DE3339625C2 - - Google Patents

Info

Publication number
DE3339625C2
DE3339625C2 DE19833339625 DE3339625A DE3339625C2 DE 3339625 C2 DE3339625 C2 DE 3339625C2 DE 19833339625 DE19833339625 DE 19833339625 DE 3339625 A DE3339625 A DE 3339625A DE 3339625 C2 DE3339625 C2 DE 3339625C2
Authority
DE
Germany
Prior art keywords
carrier gas
groove
substance
vessel
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE19833339625
Other languages
German (de)
English (en)
Other versions
DE3339625A1 (de
Inventor
Georg Dr. 5100 Aachen De Gaertner
Helmut 5190 Stolberg De Grosche
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Philips Intellectual Property and Standards GmbH
Original Assignee
Philips Patentverwaltung GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Patentverwaltung GmbH filed Critical Philips Patentverwaltung GmbH
Priority to DE19833339625 priority Critical patent/DE3339625A1/de
Priority to GB08427276A priority patent/GB2151662B/en
Priority to FR8416553A priority patent/FR2554131B1/fr
Priority to JP22903684A priority patent/JPS61110766A/ja
Publication of DE3339625A1 publication Critical patent/DE3339625A1/de
Application granted granted Critical
Publication of DE3339625C2 publication Critical patent/DE3339625C2/de
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
DE19833339625 1983-11-02 1983-11-02 Vorrichtung zum anreichern eines traegergases mit dem dampf eines wenig fluechtigen stoffes Granted DE3339625A1 (de)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DE19833339625 DE3339625A1 (de) 1983-11-02 1983-11-02 Vorrichtung zum anreichern eines traegergases mit dem dampf eines wenig fluechtigen stoffes
GB08427276A GB2151662B (en) 1983-11-02 1984-10-29 Device for enriching a carrier gas with the vapour of a slightly volatile material for chemical vapour deposition method
FR8416553A FR2554131B1 (fr) 1983-11-02 1984-10-30 Procede pour enrichir un gaz vehicule de la vapeur d'une substance peu volatile
JP22903684A JPS61110766A (ja) 1983-11-02 1984-11-01 キヤリヤ−ガス富化用装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19833339625 DE3339625A1 (de) 1983-11-02 1983-11-02 Vorrichtung zum anreichern eines traegergases mit dem dampf eines wenig fluechtigen stoffes

Publications (2)

Publication Number Publication Date
DE3339625A1 DE3339625A1 (de) 1985-05-09
DE3339625C2 true DE3339625C2 (OSRAM) 1991-01-31

Family

ID=6213274

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19833339625 Granted DE3339625A1 (de) 1983-11-02 1983-11-02 Vorrichtung zum anreichern eines traegergases mit dem dampf eines wenig fluechtigen stoffes

Country Status (4)

Country Link
JP (1) JPS61110766A (OSRAM)
DE (1) DE3339625A1 (OSRAM)
FR (1) FR2554131B1 (OSRAM)
GB (1) GB2151662B (OSRAM)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19638100C1 (de) * 1996-09-18 1998-03-05 Fraunhofer Ges Forschung Vorrichtung zum Erzeugen eines dampfförmigen Reaktionsproduktes aus Feststoffteilen
US7122085B2 (en) 2002-07-30 2006-10-17 Asm America, Inc. Sublimation bed employing carrier gas guidance structures
US7156380B2 (en) 2003-09-29 2007-01-02 Asm International, N.V. Safe liquid source containers
US7601225B2 (en) 2002-06-17 2009-10-13 Asm International N.V. System for controlling the sublimation of reactants
US7833353B2 (en) 2007-01-24 2010-11-16 Asm Japan K.K. Liquid material vaporization apparatus for semiconductor processing apparatus
US8012876B2 (en) 2008-12-02 2011-09-06 Asm International N.V. Delivery of vapor precursor from solid source
US8343583B2 (en) 2008-07-10 2013-01-01 Asm International N.V. Method for vaporizing non-gaseous precursor in a fluidized bed
US9117773B2 (en) 2009-08-26 2015-08-25 Asm America, Inc. High concentration water pulses for atomic layer deposition

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3702923A1 (de) * 1987-01-31 1988-08-11 Philips Patentverwaltung Vorrichtung zum anreichern eines traegergases mit dem dampf eines wenig fluechtigen stoffes
DE3801147A1 (de) * 1988-01-16 1989-07-27 Philips Patentverwaltung Vorrichtung zum erzeugen eines mit dem dampf eines wenig fluechtigen stoffes angereicherten gasstroms
JPH0269389A (ja) * 1988-08-31 1990-03-08 Toyo Stauffer Chem Co 有機金属気相成長法における固体有機金属化合物の飽和蒸気生成方法
DE3931189A1 (de) * 1989-09-19 1991-03-28 Philips Patentverwaltung Vorrichtung und verfahren zum erzeugen eines mit dem dampf eines wenig fluechtigen stoffes angereicherten gasstroms
JPH0513166U (ja) * 1991-08-06 1993-02-23 ダイワ精工株式会社 魚釣用リ−ルの釣糸止め装置
US7186385B2 (en) 2002-07-17 2007-03-06 Applied Materials, Inc. Apparatus for providing gas to a processing chamber
KR101480971B1 (ko) 2006-10-10 2015-01-09 에이에스엠 아메리카, 인코포레이티드 전구체 전달 시스템
US7775508B2 (en) 2006-10-31 2010-08-17 Applied Materials, Inc. Ampoule for liquid draw and vapor draw with a continuous level sensor
US8146896B2 (en) 2008-10-31 2012-04-03 Applied Materials, Inc. Chemical precursor ampoule for vapor deposition processes
US11926894B2 (en) 2016-09-30 2024-03-12 Asm Ip Holding B.V. Reactant vaporizer and related systems and methods
US10876205B2 (en) 2016-09-30 2020-12-29 Asm Ip Holding B.V. Reactant vaporizer and related systems and methods
US11634812B2 (en) 2018-08-16 2023-04-25 Asm Ip Holding B.V. Solid source sublimator
US11624113B2 (en) 2019-09-13 2023-04-11 Asm Ip Holding B.V. Heating zone separation for reactant evaporation system
US12054825B2 (en) 2021-06-22 2024-08-06 Applied Materials, Inc. Bottom fed sublimation bed for high saturation efficiency in semiconductor applications

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1204588A (fr) * 1958-04-22 1960-01-27 E F Drew & Co Appareil permettant de réaliser des réactions chimiques continues
FR1532742A (fr) * 1967-07-19 1968-07-12 Bristol Aeroplane Plastics Ltd Procédé et dispositif pour mélanger les fluides
FR1581523A (OSRAM) * 1968-05-08 1969-09-19
US3801073A (en) * 1972-12-27 1974-04-02 Kates W Co Fluid mixer
US4129624A (en) * 1977-05-13 1978-12-12 The W. A. Kates Company Fluid mixer
JPS5635426A (en) * 1979-08-31 1981-04-08 Fujitsu Ltd Vapor-phase epitaxial growth device
DE3136895A1 (de) * 1981-09-17 1983-03-31 Philips Patentverwaltung Gmbh, 2000 Hamburg "vorrichtung zum verdampfen von ausgangsstoffen fuer die reaktive abscheidung aus der gasphase"

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19638100C1 (de) * 1996-09-18 1998-03-05 Fraunhofer Ges Forschung Vorrichtung zum Erzeugen eines dampfförmigen Reaktionsproduktes aus Feststoffteilen
US7601225B2 (en) 2002-06-17 2009-10-13 Asm International N.V. System for controlling the sublimation of reactants
US7851019B2 (en) 2002-06-17 2010-12-14 Asm International N.V. Method for controlling the sublimation of reactants
US8309173B2 (en) 2002-06-17 2012-11-13 Asm International N.V. System for controlling the sublimation of reactants
US7122085B2 (en) 2002-07-30 2006-10-17 Asm America, Inc. Sublimation bed employing carrier gas guidance structures
US7156380B2 (en) 2003-09-29 2007-01-02 Asm International, N.V. Safe liquid source containers
US7497420B2 (en) 2003-09-29 2009-03-03 Asm International, N.V. Safe liquid source containers
US7971861B2 (en) 2003-09-29 2011-07-05 Asm International N.V. Safe liquid source containers
US7833353B2 (en) 2007-01-24 2010-11-16 Asm Japan K.K. Liquid material vaporization apparatus for semiconductor processing apparatus
US8343583B2 (en) 2008-07-10 2013-01-01 Asm International N.V. Method for vaporizing non-gaseous precursor in a fluidized bed
US8012876B2 (en) 2008-12-02 2011-09-06 Asm International N.V. Delivery of vapor precursor from solid source
US9117773B2 (en) 2009-08-26 2015-08-25 Asm America, Inc. High concentration water pulses for atomic layer deposition

Also Published As

Publication number Publication date
GB2151662B (en) 1986-07-23
JPH0530908B2 (OSRAM) 1993-05-11
FR2554131A1 (fr) 1985-05-03
GB2151662A (en) 1985-07-24
DE3339625A1 (de) 1985-05-09
FR2554131B1 (fr) 1988-10-14
JPS61110766A (ja) 1986-05-29
GB8427276D0 (en) 1984-12-05

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Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
D2 Grant after examination
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee