DE3546327A1 - Magnetaufzeichnungsmedium - Google Patents
MagnetaufzeichnungsmediumInfo
- Publication number
- DE3546327A1 DE3546327A1 DE19853546327 DE3546327A DE3546327A1 DE 3546327 A1 DE3546327 A1 DE 3546327A1 DE 19853546327 DE19853546327 DE 19853546327 DE 3546327 A DE3546327 A DE 3546327A DE 3546327 A1 DE3546327 A1 DE 3546327A1
- Authority
- DE
- Germany
- Prior art keywords
- magnetic recording
- recording medium
- treatment
- magnetic
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005291 magnetic effect Effects 0.000 title claims description 94
- 238000011282 treatment Methods 0.000 claims description 80
- 239000010408 film Substances 0.000 claims description 58
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 23
- 229910001872 inorganic gas Inorganic materials 0.000 claims description 21
- 229910052757 nitrogen Inorganic materials 0.000 claims description 17
- 239000000203 mixture Substances 0.000 claims description 15
- 229910052760 oxygen Inorganic materials 0.000 claims description 14
- 238000009832 plasma treatment Methods 0.000 claims description 14
- 229910052739 hydrogen Inorganic materials 0.000 claims description 13
- 239000012298 atmosphere Substances 0.000 claims description 12
- 239000004952 Polyamide Substances 0.000 claims description 10
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 10
- 239000001301 oxygen Substances 0.000 claims description 10
- 229920002647 polyamide Polymers 0.000 claims description 10
- 239000010409 thin film Substances 0.000 claims description 9
- 229920005989 resin Polymers 0.000 claims description 8
- 239000011347 resin Substances 0.000 claims description 8
- 239000004642 Polyimide Substances 0.000 claims description 7
- 125000003118 aryl group Chemical group 0.000 claims description 7
- 229920001721 polyimide Polymers 0.000 claims description 7
- 239000001257 hydrogen Substances 0.000 claims description 6
- 239000004696 Poly ether ether ketone Substances 0.000 claims description 5
- 229920002530 polyetherether ketone Polymers 0.000 claims description 5
- 239000004734 Polyphenylene sulfide Substances 0.000 claims description 4
- 230000009471 action Effects 0.000 claims description 4
- 229920002492 poly(sulfone) Polymers 0.000 claims description 4
- 229920000728 polyester Polymers 0.000 claims description 4
- 229920000069 polyphenylene sulfide Polymers 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 4
- 229920006393 polyether sulfone Polymers 0.000 claims description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 2
- DOETVZCFKJCYJV-UHFFFAOYSA-N 6-(4,5-dihydro-1h-imidazol-2-yl)-2-[4-(4,5-dihydro-1h-imidazol-2-yl)phenyl]-1h-indole Chemical compound N1CCN=C1C1=CC=C(C=2NC3=CC(=CC=C3C=2)C=2NCCN=2)C=C1 DOETVZCFKJCYJV-UHFFFAOYSA-N 0.000 claims 1
- 101100286286 Dictyostelium discoideum ipi gene Proteins 0.000 claims 1
- 239000004695 Polyether sulfone Substances 0.000 claims 1
- 239000004697 Polyetherimide Substances 0.000 claims 1
- 229920001601 polyetherimide Polymers 0.000 claims 1
- 239000007789 gas Substances 0.000 description 45
- 238000000034 method Methods 0.000 description 15
- 230000000052 comparative effect Effects 0.000 description 12
- 229920006015 heat resistant resin Polymers 0.000 description 10
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 9
- 239000013078 crystal Substances 0.000 description 9
- 208000028659 discharge Diseases 0.000 description 9
- 239000000126 substance Substances 0.000 description 8
- 229910045601 alloy Inorganic materials 0.000 description 7
- 239000000956 alloy Substances 0.000 description 7
- 239000011230 binding agent Substances 0.000 description 7
- 239000011651 chromium Substances 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 7
- 238000004544 sputter deposition Methods 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 239000002585 base Substances 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- 238000001771 vacuum deposition Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 229910020630 Co Ni Inorganic materials 0.000 description 4
- 229910002440 Co–Ni Inorganic materials 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 239000004760 aramid Substances 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 4
- 229920003235 aromatic polyamide Polymers 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 229910017052 cobalt Inorganic materials 0.000 description 4
- 239000010941 cobalt Substances 0.000 description 4
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 238000010571 fourier transform-infrared absorption spectrum Methods 0.000 description 4
- 229910052734 helium Inorganic materials 0.000 description 4
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- 239000002390 adhesive tape Substances 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- 239000000969 carrier Substances 0.000 description 3
- 239000012876 carrier material Substances 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 238000007733 ion plating Methods 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 239000006247 magnetic powder Substances 0.000 description 3
- 230000005415 magnetization Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000001465 metallisation Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 229910052754 neon Inorganic materials 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910017061 Fe Co Inorganic materials 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- 229920002614 Polyether block amide Polymers 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000013626 chemical specie Substances 0.000 description 2
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 150000004985 diamines Chemical class 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 238000006068 polycondensation reaction Methods 0.000 description 2
- -1 polyethylene terephthalate Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 238000002203 pretreatment Methods 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910003321 CoFe Inorganic materials 0.000 description 1
- 229910000684 Cobalt-chrome Inorganic materials 0.000 description 1
- 229910020674 Co—B Inorganic materials 0.000 description 1
- 229910020516 Co—V Inorganic materials 0.000 description 1
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- 229910017135 Fe—O Inorganic materials 0.000 description 1
- 229910016629 MnBi Inorganic materials 0.000 description 1
- 229910016964 MnSb Inorganic materials 0.000 description 1
- 229910018657 Mn—Al Inorganic materials 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- 229910002837 PtCo Inorganic materials 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 238000004774 atomic orbital Methods 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000010952 cobalt-chrome Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000013270 controlled release Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000005294 ferromagnetic effect Effects 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012761 high-performance material Substances 0.000 description 1
- UCNNJGDEJXIUCC-UHFFFAOYSA-L hydroxy(oxo)iron;iron Chemical compound [Fe].O[Fe]=O.O[Fe]=O UCNNJGDEJXIUCC-UHFFFAOYSA-L 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 150000003951 lactams Chemical group 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000004776 molecular orbital Methods 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920001184 polypeptide Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 102000004196 processed proteins & peptides Human genes 0.000 description 1
- 108090000765 processed proteins & peptides Proteins 0.000 description 1
- 239000012260 resinous material Substances 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/739—Magnetic recording media substrates
- G11B5/73923—Organic polymer substrates
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/739—Magnetic recording media substrates
- G11B5/73923—Organic polymer substrates
- G11B5/73927—Polyester substrates, e.g. polyethylene terephthalate
- G11B5/73933—Surface treated layers, e.g. treated by corona discharge
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/739—Magnetic recording media substrates
- G11B5/73923—Organic polymer substrates
- G11B5/73937—Substrates having an organic polymer comprising a ring structure
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/90—Magnetic feature
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
- Y10T428/31681—Next to polyester, polyamide or polyimide [e.g., alkyd, glue, or nylon, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31786—Of polyester [e.g., alkyd, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Magnetic Record Carriers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59278811A JPH0610858B2 (ja) | 1984-12-29 | 1984-12-29 | 磁気記録媒体 |
| JP28104584A JPS61160830A (ja) | 1984-12-30 | 1984-12-30 | 磁気記録媒体 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3546327A1 true DE3546327A1 (de) | 1986-07-17 |
| DE3546327C2 DE3546327C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1992-04-09 |
Family
ID=26553054
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19853546327 Granted DE3546327A1 (de) | 1984-12-29 | 1985-12-30 | Magnetaufzeichnungsmedium |
Country Status (3)
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4880687A (en) * | 1986-05-09 | 1989-11-14 | Tdk Corporation | Magnetic recording medium |
| FR2614317B1 (fr) * | 1987-04-22 | 1989-07-13 | Air Liquide | Procede de protection de substrat polymerique par depot par plasma de composes du type oxynitrure de silicium et dispositif pour sa mise en oeuvre. |
| JPH0810332B2 (ja) * | 1988-02-10 | 1996-01-31 | 富士ゼロックス株式会社 | 電子写真感光体の製造方法 |
| KR960013069B1 (ko) * | 1988-04-22 | 1996-09-30 | 도레이 가부시키가이샤 | 폴리페닐렌술피드 필름, 그 제조방법 및 그 진공증착방법 |
| DE68928852T2 (de) * | 1988-09-28 | 1999-05-20 | Toray Industries, Inc., Tokio/Tokyo | Aluminium-vakuumverdämpfungsfilm und verfahren zur herstellung |
| US5324414A (en) * | 1992-06-01 | 1994-06-28 | Eastman Kodak Company | Ion selective electrode |
| JP2765673B2 (ja) * | 1992-06-04 | 1998-06-18 | インターナショナル・ビジネス・マシーンズ・コーポレイション | メタライゼーション層及びその形成方法 |
| US20090255808A1 (en) * | 2008-04-11 | 2009-10-15 | Seagate Technology Llc | Target for efficient use of precious deposition material |
| US11244704B2 (en) | 2019-09-17 | 2022-02-08 | International Business Machines Corporation | Magnetic recording tape having resilient substrate |
| US11315596B2 (en) | 2019-09-17 | 2022-04-26 | International Business Machines Corporation | Magnetic recording tape fabrication method having peek substrate |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5742889A (en) * | 1980-08-27 | 1982-03-10 | Japan Atomic Energy Res Inst | Abnormality protection system of coil for tokomak type nuclear fusion equipment |
| JPS5877030A (ja) * | 1981-10-31 | 1983-05-10 | Hitachi Maxell Ltd | 磁気記録媒体およびその製造方法 |
| DE3401625A1 (de) * | 1983-01-18 | 1984-10-04 | Diafoil Co. Ltd., Tokio/Tokyo | Polyesterfolie fuer magnetische aufzeichnungsmedien und verfahren zu ihrer herstellung |
| DE3425755C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1983-07-12 | 1987-10-29 | Tdk Corporation, Tokio/Tokyo, Jp |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5149704A (en) * | 1974-10-28 | 1976-04-30 | Fuji Photo Film Co Ltd | Jikikirokubaitaino seiho |
| JPS58222438A (ja) * | 1982-06-18 | 1983-12-24 | Tdk Corp | 磁気記録媒体 |
| JPS5979426A (ja) * | 1982-10-29 | 1984-05-08 | Tdk Corp | 磁気記録媒体 |
| JPS59160828A (ja) * | 1983-03-01 | 1984-09-11 | Fuji Photo Film Co Ltd | 磁気記録媒体 |
| US4526806A (en) * | 1983-11-22 | 1985-07-02 | Olin Corporation | One-step plasma treatment of copper foils to increase their laminate adhesion |
| US4594262A (en) * | 1984-07-05 | 1986-06-10 | Minnesota Mining And Manufacturing Company | Electron beam adhesion-promoting treatment of polyester film base |
| US4543268A (en) * | 1984-07-05 | 1985-09-24 | Minnesota Mining And Manufacturing Company | Electron-beam adhesion-promoting treatment of polyester film base for magnetic recording media |
-
1985
- 1985-12-20 GB GB8531404A patent/GB2168911B/en not_active Expired
- 1985-12-23 US US06/812,859 patent/US4816341A/en not_active Expired - Lifetime
- 1985-12-30 DE DE19853546327 patent/DE3546327A1/de active Granted
-
1988
- 1988-05-25 GB GB8812404A patent/GB2204811B/en not_active Expired
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5742889A (en) * | 1980-08-27 | 1982-03-10 | Japan Atomic Energy Res Inst | Abnormality protection system of coil for tokomak type nuclear fusion equipment |
| JPS5877030A (ja) * | 1981-10-31 | 1983-05-10 | Hitachi Maxell Ltd | 磁気記録媒体およびその製造方法 |
| DE3401625A1 (de) * | 1983-01-18 | 1984-10-04 | Diafoil Co. Ltd., Tokio/Tokyo | Polyesterfolie fuer magnetische aufzeichnungsmedien und verfahren zu ihrer herstellung |
| DE3425755C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1983-07-12 | 1987-10-29 | Tdk Corporation, Tokio/Tokyo, Jp |
Also Published As
| Publication number | Publication date |
|---|---|
| GB8812404D0 (en) | 1988-06-29 |
| DE3546327C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1992-04-09 |
| GB2204811B (en) | 1989-05-24 |
| GB2168911B (en) | 1989-06-07 |
| GB2204811A (en) | 1988-11-23 |
| GB2168911A (en) | 1986-07-02 |
| US4816341A (en) | 1989-03-28 |
| GB8531404D0 (en) | 1986-02-05 |
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