DE3733421C2 - - Google Patents

Info

Publication number
DE3733421C2
DE3733421C2 DE19873733421 DE3733421A DE3733421C2 DE 3733421 C2 DE3733421 C2 DE 3733421C2 DE 19873733421 DE19873733421 DE 19873733421 DE 3733421 A DE3733421 A DE 3733421A DE 3733421 C2 DE3733421 C2 DE 3733421C2
Authority
DE
Germany
Prior art keywords
cresol
resin
alkali
compound
mixture according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE19873733421
Other languages
German (de)
English (en)
Other versions
DE3733421A1 (de
Inventor
Koutaro Yamasue
Akira Shizuoka Jp Nagashima
Susumu Maebashi Gunma Jp Nagao
Toshio Annaka Gunma Jp Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Nippon Kayaku Co Ltd
Original Assignee
Nippon Kayaku Co Ltd
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kayaku Co Ltd, Fuji Photo Film Co Ltd filed Critical Nippon Kayaku Co Ltd
Publication of DE3733421A1 publication Critical patent/DE3733421A1/de
Application granted granted Critical
Publication of DE3733421C2 publication Critical patent/DE3733421C2/de
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
    • G03F7/023Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
DE19873733421 1986-10-02 1987-10-02 Positiv arbeitende lichtempfindliche zusammensetzung Granted DE3733421A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61234768A JP2652010B2 (ja) 1986-10-02 1986-10-02 ポジ型感光性組成物

Publications (2)

Publication Number Publication Date
DE3733421A1 DE3733421A1 (de) 1988-04-07
DE3733421C2 true DE3733421C2 (enrdf_load_stackoverflow) 1992-09-03

Family

ID=16976057

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19873733421 Granted DE3733421A1 (de) 1986-10-02 1987-10-02 Positiv arbeitende lichtempfindliche zusammensetzung

Country Status (2)

Country Link
JP (1) JP2652010B2 (enrdf_load_stackoverflow)
DE (1) DE3733421A1 (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4143081A1 (de) * 1990-12-27 1992-07-02 Toshiba Kawasaki Kk Lichtempfindliche masse und verfahren zur herstellung eines musters unter verwendung derselben

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2734545B2 (ja) * 1988-08-22 1998-03-30 大日本インキ化学工業株式会社 ポジ型フォトレジスト組成物
JP2566169B2 (ja) * 1989-12-28 1996-12-25 日本ゼオン株式会社 ポジ型レジスト組成物
JP2557748B2 (ja) * 1990-09-07 1996-11-27 日本電信電話株式会社 ポジ型レジスト材料
EP0722121B1 (en) * 1995-01-12 1999-04-28 Fuji Photo Film Co., Ltd. Photosensitive planographic printing plate
JP6135743B2 (ja) * 2015-11-10 2017-05-31 日立化成株式会社 ポジ型感光性樹脂組成物及び感光性フィルム

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS616647A (ja) * 1984-06-20 1986-01-13 Konishiroku Photo Ind Co Ltd ポジ型感光性平版印刷版用感光性組成物
JPH0654386B2 (ja) * 1986-03-28 1994-07-20 日本合成ゴム株式会社 ポジ型感放射線性樹脂組成物

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4143081A1 (de) * 1990-12-27 1992-07-02 Toshiba Kawasaki Kk Lichtempfindliche masse und verfahren zur herstellung eines musters unter verwendung derselben

Also Published As

Publication number Publication date
JPS6388546A (ja) 1988-04-19
DE3733421A1 (de) 1988-04-07
JP2652010B2 (ja) 1997-09-10

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Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
8125 Change of the main classification

Ipc: G03F 7/023

D2 Grant after examination
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee