DE2853875A1 - Verfahren zur herstellung eines cadmiumstannat-films - Google Patents
Verfahren zur herstellung eines cadmiumstannat-filmsInfo
- Publication number
- DE2853875A1 DE2853875A1 DE19782853875 DE2853875A DE2853875A1 DE 2853875 A1 DE2853875 A1 DE 2853875A1 DE 19782853875 DE19782853875 DE 19782853875 DE 2853875 A DE2853875 A DE 2853875A DE 2853875 A1 DE2853875 A1 DE 2853875A1
- Authority
- DE
- Germany
- Prior art keywords
- cadmium
- target
- sputtering
- tin
- sno
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 229910052793 cadmium Inorganic materials 0.000 title claims description 16
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 title claims description 10
- 229940071182 stannate Drugs 0.000 title claims description 8
- 238000004519 manufacturing process Methods 0.000 title claims description 4
- 238000004544 sputter deposition Methods 0.000 claims description 26
- 238000000034 method Methods 0.000 claims description 21
- 239000000758 substrate Substances 0.000 claims description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 7
- 229910001092 metal group alloy Inorganic materials 0.000 claims description 7
- 239000001301 oxygen Substances 0.000 claims description 7
- 229910052760 oxygen Inorganic materials 0.000 claims description 7
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 6
- 238000001552 radio frequency sputter deposition Methods 0.000 claims description 4
- 238000011067 equilibration Methods 0.000 claims description 2
- 239000010408 film Substances 0.000 description 16
- 239000002184 metal Substances 0.000 description 14
- 229910052751 metal Inorganic materials 0.000 description 14
- 239000000919 ceramic Substances 0.000 description 8
- 238000000151 deposition Methods 0.000 description 5
- 230000008021 deposition Effects 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910006404 SnO 2 Inorganic materials 0.000 description 2
- CSBHIHQQSASAFO-UHFFFAOYSA-N [Cd].[Sn] Chemical compound [Cd].[Sn] CSBHIHQQSASAFO-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000007731 hot pressing Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 230000008646 thermal stress Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910000925 Cd alloy Inorganic materials 0.000 description 1
- XZMCDFZZKTWFGF-UHFFFAOYSA-N Cyanamide Chemical compound NC#N XZMCDFZZKTWFGF-UHFFFAOYSA-N 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- HNQGTZYKXIXXST-UHFFFAOYSA-N calcium;dioxido(oxo)tin Chemical compound [Ca+2].[O-][Sn]([O-])=O HNQGTZYKXIXXST-UHFFFAOYSA-N 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
- C03C17/2453—Coating containing SnO2
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
Landscapes
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- General Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Physical Vapour Deposition (AREA)
- Photovoltaic Devices (AREA)
- Conductive Materials (AREA)
- Manufacturing Of Electric Cables (AREA)
- Coating By Spraying Or Casting (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US87345178A | 1978-01-30 | 1978-01-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2853875A1 true DE2853875A1 (de) | 1979-08-02 |
Family
ID=25361663
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19782853875 Withdrawn DE2853875A1 (de) | 1978-01-30 | 1978-12-13 | Verfahren zur herstellung eines cadmiumstannat-films |
Country Status (11)
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3103509A1 (de) * | 1981-02-03 | 1982-08-12 | Günter Dipl.-Phys. 6601 Heusweiler Kleer | Verfahren zum herstellen duenner schichten, target zum durchfuehren dieses verfahrens und verfahren zum erzeugen dieses targets |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63114159U (enrdf_load_html_response) * | 1987-01-19 | 1988-07-22 | ||
| US4806221A (en) * | 1987-03-26 | 1989-02-21 | Ppg Industries, Inc. | Sputtered films of bismuth/tin oxide |
| GB2256282A (en) * | 1991-04-02 | 1992-12-02 | Elmwood Sensors | Electrochromic device. |
| JPH04127042U (ja) * | 1991-05-14 | 1992-11-19 | 富士通テン株式会社 | 車載用部材の取付装置 |
| US6761985B2 (en) | 2000-10-05 | 2004-07-13 | Battelle Memorial Institute | Magnetic transparent conducting oxide film and method of making |
| TWI310408B (en) * | 2004-12-23 | 2009-06-01 | Ind Tech Res Inst | Cadmium tin oxide multi-layer laminate and its producing method |
| WO2009135114A2 (en) * | 2008-05-01 | 2009-11-05 | First Solar, Inc. | Transparent conductive materials including cadmium stannate |
| US9276142B2 (en) | 2010-12-17 | 2016-03-01 | First Solar, Inc. | Methods for forming a transparent oxide layer for a photovoltaic device |
| US8476105B2 (en) | 2010-12-22 | 2013-07-02 | General Electric Company | Method of making a transparent conductive oxide layer and a photovoltaic device |
| CN114657423B (zh) * | 2022-03-15 | 2023-03-24 | 先导薄膜材料（广东）有限公司 | 一种CdSn合金靶材及其制备方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB732891A (en) * | 1949-03-25 | 1955-06-29 | Megatron Ltd | Improvements in and relating to the production of thin layers of chemical compounds on surfaces |
| US4040927A (en) * | 1975-11-19 | 1977-08-09 | Honeywell Inc. | Cadmium tellurite thin films |
-
1978
- 1978-10-12 CA CA313,265A patent/CA1111373A/en not_active Expired
- 1978-10-18 GB GB7840996A patent/GB2013724B/en not_active Expired
- 1978-10-18 AU AU40817/78A patent/AU521645B2/en not_active Expired
- 1978-11-07 NL NL7811077A patent/NL7811077A/xx not_active Application Discontinuation
- 1978-11-15 FR FR7832284A patent/FR2415864A1/fr active Granted
- 1978-11-29 BR BR7807832A patent/BR7807832A/pt unknown
- 1978-12-13 DE DE19782853875 patent/DE2853875A1/de not_active Withdrawn
-
1979
- 1979-01-10 IT IT47571/79A patent/IT1113734B/it active
- 1979-01-29 JP JP830679A patent/JPS54113096A/ja active Granted
- 1979-01-29 BE BE0/193120A patent/BE873761A/xx not_active IP Right Cessation
- 1979-01-30 ES ES477282A patent/ES477282A1/es not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3103509A1 (de) * | 1981-02-03 | 1982-08-12 | Günter Dipl.-Phys. 6601 Heusweiler Kleer | Verfahren zum herstellen duenner schichten, target zum durchfuehren dieses verfahrens und verfahren zum erzeugen dieses targets |
Also Published As
| Publication number | Publication date |
|---|---|
| BR7807832A (pt) | 1979-07-31 |
| IT7947571A0 (it) | 1979-01-10 |
| GB2013724B (en) | 1982-10-06 |
| GB2013724A (en) | 1979-08-15 |
| CA1111373A (en) | 1981-10-27 |
| FR2415864A1 (fr) | 1979-08-24 |
| FR2415864B1 (enrdf_load_html_response) | 1983-11-18 |
| NL7811077A (nl) | 1979-08-01 |
| BE873761A (fr) | 1979-07-30 |
| JPS6146921B2 (enrdf_load_html_response) | 1986-10-16 |
| IT1113734B (it) | 1986-01-20 |
| ES477282A1 (es) | 1979-10-16 |
| JPS54113096A (en) | 1979-09-04 |
| AU4081778A (en) | 1980-04-24 |
| AU521645B2 (en) | 1982-04-22 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8141 | Disposal/no request for examination |