DE2641283A1 - Verfahren zur herstellung eines flachbildschirms - Google Patents
Verfahren zur herstellung eines flachbildschirmsInfo
- Publication number
- DE2641283A1 DE2641283A1 DE19762641283 DE2641283A DE2641283A1 DE 2641283 A1 DE2641283 A1 DE 2641283A1 DE 19762641283 DE19762641283 DE 19762641283 DE 2641283 A DE2641283 A DE 2641283A DE 2641283 A1 DE2641283 A1 DE 2641283A1
- Authority
- DE
- Germany
- Prior art keywords
- areas
- intermediate layer
- lines
- layer
- cable runs
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 17
- 239000010410 layer Substances 0.000 claims description 94
- 238000000034 method Methods 0.000 claims description 64
- 229910052782 aluminium Inorganic materials 0.000 claims description 53
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 53
- 239000011247 coating layer Substances 0.000 claims description 40
- 238000005530 etching Methods 0.000 claims description 29
- 239000000758 substrate Substances 0.000 claims description 24
- 229910052751 metal Inorganic materials 0.000 claims description 14
- 239000002184 metal Substances 0.000 claims description 14
- 230000003647 oxidation Effects 0.000 claims description 7
- 238000007254 oxidation reaction Methods 0.000 claims description 7
- 230000001590 oxidative effect Effects 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 230000000873 masking effect Effects 0.000 claims description 2
- 238000004080 punching Methods 0.000 claims 1
- 230000000717 retained effect Effects 0.000 claims 1
- 239000011521 glass Substances 0.000 description 32
- 239000000243 solution Substances 0.000 description 23
- 239000000463 material Substances 0.000 description 18
- 238000000576 coating method Methods 0.000 description 16
- 229910052715 tantalum Inorganic materials 0.000 description 16
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 16
- 239000011248 coating agent Substances 0.000 description 14
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 13
- 238000007743 anodising Methods 0.000 description 12
- 239000004020 conductor Substances 0.000 description 9
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 8
- 229910052735 hafnium Inorganic materials 0.000 description 8
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 8
- 229910052758 niobium Inorganic materials 0.000 description 8
- 239000010955 niobium Substances 0.000 description 8
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 8
- 229910052726 zirconium Inorganic materials 0.000 description 8
- 229960002050 hydrofluoric acid Drugs 0.000 description 7
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 6
- 229920002120 photoresistant polymer Polymers 0.000 description 6
- 125000006850 spacer group Chemical group 0.000 description 6
- 238000000151 deposition Methods 0.000 description 5
- 150000002739 metals Chemical class 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 4
- 229910001887 tin oxide Inorganic materials 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000000889 atomisation Methods 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910006404 SnO 2 Inorganic materials 0.000 description 2
- 238000002048 anodisation reaction Methods 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000002800 charge carrier Substances 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 101100539494 Caenorhabditis elegans unc-9 gene Proteins 0.000 description 1
- 240000009029 Gluta renghas Species 0.000 description 1
- 241001676573 Minium Species 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000006735 deficit Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000010410 dusting Methods 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000001552 radio frequency sputter deposition Methods 0.000 description 1
- 230000000284 resting effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/24—Manufacture or joining of vessels, leading-in conductors or bases
- H01J9/26—Sealing together parts of vessels
- H01J9/261—Sealing together parts of vessels the vessel being for a flat panel display
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Gas-Filled Discharge Tubes (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50111717A JPS5922337B2 (ja) | 1975-09-17 | 1975-09-17 | ガス・パネル装置の製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2641283A1 true DE2641283A1 (de) | 1977-03-24 |
Family
ID=14568366
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19762641283 Withdrawn DE2641283A1 (de) | 1975-09-17 | 1976-09-14 | Verfahren zur herstellung eines flachbildschirms |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4235001A (enExample) |
| JP (1) | JPS5922337B2 (enExample) |
| DE (1) | DE2641283A1 (enExample) |
| FR (1) | FR2325130A1 (enExample) |
| GB (1) | GB1496755A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0022974A1 (de) * | 1979-07-19 | 1981-01-28 | Siemens Aktiengesellschaft | Plasma-Bildanzeigevorrichtung |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5586038A (en) * | 1978-12-22 | 1980-06-28 | Fujitsu Ltd | Method for patterning electrode of gas-discharge display panel |
| JPS61227344A (ja) * | 1985-04-01 | 1986-10-09 | Hitachi Ltd | 放電表示装置の製法 |
| JPH0774936B2 (ja) * | 1985-08-16 | 1995-08-09 | 富士通株式会社 | ガス放電パネルの製作法 |
| NL8701347A (nl) * | 1987-06-10 | 1989-01-02 | Philips Nv | Vloeibaar kristal weergeefinrichting en werkwijze ter vervaardiging van een dergelijke weergeefinrichting. |
| JPH04265936A (ja) * | 1991-02-20 | 1992-09-22 | Sony Corp | 画像表示装置の製造方法 |
| KR940004186B1 (ko) * | 1991-08-22 | 1994-05-16 | 삼성전관 주식회사 | 플라즈마 표시소자 및 그 제조방법 |
| US5810634A (en) * | 1994-09-27 | 1998-09-22 | Sony Corporation | Method of manufacturing a plasma addressed liquid crystal display device |
| KR19990039426A (ko) * | 1997-11-12 | 1999-06-05 | 구자홍 | 플라즈마 표시소자의 격벽구조 |
| US7783543B2 (en) | 2004-12-21 | 2010-08-24 | Weather Risk Solutions, Llc | Financial activity based on natural peril events |
| US7783544B2 (en) | 2004-12-21 | 2010-08-24 | Weather Risk Solutions, Llc | Financial activity concerning tropical weather events |
| US7584133B2 (en) | 2004-12-21 | 2009-09-01 | Weather Risk Solutions Llc | Financial activity based on tropical weather events |
| US7783542B2 (en) | 2004-12-21 | 2010-08-24 | Weather Risk Solutions, Llc | Financial activity with graphical user interface based on natural peril events |
| US7584134B2 (en) | 2004-12-21 | 2009-09-01 | Weather Risk Solutions, Llc | Graphical user interface for financial activity concerning tropical weather events |
| US8266042B2 (en) | 2004-12-21 | 2012-09-11 | Weather Risk Solutions, Llc | Financial activity based on natural peril events |
| US7693766B2 (en) | 2004-12-21 | 2010-04-06 | Weather Risk Solutions Llc | Financial activity based on natural events |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS431055Y1 (enExample) * | 1965-03-26 | 1968-01-19 | ||
| US3559190A (en) * | 1966-01-18 | 1971-01-26 | Univ Illinois | Gaseous display and memory apparatus |
| BE755591Q (fr) * | 1967-11-24 | 1971-02-15 | Owens Illinois Inc | Dispositif de memorisation et de reproduction a decharges gazeuses et son mode de fonctionnement |
| JPS4813986B1 (enExample) * | 1968-06-12 | 1973-05-02 | ||
| US3805210A (en) * | 1969-12-04 | 1974-04-16 | M Croset | Integrated circuit resistor and a method for the manufacture thereof |
| FR2077476A1 (enExample) * | 1970-01-07 | 1971-10-29 | Semi Conducteurs | |
| US3646384A (en) * | 1970-06-09 | 1972-02-29 | Ibm | One-sided plasma display panel |
| GB1390105A (en) * | 1971-06-21 | 1975-04-09 | Fujitsu Ltd | Gas discharge display device and a method for fabricating the same |
| US3787106A (en) * | 1971-11-09 | 1974-01-22 | Owens Illinois Inc | Monolithically structured gas discharge device and method of fabrication |
| JPS5217995B2 (enExample) * | 1972-02-18 | 1977-05-19 | ||
| US3808497A (en) * | 1972-05-08 | 1974-04-30 | Ibm | Gaseous discharge device and method of spacing the plates thereof |
-
1975
- 1975-09-17 JP JP50111717A patent/JPS5922337B2/ja not_active Expired
-
1976
- 1976-08-10 FR FR7625016A patent/FR2325130A1/fr active Granted
- 1976-08-17 GB GB34138/76A patent/GB1496755A/en not_active Expired
- 1976-09-14 DE DE19762641283 patent/DE2641283A1/de not_active Withdrawn
-
1978
- 1978-04-27 US US05/900,446 patent/US4235001A/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0022974A1 (de) * | 1979-07-19 | 1981-01-28 | Siemens Aktiengesellschaft | Plasma-Bildanzeigevorrichtung |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2325130B1 (enExample) | 1979-04-06 |
| FR2325130A1 (fr) | 1977-04-15 |
| JPS5922337B2 (ja) | 1984-05-25 |
| GB1496755A (en) | 1978-01-05 |
| JPS5236467A (en) | 1977-03-19 |
| US4235001A (en) | 1980-11-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OD | Request for examination | ||
| 8130 | Withdrawal |