ES373165A1 - Light-sensitive reproduction material and process for the preparation of a printing forme - Google Patents

Light-sensitive reproduction material and process for the preparation of a printing forme

Info

Publication number
ES373165A1
ES373165A1 ES373165A ES373165A ES373165A1 ES 373165 A1 ES373165 A1 ES 373165A1 ES 373165 A ES373165 A ES 373165A ES 373165 A ES373165 A ES 373165A ES 373165 A1 ES373165 A1 ES 373165A1
Authority
ES
Spain
Prior art keywords
photosensitive
diazo compounds
light
layer
copying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES373165A
Other languages
Spanish (es)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kalle GmbH and Co KG
Original Assignee
Kalle GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19681813443 external-priority patent/DE1813443C3/en
Application filed by Kalle GmbH and Co KG filed Critical Kalle GmbH and Co KG
Publication of ES373165A1 publication Critical patent/ES373165A1/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

Abstract

A procedure for making a flatbed printing plate by exposing a copy layer, which contains at least two related photosensitive diazo compounds, of a photosensitive copy material intended for making a printing plate, without reticulum, and by developing the layer exposed copying, to obtain the printing image of the printing press, characterized in that a photosensitive copying material is used, in whose copying layer there are photosensitive diazo compounds of such a different photosensitivity that at least one of them, relative to a source chosen luminous that emits a light that causes a photochemical decomposition of all the photosensitive diazo compounds in the copy layer, is at least one and a half times more photosensitive than the other diazo compounds, and because the exposure without reticulum is carried out with the light source chosen. (Machine-translation by Google Translate, not legally binding)
ES373165A 1968-12-09 1969-11-04 Light-sensitive reproduction material and process for the preparation of a printing forme Expired ES373165A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19681813443 DE1813443C3 (en) 1968-12-09 Photographic printing plate with a diazo copying layer

Publications (1)

Publication Number Publication Date
ES373165A1 true ES373165A1 (en) 1971-12-16

Family

ID=5715630

Family Applications (1)

Application Number Title Priority Date Filing Date
ES373165A Expired ES373165A1 (en) 1968-12-09 1969-11-04 Light-sensitive reproduction material and process for the preparation of a printing forme

Country Status (10)

Country Link
AT (1) AT296345B (en)
BE (1) BE741653A (en)
BR (1) BR6914892D0 (en)
CH (1) CH512083A (en)
ES (1) ES373165A1 (en)
FR (1) FR2025641A1 (en)
GB (1) GB1293396A (en)
IL (1) IL33344A (en)
NL (1) NL6916962A (en)
SE (1) SE358974B (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5929245A (en) * 1982-08-11 1984-02-16 Hitachi Ltd Photosensitive composition and formation of pattern using it
GB8529958D0 (en) * 1985-12-05 1986-01-15 Vickers Plc Radiation sensitive devices
EP0737894B1 (en) * 1995-02-15 2000-06-07 Agfa-Gevaert N.V. A diazo based imaging element having improved storage stability
WO1999061410A1 (en) 1998-05-12 1999-12-02 American Home Products Corporation 2,3,5-substituted biphenyls useful in the treatment of insulin resistance and hyperglycemia
US6221902B1 (en) 1998-05-12 2001-04-24 American Home Products Corporation Biphenyl sulfonyl aryl carboxylic acids useful in the treatment of insulin resistance and hyperglycemia
US6451827B2 (en) 1998-05-12 2002-09-17 Wyeth 2,3,5-substituted biphenyls useful in the treatment of insulin resistance and hyperglycemia
US6232322B1 (en) 1998-05-12 2001-05-15 American Home Products Corporation Biphenyl oxo-acetic acids useful in the treatment of insulin resistance and hyperglycemia
US6110963A (en) * 1998-05-12 2000-08-29 American Home Products Corporation Aryl-oxo-acetic acids useful in the treatment of insulin resistance and hyperglycemia
US6063815A (en) * 1998-05-12 2000-05-16 American Home Products Corporation Benzopenones useful in the treatment of insulin resistance and hyperglycemia
US6699896B1 (en) 1998-05-12 2004-03-02 Wyeth Oxazole-aryl-carboxylic acids useful in the treatment of insulin resistance and hyperglycemia
US6310081B1 (en) 1999-05-10 2001-10-30 American Home Products Corporation Biphenyl sulfonyl aryl carboxylic acids useful in the treatment of insulin resistance and hyperglycemia

Also Published As

Publication number Publication date
NL6916962A (en) 1970-06-11
GB1293396A (en) 1972-10-18
SE358974B (en) 1973-08-13
FR2025641A1 (en) 1970-09-11
CH512083A (en) 1971-08-31
BE741653A (en) 1970-05-13
DE1813443B2 (en) 1976-07-22
AT296345B (en) 1972-02-10
IL33344A0 (en) 1970-01-29
DE1813443A1 (en) 1970-06-25
IL33344A (en) 1973-07-30
BR6914892D0 (en) 1973-01-11

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