA-N 2-bromo-6-nitroaniline Chemical compound NC1=C(Br)C=CC=C1[N+]([O-])=O KKMOSYLWYLMHAL-UHFFFAOYSA-N 0.000 claims description 2
- 150000001553 barium compounds Chemical class 0.000 claims description 2
- JHXKRIRFYBPWGE-UHFFFAOYSA-K bismuth chloride Chemical compound Cl[Bi](Cl)Cl JHXKRIRFYBPWGE-UHFFFAOYSA-K 0.000 claims description 2
- JAONZGLTYYUPCT-UHFFFAOYSA-K bismuth subgallate Chemical compound OC(=O)C1=CC(O)=C2O[Bi](O)OC2=C1 JAONZGLTYYUPCT-UHFFFAOYSA-K 0.000 claims description 2
- 229960000199 bismuth subgallate Drugs 0.000 claims description 2
- 229910000380 bismuth sulfate Inorganic materials 0.000 claims description 2
- TXKAQZRUJUNDHI-UHFFFAOYSA-K bismuth tribromide Chemical compound Br[Bi](Br)Br TXKAQZRUJUNDHI-UHFFFAOYSA-K 0.000 claims description 2
- HGSSJXRWSCRNPH-UHFFFAOYSA-K bismuth;butanoate Chemical compound [Bi+3].CCCC([O-])=O.CCCC([O-])=O.CCCC([O-])=O HGSSJXRWSCRNPH-UHFFFAOYSA-K 0.000 claims description 2
- PIJVDJTXPKJZHD-UHFFFAOYSA-M bismuth;oxygen(2-);bromide Chemical compound [O-2].[Br-].[Bi+3] PIJVDJTXPKJZHD-UHFFFAOYSA-M 0.000 claims description 2
- FGQDLCIITXBKAR-UHFFFAOYSA-K bismuth;triiodate Chemical compound [Bi+3].[O-]I(=O)=O.[O-]I(=O)=O.[O-]I(=O)=O FGQDLCIITXBKAR-UHFFFAOYSA-K 0.000 claims description 2
- BEQZMQXCOWIHRY-UHFFFAOYSA-H dibismuth;trisulfate Chemical compound [Bi+3].[Bi+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O BEQZMQXCOWIHRY-UHFFFAOYSA-H 0.000 claims description 2
- QGWDKKHSDXWPET-UHFFFAOYSA-E pentabismuth;oxygen(2-);nonahydroxide;tetranitrate Chemical compound [OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[O-2].[Bi+3].[Bi+3].[Bi+3].[Bi+3].[Bi+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O QGWDKKHSDXWPET-UHFFFAOYSA-E 0.000 claims description 2
- 229910052788 barium Inorganic materials 0.000 claims 9
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 claims 9
- 229910052797 bismuth Inorganic materials 0.000 claims 9
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims 9
- 229940049676 bismuth hydroxide Drugs 0.000 claims 1
- TZSXPYWRDWEXHG-UHFFFAOYSA-K bismuth;trihydroxide Chemical compound [OH-].[OH-].[OH-].[Bi+3] TZSXPYWRDWEXHG-UHFFFAOYSA-K 0.000 claims 1
- 150000003839 salts Chemical class 0.000 description 11
- 229910021417 amorphous silicon Inorganic materials 0.000 description 8
- 229910021424 microcrystalline silicon Inorganic materials 0.000 description 6
- 108091008695 photoreceptors Proteins 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 4
- 235000014113 dietary fatty acids Nutrition 0.000 description 4
- 229930195729 fatty acid Natural products 0.000 description 4
- 239000000194 fatty acid Substances 0.000 description 4
- 239000011669 selenium Substances 0.000 description 4
- 150000004665 fatty acids Chemical class 0.000 description 3
- 230000002209 hydrophobic effect Effects 0.000 description 3
- 229910052711 selenium Inorganic materials 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 231100000252 nontoxic Toxicity 0.000 description 2
- 230000003000 nontoxic effect Effects 0.000 description 2
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- ITHZDDVSAWDQPZ-UHFFFAOYSA-L barium acetate Chemical compound [Ba+2].CC([O-])=O.CC([O-])=O ITHZDDVSAWDQPZ-UHFFFAOYSA-L 0.000 description 1
- AYJRCSIUFZENHW-UHFFFAOYSA-L barium carbonate Chemical compound [Ba+2].[O-]C([O-])=O AYJRCSIUFZENHW-UHFFFAOYSA-L 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910001451 bismuth ion Inorganic materials 0.000 description 1
- IAQAJTTVJUUIQJ-UHFFFAOYSA-N bismuth;trihydrate Chemical compound O.O.O.[Bi] IAQAJTTVJUUIQJ-UHFFFAOYSA-N 0.000 description 1
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006735 deficit Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000010494 dissociation reaction Methods 0.000 description 1
- 230000005593 dissociations Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 229910001960 metal nitrate Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 150000002927 oxygen compounds Chemical class 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000012429 reaction media Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- HQOJMTATBXYHNR-UHFFFAOYSA-M thallium(I) acetate Chemical compound [Tl+].CC([O-])=O HQOJMTATBXYHNR-UHFFFAOYSA-M 0.000 description 1
- DASUJKKKKGHFBF-UHFFFAOYSA-L thallium(i) carbonate Chemical compound [Tl+].[Tl+].[O-]C([O-])=O DASUJKKKKGHFBF-UHFFFAOYSA-L 0.000 description 1
- 239000003440 toxic substance Substances 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G21/00—Arrangements not provided for by groups G03G13/00 - G03G19/00, e.g. cleaning, elimination of residual charge
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G21/00—Arrangements not provided for by groups G03G13/00 - G03G19/00, e.g. cleaning, elimination of residual charge
- G03G21/0005—Arrangements not provided for by groups G03G13/00 - G03G19/00, e.g. cleaning, elimination of residual charge for removing solid developer or debris from the electrographic recording medium
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G2221/00—Processes not provided for by group G03G2215/00, e.g. cleaning or residual charge elimination
- G03G2221/0026—Cleaning of foreign matter, e.g. paper powder, from imaging member
- G03G2221/0031—Type of foreign matter
- G03G2221/0042—Paper powder and other dry foreign matter
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G2221/00—Processes not provided for by group G03G2215/00, e.g. cleaning or residual charge elimination
- G03G2221/0026—Cleaning of foreign matter, e.g. paper powder, from imaging member
- G03G2221/0047—Type of cleaning device
- G03G2221/0052—Common container for holding cleaned foreign matter and residual toner
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G2221/00—Processes not provided for by group G03G2215/00, e.g. cleaning or residual charge elimination
- G03G2221/0026—Cleaning of foreign matter, e.g. paper powder, from imaging member
- G03G2221/0068—Cleaning mechanism
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Cleaning In Electrography (AREA)
- Control Or Security For Electrophotography (AREA)
- Developing Agents For Electrophotography (AREA)
- Discharging, Photosensitive Material Shape In Electrophotography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62279066A JP2567876B2 (ja) | 1987-11-06 | 1987-11-06 | 画像形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3837386A1 DE3837386A1 (de) | 1989-05-24 |
| DE3837386C2 true DE3837386C2 (enrdf_load_stackoverflow) | 1990-04-26 |
Family
ID=17605935
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE3837386A Granted DE3837386A1 (de) | 1987-11-06 | 1988-11-03 | Verfahren und vorrichtung zur bilderzeugung |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US5035973A (enrdf_load_stackoverflow) |
| JP (1) | JP2567876B2 (enrdf_load_stackoverflow) |
| DE (1) | DE3837386A1 (enrdf_load_stackoverflow) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2941049B2 (ja) * | 1990-11-30 | 1999-08-25 | コニカ株式会社 | 画像形成方法 |
| JP2000242089A (ja) * | 1999-02-22 | 2000-09-08 | Kyocera Mita Corp | 画像形成方法 |
| JP4063498B2 (ja) * | 2000-03-02 | 2008-03-19 | 株式会社リコー | 画像形成装置 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3501294A (en) * | 1966-11-14 | 1970-03-17 | Xerox Corp | Method of treating the surface of a xerographic plate with a metal salt of a fatty acid to improve image transfer |
| US3656948A (en) * | 1969-11-20 | 1972-04-18 | Xerox Corp | Selective removal of liquid developer in a cyclical electrophotographic process |
| US4053572A (en) * | 1976-05-17 | 1977-10-11 | The Harshaw Chemical Company | Process for preparing essentially pure barium fluoride crystals |
| JPS58134651A (ja) * | 1982-02-05 | 1983-08-10 | Canon Inc | 現像剤 |
| JPH0652461B2 (ja) * | 1982-05-24 | 1994-07-06 | キヤノン株式会社 | 電子写真装置、電子写真装置の保守方法および該保守方法に用いるクリーニング部材 |
| JPS60173570A (ja) * | 1984-02-20 | 1985-09-06 | Canon Inc | 画像形成装置 |
| JPS61231558A (ja) * | 1985-04-05 | 1986-10-15 | Mitsubishi Chem Ind Ltd | 電子写真感光体の製造及び再生方法 |
| JPS61231564A (ja) * | 1985-04-05 | 1986-10-15 | Mitsubishi Chem Ind Ltd | 電子写真複写方式 |
| JPS6261074A (ja) * | 1985-09-12 | 1987-03-17 | Canon Inc | 一成分磁性現像剤 |
| JPS63271478A (ja) * | 1987-04-30 | 1988-11-09 | Konica Corp | 負電荷潜像現像剤 |
-
1987
- 1987-11-06 JP JP62279066A patent/JP2567876B2/ja not_active Expired - Fee Related
-
1988
- 1988-11-01 US US07/265,530 patent/US5035973A/en not_active Expired - Fee Related
- 1988-11-03 DE DE3837386A patent/DE3837386A1/de active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01121884A (ja) | 1989-05-15 |
| DE3837386A1 (de) | 1989-05-24 |
| JP2567876B2 (ja) | 1996-12-25 |
| US5035973A (en) | 1991-07-30 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OP8 | Request for examination as to paragraph 44 patent law | ||
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition | ||
| 8339 | Ceased/non-payment of the annual fee |