DE3741385C2 - Durch Belichtung abbildbare Lötmaskenbeschichtung - Google Patents

Durch Belichtung abbildbare Lötmaskenbeschichtung

Info

Publication number
DE3741385C2
DE3741385C2 DE3741385A DE3741385A DE3741385C2 DE 3741385 C2 DE3741385 C2 DE 3741385C2 DE 3741385 A DE3741385 A DE 3741385A DE 3741385 A DE3741385 A DE 3741385A DE 3741385 C2 DE3741385 C2 DE 3741385C2
Authority
DE
Germany
Prior art keywords
diisocyanate
acid
reaction mixture
composition according
approx
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3741385A
Other languages
German (de)
English (en)
Other versions
DE3741385A1 (de
Inventor
Songvit Setthachayanon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Armstrong World Industries Inc
Original Assignee
Armstrong World Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Armstrong World Industries Inc filed Critical Armstrong World Industries Inc
Publication of DE3741385A1 publication Critical patent/DE3741385A1/de
Application granted granted Critical
Publication of DE3741385C2 publication Critical patent/DE3741385C2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/06—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/30—Low-molecular-weight compounds
    • C08G18/34—Carboxylic acids; Esters thereof with monohydroxyl compounds
    • C08G18/348—Hydroxycarboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
    • C08G18/6725—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen containing ester groups other than acrylate or alkylacrylate ester groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Paints Or Removers (AREA)
DE3741385A 1986-12-08 1987-12-07 Durch Belichtung abbildbare Lötmaskenbeschichtung Expired - Fee Related DE3741385C2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US93960486A 1986-12-08 1986-12-08
US4546487A 1987-05-04 1987-05-04

Publications (2)

Publication Number Publication Date
DE3741385A1 DE3741385A1 (de) 1988-06-09
DE3741385C2 true DE3741385C2 (de) 1996-06-05

Family

ID=26722797

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3741385A Expired - Fee Related DE3741385C2 (de) 1986-12-08 1987-12-07 Durch Belichtung abbildbare Lötmaskenbeschichtung

Country Status (13)

Country Link
KR (1) KR910001523B1 (zh)
CN (1) CN1031227C (zh)
BR (1) BR8706609A (zh)
CA (1) CA1332093C (zh)
CH (1) CH680622A5 (zh)
DE (1) DE3741385C2 (zh)
FR (1) FR2607820B1 (zh)
GB (1) GB2199335B (zh)
HK (1) HK60692A (zh)
IT (1) IT1233418B (zh)
MX (1) MX168832B (zh)
NL (1) NL190785C (zh)
SG (1) SG61192G (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR910021456A (ko) * 1990-02-20 1991-12-20 우메모토 요시마사 수용성 광경화성 폴리우레탄 폴리(메트)아크릴레이트, 그것을 함유한 접착제 및 라미네이트된 물품의 제조방법
CA2040097A1 (en) * 1990-04-12 1991-10-13 Wako Yokoyama Urethane polymers for printing plate compositions
US5341799A (en) * 1991-12-23 1994-08-30 Hercules Incorporated Urethane polymers for printing plate compositions
US6747088B1 (en) 1999-09-30 2004-06-08 Basf Aktiengesellschaft Aqueous polyurethane dispersions which can be hardened with mit UV-radiation and thermally, and use thereof
TW201220974A (en) * 2010-05-21 2012-05-16 Nano Terra Inc Stencils for high-throughput micron-scale etching of substrates and processes of making and using the same
CN104193944A (zh) * 2014-08-21 2014-12-10 苏州瑞红电子化学品有限公司 一种酸值可控光敏碱溶性聚氨酯丙烯酸酯树脂及其光刻胶组合物

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4153778A (en) * 1978-03-30 1979-05-08 Union Carbide Corporation Acrylyl capped urethane oligomers
NL8401785A (nl) * 1984-06-04 1986-01-02 Polyvinyl Chemie Holland Werkwijze voor de bereiding van een waterige dispersie van urethan-acrylaat entcopolymeren, alsmede aldus verkregen stabiele waterige dispersie.
DE3676054D1 (de) * 1985-05-17 1991-01-17 Atochem North America Durch waessriges alkali entwickelbare, uv-haertbare urethanacrylatverbindungen und zusammensetzungen, die zur herstellung von beschichtung fuer loetmasken geeignet sind.

Also Published As

Publication number Publication date
HK60692A (en) 1992-08-21
KR910001523B1 (ko) 1991-03-15
NL190785B (nl) 1994-03-16
GB8728631D0 (en) 1988-01-13
NL8702942A (nl) 1988-07-01
CN87107321A (zh) 1988-06-22
KR880014415A (ko) 1988-12-23
MX168832B (es) 1993-06-10
IT1233418B (it) 1992-03-31
DE3741385A1 (de) 1988-06-09
SG61192G (en) 1992-09-04
GB2199335B (en) 1991-01-09
FR2607820B1 (fr) 1994-06-10
CN1031227C (zh) 1996-03-06
CA1332093C (en) 1994-09-20
CH680622A5 (zh) 1992-09-30
FR2607820A1 (fr) 1988-06-10
IT8722899A0 (it) 1987-12-04
NL190785C (nl) 1994-08-16
BR8706609A (pt) 1988-07-19
GB2199335A (en) 1988-07-06

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
8125 Change of the main classification

Ipc: C08G 18/67

8125 Change of the main classification

Ipc: C09D175/16

D2 Grant after examination
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee