DE3142766A1 - "verfahren zur herstellung eines magnetischen filmfoermigen targets zum bedampfen" - Google Patents
"verfahren zur herstellung eines magnetischen filmfoermigen targets zum bedampfen"Info
- Publication number
- DE3142766A1 DE3142766A1 DE19813142766 DE3142766A DE3142766A1 DE 3142766 A1 DE3142766 A1 DE 3142766A1 DE 19813142766 DE19813142766 DE 19813142766 DE 3142766 A DE3142766 A DE 3142766A DE 3142766 A1 DE3142766 A1 DE 3142766A1
- Authority
- DE
- Germany
- Prior art keywords
- magnetic
- film
- target
- substrate
- metallic components
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 18
- 238000001704 evaporation Methods 0.000 title description 6
- 230000008020 evaporation Effects 0.000 title description 5
- 238000000034 method Methods 0.000 claims description 74
- 239000000758 substrate Substances 0.000 claims description 43
- 238000007740 vapor deposition Methods 0.000 claims description 32
- 239000000696 magnetic material Substances 0.000 claims description 25
- 238000000576 coating method Methods 0.000 claims description 22
- 239000011248 coating agent Substances 0.000 claims description 19
- 239000007858 starting material Substances 0.000 claims description 14
- 238000007733 ion plating Methods 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 12
- 239000000203 mixture Substances 0.000 claims description 12
- 239000000956 alloy Substances 0.000 claims description 10
- 230000015572 biosynthetic process Effects 0.000 claims description 9
- 229910001004 magnetic alloy Inorganic materials 0.000 claims description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 235000010724 Wisteria floribunda Nutrition 0.000 claims 1
- 239000010408 film Substances 0.000 description 25
- 150000002500 ions Chemical class 0.000 description 19
- 238000007796 conventional method Methods 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 239000007789 gas Substances 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 229910052688 Gadolinium Inorganic materials 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 229910052797 bismuth Inorganic materials 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000010025 steaming Methods 0.000 description 2
- 238000000889 atomisation Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/20—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by evaporation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
- H01F41/183—Sputtering targets therefor
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Thin Magnetic Films (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55151206A JPS5775414A (en) | 1980-10-28 | 1980-10-28 | Manufacture of magneti substance thin film target for sputtering |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE3142766A1 true DE3142766A1 (de) | 1982-06-24 |
Family
ID=15513547
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19813142766 Ceased DE3142766A1 (de) | 1980-10-28 | 1981-10-28 | "verfahren zur herstellung eines magnetischen filmfoermigen targets zum bedampfen" |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US4476000A (enExample) |
| JP (1) | JPS5775414A (enExample) |
| DE (1) | DE3142766A1 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4620872A (en) * | 1984-10-18 | 1986-11-04 | Mitsubishi Kinzoku Kabushiki Kaisha | Composite target material and process for producing the same |
| US6398924B1 (en) | 1999-06-29 | 2002-06-04 | International Business Machines Corporation | Spin valve sensor with improved pinning field between nickel oxide (NiO) pinning layer and pinned layer |
| US6277253B1 (en) * | 1999-10-06 | 2001-08-21 | Applied Materials, Inc. | External coating of tungsten or tantalum or other refractory metal on IMP coils |
| US6699375B1 (en) | 2000-06-29 | 2004-03-02 | Applied Materials, Inc. | Method of extending process kit consumable recycling life |
| SG11201401542YA (en) | 2012-03-15 | 2014-11-27 | Jx Nippon Mining & Metals Corp | Magnetic material sputtering target and manufacturing method thereof |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2729486A1 (de) * | 1976-07-01 | 1978-01-05 | Fujitsu Ltd | Verfahren zur herstellung einer magnetischen duennschicht |
| DE2832620A1 (de) * | 1977-07-25 | 1979-02-15 | Motorola Inc | Verfahren und vorrichtung zur zerstaeubung von ferromagnetischem material |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3350180A (en) * | 1967-10-31 | Magnetic device with alternating lami- na of magnetic material and non-mag- netic metal on a substrate | ||
| US3856579A (en) * | 1972-12-04 | 1974-12-24 | Battelle Development Corp | Sputtered magnetic materials comprising rare-earth metals and method of preparation |
| JPS5812728B2 (ja) * | 1974-12-10 | 1983-03-10 | 富士写真フイルム株式会社 | ジキキロクバイタイノ セイホウ |
| CH610013A5 (enExample) * | 1975-11-19 | 1979-03-30 | Battelle Memorial Institute | |
| EP0015692B1 (en) * | 1979-02-23 | 1983-07-27 | Sekisui Kagaku Kogyo Kabushiki Kaisha | A process for producing a magnetic recording medium |
-
1980
- 1980-10-28 JP JP55151206A patent/JPS5775414A/ja active Granted
-
1981
- 1981-10-21 US US06/313,286 patent/US4476000A/en not_active Expired - Fee Related
- 1981-10-28 DE DE19813142766 patent/DE3142766A1/de not_active Ceased
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2729486A1 (de) * | 1976-07-01 | 1978-01-05 | Fujitsu Ltd | Verfahren zur herstellung einer magnetischen duennschicht |
| DE2832620A1 (de) * | 1977-07-25 | 1979-02-15 | Motorola Inc | Verfahren und vorrichtung zur zerstaeubung von ferromagnetischem material |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5775414A (en) | 1982-05-12 |
| JPS614166B2 (enExample) | 1986-02-07 |
| US4476000A (en) | 1984-10-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8110 | Request for examination paragraph 44 | ||
| 8128 | New person/name/address of the agent |
Representative=s name: KADOR, U., DIPL.-CHEM. DR.RER.NAT., PAT.-ANW., 800 |
|
| 8131 | Rejection |