DE3504186A1 - Elektrolytisches wasserbad und verfahren zur abscheidung einer nickel-phosphor-legierung - Google Patents
Elektrolytisches wasserbad und verfahren zur abscheidung einer nickel-phosphor-legierungInfo
- Publication number
- DE3504186A1 DE3504186A1 DE19853504186 DE3504186A DE3504186A1 DE 3504186 A1 DE3504186 A1 DE 3504186A1 DE 19853504186 DE19853504186 DE 19853504186 DE 3504186 A DE3504186 A DE 3504186A DE 3504186 A1 DE3504186 A1 DE 3504186A1
- Authority
- DE
- Germany
- Prior art keywords
- nickel
- concentration
- per
- water bath
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 229910001868 water Inorganic materials 0.000 title claims abstract description 31
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 20
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 title claims description 10
- 229910001096 P alloy Inorganic materials 0.000 title claims description 9
- 238000000034 method Methods 0.000 title claims description 5
- 238000000151 deposition Methods 0.000 title 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 8
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000004327 boric acid Substances 0.000 claims abstract description 6
- 239000000080 wetting agent Substances 0.000 claims abstract description 6
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 4
- GJYJYFHBOBUTBY-UHFFFAOYSA-N alpha-camphorene Chemical compound CC(C)=CCCC(=C)C1CCC(CCC=C(C)C)=CC1 GJYJYFHBOBUTBY-UHFFFAOYSA-N 0.000 claims abstract description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 8
- 229910052698 phosphorus Inorganic materials 0.000 claims description 8
- 239000011574 phosphorus Substances 0.000 claims description 8
- 230000008021 deposition Effects 0.000 claims description 6
- -1 nickel fluoroborate Chemical compound 0.000 claims description 5
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 claims description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 2
- 150000008052 alkyl sulfonates Chemical class 0.000 claims description 2
- 229910052708 sodium Inorganic materials 0.000 claims description 2
- 239000011734 sodium Substances 0.000 claims description 2
- XXSPKSHUSWQAIZ-UHFFFAOYSA-L 36026-88-7 Chemical compound [Ni+2].[O-]P=O.[O-]P=O XXSPKSHUSWQAIZ-UHFFFAOYSA-L 0.000 abstract description 2
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 abstract description 2
- 229910001379 sodium hypophosphite Inorganic materials 0.000 abstract description 2
- 238000000576 coating method Methods 0.000 description 12
- 239000003792 electrolyte Substances 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 238000007669 thermal treatment Methods 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 235000019333 sodium laurylsulphate Nutrition 0.000 description 1
- RUQIYMSRQQCKIK-UHFFFAOYSA-M sodium;2,3-di(propan-2-yl)naphthalene-1-sulfonate Chemical compound [Na+].C1=CC=C2C(S([O-])(=O)=O)=C(C(C)C)C(C(C)C)=CC2=C1 RUQIYMSRQQCKIK-UHFFFAOYSA-M 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Chemically Coating (AREA)
- Battery Electrode And Active Subsutance (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CS84902A CS240582B1 (en) | 1984-02-08 | 1984-02-08 | Electrolytic aqueous bath for nickel-phosphorus alloy deposition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE3504186A1 true DE3504186A1 (de) | 1985-08-08 |
Family
ID=5342071
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19853504186 Withdrawn DE3504186A1 (de) | 1984-02-08 | 1985-02-07 | Elektrolytisches wasserbad und verfahren zur abscheidung einer nickel-phosphor-legierung |
Country Status (2)
| Country | Link |
|---|---|
| CS (1) | CS240582B1 (cs) |
| DE (1) | DE3504186A1 (cs) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0266020A1 (en) * | 1986-10-27 | 1988-05-04 | Burlington Industries, Inc. | Nickel phosphorus electroplating |
| US4801947A (en) * | 1987-06-25 | 1989-01-31 | Burlington Industries, Inc. | Electrodeposition-produced orifice plate of amorphous metal |
| WO1999002765A1 (en) * | 1997-07-09 | 1999-01-21 | Atotech Deutschland Gmbh | Electroplating of nickel-phosphorus alloys coatings |
| US5863407A (en) * | 1993-05-14 | 1999-01-26 | Kiyokawa Mekki Kougyo Co., Ltd. | Metal film resistor having fuse function and method for producing the same |
-
1984
- 1984-02-08 CS CS84902A patent/CS240582B1/cs unknown
-
1985
- 1985-02-07 DE DE19853504186 patent/DE3504186A1/de not_active Withdrawn
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0266020A1 (en) * | 1986-10-27 | 1988-05-04 | Burlington Industries, Inc. | Nickel phosphorus electroplating |
| US4801947A (en) * | 1987-06-25 | 1989-01-31 | Burlington Industries, Inc. | Electrodeposition-produced orifice plate of amorphous metal |
| US5863407A (en) * | 1993-05-14 | 1999-01-26 | Kiyokawa Mekki Kougyo Co., Ltd. | Metal film resistor having fuse function and method for producing the same |
| WO1999002765A1 (en) * | 1997-07-09 | 1999-01-21 | Atotech Deutschland Gmbh | Electroplating of nickel-phosphorus alloys coatings |
Also Published As
| Publication number | Publication date |
|---|---|
| CS90284A1 (en) | 1985-07-16 |
| CS240582B1 (en) | 1986-02-13 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8139 | Disposal/non-payment of the annual fee |