DE2749207C2 - Anordnung zum Aufbringen einer Substanzschicht auf einem Substrat mittels Mulekularstrahlen - Google Patents

Anordnung zum Aufbringen einer Substanzschicht auf einem Substrat mittels Mulekularstrahlen

Info

Publication number
DE2749207C2
DE2749207C2 DE2749207A DE2749207A DE2749207C2 DE 2749207 C2 DE2749207 C2 DE 2749207C2 DE 2749207 A DE2749207 A DE 2749207A DE 2749207 A DE2749207 A DE 2749207A DE 2749207 C2 DE2749207 C2 DE 2749207C2
Authority
DE
Germany
Prior art keywords
evaporation
molecules
molecular beams
applying
arrangement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE2749207A
Other languages
German (de)
English (en)
Other versions
DE2749207A1 (de
Inventor
Patrick Etienne
Nguyen Trong Bourg-la-Reine Linh
Jean Orsay Massies
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Publication of DE2749207A1 publication Critical patent/DE2749207A1/de
Application granted granted Critical
Publication of DE2749207C2 publication Critical patent/DE2749207C2/de
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/548—Controlling the composition
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S118/00—Coating apparatus
    • Y10S118/90—Semiconductor vapor doping
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/006—Apparatus
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/169—Vacuum deposition, e.g. including molecular beam epitaxy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
DE2749207A 1976-11-05 1977-11-03 Anordnung zum Aufbringen einer Substanzschicht auf einem Substrat mittels Mulekularstrahlen Expired DE2749207C2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7633471A FR2370320A1 (fr) 1976-11-05 1976-11-05 Systeme de regulation de flux moleculaires, et son application aux techniques de co-evaporation

Publications (2)

Publication Number Publication Date
DE2749207A1 DE2749207A1 (de) 1978-05-18
DE2749207C2 true DE2749207C2 (de) 1984-06-14

Family

ID=9179603

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2749207A Expired DE2749207C2 (de) 1976-11-05 1977-11-03 Anordnung zum Aufbringen einer Substanzschicht auf einem Substrat mittels Mulekularstrahlen

Country Status (4)

Country Link
US (1) US4160166A (https=)
DE (1) DE2749207C2 (https=)
FR (1) FR2370320A1 (https=)
GB (1) GB1545666A (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4172020A (en) * 1978-05-24 1979-10-23 Gould Inc. Method and apparatus for monitoring and controlling sputter deposition processes
JPS60225422A (ja) * 1984-04-24 1985-11-09 Hitachi Ltd 薄膜形成方法およびその装置
GB2158843A (en) * 1984-05-14 1985-11-20 Philips Electronic Associated Method of manufacturing a semiconductor device by molecular beam epitaxy
GB2162207B (en) * 1984-07-26 1989-05-10 Japan Res Dev Corp Semiconductor crystal growth apparatus
US5099557A (en) * 1988-07-08 1992-03-31 Engelsberg Audrey C Removal of surface contaminants by irradiation from a high-energy source
US5821175A (en) * 1988-07-08 1998-10-13 Cauldron Limited Partnership Removal of surface contaminants by irradiation using various methods to achieve desired inert gas flow over treated surface
US5531857A (en) * 1988-07-08 1996-07-02 Cauldron Limited Partnership Removal of surface contaminants by irradiation from a high energy source
AU7682594A (en) * 1993-09-08 1995-03-27 Uvtech Systems, Inc. Surface processing
US5814156A (en) * 1993-09-08 1998-09-29 Uvtech Systems Inc. Photoreactive surface cleaning

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3316386A (en) * 1964-05-20 1967-04-25 Bendix Corp Multiple evaporation rate monitor and control
US3654109A (en) * 1968-04-25 1972-04-04 Ibm Apparatus and method for measuring rate in flow processes

Also Published As

Publication number Publication date
GB1545666A (en) 1979-05-10
FR2370320A1 (fr) 1978-06-02
DE2749207A1 (de) 1978-05-18
FR2370320B1 (https=) 1979-03-30
US4160166A (en) 1979-07-03

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Legal Events

Date Code Title Description
OD Request for examination
8125 Change of the main classification

Ipc: H01J 49/26

D2 Grant after examination
8363 Opposition against the patent
8331 Complete revocation