DE3688097D1 - Verfahren und einrichtung zur beseitigung kleiner teilchen von einer oberflaeche. - Google Patents
Verfahren und einrichtung zur beseitigung kleiner teilchen von einer oberflaeche.Info
- Publication number
- DE3688097D1 DE3688097D1 DE8686105296T DE3688097T DE3688097D1 DE 3688097 D1 DE3688097 D1 DE 3688097D1 DE 8686105296 T DE8686105296 T DE 8686105296T DE 3688097 T DE3688097 T DE 3688097T DE 3688097 D1 DE3688097 D1 DE 3688097D1
- Authority
- DE
- Germany
- Prior art keywords
- rinsing
- surfactant
- solution
- small particles
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
- C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
- C23G5/028—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons
- C23G5/02803—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
- C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
- C23G5/032—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing oxygen-containing compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/017—Clean surfaces
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/725,062 US4711256A (en) | 1985-04-19 | 1985-04-19 | Method and apparatus for removal of small particles from a surface |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3688097D1 true DE3688097D1 (de) | 1993-04-29 |
DE3688097T2 DE3688097T2 (de) | 1993-10-28 |
Family
ID=24913008
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE86105296T Expired - Fee Related DE3688097T2 (de) | 1985-04-19 | 1986-04-16 | Verfahren und Einrichtung zur Beseitigung kleiner Teilchen von einer Oberfläche. |
Country Status (5)
Country | Link |
---|---|
US (1) | US4711256A (de) |
EP (1) | EP0199288B1 (de) |
JP (1) | JPH0666308B2 (de) |
AT (1) | ATE87338T1 (de) |
DE (1) | DE3688097T2 (de) |
Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4828751A (en) * | 1987-08-28 | 1989-05-09 | Pcr, Inc. | Solvent composition for cleaning silicon wafers |
DE3834396A1 (de) * | 1988-10-10 | 1990-04-12 | Telefunken Electronic Gmbh | Verfahren zum entfernen von oberflaechenschichten |
JPH02152234A (ja) * | 1988-12-05 | 1990-06-12 | Mitsubishi Electric Corp | 蒸気乾燥方法 |
JP2577798B2 (ja) * | 1989-08-16 | 1997-02-05 | 株式会社日立製作所 | 液中微粒子付着制御方法 |
JPH085140B2 (ja) * | 1989-09-26 | 1996-01-24 | ダイキン工業株式会社 | フッ素樹脂製品の処理方法 |
MY114292A (en) * | 1989-10-26 | 2002-09-30 | Momentive Performance Mat Jp | Method for removing residual liquid cleaning agent using a rinsing composition containing a polyorganosiloxane |
KR950010446B1 (ko) * | 1990-03-16 | 1995-09-18 | 가부시키가이샤 도시바 | 세정방법 |
US5503681A (en) * | 1990-03-16 | 1996-04-02 | Kabushiki Kaisha Toshiba | Method of cleaning an object |
US5593507A (en) * | 1990-08-22 | 1997-01-14 | Kabushiki Kaisha Toshiba | Cleaning method and cleaning apparatus |
EP0496899B1 (de) * | 1990-08-22 | 1996-10-16 | Kabushiki Kaisha Toshiba | Reinigungsverfahren |
JP2787788B2 (ja) * | 1990-09-26 | 1998-08-20 | インターナショナル・ビジネス・マシーンズ・コーポレーション | 残留物除去方法 |
JPH0793270B2 (ja) * | 1991-02-15 | 1995-10-09 | 株式会社半導体プロセス研究所 | 半導体製造装置及びその使用方法 |
JPH054077A (ja) * | 1991-03-27 | 1993-01-14 | Japan Field Kk | 被洗浄物の洗浄方法 |
US5320706A (en) * | 1991-10-15 | 1994-06-14 | Texas Instruments Incorporated | Removing slurry residue from semiconductor wafer planarization |
US5360509A (en) * | 1993-03-08 | 1994-11-01 | Gi Corporation | Low cost method of fabricating epitaxial semiconductor devices |
JPH07216392A (ja) * | 1994-01-26 | 1995-08-15 | Daikin Ind Ltd | 洗浄剤及び洗浄方法 |
JP2914555B2 (ja) * | 1994-08-30 | 1999-07-05 | 信越半導体株式会社 | 半導体シリコンウェーハの洗浄方法 |
US5536327A (en) * | 1994-11-21 | 1996-07-16 | Entropic Systems, Inc. | Removal of hydrocarbon or fluorocarbon residues using coupling agent additives |
JP3351924B2 (ja) * | 1995-01-06 | 2002-12-03 | 忠弘 大見 | 洗浄方法 |
US5635414A (en) * | 1995-03-28 | 1997-06-03 | Zakaluk; Gregory | Low cost method of fabricating shallow junction, Schottky semiconductor devices |
US6132522A (en) * | 1996-07-19 | 2000-10-17 | Cfmt, Inc. | Wet processing methods for the manufacture of electronic components using sequential chemical processing |
US6248651B1 (en) | 1998-06-24 | 2001-06-19 | General Semiconductor, Inc. | Low cost method of fabricating transient voltage suppressor semiconductor devices or the like |
JP4025943B2 (ja) * | 1999-02-26 | 2007-12-26 | 大阪府 | 機能性ポリアミド酸微粒子及び機能性ポリイミド微粒子ならびにこれらの製造方法 |
GB2358791A (en) * | 2000-02-04 | 2001-08-08 | Versar Inc | Method composition and apparatus for cleaning internal surfaces of oxygen converters and cylinders |
US6450182B2 (en) | 2000-04-12 | 2002-09-17 | Versar, Inc. | Methods, compositions and apparatus for cleaning pipes |
US7163589B2 (en) * | 2001-05-23 | 2007-01-16 | Argos Associates, Inc. | Method and apparatus for decontamination of sensitive equipment |
US7022437B2 (en) * | 2003-01-15 | 2006-04-04 | Asml Netherlands B.V. | Perfluoropolyether liquid pellicle and methods of cleaning masks using perfluoropolyether liquid |
US8404056B1 (en) * | 2009-05-27 | 2013-03-26 | WD Media, LLC | Process control for a sonication cleaning tank |
US8863763B1 (en) * | 2009-05-27 | 2014-10-21 | WD Media, LLC | Sonication cleaning with a particle counter |
US9102604B1 (en) * | 2010-02-15 | 2015-08-11 | Baxter International Inc. | Methods for cleaning distilling columns |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3664806A (en) * | 1963-09-13 | 1972-05-23 | Res Dev Co | Dry cleaning of textile fibers and other garment materials with chlorofluoro hydrocarbons having relatively high freezing points |
US3509061A (en) * | 1966-10-18 | 1970-04-28 | Us Navy | Method and compositions for displacing organic liquids from solid surfaces |
US3784471A (en) * | 1970-05-11 | 1974-01-08 | Avco Corp | Solid additives dispersed in perfluorinated liquids with perfluoroalkyl ether dispersants |
GB1399867A (en) * | 1971-09-27 | 1975-07-02 | Ici Ltd | Cleaning process |
GB1440438A (en) * | 1972-09-07 | 1976-06-23 | Ici Ltd | Cleaning process |
US3957672A (en) * | 1973-11-23 | 1976-05-18 | The United States Of America As Represented By The Secretary Of The Navy | Displacement of organic liquid films from solid surfaces by non aqueous systems |
US4156619A (en) * | 1975-06-11 | 1979-05-29 | Wacker-Chemitronic Gesellschaft Fur Elektronik-Grundstoffe Mbh | Process for cleaning semi-conductor discs |
AT347198B (de) * | 1975-07-22 | 1978-12-11 | Hoesch Werke Ag | Verfahren und vorrichtung zum behandeln von walzzunder |
DE2541613A1 (de) * | 1975-09-18 | 1977-03-24 | Gernot Karau | Verfahren und vorrichtung zur entfettung und/oder reinigung von metallspaenen, schuettguetern, kleinteilen o.dgl. |
US4111715A (en) * | 1976-03-15 | 1978-09-05 | Westinghouse Electric Corp. | Apparatus and method for chemically removing plastics |
DE2656384B2 (de) * | 1976-12-13 | 1980-04-17 | Chemische Fabrik Kreussler & Co Gmbh, 6200 Wiesbaden | Verfahren zur Reinigung von Textilien in organischen Lösungsmittelbadern |
GB1544841A (en) * | 1977-01-04 | 1979-04-25 | Plessey Co Ltd | Fluid for cleaning electrical contacts |
JPS53132173A (en) * | 1977-04-23 | 1978-11-17 | Kamaya Kagaku Kogyo Co Ltd | Method of cleaning glass surface |
JPS5835108B2 (ja) * | 1979-08-03 | 1983-07-30 | ダイキン工業株式会社 | 物品の洗滌乾燥方法 |
US4269630A (en) * | 1979-10-01 | 1981-05-26 | George M. Stephenson | Two-step process and composition for cleaning polished surfaces |
