DE2760154C2 - Vorrichtung für akustische Oberflächenwellen - Google Patents

Vorrichtung für akustische Oberflächenwellen

Info

Publication number
DE2760154C2
DE2760154C2 DE2760154A DE2760154A DE2760154C2 DE 2760154 C2 DE2760154 C2 DE 2760154C2 DE 2760154 A DE2760154 A DE 2760154A DE 2760154 A DE2760154 A DE 2760154A DE 2760154 C2 DE2760154 C2 DE 2760154C2
Authority
DE
Germany
Prior art keywords
substrate
surface acoustic
depth
acoustic wave
wave device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE2760154A
Other languages
German (de)
English (en)
Inventor
Toshio Yokohama Kanagawa Sudo
Sadao Tokio/Tokyo Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP13372076A external-priority patent/JPS5828770B2/ja
Priority claimed from JP13372176A external-priority patent/JPS53108256A/ja
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Application granted granted Critical
Publication of DE2760154C2 publication Critical patent/DE2760154C2/de
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/46—Filters
    • H03H9/64—Filters using surface acoustic waves
    • H03H9/6489—Compensation of undesirable effects
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02535—Details of surface acoustic wave devices
    • H03H9/02543—Characteristics of substrate, e.g. cutting angles
    • H03H9/02559—Characteristics of substrate, e.g. cutting angles of lithium niobate or lithium-tantalate substrates
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02535—Details of surface acoustic wave devices
    • H03H9/02614—Treatment of substrates, e.g. curved, spherical, cylindrical substrates ensuring closed round-about circuits for the acoustical waves
    • H03H9/02622—Treatment of substrates, e.g. curved, spherical, cylindrical substrates ensuring closed round-about circuits for the acoustical waves of the surface, including back surface
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02535—Details of surface acoustic wave devices
    • H03H9/02818—Means for compensation or elimination of undesirable effects
    • H03H9/02866—Means for compensation or elimination of undesirable effects of bulk wave excitation and reflections

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
DE2760154A 1976-11-09 1977-11-09 Vorrichtung für akustische Oberflächenwellen Expired DE2760154C2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP13372076A JPS5828770B2 (ja) 1976-11-09 1976-11-09 弾性表面波装置
JP13372176A JPS53108256A (en) 1976-11-09 1976-11-09 Elastic surface wave device

Publications (1)

Publication Number Publication Date
DE2760154C2 true DE2760154C2 (de) 1984-12-20

Family

ID=26467994

Family Applications (2)

Application Number Title Priority Date Filing Date
DE2760154A Expired DE2760154C2 (de) 1976-11-09 1977-11-09 Vorrichtung für akustische Oberflächenwellen
DE2750144A Expired DE2750144C2 (de) 1976-11-09 1977-11-09 Vorichtung auf der Basis der akustischen Oberflächenwellen

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE2750144A Expired DE2750144C2 (de) 1976-11-09 1977-11-09 Vorichtung auf der Basis der akustischen Oberflächenwellen

Country Status (5)

Country Link
US (1) US4163201A (Direct)
CA (1) CA1089544A (Direct)
DE (2) DE2760154C2 (Direct)
FR (1) FR2370387A1 (Direct)
GB (1) GB1594339A (Direct)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58119219A (ja) * 1982-01-11 1983-07-15 Hitachi Ltd 弾性表面波装置
JPH0897675A (ja) * 1994-09-28 1996-04-12 Canon Inc 弾性表面波素子及びその作製方法及びそれを用いた通信装置
DE19626410A1 (de) * 1996-07-01 1998-01-08 Siemens Matsushita Components Substrat für mit akustischen Oberflächenwellen arbeitende Bauelemente
EP1017169B1 (en) * 1998-12-29 2005-03-16 Kabushiki Kaisha Toshiba Surface acoustic wave device
EP1454412B1 (en) 2001-11-06 2009-10-28 Avago Technologies Wireless IP (Singapore) Pte. Ltd. Filter device and method of fabricating a filter device
CN100566152C (zh) * 2002-09-12 2009-12-02 Nxp股份有限公司 具有抑制体声波滤波器中通带波纹的装置的体声波谐振器
JP2005303980A (ja) * 2004-03-15 2005-10-27 Matsushita Electric Ind Co Ltd 弾性表面波デバイスおよびその形成方法
JP5910636B2 (ja) * 2012-02-03 2016-04-27 株式会社村田製作所 弾性表面波素子及びそれを備えた複合モジュール
US9991870B2 (en) 2015-08-25 2018-06-05 Avago Technologies General Ip (Singapore) Pte. Ltd. Surface acoustic wave (SAW) resonator
US10523178B2 (en) * 2015-08-25 2019-12-31 Avago Technologies International Sales Pte. Limited Surface acoustic wave (SAW) resonator
US10020796B2 (en) * 2015-08-25 2018-07-10 Avago Technologies General Ip (Singapore) Pte. Ltd. Surface acoustic wave (SAW) resonator
US10469056B2 (en) 2015-08-25 2019-11-05 Avago Technologies International Sales Pte. Limited Acoustic filters integrated into single die
US10090822B2 (en) * 2015-08-25 2018-10-02 Avago Technologies General Ip (Singapore) Pte. Ltd. Surface acoustic wave (SAW) resonator
US10177734B2 (en) 2015-08-25 2019-01-08 Avago Technologies International Sales Pte. Limited Surface acoustic wave (SAW) resonator
US20170063330A1 (en) * 2015-08-25 2017-03-02 Avago Technologies General Ip (Singapore) Pte. Ltd. Surface acoustic wave (saw) resonator
US10536133B2 (en) 2016-04-22 2020-01-14 Avago Technologies International Sales Pte. Limited Composite surface acoustic wave (SAW) device with absorbing layer for suppression of spurious responses
US20180337657A1 (en) * 2015-09-25 2018-11-22 Avago Technologies General Ip (Singapore) Pte. Ltd. Acoustic wave resonator having antiresonant cavity
US20180241374A1 (en) * 2015-09-25 2018-08-23 Avago Technologies General Ip (Singapore) Pte. Ltd Acoustic wave resonator having antiresonant cavity
US9369111B1 (en) * 2015-10-28 2016-06-14 Resonant Inc. Fabrication of surface acoustic wave filters having plate modes
US10177735B2 (en) * 2016-02-29 2019-01-08 Avago Technologies International Sales Pte. Limited Surface acoustic wave (SAW) resonator
JP2018037719A (ja) * 2016-08-29 2018-03-08 株式会社村田製作所 弾性波装置
US11183987B2 (en) * 2019-09-26 2021-11-23 Avago Technologies International Sales Pte. Limited Acoustic resonator device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3818382A (en) * 1970-10-20 1974-06-18 Raytheon Co Surface wave delay line structures having reduced temperature coefficient of delay time
DE2440718A1 (de) * 1973-09-04 1975-03-13 Philips Nv Anordnung fuer akustische oberflaechenwellen und verfahren zur herstellung einer derartigen anordnung

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5099289A (Direct) * 1973-12-28 1975-08-06
FR2261654B1 (Direct) * 1974-02-15 1978-01-06 Thomson Csf
JPS5515887B2 (Direct) * 1974-09-09 1980-04-26
US4001767A (en) * 1975-11-18 1977-01-04 The United States Of America As Represented By The Secretary Of The Air Force Low diffraction loss-low spurious response LiTaO3 substrate for surface acoustic wave devices
JPS52114246A (en) * 1976-03-22 1977-09-24 Toshiba Corp Elastic surface wave device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3818382A (en) * 1970-10-20 1974-06-18 Raytheon Co Surface wave delay line structures having reduced temperature coefficient of delay time
DE2440718A1 (de) * 1973-09-04 1975-03-13 Philips Nv Anordnung fuer akustische oberflaechenwellen und verfahren zur herstellung einer derartigen anordnung

Also Published As

Publication number Publication date
CA1089544A (en) 1980-11-11
DE2750144C2 (de) 1984-09-20
US4163201A (en) 1979-07-31
FR2370387A1 (fr) 1978-06-02
GB1594339A (en) 1981-07-30
FR2370387B1 (Direct) 1983-10-14
DE2750144A1 (de) 1978-05-18

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Owner name: KABUSHIKI KAISHA TOSHIBA, KAWASAKI, KANAGAWA, JP

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Free format text: HENKEL, G., DR.PHIL. FEILER, L., DR.RER.NAT. HAENZEL, W., DIPL.-ING., PAT.-ANW., 8000 MUENCHEN