JPS5612011B2 - - Google Patents

Info

Publication number
JPS5612011B2
JPS5612011B2 JP720773A JP720773A JPS5612011B2 JP S5612011 B2 JPS5612011 B2 JP S5612011B2 JP 720773 A JP720773 A JP 720773A JP 720773 A JP720773 A JP 720773A JP S5612011 B2 JPS5612011 B2 JP S5612011B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP720773A
Other languages
Japanese (ja)
Other versions
JPS4996675A (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP720773A priority Critical patent/JPS5612011B2/ja
Priority to GB25274A priority patent/GB1461471A/en
Priority to GB3728276A priority patent/GB1461472A/en
Priority to FR7401340A priority patent/FR2224787B1/fr
Priority to DE19742401998 priority patent/DE2401998C2/de
Publication of JPS4996675A publication Critical patent/JPS4996675A/ja
Priority to US05/629,561 priority patent/US4032341A/en
Priority to US05/785,047 priority patent/US4083634A/en
Publication of JPS5612011B2 publication Critical patent/JPS5612011B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B15/00—Special procedures for taking photographs; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Measurement Of Current Or Voltage (AREA)
JP720773A 1973-01-16 1973-01-16 Expired JPS5612011B2 (enrdf_load_stackoverflow)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP720773A JPS5612011B2 (enrdf_load_stackoverflow) 1973-01-16 1973-01-16
GB25274A GB1461471A (en) 1973-01-16 1974-01-03 Exposure method
GB3728276A GB1461472A (en) 1973-01-16 1974-01-03 Apparatus for imagewise exposing a layer of photosensitive material
FR7401340A FR2224787B1 (enrdf_load_stackoverflow) 1973-01-16 1974-01-15
DE19742401998 DE2401998C2 (de) 1973-01-16 1974-01-16 Kopierverfahren, insbesondere für die Herstellung von integrierten Schaltungen
US05/629,561 US4032341A (en) 1973-01-16 1975-11-06 Pattern exposure using a polychromatic light source
US05/785,047 US4083634A (en) 1973-01-16 1977-04-06 Pattern exposure apparatus using polychromatic light source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP720773A JPS5612011B2 (enrdf_load_stackoverflow) 1973-01-16 1973-01-16

Publications (2)

Publication Number Publication Date
JPS4996675A JPS4996675A (enrdf_load_stackoverflow) 1974-09-12
JPS5612011B2 true JPS5612011B2 (enrdf_load_stackoverflow) 1981-03-18

Family

ID=11659554

Family Applications (1)

Application Number Title Priority Date Filing Date
JP720773A Expired JPS5612011B2 (enrdf_load_stackoverflow) 1973-01-16 1973-01-16

Country Status (4)

Country Link
JP (1) JPS5612011B2 (enrdf_load_stackoverflow)
DE (1) DE2401998C2 (enrdf_load_stackoverflow)
FR (1) FR2224787B1 (enrdf_load_stackoverflow)
GB (2) GB1461471A (enrdf_load_stackoverflow)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3576630A (en) * 1966-10-29 1971-04-27 Nippon Electric Co Photo-etching process
DE1614636A1 (de) * 1967-09-23 1971-02-25 Siemens Ag Verfahren zum Herstellen einer Fotolackmaske fuer Halbleiterzwecke
CH484517A (de) * 1968-06-28 1970-01-15 Ibm Verfahren zum Aufbringen eines Stoffes auf einen begrenzten Oberflächenbereich eines Halbleiters
DE2116713B2 (de) * 1971-04-06 1974-03-28 Ibm Deutschland Gmbh, 7000 Stuttgart Belichtungsverfahren zum Abbilden sehr fein strukturierter Lichtmuster auf Photolackschichten und dazu geeignete Belichtungsvorrichtung

Also Published As

Publication number Publication date
FR2224787B1 (enrdf_load_stackoverflow) 1980-01-11
GB1461471A (en) 1977-01-13
GB1461472A (en) 1977-01-13
DE2401998C2 (de) 1983-04-14
JPS4996675A (enrdf_load_stackoverflow) 1974-09-12
DE2401998A1 (de) 1974-07-25
FR2224787A1 (enrdf_load_stackoverflow) 1974-10-31

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