JPS58204100A (ja) * | 1982-05-24 | 1983-11-28 | ダイキン工業株式会社 | 表面清浄化用組成物 |
-
1985
- 1985-04-19 US US06/725,062 patent/US4711256A/en not_active Expired - Lifetime
-
1986
- 1986-04-16 DE DE86105296T patent/DE3688097T2/de not_active Expired - Fee Related
- 1986-04-16 AT AT86105296T patent/ATE87338T1/de not_active IP Right Cessation
- 1986-04-16 EP EP86105296A patent/EP0199288B1/de not_active Expired - Lifetime
- 1986-04-18 JP JP61089852A patent/JPH0666308B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0199288B1 (de) | 1993-03-24 |
EP0199288A3 (en) | 1988-08-17 |
EP0199288A2 (de) | 1986-10-29 |
JPS61292325A (ja) | 1986-12-23 |
ATE87338T1 (de) | 1993-04-15 |
US4711256A (en) | 1987-12-08 |
JPH0666308B2 (ja) | 1994-08-24 |
DE3688097T2 (de) | 1993-10-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE3688097D1 (de) | Verfahren und einrichtung zur beseitigung kleiner teilchen von einer oberflaeche. | |
DE3787595D1 (de) | Verfahren zum entfernen von unerwuenschten teilchen von der oberflaeche eines substrats. | |
DD243168A3 (de) | Verfahren zur vakuumreinigung von oel und vorrichtung zur durchfuehrung des verfahrens | |
DE3779669D1 (de) | Vorrichtung fuer gas-fluessigkeitskontakt und verfahren zum entfernen von h2s. | |
ATE219704T1 (de) | Vorrichtung zum mikrobiologischen waschen von teilen | |
DE69129677D1 (de) | Verfahren zum Ansaugen von Substraten und Vorrichtung für deren Ausführung | |
ES2062795T3 (es) | Material de adsorcion para la eliminacion selectiva del ldl- o/y vldl. | |
ATE30511T1 (de) | Verfahren zur desinfektion und reinigung von kontaktlinsen. | |
DE3889858D1 (de) | Verfahren zur hydrophilierenden und/oder Kittreste entfernenden Oberflächenbehandlung von Siliciumscheiben. | |
AT388120B (de) | Vorrichtung und verfahren zur reinigung von gegenstaenden von anhaftenden fluessigen behandlungsmitteln und deren rueckgewinnung | |
ATE189830T1 (de) | Verfahren zum entfernen von verunreinigungen mittels einem einbasischen ester | |
ATA352376A (de) | Verfahren und vorrichtung zur entfernung von detergentien aus waeschereiabwaessern | |
ATE40478T1 (de) | Verfahren und mittel zur raschen und vollstaendigen beseitigung einer truebung in einer biologischen fluessigkeit. | |
DE69114877D1 (de) | Verfahren zum Entfernen einer Flüssigkeit von der Oberfläche eines Substrats in einer Schleuder. | |
DE3766023D1 (de) | Verfahren zur schnellen entfernung von schwefelwasserstoff aus solchen enthaltenden fluessigem schwefel und dafuer anzuwendendes katalytisches system. | |
DE58903661D1 (de) | Verfahren und vorrichtung zum reinigen, von gegenstaenden mit umweltgefaehrdenden loesungsmitteln, insbesondere halogenkohlenwasserstoffen. | |
DE3766651D1 (de) | Verfahren zur behandlung von kaustisch raffinierten glyceridoelen zur entfernung von seifen und phospholipiden. | |
ATE273736T1 (de) | Vorrichtung und verfahren zur entfernung von lösungsmittelresten | |
DE69903055D1 (de) | Verfahren und vorrichtung zur reinigung plattenförmiger gegenstände | |
DE3778246D1 (de) | Verfahren zum entfernen einer niob enthaltenden beschichtung von einem substrat. | |
DE59102413D1 (de) | Verfahren und Vorrichtung zur Reinigung von kontaminierten Stoffen und Geräten. | |
AT359094B (de) | Verfahren und vorrichtung zur aufbereitung von fluessigmist | |
GB2013718B (en) | Process and apparatus for removing treatment liquid adhering to an article after an electroplating or chemical surface treatment thereof | |
ATE134305T1 (de) | Vorrichtung zum reinigen von glatten oberflächen | |
DE59202755D1 (de) | Verfahren zur reinigung von harten oberflächen insbesondere in reinräumen. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |