DE3778993D1 - Verfahren zur herstellung von silizium-tetrafluorid. - Google Patents

Verfahren zur herstellung von silizium-tetrafluorid.

Info

Publication number
DE3778993D1
DE3778993D1 DE8787201303T DE3778993T DE3778993D1 DE 3778993 D1 DE3778993 D1 DE 3778993D1 DE 8787201303 T DE8787201303 T DE 8787201303T DE 3778993 T DE3778993 T DE 3778993T DE 3778993 D1 DE3778993 D1 DE 3778993D1
Authority
DE
Germany
Prior art keywords
silicon tetrafluoride
gaseous stream
carried out
sulphuric acid
zone
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8787201303T
Other languages
English (en)
Inventor
Guido Anania
Angelo Bianchi
Vito Cultrera
Francesco Russo
Giovanni Spagna
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Enichem Agricoltura SpA
Original Assignee
Enichem Agricoltura SpA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Enichem Agricoltura SpA filed Critical Enichem Agricoltura SpA
Application granted granted Critical
Publication of DE3778993D1 publication Critical patent/DE3778993D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/10705—Tetrafluoride
DE8787201303T 1986-07-23 1987-07-08 Verfahren zur herstellung von silizium-tetrafluorid. Expired - Fee Related DE3778993D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT21226/86A IT1196983B (it) 1986-07-23 1986-07-23 Procedimento per la produzione di tetrafluoruro di silicio

Publications (1)

Publication Number Publication Date
DE3778993D1 true DE3778993D1 (de) 1992-06-17

Family

ID=11178673

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8787201303T Expired - Fee Related DE3778993D1 (de) 1986-07-23 1987-07-08 Verfahren zur herstellung von silizium-tetrafluorid.

Country Status (8)

Country Link
US (1) US4900530A (de)
EP (1) EP0254349B1 (de)
JP (1) JPS6340714A (de)
AT (1) ATE76040T1 (de)
DE (1) DE3778993D1 (de)
ES (1) ES2032811T3 (de)
GR (1) GR3004735T3 (de)
IT (1) IT1196983B (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NO931606L (no) * 1992-05-26 1993-11-29 Saint Gobain Vitrage Vindusplate med en funksjonell film
US5232602A (en) * 1992-07-01 1993-08-03 Hemlock Semiconductor Corporation Phosphorous removal from tetrachlorosilane
US5242670A (en) * 1992-07-02 1993-09-07 Gehringer Ronald C Method for hydrofluoric acid digestion of silica/alumina matrix material for the production of silicon tetrafluoride, aluminum fluoride and other residual metal fluorides and oxides
US5888468A (en) * 1998-06-05 1999-03-30 Starmet Corp. Method for producing silicon tetrafluoride from uranium tetrafluoride
US6033642A (en) * 1999-03-29 2000-03-07 Starmet Corporation Method for producing silicon tetrafluoride from uranium oxyfluoride
US7666379B2 (en) * 2001-07-16 2010-02-23 Voltaix, Inc. Process and apparatus for removing Bronsted acid impurities in binary halides
TW200512159A (en) * 2003-09-25 2005-04-01 Showa Denko Kk Method for producing tetrafluorosilane
JP4588396B2 (ja) * 2003-09-25 2010-12-01 昭和電工株式会社 テトラフルオロシランの製造方法
JP4576312B2 (ja) * 2005-10-03 2010-11-04 東北電力株式会社 四フッ化ケイ素の製造方法、及びそれに用いる製造装置
EP1951620A2 (de) 2005-11-25 2008-08-06 Vesta Research, Ltd. Verfahren zur herstellung einer silicium-nitrid-verbindung
CN102862990A (zh) * 2007-09-21 2013-01-09 Memc电子材料有限公司 用于纯化四氟化硅的方法
US8528026B2 (en) * 2008-12-05 2013-09-03 At&T Intellectual Property I, L.P. System and method for processing audio signals received by a communication device
US8124039B2 (en) 2009-01-26 2012-02-28 Vithal Revankar Process of silicon tetrafluoride gas synthesis
CN112158849B (zh) * 2020-09-27 2023-06-30 湖北祥云(集团)化工股份有限公司 一种磷矿伴生氟制备四氟化硅的方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2456509A (en) * 1944-10-06 1948-12-14 Allied Chem & Dye Corp Manufacture of hydrogen fluoride
GB745800A (en) * 1953-08-06 1956-02-29 Kali Chemie Ag Process for the production of pure silicon tetrafluoride
DE1022569B (de) * 1954-06-09 1958-01-16 Grace W R & Co Verfahren zur Herstellung von Siliciumtetrafluorid
GB1015604A (en) * 1961-10-11 1966-01-05 Texas Instruments Ltd A treatment process for silicon compounds
US3758674A (en) * 1971-09-16 1973-09-11 Wellman Power Gas Inc Process for producing anhydrous hf from fluosilicic acid
US3969485A (en) * 1971-10-28 1976-07-13 Flemmert Goesta Lennart Process for converting silicon-and-fluorine-containing waste gases into silicon dioxide and hydrogen fluoride
US4138509A (en) * 1977-12-23 1979-02-06 Motorola, Inc. Silicon purification process
JPS604126B2 (ja) * 1981-03-18 1985-02-01 セントラル硝子株式会社 四弗化珪素の精製法
JPS604127B2 (ja) * 1981-08-06 1985-02-01 セントラル硝子株式会社 四弗化珪素ガスの精製法
US4470959A (en) * 1983-06-20 1984-09-11 Allied Corporation Continuous production of silicon tetrafluoride gas in a vertical column
JPS6090810A (ja) * 1983-10-20 1985-05-22 Mitsui Toatsu Chem Inc フルオロシランガスの製造方法
US4557921A (en) * 1984-06-27 1985-12-10 Ethyl Corporation Purification of halide
JPS6197129A (ja) * 1984-10-18 1986-05-15 Mitsui Toatsu Chem Inc フルオロシラン類の精製法
JPS61118117A (ja) * 1984-11-14 1986-06-05 Taiyo Sanso Kk 有毒ガス成分を含むガスの処理方法

Also Published As

Publication number Publication date
JPS6340714A (ja) 1988-02-22
ES2032811T3 (es) 1993-03-01
EP0254349A3 (en) 1988-08-31
IT8621226A0 (it) 1986-07-23
EP0254349A2 (de) 1988-01-27
ATE76040T1 (de) 1992-05-15
GR3004735T3 (de) 1993-04-28
US4900530A (en) 1990-02-13
EP0254349B1 (de) 1992-05-13
IT1196983B (it) 1988-11-25
IT8621226A1 (it) 1988-01-23

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee