DE2702896C2 - Verfahren zur Herstellung von feinteiligen Metall- und/oder Metalloidoxiden durch Dampfphasenhydrolyse und Vorrichtung zur Durchführung des Verfahrens - Google Patents
Verfahren zur Herstellung von feinteiligen Metall- und/oder Metalloidoxiden durch Dampfphasenhydrolyse und Vorrichtung zur Durchführung des VerfahrensInfo
- Publication number
- DE2702896C2 DE2702896C2 DE2702896A DE2702896A DE2702896C2 DE 2702896 C2 DE2702896 C2 DE 2702896C2 DE 2702896 A DE2702896 A DE 2702896A DE 2702896 A DE2702896 A DE 2702896A DE 2702896 C2 DE2702896 C2 DE 2702896C2
- Authority
- DE
- Germany
- Prior art keywords
- burner
- fuel
- starting material
- hydrolysis
- hydrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000006460 hydrolysis reaction Methods 0.000 title claims description 33
- 229910052751 metal Inorganic materials 0.000 title claims description 27
- 239000002184 metal Substances 0.000 title claims description 27
- 230000007062 hydrolysis Effects 0.000 title claims description 25
- 229910052752 metalloid Inorganic materials 0.000 title claims description 25
- 238000000034 method Methods 0.000 title claims description 19
- 239000012808 vapor phase Substances 0.000 title claims description 10
- 150000002738 metalloids Chemical class 0.000 title claims description 8
- 239000000376 reactant Substances 0.000 claims description 31
- 239000000446 fuel Substances 0.000 claims description 29
- 238000009792 diffusion process Methods 0.000 claims description 23
- 239000007858 starting material Substances 0.000 claims description 21
- -1 metalloid halide Chemical class 0.000 claims description 19
- 238000006243 chemical reaction Methods 0.000 claims description 18
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 16
- 239000001257 hydrogen Substances 0.000 claims description 16
- 229910052739 hydrogen Inorganic materials 0.000 claims description 16
- 239000007789 gas Substances 0.000 claims description 15
- 239000000203 mixture Substances 0.000 claims description 15
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 9
- 239000001301 oxygen Substances 0.000 claims description 9
- 229910052760 oxygen Inorganic materials 0.000 claims description 9
- 238000002485 combustion reaction Methods 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 7
- 239000007787 solid Substances 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 40
- 239000000377 silicon dioxide Substances 0.000 description 20
- 239000000047 product Substances 0.000 description 13
- 230000008719 thickening Effects 0.000 description 10
- 239000011261 inert gas Substances 0.000 description 7
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 239000002737 fuel gas Substances 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 239000007800 oxidant agent Substances 0.000 description 5
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 239000007795 chemical reaction product Substances 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- 229920000728 polyester Polymers 0.000 description 4
- 239000000523 sample Substances 0.000 description 4
- 239000005049 silicon tetrachloride Substances 0.000 description 4
- 239000012265 solid product Substances 0.000 description 4
- 239000006227 byproduct Substances 0.000 description 3
- 229920001971 elastomer Polymers 0.000 description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 3
- 239000004753 textile Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000004438 BET method Methods 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 230000004323 axial length Effects 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000007865 diluting Methods 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- 239000000806 elastomer Substances 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 229910000039 hydrogen halide Inorganic materials 0.000 description 2
- 239000012433 hydrogen halide Substances 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- 238000010791 quenching Methods 0.000 description 2
- 230000000171 quenching effect Effects 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical class [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910021552 Vanadium(IV) chloride Inorganic materials 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- DAMJCWMGELCIMI-UHFFFAOYSA-N benzyl n-(2-oxopyrrolidin-3-yl)carbamate Chemical compound C=1C=CC=CC=1COC(=O)NC1CCNC1=O DAMJCWMGELCIMI-UHFFFAOYSA-N 0.000 description 1
- 239000002981 blocking agent Substances 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- NJKDOKBDBHYMAH-UHFFFAOYSA-N dibutyl(dichloro)silane Chemical compound CCCC[Si](Cl)(Cl)CCCC NJKDOKBDBHYMAH-UHFFFAOYSA-N 0.000 description 1
- KTQYJQFGNYHXMB-UHFFFAOYSA-N dichloro(methyl)silicon Chemical compound C[Si](Cl)Cl KTQYJQFGNYHXMB-UHFFFAOYSA-N 0.000 description 1
- HAQCYFVZKUAIEU-UHFFFAOYSA-N dichloro-fluoro-methylsilane Chemical compound C[Si](F)(Cl)Cl HAQCYFVZKUAIEU-UHFFFAOYSA-N 0.000 description 1
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000012757 flame retardant agent Substances 0.000 description 1
- 230000009969 flowable effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 238000007038 hydrochlorination reaction Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 229910001510 metal chloride Inorganic materials 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- 239000005048 methyldichlorosilane Substances 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 239000003345 natural gas Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000005053 propyltrichlorosilane Substances 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 239000013074 reference sample Substances 0.000 description 1
- 239000012763 reinforcing filler Substances 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 230000002000 scavenging effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- UBZYKBZMAMTNKW-UHFFFAOYSA-J titanium tetrabromide Chemical compound Br[Ti](Br)(Br)Br UBZYKBZMAMTNKW-UHFFFAOYSA-J 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- ZOYFEXPFPVDYIS-UHFFFAOYSA-N trichloro(ethyl)silane Chemical compound CC[Si](Cl)(Cl)Cl ZOYFEXPFPVDYIS-UHFFFAOYSA-N 0.000 description 1
- DOEHJNBEOVLHGL-UHFFFAOYSA-N trichloro(propyl)silane Chemical compound CCC[Si](Cl)(Cl)Cl DOEHJNBEOVLHGL-UHFFFAOYSA-N 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 229910001935 vanadium oxide Inorganic materials 0.000 description 1
- JTJFQBNJBPPZRI-UHFFFAOYSA-J vanadium tetrachloride Chemical compound Cl[V](Cl)(Cl)Cl JTJFQBNJBPPZRI-UHFFFAOYSA-J 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- DUNKXUFBGCUVQW-UHFFFAOYSA-J zirconium tetrachloride Chemical compound Cl[Zr](Cl)(Cl)Cl DUNKXUFBGCUVQW-UHFFFAOYSA-J 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
- C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/14—Methods for preparing oxides or hydroxides in general
- C01B13/20—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state
- C01B13/22—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state of halides or oxyhalides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Glass Melting And Manufacturing (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Silicon Compounds (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/653,116 US4048290A (en) | 1976-01-28 | 1976-01-28 | Process for the production of finely-divided metal and metalloid oxides |
Publications (2)
Publication Number | Publication Date |
---|---|
DE2702896A1 DE2702896A1 (de) | 1977-08-04 |
DE2702896C2 true DE2702896C2 (de) | 1987-04-30 |
Family
ID=24619558
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE2702896A Expired DE2702896C2 (de) | 1976-01-28 | 1977-01-25 | Verfahren zur Herstellung von feinteiligen Metall- und/oder Metalloidoxiden durch Dampfphasenhydrolyse und Vorrichtung zur Durchführung des Verfahrens |
Country Status (11)
Families Citing this family (55)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU529558B2 (en) * | 1978-12-20 | 1983-06-09 | Consortium Fur Elektrochemische Industrie Gmbh | Agglomereted mixtures of metel oxides |
DE2931585A1 (de) * | 1979-08-03 | 1981-02-12 | Degussa | Temperaturstabilisiertes, pyrogen hergestelltes aluminiumoxid-mischoxid, das verfahren zu seiner herstellung und verwendung |
DE2931810A1 (de) * | 1979-08-06 | 1981-02-19 | Degussa | Temperaturstabilisiertes siliciumdioxid-mischoxid, das verfahren zu seiner herstellung und verwendung |
US4292290A (en) * | 1980-04-16 | 1981-09-29 | Cabot Corporation | Process for the production of finely-divided metal and metalloid oxides |
JPS6395106A (ja) * | 1986-10-07 | 1988-04-26 | Chisso Corp | 炭化珪素の製造方法 |
US4937062A (en) * | 1988-03-07 | 1990-06-26 | Cabot Corporation | High surface area metal oxide foams and method of producing the same |
US5123836A (en) * | 1988-07-29 | 1992-06-23 | Chiyoda Corporation | Method for the combustion treatment of toxic gas-containing waste gas |
US5147630A (en) * | 1989-06-05 | 1992-09-15 | Reznek Steven R | Method of producing alumina foams |
US5342597A (en) * | 1990-11-14 | 1994-08-30 | Cabot Corporation | Process for uniformly moisturizing fumed silica |
US5344862A (en) * | 1991-10-25 | 1994-09-06 | Kimberly-Clark Corporation | Thermoplastic compositions and nonwoven webs prepared therefrom |
DE4235996A1 (de) * | 1992-10-24 | 1994-04-28 | Degussa | Flammenhydrolytisch hergestelltes Titandioxid-Mischoxid, Verfahren zu seiner Herstellung und Verwendung |
US5340560A (en) * | 1993-04-30 | 1994-08-23 | General Electric Company | Method for making fumed silica having a reduced aggregate size and product |
DE4322804A1 (de) * | 1993-07-08 | 1995-01-12 | Wacker Chemie Gmbh | Verfahren zur Herstellung von hochdisperser Kieselsäure und Vorrichtung zur Durchführung des Verfahrens |
US5494855A (en) * | 1994-04-06 | 1996-02-27 | Kimberly-Clark Corporation | Thermoplastic compositions and nonwoven webs prepared therefrom |
US5510093A (en) * | 1994-07-25 | 1996-04-23 | Alzeta Corporation | Combustive destruction of halogenated compounds |
US6524548B1 (en) | 1994-12-17 | 2003-02-25 | Degussa Ag | Zirconium dioxide powder, method of its production and use |
US5626786A (en) | 1995-04-17 | 1997-05-06 | Huntington; John H. | Labile bromine fire suppressants |
JP3409294B2 (ja) * | 1996-01-25 | 2003-05-26 | 株式会社豊田中央研究所 | 酸化物粉末の製造方法 |
DE19650500A1 (de) | 1996-12-05 | 1998-06-10 | Degussa | Dotierte, pyrogen hergestellte Oxide |
US7384680B2 (en) * | 1997-07-21 | 2008-06-10 | Nanogram Corporation | Nanoparticle-based power coatings and corresponding structures |
US6387531B1 (en) | 1998-07-27 | 2002-05-14 | Nanogram Corporation | Metal (silicon) oxide/carbon composite particles |
US6391494B2 (en) | 1999-05-13 | 2002-05-21 | Nanogram Corporation | Metal vanadium oxide particles |
US6503646B1 (en) * | 2000-08-28 | 2003-01-07 | Nanogram Corporation | High rate batteries |
US6099798A (en) * | 1997-10-31 | 2000-08-08 | Nanogram Corp. | Ultraviolet light block and photocatalytic materials |
US6726990B1 (en) | 1998-05-27 | 2004-04-27 | Nanogram Corporation | Silicon oxide particles |
US6106798A (en) * | 1997-07-21 | 2000-08-22 | Nanogram Corporation | Vanadium oxide nanoparticles |
US6290735B1 (en) | 1997-10-31 | 2001-09-18 | Nanogram Corporation | Abrasive particles for surface polishing |
US20090255189A1 (en) * | 1998-08-19 | 2009-10-15 | Nanogram Corporation | Aluminum oxide particles |
US6225007B1 (en) | 1999-02-05 | 2001-05-01 | Nanogram Corporation | Medal vanadium oxide particles |
US5938979A (en) * | 1997-10-31 | 1999-08-17 | Nanogram Corporation | Electromagnetic shielding |
DE19954261A1 (de) * | 1998-11-26 | 2000-05-31 | Degussa | Verfahren und Vorrichtung zur Synthese von Feststoffen |
US6887566B1 (en) * | 1999-11-17 | 2005-05-03 | Cabot Corporation | Ceria composition and process for preparing same |
US6658855B1 (en) * | 2000-03-01 | 2003-12-09 | Honeywell International Inc. | System for warming pressurized gas |
JP2001316115A (ja) * | 2000-03-28 | 2001-11-13 | Degussa Ag | ドーピングされた二酸化チタン |
JP2005534149A (ja) * | 2002-07-22 | 2005-11-10 | ナノグラム・コーポレイション | 大容量および高出力バッテリー |
JP3687098B2 (ja) * | 2002-12-11 | 2005-08-24 | 株式会社ノーリツ | 燃焼管及びこの燃焼管を備えたガス燃焼機器 |
EP1697260B1 (en) * | 2003-12-03 | 2012-07-11 | Evonik Degussa GmbH | Flame-hydrolysis for the production of titanium dioxide powder |
CA2512313A1 (en) * | 2004-07-20 | 2006-01-20 | E.I. Dupont De Nemours And Company | Apparatus for making metal oxide nanopowder |
CA2512317A1 (en) * | 2004-07-20 | 2006-01-20 | E.I. Dupont De Nemours And Company | Process for making metal oxide nanoparticles |
KR101502161B1 (ko) * | 2005-01-12 | 2015-03-12 | 이클립스 에어로스페이스, 인크. | 화재 진압 시스템 |
RU2282589C1 (ru) * | 2005-05-18 | 2006-08-27 | Открытое Акционерное Общество Рязанский завод по производству и обработке цветных металлов "ОАО РЯЗЦВЕТМЕТ" | Способ получения полуторной окиси сурьмы |
WO2007127232A2 (en) * | 2006-04-28 | 2007-11-08 | Cabot Corporation | Process for the production of fumed silica |
CN103333526A (zh) | 2007-01-03 | 2013-10-02 | 内诺格雷姆公司 | 基于硅/锗的纳米颗粒油墨、掺杂型颗粒、用于半导体应用的印刷和方法 |
CN106241821B (zh) * | 2016-07-21 | 2018-07-03 | 宜昌南玻硅材料有限公司 | 一种纳米级气相法白炭黑原料的混合装置及方法 |
ES2776901T3 (es) | 2016-07-29 | 2020-08-03 | Evonik Degussa Gmbh | Procedimiento para la producción de un material termoaislante que contiene ácido silícico hidrófobo |
US11565974B2 (en) | 2017-01-18 | 2023-01-31 | Evonik Operations Gmbh | Granular thermal insulation material and method for producing the same |
DE102017209782A1 (de) | 2017-06-09 | 2018-12-13 | Evonik Degussa Gmbh | Verfahren zur Wärmedämmung eines evakuierbaren Behälters |
CN108101001B (zh) * | 2018-01-31 | 2023-08-22 | 广州汇富研究院有限公司 | 粉体材料制备装置 |
JP7184916B2 (ja) | 2018-03-05 | 2022-12-06 | エボニック オペレーションズ ゲーエムベーハー | エーロゲル材料を製造する方法 |
EP3823939A1 (en) | 2018-07-17 | 2021-05-26 | Evonik Operations GmbH | Thermal insulating composition based on fumed silica granulates, processes for its preparation and uses thereof |
EP3597615A1 (en) | 2018-07-17 | 2020-01-22 | Evonik Operations GmbH | Granular mixed oxide material and thermal insulating composition on its basis |
CN112424144B (zh) | 2018-07-18 | 2023-02-17 | 赢创运营有限公司 | 在环境压力下使基于二氧化硅的成型隔绝材料体疏水化的方法 |
US20230002627A1 (en) | 2020-01-14 | 2023-01-05 | Evonik Operations Gmbh | Silica-based hydrophobic granular material with an increased polarity |
KR20220127856A (ko) | 2020-01-14 | 2022-09-20 | 에보니크 오퍼레이션즈 게엠베하 | 개질된 표면 활성을 갖는 발연 실리카 |
PL4043398T3 (pl) | 2021-02-11 | 2023-11-06 | Evonik Operations Gmbh | Krzemionka o zmniejszonym ładunku elektrostatycznym do zastosowań tonera |
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Publication number | Priority date | Publication date | Assignee | Title |
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US3130008A (en) * | 1949-11-23 | 1964-04-21 | Cabot Corp | Method of preparing metallic oxides by hydrolysis of metallic halides |
DE974793C (de) * | 1952-04-02 | 1961-04-27 | Degussa | Verfahren zur Herstellung von feinverteilten Oxyden |
GB726250A (en) * | 1952-04-02 | 1955-03-16 | Degussa | Process for the production of finely divided oxides |
NL112542C (enrdf_load_stackoverflow) * | 1952-04-02 | |||
DE974974C (de) * | 1953-07-19 | 1961-06-22 | Degussa | Verfahren zur Herstellung von feinverteilten Oxyden |
US3086851A (en) * | 1957-10-10 | 1963-04-23 | Degussa | Burner for production of finely divided oxides |
US3006738A (en) * | 1957-10-10 | 1961-10-31 | Degussa | Burner for production of finely divided oxides |
US2990249A (en) * | 1958-10-09 | 1961-06-27 | Degussa | Process of preparing finely divided oxides by hydrolysis |
US2957753A (en) * | 1958-11-05 | 1960-10-25 | American Cyanamid Co | Titanium dioxide from titanium tetrachloride |
US3069281A (en) * | 1959-10-26 | 1962-12-18 | Pittsburgh Plate Glass Co | Method of preparing metal oxides |
US3062621A (en) * | 1960-07-07 | 1962-11-06 | American Cyanamid Co | Titanium dioxide pigment and compositions containing the same |
NL129085C (enrdf_load_stackoverflow) * | 1963-04-13 | |||
GB1092883A (en) * | 1963-06-10 | 1967-11-29 | Laporte Titanium Ltd | Improvements in and relating to the manufacture of oxides |
FR1437011A (fr) * | 1964-07-01 | 1966-04-29 | Pittsburgh Plate Glass Co | Procédé de fabrication d'oxydes métalliques, notamment d'oxydes métalliques pigmentaires |
US3694168A (en) * | 1967-03-06 | 1972-09-26 | Titan Gmbh | Means for producing pyrogenic titanium dioxide pigment |
US3647377A (en) * | 1968-08-29 | 1972-03-07 | Titan Gmbh | Process for the manufacture of fine particle size titanium dioxide by reacting titanium tetrachloride with oxygen |
US3663283A (en) * | 1969-10-02 | 1972-05-16 | Richard A Hebert | Process and apparatus for the production of finely-divided metal oxides |
US3959439A (en) * | 1971-09-14 | 1976-05-25 | Aluminum Company Of America | Aluminum chloride production process |
BE790704A (fr) * | 1971-10-28 | 1973-02-15 | Degussa | Procede pour la fabrication d'oxydes finement |
-
1976
- 1976-01-28 US US05/653,116 patent/US4048290A/en not_active Expired - Lifetime
-
1977
- 1977-01-25 DE DE2702896A patent/DE2702896C2/de not_active Expired
- 1977-01-26 GB GB3130/77A patent/GB1563272A/en not_active Expired
- 1977-01-27 LU LU76647A patent/LU76647A1/xx unknown
- 1977-01-27 IT IT67169/77A patent/IT1082721B/it active
- 1977-01-27 FR FR7702331A patent/FR2339569A1/fr active Granted
- 1977-01-27 JP JP733177A patent/JPS52110265A/ja active Granted
- 1977-01-27 DK DK034877A patent/DK152352C/da not_active IP Right Cessation
- 1977-01-28 NL NL7700950A patent/NL7700950A/xx not_active Application Discontinuation
- 1977-01-28 BE BE174500A patent/BE850891A/xx not_active IP Right Cessation
- 1977-01-28 IE IE187/77A patent/IE44365B1/en unknown
Also Published As
Publication number | Publication date |
---|---|
JPS52110265A (en) | 1977-09-16 |
DE2702896A1 (de) | 1977-08-04 |
NL7700950A (nl) | 1977-08-01 |
DK34877A (da) | 1977-07-29 |
DK152352B (da) | 1988-02-22 |
IT1082721B (it) | 1985-05-21 |
BE850891A (fr) | 1977-05-16 |
US4048290A (en) | 1977-09-13 |
FR2339569B1 (enrdf_load_stackoverflow) | 1983-05-27 |
DK152352C (da) | 1988-07-25 |
GB1563272A (en) | 1980-03-26 |
FR2339569A1 (fr) | 1977-08-26 |
IE44365L (en) | 1977-07-28 |
IE44365B1 (en) | 1981-11-04 |
JPS6154724B2 (enrdf_load_stackoverflow) | 1986-11-25 |
LU76647A1 (enrdf_load_stackoverflow) | 1977-06-24 |
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