DE2642634A1 - Verfahren zum justieren von belichtungsmasken relativ zu einer substratscheibe - Google Patents
Verfahren zum justieren von belichtungsmasken relativ zu einer substratscheibeInfo
- Publication number
- DE2642634A1 DE2642634A1 DE19762642634 DE2642634A DE2642634A1 DE 2642634 A1 DE2642634 A1 DE 2642634A1 DE 19762642634 DE19762642634 DE 19762642634 DE 2642634 A DE2642634 A DE 2642634A DE 2642634 A1 DE2642634 A1 DE 2642634A1
- Authority
- DE
- Germany
- Prior art keywords
- adjustment
- alignment
- substrate wafer
- alignment marks
- row
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000000758 substrate Substances 0.000 title claims description 46
- 238000000034 method Methods 0.000 title claims description 30
- 238000000206 photolithography Methods 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 16
- 238000004519 manufacturing process Methods 0.000 description 10
- 229920002120 photoresistant polymer Polymers 0.000 description 9
- 235000012239 silicon dioxide Nutrition 0.000 description 8
- 239000000377 silicon dioxide Substances 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- 230000000295 complement effect Effects 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Projection-Type Copiers In General (AREA)
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19762642634 DE2642634A1 (de) | 1976-09-22 | 1976-09-22 | Verfahren zum justieren von belichtungsmasken relativ zu einer substratscheibe |
| FR7726943A FR2365824A1 (fr) | 1976-09-22 | 1977-09-06 | Procede pour realiser l'ajustement de masque d'exposition par rapport a une pastille de substrat |
| GB39312/77A GB1551631A (en) | 1976-09-22 | 1977-09-21 | Adjusting exposure masks relative to substrate wafers |
| IT27767/77A IT1086953B (it) | 1976-09-22 | 1977-09-21 | Dispositivo di aggiustaggio di maschere di esposizione rispetto ad un disco di substrato |
| NL7710358A NL7710358A (nl) | 1976-09-22 | 1977-09-21 | Werkwijze voor het justeren van een belich- tingsmasker ten opzichte van een substraat- schijf. |
| JP11450977A JPS5341984A (en) | 1976-09-22 | 1977-09-22 | Method of positioning exposure mask |
| BE181125A BE858958A (fr) | 1976-09-22 | 1977-09-22 | Procede pour realiser l'ajustement de masques d'exposition par rapport a une pastille de substrat |
| US05/835,746 US4118230A (en) | 1976-09-22 | 1977-09-22 | Process for adjusting exposure masks relative to a substrate wafer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19762642634 DE2642634A1 (de) | 1976-09-22 | 1976-09-22 | Verfahren zum justieren von belichtungsmasken relativ zu einer substratscheibe |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2642634A1 true DE2642634A1 (de) | 1978-03-23 |
Family
ID=5988556
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19762642634 Withdrawn DE2642634A1 (de) | 1976-09-22 | 1976-09-22 | Verfahren zum justieren von belichtungsmasken relativ zu einer substratscheibe |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US4118230A (enExample) |
| JP (1) | JPS5341984A (enExample) |
| BE (1) | BE858958A (enExample) |
| DE (1) | DE2642634A1 (enExample) |
| FR (1) | FR2365824A1 (enExample) |
| GB (1) | GB1551631A (enExample) |
| IT (1) | IT1086953B (enExample) |
| NL (1) | NL7710358A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3910048A1 (de) * | 1989-03-28 | 1990-08-30 | Heidelberg Instr Gmbh Laser Un | Verfahren zur herstellung oder inspektion von mikrostrukturen auf grossflaechigen substraten |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2066487B (en) * | 1979-12-18 | 1983-11-23 | Philips Electronic Associated | Alignment of exposure masks |
| JPS5764921A (en) * | 1980-10-08 | 1982-04-20 | Toshiba Corp | Manufacture of gaas integrated circuit |
| US4343878A (en) * | 1981-01-02 | 1982-08-10 | Amdahl Corporation | System for providing photomask alignment keys in semiconductor integrated circuit processing |
| US4883359A (en) * | 1984-02-28 | 1989-11-28 | Canon Kabushiki Kaisha | Alignment method and pattern forming method using the same |
| JP3163666B2 (ja) * | 1991-07-29 | 2001-05-08 | ソニー株式会社 | 位相シフトマスクを用いたパターン形成方法 |
| US5316984A (en) * | 1993-03-25 | 1994-05-31 | Vlsi Technology, Inc. | Bright field wafer target |
| US6576529B1 (en) * | 1999-12-07 | 2003-06-10 | Agere Systems Inc. | Method of forming an alignment feature in or on a multilayered semiconductor structure |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3477848A (en) * | 1964-12-14 | 1969-11-11 | Texas Instruments Inc | Method for producing sets of photomask having accurate registration |
| US3607267A (en) * | 1967-10-09 | 1971-09-21 | Motorola Inc | Precision alignment of photographic masks |
| US3506442A (en) * | 1968-09-27 | 1970-04-14 | Bell Telephone Labor Inc | Photomask modification and registration test methods |
| US3690881A (en) * | 1970-09-28 | 1972-09-12 | Bell Telephone Labor Inc | Moire pattern aligning of photolithographic mask |
| US3963489A (en) * | 1975-04-30 | 1976-06-15 | Western Electric Company, Inc. | Method of precisely aligning pattern-defining masks |
| US4060643A (en) * | 1976-02-02 | 1977-11-29 | Blanks William L | Method and apparatus for identifying color separation film |
-
1976
- 1976-09-22 DE DE19762642634 patent/DE2642634A1/de not_active Withdrawn
-
1977
- 1977-09-06 FR FR7726943A patent/FR2365824A1/fr active Granted
- 1977-09-21 GB GB39312/77A patent/GB1551631A/en not_active Expired
- 1977-09-21 NL NL7710358A patent/NL7710358A/xx not_active Application Discontinuation
- 1977-09-21 IT IT27767/77A patent/IT1086953B/it active
- 1977-09-22 JP JP11450977A patent/JPS5341984A/ja active Pending
- 1977-09-22 BE BE181125A patent/BE858958A/xx unknown
- 1977-09-22 US US05/835,746 patent/US4118230A/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3910048A1 (de) * | 1989-03-28 | 1990-08-30 | Heidelberg Instr Gmbh Laser Un | Verfahren zur herstellung oder inspektion von mikrostrukturen auf grossflaechigen substraten |
| US5103257A (en) * | 1989-03-28 | 1992-04-07 | Heidelberg Instruments Gmbh | Process for producing or inspecting micropatterns on large-area substrates |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5341984A (en) | 1978-04-15 |
| BE858958A (fr) | 1978-01-16 |
| IT1086953B (it) | 1985-05-31 |
| US4118230A (en) | 1978-10-03 |
| GB1551631A (en) | 1979-08-30 |
| NL7710358A (nl) | 1978-03-28 |
| FR2365824B1 (enExample) | 1981-05-08 |
| FR2365824A1 (fr) | 1978-04-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OAM | Search report available | ||
| OC | Search report available | ||
| 8110 | Request for examination paragraph 44 | ||
| 8139 | Disposal/non-payment of the annual fee |