DE3381069D1 - Feldeffekttransistor mit modulierter beweglichkeit. - Google Patents

Feldeffekttransistor mit modulierter beweglichkeit.

Info

Publication number
DE3381069D1
DE3381069D1 DE8383302074T DE3381069T DE3381069D1 DE 3381069 D1 DE3381069 D1 DE 3381069D1 DE 8383302074 T DE8383302074 T DE 8383302074T DE 3381069 T DE3381069 T DE 3381069T DE 3381069 D1 DE3381069 D1 DE 3381069D1
Authority
DE
Germany
Prior art keywords
field effect
effect transistor
modular mobility
modular
mobility
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8383302074T
Other languages
English (en)
Inventor
Hiroyuki Sakaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Application granted granted Critical
Publication of DE3381069D1 publication Critical patent/DE3381069D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/80—Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier
    • H01L29/802—Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier with heterojunction gate, e.g. transistors with semiconductor layer acting as gate insulating layer, MIS-like transistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/432—Heterojunction gate for field effect devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/7727—Velocity modulation transistors, i.e. VMT
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/778—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface
    • H01L29/7782—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with confinement of carriers by at least two heterojunctions, e.g. DHHEMT, quantum well HEMT, DHMODFET
    • H01L29/7783—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with confinement of carriers by at least two heterojunctions, e.g. DHHEMT, quantum well HEMT, DHMODFET using III-V semiconductor material

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Bipolar Transistors (AREA)
  • Electrodes Of Semiconductors (AREA)
DE8383302074T 1982-04-14 1983-04-13 Feldeffekttransistor mit modulierter beweglichkeit. Expired - Lifetime DE3381069D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57062175A JPS58178572A (ja) 1982-04-14 1982-04-14 移動度変調形電界効果トランジスタ

Publications (1)

Publication Number Publication Date
DE3381069D1 true DE3381069D1 (de) 1990-02-08

Family

ID=13192518

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8383302074T Expired - Lifetime DE3381069D1 (de) 1982-04-14 1983-04-13 Feldeffekttransistor mit modulierter beweglichkeit.

Country Status (5)

Country Link
US (1) US4688061A (de)
EP (1) EP0091831B1 (de)
JP (1) JPS58178572A (de)
CA (1) CA1217575A (de)
DE (1) DE3381069D1 (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0810751B2 (ja) * 1983-12-23 1996-01-31 株式会社日立製作所 半導体装置
JPH06105717B2 (ja) * 1984-01-14 1994-12-21 富士通株式会社 電界効果型半導体装置
US4791072A (en) * 1984-06-15 1988-12-13 American Telephone And Telegraph Company, At&T Bell Laboratories Method for making a complementary device containing MODFET
JPH0714055B2 (ja) * 1984-09-03 1995-02-15 日本電気株式会社 電界効果型素子
US4745452A (en) * 1984-09-24 1988-05-17 Massachusetts Institute Of Technology Tunneling transfer devices
JPS61174776A (ja) * 1985-01-30 1986-08-06 Sony Corp ヘテロ接合電界効果トランジスタ
JPS62256478A (ja) * 1986-04-30 1987-11-09 Sumitomo Electric Ind Ltd 化合物半導体装置
FR2600821B1 (fr) * 1986-06-30 1988-12-30 Thomson Csf Dispositif semi-conducteur a heterojonction et double canal, son application a un transistor a effet de champ, et son application a un dispositif de transductance negative
US4821093A (en) * 1986-08-18 1989-04-11 The United States Of America As Represented By The Secretary Of The Army Dual channel high electron mobility field effect transistor
US4905059A (en) * 1986-09-25 1990-02-27 Regents Of The University Of Minnesota Modulation doped radiation emitting semiconductor device
WO1988002557A1 (en) * 1986-09-25 1988-04-07 Regents Of The University Of Minnesota Modulation doped radiation emitting semiconductor device
JPS63102374A (ja) * 1986-09-29 1988-05-07 シーメンス、アクチエンゲゼルシヤフト 電界効果トランジスタ
US4882608A (en) * 1987-02-09 1989-11-21 International Business Machines Corporation Multilayer semiconductor device having multiple paths of current flow
US4855797A (en) * 1987-07-06 1989-08-08 Siemens Corporate Research And Support, Inc. Modulation doped high electron mobility transistor with n-i-p-i structure
US4839702A (en) * 1987-11-20 1989-06-13 Bell Communications Research, Inc. Semiconductor device based on charge emission from a quantum well
US4839310A (en) * 1988-01-27 1989-06-13 Massachusetts Institute Of Technology High mobility transistor with opposed-gates
DE3811801A1 (de) * 1988-04-08 1989-10-19 Siemens Ag Halbleiter-bauelement, geeignet als extrem schneller schalter
US5633512A (en) * 1990-05-23 1997-05-27 Canon Kabushiki Kaisha Semiconductor device for varying the mobility of electrons by light irradiation
JP2919581B2 (ja) * 1990-08-31 1999-07-12 三洋電機株式会社 速度変調トランジスタ
US5350936A (en) * 1993-07-19 1994-09-27 Texas Instruments Incorporated Linear field effect transistor
CN102437025B (zh) * 2011-12-02 2013-04-24 南京大学 一种消除pmos中负偏压温度不稳定性影响的方法
US10985247B2 (en) 2017-10-18 2021-04-20 Iucf-Hyu (Industry-University Cooperation Foundation Hanyang University) Layer, multilevel element, method for fabricating multilevel element, and method for driving multilevel element
EP3640993A1 (de) * 2017-10-18 2020-04-22 IUCF-HYU (Industry-University Cooperation Foundation Hanyang University) Schicht, mehrstufiges element, verfahren zur herstellung eines mehrstufigen elements und verfahren zur steuerung eines mehrstufigen elements
WO2022269366A1 (en) 2021-06-24 2022-12-29 Marvell Asia Pte Ltd A network device having transistors employing charge-carrier mobility modulation to drive operation beyond transition frequency

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1418613A (fr) * 1963-12-30 1965-11-19 Ibm Dispositif semi-conducteur à jonctions hétérogènes utilisant le transfert de porteurs majoritaires
US4236167A (en) * 1978-02-06 1980-11-25 Rca Corporation Stepped oxide, high voltage MOS transistor with near intrinsic channel regions of different doping levels
US4242691A (en) * 1978-09-18 1980-12-30 Mitsubishi Denki Kabushiki Kaisha MOS Semiconductor device
FR2465317A2 (fr) * 1979-03-28 1981-03-20 Thomson Csf Transistor a effet de champ a frequence de coupure elevee
US4257055A (en) * 1979-07-26 1981-03-17 University Of Illinois Foundation Negative resistance heterojunction devices
FR2465318A1 (fr) * 1979-09-10 1981-03-20 Thomson Csf Transistor a effet de champ a frequence de coupure elevee
IT1149814B (it) * 1979-11-26 1986-12-10 Ibm Struttura semiconduttrice
EP0033037B1 (de) * 1979-12-28 1990-03-21 Fujitsu Limited Halbleitervorrichtungen mit Heteroübergang
FR2489045A1 (fr) * 1980-08-20 1982-02-26 Thomson Csf Transistor a effet de champ gaas a memoire non volatile

Also Published As

Publication number Publication date
JPS58178572A (ja) 1983-10-19
EP0091831A3 (en) 1986-02-12
CA1217575A (en) 1987-02-03
EP0091831B1 (de) 1990-01-03
JPH0258773B2 (de) 1990-12-10
US4688061A (en) 1987-08-18
EP0091831A2 (de) 1983-10-19

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Legal Events

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8364 No opposition during term of opposition