FR2077476A1 - - Google Patents
Info
- Publication number
- FR2077476A1 FR2077476A1 FR7000385A FR7000385A FR2077476A1 FR 2077476 A1 FR2077476 A1 FR 2077476A1 FR 7000385 A FR7000385 A FR 7000385A FR 7000385 A FR7000385 A FR 7000385A FR 2077476 A1 FR2077476 A1 FR 2077476A1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
- H10P14/6302—Non-deposition formation processes
- H10P14/6304—Formation by oxidation, e.g. oxidation of the substrate
- H10P14/6314—Formation by oxidation, e.g. oxidation of the substrate of a metallic layer
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
- H10P14/6302—Non-deposition formation processes
- H10P14/6322—Formation by thermal treatments
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/69—Inorganic materials
- H10P14/692—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses
- H10P14/6938—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides
- H10P14/6939—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides characterised by the metal
- H10P14/69393—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides characterised by the metal the material containing tantalum, e.g. Ta2O5
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7000385A FR2077476A1 (enExample) | 1970-01-07 | 1970-01-07 | |
| US00102382A US3737341A (en) | 1970-01-07 | 1970-12-29 | Novel method of manufacturing protective oxide films,and structures embodying such films |
| DE2100154A DE2100154C3 (de) | 1970-01-07 | 1971-01-04 | Verfahren zum Aufbringen einer Oxyd-Schutzschicht vorbestimmter Form auf eine Oberfläche eines Halbleitersubstrats |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7000385A FR2077476A1 (enExample) | 1970-01-07 | 1970-01-07 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| FR2077476A1 true FR2077476A1 (enExample) | 1971-10-29 |
Family
ID=9048676
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7000385A Withdrawn FR2077476A1 (enExample) | 1970-01-07 | 1970-01-07 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US3737341A (enExample) |
| DE (1) | DE2100154C3 (enExample) |
| FR (1) | FR2077476A1 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3983284A (en) * | 1972-06-02 | 1976-09-28 | Thomson-Csf | Flat connection for a semiconductor multilayer structure |
| JPS5922337B2 (ja) * | 1975-09-17 | 1984-05-25 | ニホンアイ ビ− エム カブシキガイシヤ | ガス・パネル装置の製造方法 |
| US4496419A (en) * | 1983-02-28 | 1985-01-29 | Cornell Research Foundation, Inc. | Fine line patterning method for submicron devices |
| JPS6142140A (ja) * | 1984-07-30 | 1986-02-28 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 自己整合構造の形成方法 |
| WO1997035812A1 (en) * | 1996-03-28 | 1997-10-02 | Corning Incorporated | Polarizing glasses having integral non-polarizing regions |
| US6524773B1 (en) | 1996-03-28 | 2003-02-25 | Corning Incorporated | Polarizing glasses having integral non-polarizing regions |
| US6171762B1 (en) | 1996-03-28 | 2001-01-09 | Corning Incorporated | Polarizing glasses having integral non-polarizing regions |
| EP0891306B1 (en) * | 1996-04-04 | 2005-08-24 | Corning Incorporated | Method of reductively forming patterend coloration in a glass substrate by means of a patterned barrier film |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1349608A (fr) * | 1963-02-21 | 1964-01-17 | Western Electric Co | Décapage de l'aluminium par la technique de réserve |
| GB1003663A (en) * | 1963-06-28 | 1965-09-08 | Ibm | Anodizing method |
-
1970
- 1970-01-07 FR FR7000385A patent/FR2077476A1/fr not_active Withdrawn
- 1970-12-29 US US00102382A patent/US3737341A/en not_active Expired - Lifetime
-
1971
- 1971-01-04 DE DE2100154A patent/DE2100154C3/de not_active Expired
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1349608A (fr) * | 1963-02-21 | 1964-01-17 | Western Electric Co | Décapage de l'aluminium par la technique de réserve |
| GB1003663A (en) * | 1963-06-28 | 1965-09-08 | Ibm | Anodizing method |
Non-Patent Citations (4)
| Title |
|---|
| (REVUE AMERICAINE"IEEE TRANSACTIONS ON ELECTRON DEVICES"VOLUME ED-13,NO.5,MAI 1966."A COMPATIBLETECHNIQUE FOR THE FORMATION OF THIN TA FILM RESISTORS ON SILICON INTEGRATED CIRCUITS.M.J.WALKERPAGES 472-477.) * |
| PAGES 472-477.) * |
| REVUE AMERICAINE"IEEE TRANSACTIONS ON ELECTRON DEVICES"VOLUME ED-13,NO.5,MAI 1966."A COMPATIBLE * |
| TECHNIQUE FOR THE FORMATION OF THIN TA FILM RESISTORS ON SILICON INTEGRATED CIRCUITS.M.J.WALKER * |
Also Published As
| Publication number | Publication date |
|---|---|
| DE2100154C3 (de) | 1978-11-23 |
| DE2100154B2 (de) | 1978-03-23 |
| DE2100154A1 (de) | 1971-07-15 |
| US3737341A (en) | 1973-06-05 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| TP | Transmission of property | ||
| ST | Notification of lapse |