DE2847369C2 - - Google Patents

Info

Publication number
DE2847369C2
DE2847369C2 DE2847369A DE2847369A DE2847369C2 DE 2847369 C2 DE2847369 C2 DE 2847369C2 DE 2847369 A DE2847369 A DE 2847369A DE 2847369 A DE2847369 A DE 2847369A DE 2847369 C2 DE2847369 C2 DE 2847369C2
Authority
DE
Germany
Prior art keywords
bit
line
counter
memory
word
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE2847369A
Other languages
German (de)
English (en)
Other versions
DE2847369A1 (de
Inventor
Fred K. Los Altos Hills Calif. Us Buelow
John J. Sunnyvale Calif. Us Zasio
Laurence H. Cupterino Calif. Us Cooke
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Publication of DE2847369A1 publication Critical patent/DE2847369A1/de
Application granted granted Critical
Publication of DE2847369C2 publication Critical patent/DE2847369C2/de
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
DE19782847369 1977-11-01 1978-10-31 Vorrichtung und verfahren zur abtastung eines elektronenstrahlenbuendels Granted DE2847369A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/847,485 US4147937A (en) 1977-11-01 1977-11-01 Electron beam exposure system method and apparatus

Publications (2)

Publication Number Publication Date
DE2847369A1 DE2847369A1 (de) 1979-05-03
DE2847369C2 true DE2847369C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1990-08-30

Family

ID=25300745

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19782847369 Granted DE2847369A1 (de) 1977-11-01 1978-10-31 Vorrichtung und verfahren zur abtastung eines elektronenstrahlenbuendels

Country Status (6)

Country Link
US (1) US4147937A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS5472683A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CA (1) CA1094668A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE2847369A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
FR (1) FR2407567A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
NL (1) NL183682C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5493364A (en) * 1977-12-30 1979-07-24 Fujitsu Ltd Exposure system for electron beam
US4280186A (en) * 1978-07-07 1981-07-21 Tokyo Shibaura Denki Kabushiki Kaisha Exposure apparatus using electron beams
WO1980002772A1 (en) * 1979-06-08 1980-12-11 Fujitsu Ltd Electron beam projecting system
JPS55165632A (en) * 1979-06-12 1980-12-24 Fujitsu Ltd Method for electron-beam exposure
US4484077A (en) * 1979-06-08 1984-11-20 Fujitsu Limited Exposure system and method using an electron beam
JPS5753938A (en) * 1980-09-17 1982-03-31 Toshiba Corp Electron beam exposure apparatus
EP0053225B1 (en) * 1980-11-28 1985-03-13 International Business Machines Corporation Electron beam system and method
JPS57204125A (en) * 1981-06-10 1982-12-14 Hitachi Ltd Electron-ray drawing device
US4477729A (en) * 1982-10-01 1984-10-16 International Business Machines Corporation Continuously writing electron beam stitched pattern exposure system
JPS59124719A (ja) * 1982-12-29 1984-07-18 Fujitsu Ltd 電子ビ−ム露光装置
JPH0793250B2 (ja) * 1984-09-21 1995-10-09 株式会社東芝 パタ−ン形成方法
US4698509A (en) * 1985-02-14 1987-10-06 Varian Associates, Inc. High speed pattern generator for electron beam lithography
US4837447A (en) * 1986-05-06 1989-06-06 Research Triangle Institute, Inc. Rasterization system for converting polygonal pattern data into a bit-map
JPS62277724A (ja) * 1986-05-27 1987-12-02 Fujitsu Ltd 電子ビ−ム露光装置
JP2880284B2 (ja) * 1990-11-30 1999-04-05 株式会社日立製作所 電子ビーム描画法および装置
US5251140A (en) * 1991-07-26 1993-10-05 International Business Machines Corporation E-beam control data compaction system and method
US5159201A (en) * 1991-07-26 1992-10-27 International Business Machines Corporation Shape decompositon system and method
US5294800A (en) * 1992-07-31 1994-03-15 International Business Machines Corporation E-beam control data compaction system and method
RU2164718C1 (ru) * 2000-07-04 2001-03-27 Общество с ограниченной ответственностью "Агентство маркетинга научных разработок" Установка для формирования наноструктур на поверхности полупроводниковых пластин ионными пучками
DE102004055149B4 (de) * 2004-11-16 2007-07-19 Leica Microsystems Lithography Gmbh Vorrichtung und Verfahren zum Abbilden eines Mehrfach-Partikelstrahls auf ein Substrat

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3866013A (en) * 1973-09-19 1975-02-11 Ibm Method and apparatus for controlling movable means such as an electron beam
US3900737A (en) * 1974-04-18 1975-08-19 Bell Telephone Labor Inc Electron beam exposure system
JPS5148313A (ja) * 1974-10-23 1976-04-26 Hitachi Ltd Fudogatajikihetsudoroodeingukiko
JPS51147967A (en) * 1975-06-14 1976-12-18 Fujitsu Ltd Method of controlling spot exposure
JPS5283177A (en) * 1975-12-31 1977-07-11 Fujitsu Ltd Electron beam exposure device

Also Published As

Publication number Publication date
NL7810809A (nl) 1979-05-03
DE2847369A1 (de) 1979-05-03
JPS5728946B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1982-06-19
JPS5472683A (en) 1979-06-11
NL183682B (nl) 1988-07-18
FR2407567B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1981-07-17
US4147937A (en) 1979-04-03
FR2407567A1 (fr) 1979-05-25
CA1094668A (en) 1981-01-27
NL183682C (nl) 1988-12-16

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Legal Events

Date Code Title Description
OAP Request for examination filed
OD Request for examination
D2 Grant after examination
8380 Miscellaneous part iii

Free format text: DIE ENTGEGENGEHALTENE DRUCKSCHRIFT "DE-OS 26 59 625" AENDERN IN "DE-OS 26 59 247"

8381 Inventor (new situation)

Free format text: BUELOW, FRED K., LOS ALTOS HILLS, CALIF., US ZASIO, JOHN J., SUNNYVALE, CALIF., US COOKE, LAURENCE H., CUPERTINO, CALIF., US

8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Free format text: BLUMBACH, KRAMER & PARTNER, 81245 MUENCHEN