DE2657643A1 - Halbleiteranordnung fuer ein speicherelement - Google Patents
Halbleiteranordnung fuer ein speicherelementInfo
- Publication number
- DE2657643A1 DE2657643A1 DE19762657643 DE2657643A DE2657643A1 DE 2657643 A1 DE2657643 A1 DE 2657643A1 DE 19762657643 DE19762657643 DE 19762657643 DE 2657643 A DE2657643 A DE 2657643A DE 2657643 A1 DE2657643 A1 DE 2657643A1
- Authority
- DE
- Germany
- Prior art keywords
- substrate
- conductivity type
- drain
- source
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000004065 semiconductor Substances 0.000 title claims description 15
- 230000015654 memory Effects 0.000 title claims description 14
- 239000000758 substrate Substances 0.000 claims description 20
- 238000003860 storage Methods 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 6
- 150000004767 nitrides Chemical class 0.000 claims description 6
- 230000005669 field effect Effects 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 238000002513 implantation Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- 229910052785 arsenic Inorganic materials 0.000 description 2
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000005513 bias potential Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000002784 hot electron Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000005496 tempering Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/01—Manufacture or treatment
- H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
- H10D30/0413—Manufacture or treatment of FETs having insulated gates [IGFET] of FETs having charge-trapping gate insulators, e.g. MNOS transistors
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/04—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
- G11C16/0466—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells with charge storage in an insulating layer, e.g. metal-nitride-oxide-silicon [MNOS], silicon-oxide-nitride-oxide-silicon [SONOS]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/69—IGFETs having charge trapping gate insulators, e.g. MNOS transistors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/17—Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
- H10D62/351—Substrate regions of field-effect devices
- H10D62/357—Substrate regions of field-effect devices of FETs
- H10D62/364—Substrate regions of field-effect devices of FETs of IGFETs
- H10D62/371—Inactive supplementary semiconductor regions, e.g. for preventing punch-through, improving capacity effect or leakage current
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
- H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
- H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Non-Volatile Memory (AREA)
- Semiconductor Memories (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/645,770 US4017888A (en) | 1975-12-31 | 1975-12-31 | Non-volatile metal nitride oxide semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2657643A1 true DE2657643A1 (de) | 1977-07-14 |
Family
ID=24590415
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19762657643 Withdrawn DE2657643A1 (de) | 1975-12-31 | 1976-12-20 | Halbleiteranordnung fuer ein speicherelement |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4017888A (OSRAM) |
| JP (1) | JPS5283183A (OSRAM) |
| DE (1) | DE2657643A1 (OSRAM) |
| FR (1) | FR2337402A1 (OSRAM) |
| GB (1) | GB1502587A (OSRAM) |
Families Citing this family (79)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4108686A (en) * | 1977-07-22 | 1978-08-22 | Rca Corp. | Method of making an insulated gate field effect transistor by implanted double counterdoping |
| US4173766A (en) * | 1977-09-16 | 1979-11-06 | Fairchild Camera And Instrument Corporation | Insulated gate field-effect transistor read-only memory cell |
| US4350991A (en) * | 1978-01-06 | 1982-09-21 | International Business Machines Corp. | Narrow channel length MOS field effect transistor with field protection region for reduced source-to-substrate capacitance |
| US4353083A (en) * | 1978-11-27 | 1982-10-05 | Ncr Corporation | Low voltage nonvolatile memory device |
| US4250206A (en) * | 1978-12-11 | 1981-02-10 | Texas Instruments Incorporated | Method of making non-volatile semiconductor memory elements |
| WO1980001122A1 (en) * | 1978-11-27 | 1980-05-29 | Ncr Co | Semiconductor memory device |
| DE3018988A1 (de) * | 1980-05-17 | 1981-11-26 | Deutsche Itt Industries Gmbh, 7800 Freiburg | Isolierschicht-feldeffekttransistor |
| US4521796A (en) * | 1980-12-11 | 1985-06-04 | General Instrument Corporation | Memory implant profile for improved channel shielding in electrically alterable read only memory semiconductor device |
| JPS57145366A (en) * | 1980-12-11 | 1982-09-08 | Gen Instrument Corp | Electrically rewritable read only memory |
| JPS5833870A (ja) * | 1981-08-24 | 1983-02-28 | Hitachi Ltd | 半導体装置 |
| FR2569054B1 (fr) * | 1984-08-10 | 1986-11-28 | Eurotechnique Sa | Dispositif de neutralisation de l'acces a une zone a proteger d'un circuit integre |
| US4979005A (en) * | 1986-07-23 | 1990-12-18 | Texas Instruments Incorporated | Floating-gate memory cell with tailored doping profile |
| US5036375A (en) * | 1986-07-23 | 1991-07-30 | Texas Instruments Incorporated | Floating-gate memory cell with tailored doping profile |
| US5156990A (en) * | 1986-07-23 | 1992-10-20 | Texas Instruments Incorporated | Floating-gate memory cell with tailored doping profile |
| EP0311816A1 (de) * | 1987-10-15 | 1989-04-19 | BBC Brown Boveri AG | Halbleiterbauelement und Verfahren zu dessen Herstellung |
| IT1227821B (it) * | 1988-12-29 | 1991-05-07 | Sgs Thomson Microelectronics | Struttura di catena di contatti per il controllo della difettosita' di circuiti di memorie eprom |
| US5393683A (en) * | 1992-05-26 | 1995-02-28 | Micron Technology, Inc. | Method of making semiconductor devices having two-layer gate structure |
| WO1994010686A1 (en) * | 1992-11-02 | 1994-05-11 | Nvx Corporation | Flash memory system, and methods of constructing and utilizing same |
| US5622880A (en) * | 1994-08-18 | 1997-04-22 | Sun Microsystems, Inc. | Method of making a low power, high performance junction transistor |
| US6297096B1 (en) * | 1997-06-11 | 2001-10-02 | Saifun Semiconductors Ltd. | NROM fabrication method |
| IL125604A (en) | 1997-07-30 | 2004-03-28 | Saifun Semiconductors Ltd | Non-volatile electrically erasable and programmble semiconductor memory cell utilizing asymmetrical charge |
| US6768165B1 (en) | 1997-08-01 | 2004-07-27 | Saifun Semiconductors Ltd. | Two bit non-volatile electrically erasable and programmable semiconductor memory cell utilizing asymmetrical charge trapping |
| US6430077B1 (en) | 1997-12-12 | 2002-08-06 | Saifun Semiconductors Ltd. | Method for regulating read voltage level at the drain of a cell in a symmetric array |
| US6633496B2 (en) | 1997-12-12 | 2003-10-14 | Saifun Semiconductors Ltd. | Symmetric architecture for memory cells having widely spread metal bit lines |
| US6633499B1 (en) | 1997-12-12 | 2003-10-14 | Saifun Semiconductors Ltd. | Method for reducing voltage drops in symmetric array architectures |
| US6087208A (en) * | 1998-03-31 | 2000-07-11 | Advanced Micro Devices, Inc. | Method for increasing gate capacitance by using both high and low dielectric gate material |
| US6348711B1 (en) | 1998-05-20 | 2002-02-19 | Saifun Semiconductors Ltd. | NROM cell with self-aligned programming and erasure areas |
| US6215148B1 (en) | 1998-05-20 | 2001-04-10 | Saifun Semiconductors Ltd. | NROM cell with improved programming, erasing and cycling |
| US6429063B1 (en) | 1999-10-26 | 2002-08-06 | Saifun Semiconductors Ltd. | NROM cell with generally decoupled primary and secondary injection |
| US6396368B1 (en) | 1999-11-10 | 2002-05-28 | Hrl Laboratories, Llc | CMOS-compatible MEM switches and method of making |
| US6396741B1 (en) * | 2000-05-04 | 2002-05-28 | Saifun Semiconductors Ltd. | Programming of nonvolatile memory cells |
| US6928001B2 (en) * | 2000-12-07 | 2005-08-09 | Saifun Semiconductors Ltd. | Programming and erasing methods for a non-volatile memory cell |
| US6490204B2 (en) | 2000-05-04 | 2002-12-03 | Saifun Semiconductors Ltd. | Programming and erasing methods for a reference cell of an NROM array |
| US7217977B2 (en) * | 2004-04-19 | 2007-05-15 | Hrl Laboratories, Llc | Covert transformation of transistor properties as a circuit protection method |
| US6815816B1 (en) * | 2000-10-25 | 2004-11-09 | Hrl Laboratories, Llc | Implanted hidden interconnections in a semiconductor device for preventing reverse engineering |
| JP3881840B2 (ja) * | 2000-11-14 | 2007-02-14 | 独立行政法人産業技術総合研究所 | 半導体装置 |
| US6614692B2 (en) | 2001-01-18 | 2003-09-02 | Saifun Semiconductors Ltd. | EEPROM array and method for operation thereof |
| US6791191B2 (en) | 2001-01-24 | 2004-09-14 | Hrl Laboratories, Llc | Integrated circuits protected against reverse engineering and method for fabricating the same using vias without metal terminations |
| US7294935B2 (en) * | 2001-01-24 | 2007-11-13 | Hrl Laboratories, Llc | Integrated circuits protected against reverse engineering and method for fabricating the same using an apparent metal contact line terminating on field oxide |
| US6584017B2 (en) | 2001-04-05 | 2003-06-24 | Saifun Semiconductors Ltd. | Method for programming a reference cell |
| US6677805B2 (en) * | 2001-04-05 | 2004-01-13 | Saifun Semiconductors Ltd. | Charge pump stage with body effect minimization |
| US6636440B2 (en) | 2001-04-25 | 2003-10-21 | Saifun Semiconductors Ltd. | Method for operation of an EEPROM array, including refresh thereof |
| US6740942B2 (en) * | 2001-06-15 | 2004-05-25 | Hrl Laboratories, Llc. | Permanently on transistor implemented using a double polysilicon layer CMOS process with buried contact |
| US6774413B2 (en) | 2001-06-15 | 2004-08-10 | Hrl Laboratories, Llc | Integrated circuit structure with programmable connector/isolator |
| US6643181B2 (en) | 2001-10-24 | 2003-11-04 | Saifun Semiconductors Ltd. | Method for erasing a memory cell |
| US7098107B2 (en) * | 2001-11-19 | 2006-08-29 | Saifun Semiconductor Ltd. | Protective layer in memory device and method therefor |
| US6583007B1 (en) * | 2001-12-20 | 2003-06-24 | Saifun Semiconductors Ltd. | Reducing secondary injection effects |
| US6885585B2 (en) * | 2001-12-20 | 2005-04-26 | Saifun Semiconductors Ltd. | NROM NOR array |
| US6700818B2 (en) | 2002-01-31 | 2004-03-02 | Saifun Semiconductors Ltd. | Method for operating a memory device |
| US6897535B2 (en) * | 2002-05-14 | 2005-05-24 | Hrl Laboratories, Llc | Integrated circuit with reverse engineering protection |
| US6917544B2 (en) | 2002-07-10 | 2005-07-12 | Saifun Semiconductors Ltd. | Multiple use memory chip |
| US6826107B2 (en) * | 2002-08-01 | 2004-11-30 | Saifun Semiconductors Ltd. | High voltage insertion in flash memory cards |
| US7049667B2 (en) * | 2002-09-27 | 2006-05-23 | Hrl Laboratories, Llc | Conductive channel pseudo block process and circuit to inhibit reverse engineering |
| US7136304B2 (en) | 2002-10-29 | 2006-11-14 | Saifun Semiconductor Ltd | Method, system and circuit for programming a non-volatile memory array |
| US6979606B2 (en) * | 2002-11-22 | 2005-12-27 | Hrl Laboratories, Llc | Use of silicon block process step to camouflage a false transistor |
| WO2004055868A2 (en) * | 2002-12-13 | 2004-07-01 | Hrl Laboratories, Llc | Integrated circuit modification using well implants |
| US7178004B2 (en) | 2003-01-31 | 2007-02-13 | Yan Polansky | Memory array programming circuit and a method for using the circuit |
| US7142464B2 (en) * | 2003-04-29 | 2006-11-28 | Saifun Semiconductors Ltd. | Apparatus and methods for multi-level sensing in a memory array |
| US7123532B2 (en) | 2003-09-16 | 2006-10-17 | Saifun Semiconductors Ltd. | Operating array cells with matched reference cells |
| US7242063B1 (en) | 2004-06-29 | 2007-07-10 | Hrl Laboratories, Llc | Symmetric non-intrusive and covert technique to render a transistor permanently non-operable |
| US7317633B2 (en) | 2004-07-06 | 2008-01-08 | Saifun Semiconductors Ltd | Protection of NROM devices from charge damage |
| US7095655B2 (en) | 2004-08-12 | 2006-08-22 | Saifun Semiconductors Ltd. | Dynamic matching of signal path and reference path for sensing |
| US7638850B2 (en) | 2004-10-14 | 2009-12-29 | Saifun Semiconductors Ltd. | Non-volatile memory structure and method of fabrication |
| US7535765B2 (en) | 2004-12-09 | 2009-05-19 | Saifun Semiconductors Ltd. | Non-volatile memory device and method for reading cells |
| EP1684307A1 (en) | 2005-01-19 | 2006-07-26 | Saifun Semiconductors Ltd. | Method, circuit and systems for erasing one or more non-volatile memory cells |
| US8053812B2 (en) | 2005-03-17 | 2011-11-08 | Spansion Israel Ltd | Contact in planar NROM technology |
| US7804126B2 (en) | 2005-07-18 | 2010-09-28 | Saifun Semiconductors Ltd. | Dense non-volatile memory array and method of fabrication |
| US7668017B2 (en) | 2005-08-17 | 2010-02-23 | Saifun Semiconductors Ltd. | Method of erasing non-volatile memory cells |
| US7221138B2 (en) * | 2005-09-27 | 2007-05-22 | Saifun Semiconductors Ltd | Method and apparatus for measuring charge pump output current |
| US20070087503A1 (en) * | 2005-10-17 | 2007-04-19 | Saifun Semiconductors, Ltd. | Improving NROM device characteristics using adjusted gate work function |
| US7352627B2 (en) | 2006-01-03 | 2008-04-01 | Saifon Semiconductors Ltd. | Method, system, and circuit for operating a non-volatile memory array |
| US7808818B2 (en) | 2006-01-12 | 2010-10-05 | Saifun Semiconductors Ltd. | Secondary injection for NROM |
| US7692961B2 (en) | 2006-02-21 | 2010-04-06 | Saifun Semiconductors Ltd. | Method, circuit and device for disturb-control of programming nonvolatile memory cells by hot-hole injection (HHI) and by channel hot-electron (CHE) injection |
| US7760554B2 (en) | 2006-02-21 | 2010-07-20 | Saifun Semiconductors Ltd. | NROM non-volatile memory and mode of operation |
| US8253452B2 (en) | 2006-02-21 | 2012-08-28 | Spansion Israel Ltd | Circuit and method for powering up an integrated circuit and an integrated circuit utilizing same |
| US7638835B2 (en) * | 2006-02-28 | 2009-12-29 | Saifun Semiconductors Ltd. | Double density NROM with nitride strips (DDNS) |
| US7701779B2 (en) | 2006-04-27 | 2010-04-20 | Sajfun Semiconductors Ltd. | Method for programming a reference cell |
| US7605579B2 (en) | 2006-09-18 | 2009-10-20 | Saifun Semiconductors Ltd. | Measuring and controlling current consumption and output current of charge pumps |
| US8168487B2 (en) * | 2006-09-28 | 2012-05-01 | Hrl Laboratories, Llc | Programmable connection and isolation of active regions in an integrated circuit using ambiguous features to confuse a reverse engineer |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3875567A (en) * | 1971-12-29 | 1975-04-01 | Sony Corp | Memory circuit using variable threshold level field-effect device |
| JPS4951879A (OSRAM) * | 1972-09-20 | 1974-05-20 | ||
| US3867204A (en) * | 1973-03-19 | 1975-02-18 | Motorola Inc | Manufacture of semiconductor devices |
| US3943542A (en) * | 1974-11-06 | 1976-03-09 | International Business Machines, Corporation | High reliability, low leakage, self-aligned silicon gate FET and method of fabricating same |
-
1975
- 1975-12-31 US US05/645,770 patent/US4017888A/en not_active Expired - Lifetime
-
1976
- 1976-11-16 GB GB47658/76A patent/GB1502587A/en not_active Expired
- 1976-11-19 FR FR7635304A patent/FR2337402A1/fr active Granted
- 1976-12-17 JP JP15103676A patent/JPS5283183A/ja active Granted
- 1976-12-20 DE DE19762657643 patent/DE2657643A1/de not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| FR2337402B1 (OSRAM) | 1980-10-24 |
| JPS5283183A (en) | 1977-07-11 |
| FR2337402A1 (fr) | 1977-07-29 |
| GB1502587A (en) | 1978-03-01 |
| JPS5531631B2 (OSRAM) | 1980-08-19 |
| US4017888A (en) | 1977-04-12 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8139 | Disposal/non-payment of the annual fee |