DE69126456T2 - Belichtungsgerät - Google Patents
BelichtungsgerätInfo
- Publication number
- DE69126456T2 DE69126456T2 DE69126456T DE69126456T DE69126456T2 DE 69126456 T2 DE69126456 T2 DE 69126456T2 DE 69126456 T DE69126456 T DE 69126456T DE 69126456 T DE69126456 T DE 69126456T DE 69126456 T2 DE69126456 T2 DE 69126456T2
- Authority
- DE
- Germany
- Prior art keywords
- exposure device
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
- G03F7/70891—Temperature
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2049583A JP2860578B2 (ja) | 1990-03-02 | 1990-03-02 | 露光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69126456D1 DE69126456D1 (de) | 1997-07-17 |
DE69126456T2 true DE69126456T2 (de) | 1997-11-06 |
Family
ID=12835241
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69126456T Expired - Fee Related DE69126456T2 (de) | 1990-03-02 | 1991-02-28 | Belichtungsgerät |
Country Status (4)
Country | Link |
---|---|
US (1) | US5150391A (de) |
EP (1) | EP0444936B1 (de) |
JP (1) | JP2860578B2 (de) |
DE (1) | DE69126456T2 (de) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3224157B2 (ja) * | 1992-03-31 | 2001-10-29 | キヤノン株式会社 | X線マスクとその製造方法、並びに該x線マスクを用いたデバイス製造方法とx線露光装置 |
KR940007963A (ko) * | 1992-09-03 | 1994-04-28 | 오오가 노리오 | 판그물 및 투과형 전자현미경용 시료의 연마방법 |
KR0139039B1 (ko) * | 1993-06-30 | 1998-06-01 | 미타라이 하지메 | 노광장치와 이것을 이용한 디바이스 제조방법 |
US5593800A (en) * | 1994-01-06 | 1997-01-14 | Canon Kabushiki Kaisha | Mask manufacturing method and apparatus and device manufacturing method using a mask manufactured by the method or apparatus |
JP3291408B2 (ja) * | 1994-04-04 | 2002-06-10 | キヤノン株式会社 | 露光装置および集積回路の製造方法 |
JP3402750B2 (ja) * | 1994-05-25 | 2003-05-06 | キヤノン株式会社 | 位置合わせ方法及びそれを用いた素子の製造方法 |
JPH08115872A (ja) * | 1994-10-13 | 1996-05-07 | Nikon Corp | 露光装置 |
DE69521107T2 (de) * | 1994-11-29 | 2001-10-31 | Canon Kk | Ausrichtverfahren und Halbleiterbelichtungsverfahren |
JP3261948B2 (ja) * | 1995-03-28 | 2002-03-04 | キヤノン株式会社 | X線露光用マスク及びそれを用いた半導体素子の製造方法 |
JP3894509B2 (ja) * | 1995-08-07 | 2007-03-22 | キヤノン株式会社 | 光学装置、露光装置およびデバイス製造方法 |
JP3634487B2 (ja) * | 1996-02-09 | 2005-03-30 | キヤノン株式会社 | 位置合せ方法、位置合せ装置、および露光装置 |
TW341719B (en) * | 1996-03-01 | 1998-10-01 | Canon Kk | Surface position detecting method and scanning exposure method using the same |
US6559465B1 (en) | 1996-08-02 | 2003-05-06 | Canon Kabushiki Kaisha | Surface position detecting method having a detection timing determination |
JP3337921B2 (ja) | 1996-08-23 | 2002-10-28 | キヤノン株式会社 | 投影露光装置および位置合せ方法 |
US5917580A (en) * | 1996-08-29 | 1999-06-29 | Canon Kabushiki Kaisha | Scan exposure method and apparatus |
JP3745167B2 (ja) * | 1998-07-29 | 2006-02-15 | キヤノン株式会社 | ステージ装置、露光装置およびデバイス製造方法ならびにステージ駆動方法 |
JP2001332490A (ja) * | 2000-03-14 | 2001-11-30 | Nikon Corp | 位置合わせ方法、露光方法、露光装置、及びデバイス製造方法 |
US7151271B2 (en) * | 2003-10-08 | 2006-12-19 | Taiwan Semiconductor Manufacturing Co., Ltd. | System and method for passing high energy particles through a mask |
KR101549709B1 (ko) | 2006-11-09 | 2015-09-11 | 가부시키가이샤 니콘 | 유지 장치, 위치 검출 장치 및 노광 장치, 이동 방법, 위치검출 방법, 노광 방법, 검출계의 조정 방법, 그리고 디바이스 제조 방법 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0715869B2 (ja) * | 1983-09-30 | 1995-02-22 | 株式会社日立製作所 | 軟x線露光装置 |
JPS6197918A (ja) * | 1984-10-19 | 1986-05-16 | Hitachi Ltd | X線露光装置 |
EP0253283A3 (de) * | 1986-07-15 | 1988-07-20 | Siemens Aktiengesellschaft | Anordnung zur Belichtung von Halbleiterscheiben mittels Synchrotronstrahlung in einem Lithographiegerät |
DE3888876T2 (de) * | 1987-06-15 | 1994-10-27 | Canon Kk | Belichtungsvorrichtung. |
AT393334B (de) * | 1988-01-22 | 1991-09-25 | Ims Ionen Mikrofab Syst | Anordnung zur stabilisierung einer bestrahlten maske |
JP2631485B2 (ja) * | 1988-01-28 | 1997-07-16 | キヤノン株式会社 | 位置決め装置 |
EP0336537B1 (de) * | 1988-02-16 | 1995-12-20 | Canon Kabushiki Kaisha | Vorrichtung zum Nachweis der örtlichen Beziehung zwischen zwei Objekten |
JP2744245B2 (ja) * | 1988-03-25 | 1998-04-28 | キヤノン株式会社 | 露光装置と露光方法 |
EP0358521B1 (de) * | 1988-09-09 | 1995-06-07 | Canon Kabushiki Kaisha | Belichtungsvorrichtung |
JP2805220B2 (ja) * | 1989-09-21 | 1998-09-30 | キヤノン株式会社 | 露光装置 |
-
1990
- 1990-03-02 JP JP2049583A patent/JP2860578B2/ja not_active Expired - Fee Related
-
1991
- 1991-02-28 DE DE69126456T patent/DE69126456T2/de not_active Expired - Fee Related
- 1991-02-28 EP EP91301656A patent/EP0444936B1/de not_active Expired - Lifetime
-
1992
- 1992-02-05 US US07/830,449 patent/US5150391A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0444936B1 (de) | 1997-06-11 |
JP2860578B2 (ja) | 1999-02-24 |
DE69126456D1 (de) | 1997-07-17 |
EP0444936A3 (en) | 1991-12-11 |
EP0444936A2 (de) | 1991-09-04 |
JPH03253018A (ja) | 1991-11-12 |
US5150391A (en) | 1992-09-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |