DE69129355D1 - Projektionsbelichtungsvorrichtung - Google Patents

Projektionsbelichtungsvorrichtung

Info

Publication number
DE69129355D1
DE69129355D1 DE69129355T DE69129355T DE69129355D1 DE 69129355 D1 DE69129355 D1 DE 69129355D1 DE 69129355 T DE69129355 T DE 69129355T DE 69129355 T DE69129355 T DE 69129355T DE 69129355 D1 DE69129355 D1 DE 69129355D1
Authority
DE
Germany
Prior art keywords
exposure device
projection exposure
projection
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69129355T
Other languages
English (en)
Other versions
DE69129355T2 (de
Inventor
Yasuyuki Sakakibara
Susumu Makinouchi
Nobutaka Magome
Naomasa Shiraishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=26529934&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69129355(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of DE69129355D1 publication Critical patent/DE69129355D1/de
Application granted granted Critical
Publication of DE69129355T2 publication Critical patent/DE69129355T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70325—Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses
    • G03F7/70333—Focus drilling, i.e. increase in depth of focus for exposure by modulating focus during exposure [FLEX]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
DE69129355T 1990-10-30 1991-10-30 Projektionsbelichtungsvorrichtung Expired - Fee Related DE69129355T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP29316290 1990-10-30
JP23153091A JP3234891B2 (ja) 1990-10-30 1991-09-11 投影露光装置

Publications (2)

Publication Number Publication Date
DE69129355D1 true DE69129355D1 (de) 1998-06-10
DE69129355T2 DE69129355T2 (de) 1998-10-22

Family

ID=26529934

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69129355T Expired - Fee Related DE69129355T2 (de) 1990-10-30 1991-10-30 Projektionsbelichtungsvorrichtung

Country Status (3)

Country Link
EP (2) EP0484131B1 (de)
JP (1) JP3234891B2 (de)
DE (1) DE69129355T2 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2705312B2 (ja) * 1990-12-06 1998-01-28 ソニー株式会社 投影露光方法
KR100538685B1 (ko) * 1993-04-06 2006-09-14 가부시키가이샤 니콘 투영노광장치, 노광방법, 및 소자 제조 방법
JPH09320921A (ja) * 1996-05-24 1997-12-12 Nikon Corp ベースライン量の測定方法及び投影露光装置
JP3796367B2 (ja) * 1999-03-09 2006-07-12 キヤノン株式会社 ステージ制御方法、露光方法、露光装置およびデバイス製造方法
SG110121A1 (en) * 2003-09-10 2005-04-28 Asml Netherlands Bv Method for exposing a substrate and lithographic projection apparatus
KR102428750B1 (ko) * 2017-10-19 2022-08-02 사이머 엘엘씨 단일의 리소그래피 노광 패스로 복수의 에어리얼 이미지를 형성하는 방법
JP7261089B2 (ja) 2019-05-29 2023-04-19 旭化成株式会社 フレキソ印刷原版、及びフレキソ印刷版の製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5817446A (ja) * 1981-07-24 1983-02-01 Hitachi Ltd 投影露光方法および装置
US4869999A (en) * 1986-08-08 1989-09-26 Hitachi, Ltd. Method of forming pattern and projection aligner for carrying out the same
JP2705312B2 (ja) * 1990-12-06 1998-01-28 ソニー株式会社 投影露光方法

Also Published As

Publication number Publication date
JPH0513305A (ja) 1993-01-22
EP0484131A2 (de) 1992-05-06
EP0484131A3 (en) 1992-09-09
EP0819988A1 (de) 1998-01-21
DE69129355T2 (de) 1998-10-22
JP3234891B2 (ja) 2001-12-04
EP0484131B1 (de) 1998-05-06

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee