GB1461472A - Apparatus for imagewise exposing a layer of photosensitive material - Google Patents

Apparatus for imagewise exposing a layer of photosensitive material

Info

Publication number
GB1461472A
GB1461472A GB3728276A GB3728276A GB1461472A GB 1461472 A GB1461472 A GB 1461472A GB 3728276 A GB3728276 A GB 3728276A GB 3728276 A GB3728276 A GB 3728276A GB 1461472 A GB1461472 A GB 1461472A
Authority
GB
United Kingdom
Prior art keywords
layer
imagewise exposing
jan
photo
photosensitive material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3728276A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of GB1461472A publication Critical patent/GB1461472A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B15/00—Special procedures for taking photographs; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Measurement Of Current Or Voltage (AREA)

Abstract

1461472 Photo-copying CANON KK 3 Jan 1974 [16 Jan 1973] 37282/76 Divided out of 1461471 Heading G2A The subject matter of this Specification is continued in Specification 1461471 but the claims are concerned with apparatus for imagewise exposing a layer of photo-sensitive material comprising a mercury vapour actinic radiation source, means enabling the said layer to be observed and positioned under non-actinic illumination, means defining an exposure path by which the said layer can be exposed to an actinic radiation image of an original illuminated from the said source, and filtering means in the exposure path for attenuating two radiation lines relative to a third line.
GB3728276A 1973-01-16 1974-01-03 Apparatus for imagewise exposing a layer of photosensitive material Expired GB1461472A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP720773A JPS5612011B2 (en) 1973-01-16 1973-01-16

Publications (1)

Publication Number Publication Date
GB1461472A true GB1461472A (en) 1977-01-13

Family

ID=11659554

Family Applications (2)

Application Number Title Priority Date Filing Date
GB25274A Expired GB1461471A (en) 1973-01-16 1974-01-03 Exposure method
GB3728276A Expired GB1461472A (en) 1973-01-16 1974-01-03 Apparatus for imagewise exposing a layer of photosensitive material

Family Applications Before (1)

Application Number Title Priority Date Filing Date
GB25274A Expired GB1461471A (en) 1973-01-16 1974-01-03 Exposure method

Country Status (4)

Country Link
JP (1) JPS5612011B2 (en)
DE (1) DE2401998C2 (en)
FR (1) FR2224787B1 (en)
GB (2) GB1461471A (en)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3576630A (en) * 1966-10-29 1971-04-27 Nippon Electric Co Photo-etching process
DE1614636A1 (en) * 1967-09-23 1971-02-25 Siemens Ag Method for producing a photoresist mask for semiconductor purposes
CH497792A (en) * 1968-06-28 1970-10-15 Ibm Method of manufacturing semiconductor devices
DE2116713B2 (en) * 1971-04-06 1974-03-28 Ibm Deutschland Gmbh, 7000 Stuttgart Exposure method for imaging very finely structured light patterns on photoresist layers and a suitable exposure device

Also Published As

Publication number Publication date
DE2401998C2 (en) 1983-04-14
FR2224787B1 (en) 1980-01-11
JPS4996675A (en) 1974-09-12
GB1461471A (en) 1977-01-13
FR2224787A1 (en) 1974-10-31
DE2401998A1 (en) 1974-07-25
JPS5612011B2 (en) 1981-03-18

Similar Documents

Publication Publication Date Title
ES446881A1 (en) Interimage effects with spontaneously developable silver halide
GB1461685A (en) Method and means for forming an aligned mask that does not include alignment marks employed in aligning the mask
GB1391270A (en) Photolithography
ES373165A1 (en) Light-sensitive reproduction material and process for the preparation of a printing forme
GB581001A (en) Improvements in diazotype processes
GB1461472A (en) Apparatus for imagewise exposing a layer of photosensitive material
GB1048135A (en) Photographic reproduction process
GB1530184A (en) Colour printing method
JPS5317720A (en) Silver halide light sensitive material
GB1256971A (en)
GB2024453B (en) Partial exposure frame for photographic copying of eg negatives on diapositives onto copying paper
ES326326A1 (en) A procedure for the preparation of a plate for printing in offset. (Machine-translation by Google Translate, not legally binding)
JPS5218311A (en) Super high contrast silver halide photographic emulsion
GB1179318A (en) Improvements in or relating to Automatically Producing Prints from Strip Film.
FR2406223B1 (en) PHOTOGRAPHIC SHEET POSITIONING DEVICE FOR PHOTOGRAPHIC FILM PROCESSING DEVICE
US2905070A (en) Photoprinting apparatus
GB2013356A (en) Colour photographic silver halide material containing a development inhibitor releasing compound
GB1430110A (en) Identification card
GB1054812A (en)
JPS53130029A (en) Multilayer silver halide color photographic material
ES410394A1 (en) Methods of manufacture of color picture tubes
GB1306874A (en) Method of making photographic images
US3232760A (en) Photographic registration and compositing method for preparing resists for etching gravure cylinders
FR2412100A1 (en) Prodn. method for autotype of irregular structure - using coarse grained photographic material and developing in infection developer
GB1180438A (en) Process and Reproduction Material for Duplicating Silver Films

Legal Events

Date Code Title Description
PS Patent sealed
PE20 Patent expired after termination of 20 years

Effective date: 19940102