DE3030454A1 - Einrichtung zur grossflaechigen abscheidung von haftfesten, insbesondere harten kohlenstoffschichten - Google Patents

Einrichtung zur grossflaechigen abscheidung von haftfesten, insbesondere harten kohlenstoffschichten

Info

Publication number
DE3030454A1
DE3030454A1 DE19803030454 DE3030454A DE3030454A1 DE 3030454 A1 DE3030454 A1 DE 3030454A1 DE 19803030454 DE19803030454 DE 19803030454 DE 3030454 A DE3030454 A DE 3030454A DE 3030454 A1 DE3030454 A1 DE 3030454A1
Authority
DE
Germany
Prior art keywords
cathode
substrates
anode
hot cathode
reflector electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE19803030454
Other languages
German (de)
English (en)
Other versions
DE3030454C2 (de
Inventor
Helmut 8046 Dresden Bollinger
Dipl.-Phys. Bernd 8021 Dresden Bücken
Dipl.-Ing. Rüdiger 8019 Dresden Wilberg
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hochvakuum Dresden VEB
Original Assignee
Hochvakuum Dresden VEB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hochvakuum Dresden VEB filed Critical Hochvakuum Dresden VEB
Publication of DE3030454A1 publication Critical patent/DE3030454A1/de
Application granted granted Critical
Publication of DE3030454C2 publication Critical patent/DE3030454C2/de
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
DE19803030454 1979-10-02 1980-08-12 Vorrichtung zur großflächigen Abscheidung von haftfesten, insbesondere harten Kohlenstoffschichten Expired DE3030454C2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD21595179A DD146307A1 (de) 1979-10-02 1979-10-02 Einrichtung zur grossflaechigen haftfesten abscheidung,insbesondere von kohlenstoffschichten

Publications (2)

Publication Number Publication Date
DE3030454A1 true DE3030454A1 (de) 1981-04-16
DE3030454C2 DE3030454C2 (de) 1987-04-02

Family

ID=5520396

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19803030454 Expired DE3030454C2 (de) 1979-10-02 1980-08-12 Vorrichtung zur großflächigen Abscheidung von haftfesten, insbesondere harten Kohlenstoffschichten

Country Status (4)

Country Link
JP (1) JPS5941509B2 (US06878557-20050412-C00065.png)
CH (1) CH653708A5 (US06878557-20050412-C00065.png)
DD (1) DD146307A1 (US06878557-20050412-C00065.png)
DE (1) DE3030454C2 (US06878557-20050412-C00065.png)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4504519A (en) * 1981-10-21 1985-03-12 Rca Corporation Diamond-like film and process for producing same

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3246361A1 (de) * 1982-02-27 1983-09-08 Philips Patentverwaltung Gmbh, 2000 Hamburg Kohlenstoff enthaltende gleitschicht
US6804791B2 (en) 1990-03-23 2004-10-12 Matsushita Electric Industrial Co., Ltd. Data processing apparatus
JPH0560537U (ja) * 1992-01-22 1993-08-10 弘 小川 厨房用塵芥処理装置
JP4080503B2 (ja) 2005-10-03 2008-04-23 中部日本マルコ株式会社 非接触コネクタ

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
NICHTS-ERMITTELT *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4504519A (en) * 1981-10-21 1985-03-12 Rca Corporation Diamond-like film and process for producing same

Also Published As

Publication number Publication date
JPS56102576A (en) 1981-08-17
DD146307A1 (de) 1981-02-04
JPS5941509B2 (ja) 1984-10-08
DE3030454C2 (de) 1987-04-02
CH653708A5 (en) 1986-01-15

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Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
D2 Grant after examination
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee