DE2341734B2 - Verfahren zur Herstellung einer Reliefdruckform - Google Patents

Verfahren zur Herstellung einer Reliefdruckform

Info

Publication number
DE2341734B2
DE2341734B2 DE19732341734 DE2341734A DE2341734B2 DE 2341734 B2 DE2341734 B2 DE 2341734B2 DE 19732341734 DE19732341734 DE 19732341734 DE 2341734 A DE2341734 A DE 2341734A DE 2341734 B2 DE2341734 B2 DE 2341734B2
Authority
DE
Germany
Prior art keywords
film
thickness
refractive index
acid
photopolymerizable layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE19732341734
Other languages
German (de)
English (en)
Other versions
DE2341734A1 (de
Inventor
Tsunetoshi Saitama Kai
Masayoshi Tokio Mizuno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Corp
Original Assignee
Asahi Kasei Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kasei Kogyo KK filed Critical Asahi Kasei Kogyo KK
Publication of DE2341734A1 publication Critical patent/DE2341734A1/de
Publication of DE2341734B2 publication Critical patent/DE2341734B2/de
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
DE19732341734 1972-08-18 1973-08-17 Verfahren zur Herstellung einer Reliefdruckform Ceased DE2341734B2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP47082087A JPS5040043B2 (ja) 1972-08-18 1972-08-18

Publications (2)

Publication Number Publication Date
DE2341734A1 DE2341734A1 (de) 1974-03-07
DE2341734B2 true DE2341734B2 (de) 1978-09-14

Family

ID=13764647

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19732341734 Ceased DE2341734B2 (de) 1972-08-18 1973-08-17 Verfahren zur Herstellung einer Reliefdruckform

Country Status (4)

Country Link
JP (1) JPS5040043B2 (ja)
DE (1) DE2341734B2 (ja)
FR (1) FR2196488B1 (ja)
GB (1) GB1426376A (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS513621A (ja) * 1974-06-28 1976-01-13 Shigeru Usami Reriifusakuseihoho
FR2514159A1 (fr) * 1981-10-02 1983-04-08 Rhone Poulenc Syst Composition photosensible et plaque lithographique realisee a l'aide de cette composition

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE525225A (ja) * 1951-08-20
US3573975A (en) * 1968-07-10 1971-04-06 Ibm Photochemical fabrication process
CA923358A (en) * 1969-08-01 1973-03-27 Fuji Photo Film Co. Light-sensitive stencil printing material

Also Published As

Publication number Publication date
FR2196488B1 (ja) 1974-11-08
GB1426376A (en) 1976-02-25
JPS5040043B2 (ja) 1975-12-22
FR2196488A1 (ja) 1974-03-15
JPS4937702A (ja) 1974-04-08
DE2341734A1 (de) 1974-03-07

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Legal Events

Date Code Title Description
8228 New agent

Free format text: STREHL, P., DIPL.-ING. DIPL.-WIRTSCH.-ING. SCHUEBEL-HOPF, U., DIPL.-CHEM. DR.RER.NAT., PAT.-ANW., 8000 MUENCHEN

8235 Patent refused