DE2556291C3 - Raster-Ionenmikroskop - Google Patents
Raster-IonenmikroskopInfo
- Publication number
- DE2556291C3 DE2556291C3 DE2556291A DE2556291A DE2556291C3 DE 2556291 C3 DE2556291 C3 DE 2556291C3 DE 2556291 A DE2556291 A DE 2556291A DE 2556291 A DE2556291 A DE 2556291A DE 2556291 C3 DE2556291 C3 DE 2556291C3
- Authority
- DE
- Germany
- Prior art keywords
- sample
- mass
- ion beam
- analyzer
- primary
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 150000002500 ions Chemical class 0.000 claims description 51
- 238000010884 ion-beam technique Methods 0.000 claims description 27
- 238000009826 distribution Methods 0.000 claims description 9
- 230000001133 acceleration Effects 0.000 claims description 6
- 238000004458 analytical method Methods 0.000 claims description 6
- 238000012876 topography Methods 0.000 claims description 6
- 239000003990 capacitor Substances 0.000 claims description 4
- 238000000605 extraction Methods 0.000 claims description 3
- 238000001514 detection method Methods 0.000 claims description 2
- 230000035945 sensitivity Effects 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 claims 4
- 238000003384 imaging method Methods 0.000 claims 4
- 239000007787 solid Substances 0.000 claims 3
- 230000007812 deficiency Effects 0.000 claims 2
- 238000000889 atomisation Methods 0.000 claims 1
- 238000001819 mass spectrum Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 238000004452 microanalysis Methods 0.000 claims 1
- 238000007431 microscopic evaluation Methods 0.000 claims 1
- 238000001004 secondary ion mass spectrometry Methods 0.000 claims 1
- 230000001360 synchronised effect Effects 0.000 claims 1
- 238000012800 visualization Methods 0.000 claims 1
- 230000005684 electric field Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- -1 argon ions Chemical class 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 238000004626 scanning electron microscopy Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/252—Tubes for spot-analysing by electron or ion beams; Microanalysers
- H01J37/256—Tubes for spot-analysing by electron or ion beams; Microanalysers using scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/10—Lenses
- H01J37/12—Lenses electrostatic
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2556291A DE2556291C3 (de) | 1975-12-13 | 1975-12-13 | Raster-Ionenmikroskop |
| GB18755/76A GB1490496A (en) | 1975-12-13 | 1976-05-07 | Raster scanning ion microscope with quadrupole mass filte |
| US05/701,683 US4132892A (en) | 1975-12-13 | 1976-07-01 | Raster scanning ion microscope with quadrupole mass filter |
| FR7623714A FR2335038A1 (fr) | 1975-12-13 | 1976-08-03 | Microscope ionique a grille |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2556291A DE2556291C3 (de) | 1975-12-13 | 1975-12-13 | Raster-Ionenmikroskop |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| DE2556291A1 DE2556291A1 (de) | 1977-06-23 |
| DE2556291B2 DE2556291B2 (de) | 1980-03-27 |
| DE2556291C3 true DE2556291C3 (de) | 1980-11-27 |
Family
ID=5964353
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2556291A Expired DE2556291C3 (de) | 1975-12-13 | 1975-12-13 | Raster-Ionenmikroskop |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4132892A (enExample) |
| DE (1) | DE2556291C3 (enExample) |
| FR (1) | FR2335038A1 (enExample) |
| GB (1) | GB1490496A (enExample) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2950330C2 (de) * | 1979-12-14 | 1983-06-01 | Leybold-Heraeus GmbH, 5000 Köln | Vorrichtung zur chemischen Analyse von Proben |
| US4315153A (en) * | 1980-05-19 | 1982-02-09 | Hughes Aircraft Company | Focusing ExB mass separator for space-charge dominated ion beams |
| JPS6197557A (ja) * | 1984-10-19 | 1986-05-16 | Kawasaki Steel Corp | 二次イオン質量分析装置 |
| US4661702A (en) * | 1984-10-24 | 1987-04-28 | The Perkin-Elmer Corporation | Primary ion beam raster gating technique for secondary ion mass spectrometer system |
| US4633084A (en) * | 1985-01-16 | 1986-12-30 | The United States Of America As Represented By The United States Department Of Energy | High efficiency direct detection of ions from resonance ionization of sputtered atoms |
| US4556794A (en) * | 1985-01-30 | 1985-12-03 | Hughes Aircraft Company | Secondary ion collection and transport system for ion microprobe |
| US4829179A (en) * | 1986-07-12 | 1989-05-09 | Nissin Electric Company, Limited | Surface analyzer |
| US4785173A (en) * | 1987-03-09 | 1988-11-15 | Anelva Corporation | Element analyzing apparatus |
| US4800273A (en) * | 1988-01-07 | 1989-01-24 | Phillips Bradway F | Secondary ion mass spectrometer |
| US4968888A (en) * | 1989-07-05 | 1990-11-06 | The United States Of America As Represented By The United States Department Of Energy | Pulsed field sample neutralization |
| JP3260663B2 (ja) * | 1997-07-23 | 2002-02-25 | 沖電気工業株式会社 | ホール内表面の組成分布検出方法 |
| US6153880A (en) * | 1999-09-30 | 2000-11-28 | Agilent Technologies, Inc. | Method and apparatus for performance improvement of mass spectrometers using dynamic ion optics |
| GB2386747A (en) * | 2001-11-08 | 2003-09-24 | Ionoptika Ltd | Fullerene ion gun |
| DE102004030523A1 (de) * | 2004-06-18 | 2006-01-12 | Siemens Ag | Transportsystem für Nanopartikel und Verfahren zu dessen Betrieb |
| EP2027594B1 (en) * | 2005-07-08 | 2011-12-14 | NexGen Semi Holding, Inc. | Apparatus and method for controlled particle beam manufacturing of semiconductors |
| WO2008140585A1 (en) | 2006-11-22 | 2008-11-20 | Nexgen Semi Holding, Inc. | Apparatus and method for conformal mask manufacturing |
| US10991545B2 (en) | 2008-06-30 | 2021-04-27 | Nexgen Semi Holding, Inc. | Method and device for spatial charged particle bunching |
| US10566169B1 (en) | 2008-06-30 | 2020-02-18 | Nexgen Semi Holding, Inc. | Method and device for spatial charged particle bunching |
| US9245722B2 (en) * | 2013-09-16 | 2016-01-26 | Georgia Tech Research Corporation | SMS probe and SEM imaging system and methods of use |
| US12493005B1 (en) | 2022-06-07 | 2025-12-09 | Nexgen Semi Holding, Inc. | Extended range active illumination imager |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5034439B1 (enExample) * | 1969-05-16 | 1975-11-08 | ||
| US3894233A (en) * | 1972-10-27 | 1975-07-08 | Hitachi Ltd | Ion microprobe analyzer |
| DE2255302C3 (de) * | 1972-11-11 | 1980-09-11 | Leybold-Heraeus Gmbh, 5000 Koeln | Einrichtung für die Sekundär-Ionen-Massenspektroskopie |
| JPS5015594A (enExample) * | 1973-06-08 | 1975-02-19 | ||
| DE2347946A1 (de) * | 1973-09-24 | 1975-04-10 | Max Planck Gesellschaft | Quadrupolfeld-massenanalysator hoher eingangsapertur |
| DE2414221C3 (de) * | 1974-03-25 | 1979-01-18 | Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E.V., 3400 Goettingen | Ionenoptisches Gerät zur Untersuchung der Oberfläche einer Probe durch IonenbeschuB und Analyse der vom beschossenen Oberflächenbereich ausgehenden Ionen |
-
1975
- 1975-12-13 DE DE2556291A patent/DE2556291C3/de not_active Expired
-
1976
- 1976-05-07 GB GB18755/76A patent/GB1490496A/en not_active Expired
- 1976-07-01 US US05/701,683 patent/US4132892A/en not_active Expired - Lifetime
- 1976-08-03 FR FR7623714A patent/FR2335038A1/fr active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| DE2556291B2 (de) | 1980-03-27 |
| DE2556291A1 (de) | 1977-06-23 |
| FR2335038A1 (fr) | 1977-07-08 |
| FR2335038B1 (enExample) | 1981-09-04 |
| GB1490496A (en) | 1977-11-02 |
| US4132892A (en) | 1979-01-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C3 | Grant after two publication steps (3rd publication) |