DE2442300A1 - Verfahren zum elektroplattieren - Google Patents
Verfahren zum elektroplattierenInfo
- Publication number
- DE2442300A1 DE2442300A1 DE2442300A DE2442300A DE2442300A1 DE 2442300 A1 DE2442300 A1 DE 2442300A1 DE 2442300 A DE2442300 A DE 2442300A DE 2442300 A DE2442300 A DE 2442300A DE 2442300 A1 DE2442300 A1 DE 2442300A1
- Authority
- DE
- Germany
- Prior art keywords
- plating
- layer
- magnetic
- current density
- ferromagnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title claims description 34
- 238000009713 electroplating Methods 0.000 title claims description 14
- 238000007747 plating Methods 0.000 claims description 125
- 230000005291 magnetic effect Effects 0.000 claims description 51
- 230000005294 ferromagnetic effect Effects 0.000 claims description 37
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 33
- 239000010949 copper Substances 0.000 claims description 17
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 16
- 229910052802 copper Inorganic materials 0.000 claims description 16
- 229910052759 nickel Inorganic materials 0.000 claims description 16
- 230000008021 deposition Effects 0.000 claims description 13
- 239000011701 zinc Substances 0.000 claims description 13
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 12
- 229910052725 zinc Inorganic materials 0.000 claims description 12
- 239000002245 particle Substances 0.000 claims description 9
- 229910017052 cobalt Inorganic materials 0.000 claims description 8
- 239000010941 cobalt Substances 0.000 claims description 8
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 8
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 7
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 7
- 239000011135 tin Substances 0.000 claims description 7
- 229910052718 tin Inorganic materials 0.000 claims description 7
- 238000005253 cladding Methods 0.000 claims description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 5
- 229910052737 gold Inorganic materials 0.000 claims description 5
- 239000010931 gold Substances 0.000 claims description 5
- 229910052804 chromium Inorganic materials 0.000 claims 6
- 239000011651 chromium Substances 0.000 claims 6
- 229910052698 phosphorus Inorganic materials 0.000 claims 6
- 239000011574 phosphorus Substances 0.000 claims 6
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims 4
- -1 phosphorus compound Chemical class 0.000 claims 2
- 150000001869 cobalt compounds Chemical class 0.000 claims 1
- 150000003606 tin compounds Chemical class 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- 150000002739 metals Chemical class 0.000 description 5
- 241000080590 Niso Species 0.000 description 4
- 239000012876 carrier material Substances 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 3
- 230000005415 magnetization Effects 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 150000002815 nickel Chemical class 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- 101001055222 Homo sapiens Interleukin-8 Proteins 0.000 description 1
- 102100026236 Interleukin-8 Human genes 0.000 description 1
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- 235000010724 Wisteria floribunda Nutrition 0.000 description 1
- QXZUUHYBWMWJHK-UHFFFAOYSA-N [Co].[Ni] Chemical compound [Co].[Ni] QXZUUHYBWMWJHK-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007600 charging Methods 0.000 description 1
- 229910001429 cobalt ion Inorganic materials 0.000 description 1
- XLJKHNWPARRRJB-UHFFFAOYSA-N cobalt(2+) Chemical compound [Co+2] XLJKHNWPARRRJB-UHFFFAOYSA-N 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 229910001453 nickel ion Inorganic materials 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000010278 pulse charging Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000005028 tinplate Substances 0.000 description 1
- 230000005612 types of electricity Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Thin Magnetic Films (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9964173A JPS5713637B2 (enrdf_load_stackoverflow) | 1973-09-04 | 1973-09-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2442300A1 true DE2442300A1 (de) | 1975-03-20 |
Family
ID=14252671
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2442300A Withdrawn DE2442300A1 (de) | 1973-09-04 | 1974-09-04 | Verfahren zum elektroplattieren |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPS5713637B2 (enrdf_load_stackoverflow) |
| DE (1) | DE2442300A1 (enrdf_load_stackoverflow) |
| GB (1) | GB1433850A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4699695A (en) * | 1984-07-20 | 1987-10-13 | Rieger Franz Metallveredelung | Nickel plating bath |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IL76592A (en) * | 1985-10-06 | 1989-03-31 | Technion Res & Dev Foundation | Method for electrodeposition of at least two metals from a single solution |
| US4869971A (en) * | 1986-05-22 | 1989-09-26 | Nee Chin Cheng | Multilayer pulsed-current electrodeposition process |
| JPH023423U (enrdf_load_stackoverflow) * | 1988-06-20 | 1990-01-10 | ||
| EP1346083A2 (en) * | 2000-11-03 | 2003-09-24 | Shipley Company LLC | Electrochemical co-deposition of metals for electronic device manufacture |
| KR100848689B1 (ko) * | 2006-11-01 | 2008-07-28 | 고려대학교 산학협력단 | 다층 나노선 및 이의 형성방법 |
-
1973
- 1973-09-04 JP JP9964173A patent/JPS5713637B2/ja not_active Expired
-
1974
- 1974-09-04 DE DE2442300A patent/DE2442300A1/de not_active Withdrawn
- 1974-09-04 GB GB3874674A patent/GB1433850A/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4699695A (en) * | 1984-07-20 | 1987-10-13 | Rieger Franz Metallveredelung | Nickel plating bath |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5713637B2 (enrdf_load_stackoverflow) | 1982-03-18 |
| GB1433850A (en) | 1976-04-28 |
| JPS5050237A (enrdf_load_stackoverflow) | 1975-05-06 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8141 | Disposal/no request for examination |