GB1293396A - Light-sensitive reproduction material and process for the preparation of a printing forme - Google Patents

Light-sensitive reproduction material and process for the preparation of a printing forme

Info

Publication number
GB1293396A
GB1293396A GB55105/69A GB5510569A GB1293396A GB 1293396 A GB1293396 A GB 1293396A GB 55105/69 A GB55105/69 A GB 55105/69A GB 5510569 A GB5510569 A GB 5510569A GB 1293396 A GB1293396 A GB 1293396A
Authority
GB
United Kingdom
Prior art keywords
compounds
diazide
sensitive
light
naphthoquinone
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB55105/69A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kalle GmbH and Co KG
Original Assignee
Kalle GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19681813443 external-priority patent/DE1813443C3/en
Application filed by Kalle GmbH and Co KG filed Critical Kalle GmbH and Co KG
Publication of GB1293396A publication Critical patent/GB1293396A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing

Abstract

1293396 Photo-sensitive materials KALLE A G 11 Nov 1969 [9 Dec 1968] 55105/69 Heading G2C Light-sensitive material for the production of printing plates comprises a support coated with a layer containing at least two compounds, one compound being at least one and half times more sensitive to a light source which decomposes both or all the compounds, the compounds being (i) an ester or amide of a 1, 2-naphthoquinone 2-diazide-5-sulphonic acid with an ester or amide of a 1, 2-naphthoquinone-2-diazide-4- sulphonic acid, (ii) a 3-methoxy diphenylamine- 4-diazonium/formaldehyde condensate with a diphenylamine-4-diazonium/formaldehyde condensate or (iii) a p-quinone diazide with a piminoquinone diazide. The two compounds may be in a moler ratio of 4:6 to 6:4 and are preferably mixed with a polymer such as a novolak or a resole, cellulose acetate, polyvinyl chloride, a styrene copolymer, a polyurethane, an epoxy or an acrylic resin or a maleic acid/resin condensate. The material may be used for continuous tone work and in the examples is exposed to a step wedge and produces more steps on development than does a material only containing one of the compounds. The support is preferably roughened e.g. by sand-blasting or by rotating wire brushes or a light-sensitive layer produced as disclosed in Specification 1238072 or Specification 1293161 is used to improve continuous tape reproduction.
GB55105/69A 1968-12-09 1969-11-11 Light-sensitive reproduction material and process for the preparation of a printing forme Expired GB1293396A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19681813443 DE1813443C3 (en) 1968-12-09 Photographic printing plate with a diazo copying layer

Publications (1)

Publication Number Publication Date
GB1293396A true GB1293396A (en) 1972-10-18

Family

ID=5715630

Family Applications (1)

Application Number Title Priority Date Filing Date
GB55105/69A Expired GB1293396A (en) 1968-12-09 1969-11-11 Light-sensitive reproduction material and process for the preparation of a printing forme

Country Status (10)

Country Link
AT (1) AT296345B (en)
BE (1) BE741653A (en)
BR (1) BR6914892D0 (en)
CH (1) CH512083A (en)
ES (1) ES373165A1 (en)
FR (1) FR2025641A1 (en)
GB (1) GB1293396A (en)
IL (1) IL33344A (en)
NL (1) NL6916962A (en)
SE (1) SE358974B (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0100920A1 (en) * 1982-08-11 1984-02-22 Hitachi, Ltd. Photosensitive composition and pattern forming process using same
US6063815A (en) * 1998-05-12 2000-05-16 American Home Products Corporation Benzopenones useful in the treatment of insulin resistance and hyperglycemia
US6110963A (en) * 1998-05-12 2000-08-29 American Home Products Corporation Aryl-oxo-acetic acids useful in the treatment of insulin resistance and hyperglycemia
US6214877B1 (en) 1998-05-12 2001-04-10 John A. Butera 2,3,5-substituted biphenyls useful in the treatment of insulin resistance and hyperglycemia
US6221902B1 (en) 1998-05-12 2001-04-24 American Home Products Corporation Biphenyl sulfonyl aryl carboxylic acids useful in the treatment of insulin resistance and hyperglycemia
US6232322B1 (en) 1998-05-12 2001-05-15 American Home Products Corporation Biphenyl oxo-acetic acids useful in the treatment of insulin resistance and hyperglycemia
US6310081B1 (en) 1999-05-10 2001-10-30 American Home Products Corporation Biphenyl sulfonyl aryl carboxylic acids useful in the treatment of insulin resistance and hyperglycemia
US6451827B2 (en) 1998-05-12 2002-09-17 Wyeth 2,3,5-substituted biphenyls useful in the treatment of insulin resistance and hyperglycemia
US6699896B1 (en) 1998-05-12 2004-03-02 Wyeth Oxazole-aryl-carboxylic acids useful in the treatment of insulin resistance and hyperglycemia

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8529958D0 (en) * 1985-12-05 1986-01-15 Vickers Plc Radiation sensitive devices
EP0737894B1 (en) * 1995-02-15 2000-06-07 Agfa-Gevaert N.V. A diazo based imaging element having improved storage stability

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0100920A1 (en) * 1982-08-11 1984-02-22 Hitachi, Ltd. Photosensitive composition and pattern forming process using same
US6451827B2 (en) 1998-05-12 2002-09-17 Wyeth 2,3,5-substituted biphenyls useful in the treatment of insulin resistance and hyperglycemia
US6110963A (en) * 1998-05-12 2000-08-29 American Home Products Corporation Aryl-oxo-acetic acids useful in the treatment of insulin resistance and hyperglycemia
US6214877B1 (en) 1998-05-12 2001-04-10 John A. Butera 2,3,5-substituted biphenyls useful in the treatment of insulin resistance and hyperglycemia
US6221902B1 (en) 1998-05-12 2001-04-24 American Home Products Corporation Biphenyl sulfonyl aryl carboxylic acids useful in the treatment of insulin resistance and hyperglycemia
US6232322B1 (en) 1998-05-12 2001-05-15 American Home Products Corporation Biphenyl oxo-acetic acids useful in the treatment of insulin resistance and hyperglycemia
US6369072B2 (en) 1998-05-12 2002-04-09 American Home Products Corporation Biphenyl oxo-acetic acids useful in the treatment of insulin resistance and hyperglycemia
US6391897B2 (en) 1998-05-12 2002-05-21 American Home Products Corporation Biphenyl oxo-acetic acids useful in the treatment of insulin resistance and hyperglycemia
US6063815A (en) * 1998-05-12 2000-05-16 American Home Products Corporation Benzopenones useful in the treatment of insulin resistance and hyperglycemia
US6699896B1 (en) 1998-05-12 2004-03-02 Wyeth Oxazole-aryl-carboxylic acids useful in the treatment of insulin resistance and hyperglycemia
US6765021B2 (en) 1998-05-12 2004-07-20 Wyeth 2,3,5-substituted biphenyls useful in the treatment of insulin resistance and hyperglycemia
US7008636B2 (en) 1998-05-12 2006-03-07 Wyeth 2,3,5-substituted biphenyls useful in the treatment of insulin resistance and hyperglycemia
US7141672B2 (en) 1998-05-12 2006-11-28 Wyeth Oxazole-aryl-carboxylic acids useful in the treatment of insulin resistance and hyperglycemia
US6310081B1 (en) 1999-05-10 2001-10-30 American Home Products Corporation Biphenyl sulfonyl aryl carboxylic acids useful in the treatment of insulin resistance and hyperglycemia

Also Published As

Publication number Publication date
DE1813443B2 (en) 1976-07-22
SE358974B (en) 1973-08-13
BE741653A (en) 1970-05-13
BR6914892D0 (en) 1973-01-11
FR2025641A1 (en) 1970-09-11
NL6916962A (en) 1970-06-11
IL33344A0 (en) 1970-01-29
DE1813443A1 (en) 1970-06-25
ES373165A1 (en) 1971-12-16
CH512083A (en) 1971-08-31
IL33344A (en) 1973-07-30
AT296345B (en) 1972-02-10

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PLE Entries relating assignments, transmissions, licences in the register of patents
PCNP Patent ceased through non-payment of renewal fee