DE2720410C2 - Cermet, Dehnungsmeßstreifen sowie Verfahren für dessen Wärmebehandlung - Google Patents

Cermet, Dehnungsmeßstreifen sowie Verfahren für dessen Wärmebehandlung

Info

Publication number
DE2720410C2
DE2720410C2 DE2720410A DE2720410A DE2720410C2 DE 2720410 C2 DE2720410 C2 DE 2720410C2 DE 2720410 A DE2720410 A DE 2720410A DE 2720410 A DE2720410 A DE 2720410A DE 2720410 C2 DE2720410 C2 DE 2720410C2
Authority
DE
Germany
Prior art keywords
resistance
cermet
change
temperature
strain gauges
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE2720410A
Other languages
German (de)
English (en)
Other versions
DE2720410A1 (de
Inventor
Thomas Sewall Oxnard Calif. Kirsch
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Gould Inc
Original Assignee
Gould Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gould Inc filed Critical Gould Inc
Publication of DE2720410A1 publication Critical patent/DE2720410A1/de
Application granted granted Critical
Publication of DE2720410C2 publication Critical patent/DE2720410C2/de
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C29/00—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides
    • C22C29/12—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides based on oxides
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/16—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring the deformation in a solid, e.g. by resistance strain gauge
    • G01B7/18—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring the deformation in a solid, e.g. by resistance strain gauge using change in resistance
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L1/00—Measuring force or stress, in general
    • G01L1/20—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
    • G01L1/22—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
    • G01L1/2287—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges constructional details of the strain gauges

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
  • Measurement Of Force In General (AREA)
  • Physical Vapour Deposition (AREA)
  • Non-Adjustable Resistors (AREA)
  • Adjustable Resistors (AREA)
DE2720410A 1976-05-06 1977-05-06 Cermet, Dehnungsmeßstreifen sowie Verfahren für dessen Wärmebehandlung Expired DE2720410C2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/683,714 US4100524A (en) 1976-05-06 1976-05-06 Electrical transducer and method of making

Publications (2)

Publication Number Publication Date
DE2720410A1 DE2720410A1 (de) 1977-11-24
DE2720410C2 true DE2720410C2 (de) 1983-06-09

Family

ID=24745154

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2720410A Expired DE2720410C2 (de) 1976-05-06 1977-05-06 Cermet, Dehnungsmeßstreifen sowie Verfahren für dessen Wärmebehandlung

Country Status (7)

Country Link
US (1) US4100524A (enExample)
JP (2) JPS52139992A (enExample)
CA (1) CA1086537A (enExample)
DE (1) DE2720410C2 (enExample)
FR (1) FR2350669A1 (enExample)
GB (1) GB1539315A (enExample)
NL (1) NL7704994A (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4298505A (en) * 1979-11-05 1981-11-03 Corning Glass Works Resistor composition and method of manufacture thereof
US4355692A (en) * 1980-11-24 1982-10-26 General Electric Company Thick film resistor force transducers and weighing scales
JPS5884401A (ja) * 1981-11-13 1983-05-20 株式会社日立製作所 抵抗体
JPS597234A (ja) * 1982-07-05 1984-01-14 Aisin Seiki Co Ltd 圧力センサ
JPS5975104A (ja) * 1982-10-22 1984-04-27 Tokyo Electric Co Ltd 歪センサ
US4433269A (en) * 1982-11-22 1984-02-21 Burroughs Corporation Air fireable ink
JPH0770367B2 (ja) * 1988-09-12 1995-07-31 株式会社豊田中央研究所 歪ゲージ用薄膜抵抗体
US4906968A (en) * 1988-10-04 1990-03-06 Cornell Research Foundation, Inc. Percolating cermet thin film thermistor
US5367285A (en) * 1993-02-26 1994-11-22 Lake Shore Cryotronics, Inc. Metal oxy-nitride resistance films and methods of making the same
US5468936A (en) * 1993-03-23 1995-11-21 Philip Morris Incorporated Heater having a multiple-layer ceramic substrate and method of fabrication
CA2326228C (en) * 1999-11-19 2004-11-16 Vladimir I. Gorokhovsky Temperature regulator for a substrate in vapour deposition processes
DE10156160B4 (de) * 2001-11-15 2007-06-14 Siemens Ag Mechanisch-elektrischer Wandler
JP5311776B2 (ja) * 2006-10-10 2013-10-09 株式会社日立国際電気 基板処理装置及び半導体装置の製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3202951A (en) * 1961-08-16 1965-08-24 Krinsky Albert Alloys and electrical transducers
US3308528A (en) * 1963-11-06 1967-03-14 Ibm Fabrication of cermet film resistors to close tolerances
US3533760A (en) * 1965-04-02 1970-10-13 Sherritt Gordon Mines Ltd Dispersion strengthened nickel-chromium alloy composition
US3498832A (en) * 1967-03-16 1970-03-03 Motorola Inc Material and method for producing cermet resistors
US3922705A (en) * 1973-06-04 1975-11-25 Gen Electric Dielectrically isolated integral silicon diaphram or other semiconductor product
US4016644A (en) * 1974-03-18 1977-04-12 Kulite Semiconductor Products, Inc. Methods of fabricating low pressure silicon transducers
US3969278A (en) * 1974-03-26 1976-07-13 Yakov Dmitrievich Aksenov Metalloceramic current-conducting material and a method for preparing same
GB1447579A (en) * 1974-07-24 1976-08-25 Trw Inc Electrical resistor composition and resistor

Also Published As

Publication number Publication date
CA1086537A (en) 1980-09-30
US4100524A (en) 1978-07-11
FR2350669B1 (enExample) 1980-09-26
GB1539315A (en) 1979-01-31
NL7704994A (nl) 1977-11-08
DE2720410A1 (de) 1977-11-24
FR2350669A1 (fr) 1977-12-02
JPS5920604U (ja) 1984-02-08
JPS52139992A (en) 1977-11-22

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Legal Events

Date Code Title Description
OD Request for examination
D2 Grant after examination
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee