FR2224787A1 - - Google Patents

Info

Publication number
FR2224787A1
FR2224787A1 FR7401340A FR7401340A FR2224787A1 FR 2224787 A1 FR2224787 A1 FR 2224787A1 FR 7401340 A FR7401340 A FR 7401340A FR 7401340 A FR7401340 A FR 7401340A FR 2224787 A1 FR2224787 A1 FR 2224787A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7401340A
Other languages
French (fr)
Other versions
FR2224787B1 (enrdf_load_stackoverflow
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of FR2224787A1 publication Critical patent/FR2224787A1/fr
Application granted granted Critical
Publication of FR2224787B1 publication Critical patent/FR2224787B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B15/00—Special procedures for taking photographs; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Measurement Of Current Or Voltage (AREA)
FR7401340A 1973-01-16 1974-01-15 Expired FR2224787B1 (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP720773A JPS5612011B2 (enrdf_load_stackoverflow) 1973-01-16 1973-01-16

Publications (2)

Publication Number Publication Date
FR2224787A1 true FR2224787A1 (enrdf_load_stackoverflow) 1974-10-31
FR2224787B1 FR2224787B1 (enrdf_load_stackoverflow) 1980-01-11

Family

ID=11659554

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7401340A Expired FR2224787B1 (enrdf_load_stackoverflow) 1973-01-16 1974-01-15

Country Status (4)

Country Link
JP (1) JPS5612011B2 (enrdf_load_stackoverflow)
DE (1) DE2401998C2 (enrdf_load_stackoverflow)
FR (1) FR2224787B1 (enrdf_load_stackoverflow)
GB (2) GB1461471A (enrdf_load_stackoverflow)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3576630A (en) * 1966-10-29 1971-04-27 Nippon Electric Co Photo-etching process
DE1614636A1 (de) * 1967-09-23 1971-02-25 Siemens Ag Verfahren zum Herstellen einer Fotolackmaske fuer Halbleiterzwecke
CH484517A (de) * 1968-06-28 1970-01-15 Ibm Verfahren zum Aufbringen eines Stoffes auf einen begrenzten Oberflächenbereich eines Halbleiters
DE2116713B2 (de) * 1971-04-06 1974-03-28 Ibm Deutschland Gmbh, 7000 Stuttgart Belichtungsverfahren zum Abbilden sehr fein strukturierter Lichtmuster auf Photolackschichten und dazu geeignete Belichtungsvorrichtung

Also Published As

Publication number Publication date
FR2224787B1 (enrdf_load_stackoverflow) 1980-01-11
GB1461471A (en) 1977-01-13
JPS5612011B2 (enrdf_load_stackoverflow) 1981-03-18
GB1461472A (en) 1977-01-13
DE2401998C2 (de) 1983-04-14
JPS4996675A (enrdf_load_stackoverflow) 1974-09-12
DE2401998A1 (de) 1974-07-25

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