DE2401998C2 - Kopierverfahren, insbesondere für die Herstellung von integrierten Schaltungen - Google Patents
Kopierverfahren, insbesondere für die Herstellung von integrierten SchaltungenInfo
- Publication number
- DE2401998C2 DE2401998C2 DE19742401998 DE2401998A DE2401998C2 DE 2401998 C2 DE2401998 C2 DE 2401998C2 DE 19742401998 DE19742401998 DE 19742401998 DE 2401998 A DE2401998 A DE 2401998A DE 2401998 C2 DE2401998 C2 DE 2401998C2
- Authority
- DE
- Germany
- Prior art keywords
- light
- layer
- photosensitive layer
- sensitive
- filter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 title claims description 35
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 239000000463 material Substances 0.000 claims description 17
- 230000003595 spectral effect Effects 0.000 claims description 9
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 claims description 6
- 229910052753 mercury Inorganic materials 0.000 claims description 6
- 230000035945 sensitivity Effects 0.000 claims description 5
- 230000005540 biological transmission Effects 0.000 claims description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 33
- 229910052710 silicon Inorganic materials 0.000 description 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 12
- 239000010703 silicon Substances 0.000 description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- 239000004065 semiconductor Substances 0.000 description 8
- 239000000758 substrate Substances 0.000 description 6
- 229910052681 coesite Inorganic materials 0.000 description 5
- 229910052906 cristobalite Inorganic materials 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 229910052682 stishovite Inorganic materials 0.000 description 5
- 229910052905 tridymite Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 235000012239 silicon dioxide Nutrition 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 238000010276 construction Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 230000037303 wrinkles Effects 0.000 description 3
- 230000004075 alteration Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B15/00—Special procedures for taking photographs; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Measurement Of Current Or Voltage (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP720773A JPS5612011B2 (enrdf_load_stackoverflow) | 1973-01-16 | 1973-01-16 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE2401998A1 DE2401998A1 (de) | 1974-07-25 |
| DE2401998C2 true DE2401998C2 (de) | 1983-04-14 |
Family
ID=11659554
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19742401998 Expired DE2401998C2 (de) | 1973-01-16 | 1974-01-16 | Kopierverfahren, insbesondere für die Herstellung von integrierten Schaltungen |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS5612011B2 (enrdf_load_stackoverflow) |
| DE (1) | DE2401998C2 (enrdf_load_stackoverflow) |
| FR (1) | FR2224787B1 (enrdf_load_stackoverflow) |
| GB (2) | GB1461471A (enrdf_load_stackoverflow) |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3576630A (en) * | 1966-10-29 | 1971-04-27 | Nippon Electric Co | Photo-etching process |
| DE1614636A1 (de) * | 1967-09-23 | 1971-02-25 | Siemens Ag | Verfahren zum Herstellen einer Fotolackmaske fuer Halbleiterzwecke |
| CH484517A (de) * | 1968-06-28 | 1970-01-15 | Ibm | Verfahren zum Aufbringen eines Stoffes auf einen begrenzten Oberflächenbereich eines Halbleiters |
| DE2116713B2 (de) * | 1971-04-06 | 1974-03-28 | Ibm Deutschland Gmbh, 7000 Stuttgart | Belichtungsverfahren zum Abbilden sehr fein strukturierter Lichtmuster auf Photolackschichten und dazu geeignete Belichtungsvorrichtung |
-
1973
- 1973-01-16 JP JP720773A patent/JPS5612011B2/ja not_active Expired
-
1974
- 1974-01-03 GB GB25274A patent/GB1461471A/en not_active Expired
- 1974-01-03 GB GB3728276A patent/GB1461472A/en not_active Expired
- 1974-01-15 FR FR7401340A patent/FR2224787B1/fr not_active Expired
- 1974-01-16 DE DE19742401998 patent/DE2401998C2/de not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| FR2224787B1 (enrdf_load_stackoverflow) | 1980-01-11 |
| GB1461471A (en) | 1977-01-13 |
| JPS5612011B2 (enrdf_load_stackoverflow) | 1981-03-18 |
| GB1461472A (en) | 1977-01-13 |
| JPS4996675A (enrdf_load_stackoverflow) | 1974-09-12 |
| DE2401998A1 (de) | 1974-07-25 |
| FR2224787A1 (enrdf_load_stackoverflow) | 1974-10-31 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8125 | Change of the main classification |
Ipc: G03C 5/08 |
|
| D2 | Grant after examination | ||
| 8363 | Opposition against the patent | ||
| 8331 | Complete revocation |