DE3536770C2 - - Google Patents

Info

Publication number
DE3536770C2
DE3536770C2 DE3536770A DE3536770A DE3536770C2 DE 3536770 C2 DE3536770 C2 DE 3536770C2 DE 3536770 A DE3536770 A DE 3536770A DE 3536770 A DE3536770 A DE 3536770A DE 3536770 C2 DE3536770 C2 DE 3536770C2
Authority
DE
Germany
Prior art keywords
inner conductor
gas
conductor
gas laser
paste
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE3536770A
Other languages
German (de)
English (en)
Other versions
DE3536770A1 (de
Inventor
W. Dr. 8750 Aschaffenburg De Gorisch
R. 6450 Hanau De Malkmus
R. Dr. 6050 Offenbach De Nitsche
W. Dr. Skrlac
D. 6454 Bruchkoebel De Wendt
W. 8752 Kleinostheim De Wohlfart
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Heraeus Medical GmbH
Original Assignee
WC Heraus GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by WC Heraus GmbH and Co KG filed Critical WC Heraus GmbH and Co KG
Priority to DE19853536770 priority Critical patent/DE3536770A1/de
Priority to US06/912,941 priority patent/US4752937A/en
Publication of DE3536770A1 publication Critical patent/DE3536770A1/de
Application granted granted Critical
Publication of DE3536770C2 publication Critical patent/DE3536770C2/de
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/04—Arrangements for thermal management
    • H01S3/041—Arrangements for thermal management for gas lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/0305—Selection of materials for the tube or the coatings thereon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0975—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using inductive or capacitive excitation

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
DE19853536770 1985-10-16 1985-10-16 Gaslaser Granted DE3536770A1 (de)

Priority Applications (2)

Application Number Priority Date Filing Date Title
DE19853536770 DE3536770A1 (de) 1985-10-16 1985-10-16 Gaslaser
US06/912,941 US4752937A (en) 1985-10-16 1986-09-29 Gas laser and production process therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19853536770 DE3536770A1 (de) 1985-10-16 1985-10-16 Gaslaser

Publications (2)

Publication Number Publication Date
DE3536770A1 DE3536770A1 (de) 1987-04-16
DE3536770C2 true DE3536770C2 (index.php) 1989-12-07

Family

ID=6283637

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19853536770 Granted DE3536770A1 (de) 1985-10-16 1985-10-16 Gaslaser

Country Status (2)

Country Link
US (1) US4752937A (index.php)
DE (1) DE3536770A1 (index.php)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL81439A (en) * 1987-01-30 1991-08-16 Alumor Lasers Ltd Ultra compact,rf excited gaseous lasers
DE3810604A1 (de) * 1988-03-29 1989-10-19 Deutsche Forsch Luft Raumfahrt Gaslaser
DE3810601A1 (de) * 1988-03-29 1989-10-19 Heraeus Gmbh W C Gaslaser
GB8817308D0 (en) * 1988-07-20 1988-08-24 British Aerospace Gas laser
US4922504A (en) * 1988-12-23 1990-05-01 Gil Teva Laser apparatus
DE3919771A1 (de) * 1989-06-16 1990-12-20 Lambda Physik Forschung Vorrichtung zum reinigen von lasergas
DE3923277A1 (de) * 1989-07-14 1991-01-24 Fraunhofer Ges Forschung Gasentladungsanordnung
US5164952A (en) * 1990-09-26 1992-11-17 Siemens Aktiengesellschaft Electrically pumped gas laser suitable for high input power
IL95906A0 (en) * 1990-10-05 1991-07-18 Laser Ind Ltd Gas laser
JPH04276671A (ja) * 1991-03-05 1992-10-01 Matsushita Electric Ind Co Ltd ガスレーザー発振装置
US5386434A (en) * 1993-02-12 1995-01-31 Uniphase Corporation Internal mirror shield, and method for protecting the mirrors of an internal gas laser
JP3338974B2 (ja) * 1995-01-11 2002-10-28 ミヤチテクノス株式会社 レーザ装置
DE19936955A1 (de) * 1999-08-05 2001-02-15 Trumpf Lasertechnik Gmbh Gaslaser
JP3401564B2 (ja) * 2000-07-31 2003-04-28 独立行政法人産業技術総合研究所 光源一体型集光発光装置
DE10047020C1 (de) * 2000-09-22 2002-02-07 Trumpf Lasertechnik Gmbh Laser mit wenigstens zwei Elektrodenrohren und einer Kühleinrichtung, Verfahren zur Herstellung eines Lasers sowie Vorrichtung zur Durchführung eines derartigen Verfahrens
CN103872573A (zh) * 2014-04-04 2014-06-18 成都微深科技有限公司 一种半回流式高强度二氧化碳激光器
CN112993724A (zh) * 2021-01-22 2021-06-18 郭秀才 一种气体激光器散热装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2735299C2 (de) * 1977-08-05 1986-08-28 W.C. Heraeus Gmbh, 6450 Hanau Elektrisch angeregter Gaslaser
US4325006A (en) * 1979-08-01 1982-04-13 Jersey Nuclear-Avco Isotopes, Inc. High pulse repetition rate coaxial flashlamp
US4359777A (en) * 1981-01-22 1982-11-16 The United States Of America As Represented By The Secretary Of The Army High efficiency transversely excited electrodeless gas lasers
US4455658A (en) * 1982-04-20 1984-06-19 Sutter Jr Leroy V Coupling circuit for use with a transversely excited gas laser
DE3316778C1 (de) * 1983-05-07 1984-10-18 W.C. Heraeus Gmbh, 6450 Hanau Gaslaser
US4553242A (en) * 1983-05-07 1985-11-12 W.C. Heraeus Gmbh Gas laser
JPS6037189A (ja) * 1983-08-09 1985-02-26 Mitsubishi Electric Corp 無声放電励起同軸型レ−ザ発振器
US4785458A (en) * 1984-02-13 1988-11-15 Mitsubishi Denki Kabushiki Kaisha Gas laser device
US4589114A (en) * 1984-06-19 1986-05-13 Sutter Jr Leroy V Optical mode control for a gas laser
DE3580333D1 (de) * 1984-09-26 1990-12-06 Siemens Ag Edelgasionenlaser, verfahren zu seinem betrieb und seine verwendung.

Also Published As

Publication number Publication date
US4752937A (en) 1988-06-21
DE3536770A1 (de) 1987-04-16

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
D2 Grant after examination
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: HERAEUS INSTRUMENTS GMBH, 6450 HANAU, DE

8327 Change in the person/name/address of the patent owner

Owner name: HERAEUS MED GMBH, 63450 HANAU, DE

8339 Ceased/non-payment of the annual fee