DE3414526C2 - - Google Patents
Info
- Publication number
- DE3414526C2 DE3414526C2 DE3414526A DE3414526A DE3414526C2 DE 3414526 C2 DE3414526 C2 DE 3414526C2 DE 3414526 A DE3414526 A DE 3414526A DE 3414526 A DE3414526 A DE 3414526A DE 3414526 C2 DE3414526 C2 DE 3414526C2
- Authority
- DE
- Germany
- Prior art keywords
- heat
- liquid
- electrodes
- resistance layer
- recording head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010410 layer Substances 0.000 claims description 79
- 239000007788 liquid Substances 0.000 claims description 52
- 239000011241 protective layer Substances 0.000 claims description 15
- 239000000758 substrate Substances 0.000 claims 1
- 239000004020 conductor Substances 0.000 description 29
- 229920002120 photoresistant polymer Polymers 0.000 description 9
- 238000005530 etching Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000001259 photo etching Methods 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- 229910003862 HfB2 Inorganic materials 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000313 electron-beam-induced deposition Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 235000011007 phosphoric acid Nutrition 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1646—Manufacturing processes thin film formation thin film formation by sputtering
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1601—Production of bubble jet print heads
- B41J2/1604—Production of bubble jet print heads of the edge shooter type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1628—Manufacturing processes etching dry etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1629—Manufacturing processes etching wet etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58067722A JPH062414B2 (ja) | 1983-04-19 | 1983-04-19 | インクジェットヘッド |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3414526A1 DE3414526A1 (de) | 1984-10-25 |
| DE3414526C2 true DE3414526C2 (en:Method) | 1990-02-01 |
Family
ID=13353131
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19843414526 Granted DE3414526A1 (de) | 1983-04-19 | 1984-04-17 | Fluessigkeitsstrahlaufzeichnungskopf |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4602261A (en:Method) |
| JP (1) | JPH062414B2 (en:Method) |
| DE (1) | DE3414526A1 (en:Method) |
| FR (1) | FR2544663B1 (en:Method) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59194867A (ja) * | 1983-04-20 | 1984-11-05 | Canon Inc | ヘッドの製造方法 |
| JPH062415B2 (ja) * | 1983-04-20 | 1994-01-12 | キヤノン株式会社 | インクジェットヘッド及び該インクジェットヘッドの製造方法 |
| JPS60157873A (ja) * | 1984-01-30 | 1985-08-19 | Canon Inc | 液体噴射記録装置の駆動回路 |
| JPH0657454B2 (ja) * | 1985-04-12 | 1994-08-03 | 株式会社日立製作所 | サ−マルヘツドの製造方法 |
| JPH0632263B2 (ja) * | 1985-09-27 | 1994-04-27 | キヤノン株式会社 | 液体噴射記録ヘッド |
| US4719478A (en) * | 1985-09-27 | 1988-01-12 | Canon Kabushiki Kaisha | Heat generating resistor, recording head using such resistor and drive method therefor |
| US4740800A (en) * | 1986-02-18 | 1988-04-26 | Canon Kabushiki Kaisha | Liquid jet recording head |
| JPS63160853A (ja) * | 1986-12-25 | 1988-07-04 | Canon Inc | 液体噴射記録ヘツド |
| JP2611981B2 (ja) * | 1987-02-04 | 1997-05-21 | キヤノン株式会社 | インクジエツト記録ヘツド用基板及びインクジエツト記録ヘツド |
| DE3884904T2 (de) * | 1987-10-30 | 1994-02-17 | Canon Kk | Schutzverfahren für Tintenstrahldruckkopf und Tintenstrahldruckkopf. |
| JP2846636B2 (ja) * | 1987-12-02 | 1999-01-13 | キヤノン株式会社 | インクジェット記録ヘッド用基板の作製方法 |
| US4887098A (en) * | 1988-11-25 | 1989-12-12 | Xerox Corporation | Thermal ink jet printer having printhead transducers with multilevelinterconnections |
| US4947189A (en) * | 1989-05-12 | 1990-08-07 | Eastman Kodak Company | Bubble jet print head having improved resistive heater and electrode construction |
| JP3248964B2 (ja) * | 1992-12-22 | 2002-01-21 | キヤノン株式会社 | 液体噴射記録ヘッド及び同ヘッドを備えた液体噴射記録装置 |
| US5946013A (en) * | 1992-12-22 | 1999-08-31 | Canon Kabushiki Kaisha | Ink jet head having a protective layer with a controlled argon content |
| US5660739A (en) * | 1994-08-26 | 1997-08-26 | Canon Kabushiki Kaisha | Method of producing substrate for ink jet recording head, ink jet recording head and ink jet recording apparatus |
| JP3397473B2 (ja) * | 1994-10-21 | 2003-04-14 | キヤノン株式会社 | 液体噴射ヘッド用素子基板を用いた液体噴射ヘッド、該ヘッドを用いた液体噴射装置 |
| US5901425A (en) | 1996-08-27 | 1999-05-11 | Topaz Technologies Inc. | Inkjet print head apparatus |
| JP2015168120A (ja) * | 2014-03-06 | 2015-09-28 | セイコーエプソン株式会社 | 積層配線の形成方法、液体噴射ヘッドの製造方法、配線実装構造、液体噴射ヘッド及び液体噴射装置 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5451837A (en) * | 1977-09-30 | 1979-04-24 | Ricoh Co Ltd | Ink jet head device |
| CA1127227A (en) * | 1977-10-03 | 1982-07-06 | Ichiro Endo | Liquid jet recording process and apparatus therefor |
| US4330787A (en) * | 1978-10-31 | 1982-05-18 | Canon Kabushiki Kaisha | Liquid jet recording device |
| JPS5931943B2 (ja) * | 1979-04-02 | 1984-08-06 | キヤノン株式会社 | 液体噴射記録法 |
| JPS5943314B2 (ja) * | 1979-04-02 | 1984-10-20 | キヤノン株式会社 | 液滴噴射記録装置 |
| US4336548A (en) * | 1979-07-04 | 1982-06-22 | Canon Kabushiki Kaisha | Droplets forming device |
| GB2106039A (en) * | 1981-08-14 | 1983-04-07 | Hewlett Packard Co | Thermal ink jet printer |
| US4438191A (en) * | 1982-11-23 | 1984-03-20 | Hewlett-Packard Company | Monolithic ink jet print head |
-
1983
- 1983-04-19 JP JP58067722A patent/JPH062414B2/ja not_active Expired - Lifetime
-
1984
- 1984-04-09 US US06/597,935 patent/US4602261A/en not_active Expired - Lifetime
- 1984-04-17 DE DE19843414526 patent/DE3414526A1/de active Granted
- 1984-04-19 FR FR8406274A patent/FR2544663B1/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPH062414B2 (ja) | 1994-01-12 |
| US4602261A (en) | 1986-07-22 |
| DE3414526A1 (de) | 1984-10-25 |
| FR2544663B1 (fr) | 1986-12-26 |
| JPS59194859A (ja) | 1984-11-05 |
| FR2544663A1 (fr) | 1984-10-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8110 | Request for examination paragraph 44 | ||
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition |